JP2024545240A5 - - Google Patents
Info
- Publication number
- JP2024545240A5 JP2024545240A5 JP2024535841A JP2024535841A JP2024545240A5 JP 2024545240 A5 JP2024545240 A5 JP 2024545240A5 JP 2024535841 A JP2024535841 A JP 2024535841A JP 2024535841 A JP2024535841 A JP 2024535841A JP 2024545240 A5 JP2024545240 A5 JP 2024545240A5
- Authority
- JP
- Japan
- Prior art keywords
- etching residue
- weight
- solution according
- residue removal
- photoresist stripping
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202163265439P | 2021-12-15 | 2021-12-15 | |
| US63/265,439 | 2021-12-15 | ||
| PCT/US2022/080658 WO2023114638A1 (en) | 2021-12-15 | 2022-11-30 | Compositions for removing photoresist and etch residue from a substrate with copper corrosion inhibitor and uses thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024545240A JP2024545240A (ja) | 2024-12-05 |
| JP2024545240A5 true JP2024545240A5 (https=) | 2025-10-15 |
Family
ID=84981781
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024535841A Pending JP2024545240A (ja) | 2021-12-15 | 2022-11-30 | 基板からフォトレジスト及びエッチング残渣を除去するための銅腐食防止剤を含む組成物並びにその使用 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20250002823A1 (https=) |
| EP (1) | EP4416555A1 (https=) |
| JP (1) | JP2024545240A (https=) |
| KR (1) | KR20240121812A (https=) |
| CN (1) | CN118401902A (https=) |
| TW (1) | TW202328358A (https=) |
| WO (1) | WO2023114638A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI885437B (zh) * | 2023-08-01 | 2025-06-01 | 新應材股份有限公司 | 剝離劑組成物以及剝離光阻的方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003213463A (ja) | 2002-01-17 | 2003-07-30 | Sumitomo Chem Co Ltd | 金属腐食防止剤および洗浄液 |
| US20060154186A1 (en) * | 2005-01-07 | 2006-07-13 | Advanced Technology Materials, Inc. | Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings |
| JP6813596B2 (ja) * | 2016-05-23 | 2021-01-13 | フジフイルム エレクトロニック マテリアルズ ユー．エス．エー．， インコーポレイテッド | 半導体基板からフォトレジストを除去するための剥離組成物 |
-
2022
- 2022-11-30 CN CN202280082663.5A patent/CN118401902A/zh active Pending
- 2022-11-30 WO PCT/US2022/080658 patent/WO2023114638A1/en not_active Ceased
- 2022-11-30 JP JP2024535841A patent/JP2024545240A/ja active Pending
- 2022-11-30 KR KR1020247022803A patent/KR20240121812A/ko active Pending
- 2022-11-30 US US18/708,246 patent/US20250002823A1/en active Pending
- 2022-11-30 EP EP22844383.4A patent/EP4416555A1/en active Pending
- 2022-12-01 TW TW111146108A patent/TW202328358A/zh unknown
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