JP2512705Y2 - 融液面レベル測定装置 - Google Patents

融液面レベル測定装置

Info

Publication number
JP2512705Y2
JP2512705Y2 JP1989076492U JP7649289U JP2512705Y2 JP 2512705 Y2 JP2512705 Y2 JP 2512705Y2 JP 1989076492 U JP1989076492 U JP 1989076492U JP 7649289 U JP7649289 U JP 7649289U JP 2512705 Y2 JP2512705 Y2 JP 2512705Y2
Authority
JP
Japan
Prior art keywords
melt surface
surface level
light receiving
output
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP1989076492U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0318171U (en, 2012
Inventor
貴範 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Sumitomo Sitix Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Sitix Corp filed Critical Sumitomo Sitix Corp
Priority to JP1989076492U priority Critical patent/JP2512705Y2/ja
Publication of JPH0318171U publication Critical patent/JPH0318171U/ja
Application granted granted Critical
Publication of JP2512705Y2 publication Critical patent/JP2512705Y2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
JP1989076492U 1989-06-29 1989-06-29 融液面レベル測定装置 Expired - Fee Related JP2512705Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989076492U JP2512705Y2 (ja) 1989-06-29 1989-06-29 融液面レベル測定装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989076492U JP2512705Y2 (ja) 1989-06-29 1989-06-29 融液面レベル測定装置

Publications (2)

Publication Number Publication Date
JPH0318171U JPH0318171U (en, 2012) 1991-02-22
JP2512705Y2 true JP2512705Y2 (ja) 1996-10-02

Family

ID=31618012

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989076492U Expired - Fee Related JP2512705Y2 (ja) 1989-06-29 1989-06-29 融液面レベル測定装置

Country Status (1)

Country Link
JP (1) JP2512705Y2 (en, 2012)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS512211Y2 (en, 2012) * 1971-03-18 1976-01-22
JPS5612204U (en, 2012) * 1979-07-06 1981-02-02

Also Published As

Publication number Publication date
JPH0318171U (en, 2012) 1991-02-22

Similar Documents

Publication Publication Date Title
US3953128A (en) Process and apparatus for filament or slit size monitoring
JPS6134410A (ja) 光学測定装置
JP2512705Y2 (ja) 融液面レベル測定装置
TWI880926B (zh) 非接觸式晶圓厚度測定裝置
JPH0449048B2 (en, 2012)
JP2559551B2 (ja) 透明板状体の平面歪測定装置
JPH047803B2 (en, 2012)
JPH0359363B2 (en, 2012)
JP3024643B1 (ja) 結晶断面形状測定方法
JP3473313B2 (ja) 結晶直径測定方法
JPH063115A (ja) 試料高さ計測装置
JPS5842946Y2 (ja) 可動材料の速度および／あるいは長さを測定するための装置
JPH02309204A (ja) 被測定対象物の段差検出装置
JP2742060B2 (ja) 単結晶引上げ装置の直径計測方法及び装置
JPH0669276U (ja) 融液面レベル測定装置
JPS6310761B2 (en, 2012)
JP2970020B2 (ja) コーティング薄膜の形成方法
RU2281349C2 (ru) Способ измерения уровня расплава при выращивании кристаллов
JPS61210920A (ja) 自動複屈折計
JPH0593613A (ja) 微小間隔測定装置及び方法
RU2073200C1 (ru) Оптико-электронное измерительное устройство
JPS5826325Y2 (ja) 位置検出装置
JPH02279585A (ja) Ｃｚ法における融液温度検出法
JPH03285888A (ja) 単結晶柱の直径測定方法
JPS593304A (ja) 寸法測定方法

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees