JP2523938Y2 - 拡散炉の排気装置 - Google Patents

拡散炉の排気装置

Info

Publication number
JP2523938Y2
JP2523938Y2 JP1989102454U JP10245489U JP2523938Y2 JP 2523938 Y2 JP2523938 Y2 JP 2523938Y2 JP 1989102454 U JP1989102454 U JP 1989102454U JP 10245489 U JP10245489 U JP 10245489U JP 2523938 Y2 JP2523938 Y2 JP 2523938Y2
Authority
JP
Japan
Prior art keywords
gas
core tube
exhaust chamber
furnace core
exhaust
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1989102454U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0341928U (enExample
Inventor
節雄 平岡
Original Assignee
関西日本電気株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 関西日本電気株式会社 filed Critical 関西日本電気株式会社
Priority to JP1989102454U priority Critical patent/JP2523938Y2/ja
Publication of JPH0341928U publication Critical patent/JPH0341928U/ja
Application granted granted Critical
Publication of JP2523938Y2 publication Critical patent/JP2523938Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
JP1989102454U 1989-08-31 1989-08-31 拡散炉の排気装置 Expired - Lifetime JP2523938Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989102454U JP2523938Y2 (ja) 1989-08-31 1989-08-31 拡散炉の排気装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989102454U JP2523938Y2 (ja) 1989-08-31 1989-08-31 拡散炉の排気装置

Publications (2)

Publication Number Publication Date
JPH0341928U JPH0341928U (enExample) 1991-04-22
JP2523938Y2 true JP2523938Y2 (ja) 1997-01-29

Family

ID=31651350

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989102454U Expired - Lifetime JP2523938Y2 (ja) 1989-08-31 1989-08-31 拡散炉の排気装置

Country Status (1)

Country Link
JP (1) JP2523938Y2 (enExample)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61190929A (ja) * 1985-02-20 1986-08-25 Hitachi Ltd 処理装置

Also Published As

Publication number Publication date
JPH0341928U (enExample) 1991-04-22

Similar Documents

Publication Publication Date Title
JP2935474B2 (ja) 平坦な基板を処理する装置及び方法
JP3073886B2 (ja) 基板の熱処理装置
US20210054507A1 (en) Apparatus for treating substrate
US8734148B2 (en) Heat treatment apparatus and method of manufacturing semiconductor device
JP2006080098A (ja) 基板処理装置および半導体装置の製造方法
JPS62206826A (ja) 半導体熱処理装置
KR100639712B1 (ko) 퍼니스 장치 및 그 장치를 사용한 열처리 방법
JP3111395B2 (ja) 熱処理装置
JP3341965B2 (ja) 縦型同軸プラズマ処理装置
WO2004027846A1 (ja) 基板処理装置および半導体装置の製造方法
JP4255237B2 (ja) 基板処理装置及び基板処理方法
JPS63111621A (ja) エツチング処理装置
JP2729238B2 (ja) 縦型処理装置
JP2004104029A (ja) 基板処理装置および半導体装置の製造方法
JPS63200536A (ja) 酸化シリコン膜形成装置
JPS61290713A (ja) 処理装置
JP2004023060A (ja) 基板処理装置
KR200360036Y1 (ko) 퍼니스 장치
KR100752148B1 (ko) 기판 처리 설비
JP2992576B2 (ja) 縦型熱処理装置
KR100328837B1 (ko) 반도체 확산장치
JPH02139919A (ja) 半導体装置の製造装置
KR200361897Y1 (ko) 퍼니스 장치
JPS60200531A (ja) 処理装置
JPH01198016A (ja) 横形プラズマｃｖｄ装置