JP2024539666A5 - - Google Patents

Info

Publication number
JP2024539666A5
JP2024539666A5 JP2024523106A JP2024523106A JP2024539666A5 JP 2024539666 A5 JP2024539666 A5 JP 2024539666A5 JP 2024523106 A JP2024523106 A JP 2024523106A JP 2024523106 A JP2024523106 A JP 2024523106A JP 2024539666 A5 JP2024539666 A5 JP 2024539666A5
Authority
JP
Japan
Prior art keywords
time
signal
phase difference
substrate
substrate support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024523106A
Other languages
English (en)
Japanese (ja)
Other versions
JP2024539666A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2022/043898 external-priority patent/WO2023069211A1/en
Publication of JP2024539666A publication Critical patent/JP2024539666A/ja
Publication of JP2024539666A5 publication Critical patent/JP2024539666A5/ja
Pending legal-status Critical Current

Links

JP2024523106A 2021-10-18 2022-09-16 電極に提供されるｒｆ信号間の位相差を決定するためのシステムおよび方法 Pending JP2024539666A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163257077P 2021-10-18 2021-10-18
US63/257,077 2021-10-18
PCT/US2022/043898 WO2023069211A1 (en) 2021-10-18 2022-09-16 Systems and methods for determining a phase difference between rf signals provided to electrodes

Publications (2)

Publication Number Publication Date
JP2024539666A JP2024539666A (ja) 2024-10-29
JP2024539666A5 true JP2024539666A5 (https=) 2025-09-24

Family

ID=86059546

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024523106A Pending JP2024539666A (ja) 2021-10-18 2022-09-16 電極に提供されるｒｆ信号間の位相差を決定するためのシステムおよび方法

Country Status (4)

Country Link
US (1) US20240404789A1 (https=)
JP (1) JP2024539666A (https=)
KR (1) KR20240090369A (https=)
WO (1) WO2023069211A1 (https=)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013250231A (ja) * 2012-06-04 2013-12-12 Daihen Corp 位相差検出装置、位相差検出プログラム及び位相差検出装置を用いたプラズマ処理システム
JP6449674B2 (ja) * 2015-02-23 2019-01-09 東京エレクトロン株式会社 プラズマ処理方法及びプラズマ処理装置
KR101736847B1 (ko) * 2015-11-03 2017-05-17 세메스 주식회사 플라즈마 발생 장치, 위상 차 조절 방법, 및 그를 이용한 기판 처리 장치
JP6997642B2 (ja) * 2018-01-30 2022-01-17 株式会社日立ハイテク プラズマ処理装置およびプラズマ処理方法
KR102913190B1 (ko) * 2018-11-21 2026-01-14 어플라이드 머티어리얼스, 인코포레이티드 위상 제어를 사용하여 플라즈마 분배를 조절하기 위한 디바이스 및 방법

Similar Documents

Publication Publication Date Title
US20250308843A1 (en) Control method and plasma processing apparatus
KR102733972B1 (ko) 플라즈마 처리 장치 및 측정 회로
JP6785862B2 (ja) プラズマｒｆバイアス消去システム
KR101769073B1 (ko) 플라즈마 처리 장치
CN103295866B (zh) 功率和频率的基于阻抗的调节
JP2024112933A (ja) 乗数モードを用いる高周波（ｒｆ）パルスインピーダンス同調
TWI812648B (zh) 電漿處理裝置及測定電路
US12125677B2 (en) High-frequency power supply apparatus
KR102852168B1 (ko) 유전체 기판의 플라즈마 처리를 위한 최적의 이온 에너지 결정
CN115280903B (zh) 高频电源装置及其输出控制方法
US11664196B2 (en) Detecting method and plasma processing apparatus
JP2024539666A5 (https=)
JPWO2023090256A5 (https=)
TWI607674B (zh) Impedance matching method and impedance matching system
TWI792807B (zh) 時間數位轉換裝置及其時間數位轉換方法
JP2005011858A (ja) プラズマを用いた半導体製造におけるμ波パワー設定方法並びに当該設定方法を適用した半導体装置の製造装置及び上記設定方法を用いた半導体装置の製造方法
TW202606375A (zh) 一種脈衝偏壓信號生成方法以及半導體製程設備
JPH11243078A (ja) プラズマ終点判定方法
WO2026016897A1 (zh) 一种脉冲偏压信号生成方法以及半导体工艺设备
KR100357728B1 (ko) 전자 빔 테스터 및 전자 빔 테스터 설정 방법