JP2513136Y2 - イオン注入装置 - Google Patents

イオン注入装置

Info

Publication number
JP2513136Y2
JP2513136Y2 JP12972690U JP12972690U JP2513136Y2 JP 2513136 Y2 JP2513136 Y2 JP 2513136Y2 JP 12972690 U JP12972690 U JP 12972690U JP 12972690 U JP12972690 U JP 12972690U JP 2513136 Y2 JP2513136 Y2 JP 2513136Y2
Authority
JP
Japan
Prior art keywords
ion
ion beam
thin film
fork
ion implanter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP12972690U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0485645U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
雄司 山口
Original Assignee
関西日本電気株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 関西日本電気株式会社 filed Critical 関西日本電気株式会社
Priority to JP12972690U priority Critical patent/JP2513136Y2/ja
Publication of JPH0485645U publication Critical patent/JPH0485645U/ja
Application granted granted Critical
Publication of JP2513136Y2 publication Critical patent/JP2513136Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP12972690U 1990-11-30 1990-11-30 イオン注入装置 Expired - Lifetime JP2513136Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12972690U JP2513136Y2 (ja) 1990-11-30 1990-11-30 イオン注入装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12972690U JP2513136Y2 (ja) 1990-11-30 1990-11-30 イオン注入装置

Publications (2)

Publication Number Publication Date
JPH0485645U JPH0485645U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-07-24
JP2513136Y2 true JP2513136Y2 (ja) 1996-10-02

Family

ID=31877117

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12972690U Expired - Lifetime JP2513136Y2 (ja) 1990-11-30 1990-11-30 イオン注入装置

Country Status (1)

Country Link
JP (1) JP2513136Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3428303B2 (ja) * 1996-07-11 2003-07-22 日新電機株式会社 イオン照射装置

Also Published As

Publication number Publication date
JPH0485645U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-07-24

Similar Documents

Publication Publication Date Title
US2932588A (en) Methods of manufacturing thin films of refractory dielectric materials
JPH0133548B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH033249A (ja) 基板保持装置
US6815696B2 (en) Beam stop for use in an ion implantation system
US5284539A (en) Method of making segmented pyrolytic graphite sputtering targets
JPH06176724A (ja) イオン源装置
JPH02297857A (ja) 伝導冷却マイクロチャネルプレート電子増倍装置
JP2513136Y2 (ja) イオン注入装置
JPH0752749B2 (ja) ウエハ−保持機構
JP2003197607A (ja) 焦電性高誘電体のエッチング方法及び装置
JP3024148B2 (ja) エッチング装置
JPH11106914A (ja) 対向マグネトロン複合スパッタ装置
JPS57155369A (en) High vacuum ion plating method and apparatus
JPS62208647A (ja) ウエハ−保持機構
US3723778A (en) Thickness sensor for sputtering systems utilizing magnetic deflection of electrons for thermal protection
JPS58141387A (ja) スパツタ装置
JPH02254162A (ja) スパッタ装置
JPH0350328U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPS5848421A (ja) ドライエツチング装置
JP2789665B2 (ja) 焦電材料基板への薄膜形成装置
JPH036366A (ja) 反応蒸着装置用基板ホルダー固定台
JPS60180125A (ja) 真空装置用試料保持治具装置
JPS6146017A (ja) 薄膜生成装置
JPH051375A (ja) 真空処理装置
Terada Aluminium ionimpression onto gallium arsenide