JP2513136Y2 - イオン注入装置 - Google Patents
イオン注入装置Info
- Publication number
- JP2513136Y2 JP2513136Y2 JP12972690U JP12972690U JP2513136Y2 JP 2513136 Y2 JP2513136 Y2 JP 2513136Y2 JP 12972690 U JP12972690 U JP 12972690U JP 12972690 U JP12972690 U JP 12972690U JP 2513136 Y2 JP2513136 Y2 JP 2513136Y2
- Authority
- JP
- Japan
- Prior art keywords
- ion
- ion beam
- thin film
- fork
- ion implanter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 19
- 229910003460 diamond Inorganic materials 0.000 claims description 15
- 239000010432 diamond Substances 0.000 claims description 15
- 239000010409 thin film Substances 0.000 claims description 11
- 150000002500 ions Chemical class 0.000 description 16
- 238000005468 ion implantation Methods 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 6
- 238000011109 contamination Methods 0.000 description 6
- 229910001385 heavy metal Inorganic materials 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- -1 19 F + Chemical class 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229910015900 BF3 Inorganic materials 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12972690U JP2513136Y2 (ja) | 1990-11-30 | 1990-11-30 | イオン注入装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12972690U JP2513136Y2 (ja) | 1990-11-30 | 1990-11-30 | イオン注入装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0485645U JPH0485645U (cs) | 1992-07-24 |
| JP2513136Y2 true JP2513136Y2 (ja) | 1996-10-02 |
Family
ID=31877117
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12972690U Expired - Lifetime JP2513136Y2 (ja) | 1990-11-30 | 1990-11-30 | イオン注入装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2513136Y2 (cs) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3428303B2 (ja) * | 1996-07-11 | 2003-07-22 | 日新電機株式会社 | イオン照射装置 |
-
1990
- 1990-11-30 JP JP12972690U patent/JP2513136Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0485645U (cs) | 1992-07-24 |
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