JP2024539666A - 電極に提供されるｒｆ信号間の位相差を決定するためのシステムおよび方法 - Google Patents

電極に提供されるｒｆ信号間の位相差を決定するためのシステムおよび方法 Download PDF

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Publication number
JP2024539666A
JP2024539666A JP2024523106A JP2024523106A JP2024539666A JP 2024539666 A JP2024539666 A JP 2024539666A JP 2024523106 A JP2024523106 A JP 2024523106A JP 2024523106 A JP2024523106 A JP 2024523106A JP 2024539666 A JP2024539666 A JP 2024539666A
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JP
Japan
Prior art keywords
signal
time
phase difference
parameter
determining
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Pending
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JP2024523106A
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English (en)
Japanese (ja)
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JP2024539666A5 (https=
Inventor
マラクタノフ・アレクセイ・エム．
匠 柳川
リゲッティ・ファビオ
ジン・ゼファ
ルケージ・ケネス
コザケビッチ・フェリックス・リーブ
ホランド・ジョン・パトリック
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Lam Research Corp
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Lam Research Corp
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Application filed by Lam Research Corp filed Critical Lam Research Corp
Publication of JP2024539666A publication Critical patent/JP2024539666A/ja
Publication of JP2024539666A5 publication Critical patent/JP2024539666A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H01J37/32165—Plural frequencies
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/3299—Feedback systems

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
JP2024523106A 2021-10-18 2022-09-16 電極に提供されるｒｆ信号間の位相差を決定するためのシステムおよび方法 Pending JP2024539666A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163257077P 2021-10-18 2021-10-18
US63/257,077 2021-10-18
PCT/US2022/043898 WO2023069211A1 (en) 2021-10-18 2022-09-16 Systems and methods for determining a phase difference between rf signals provided to electrodes

Publications (2)

Publication Number Publication Date
JP2024539666A true JP2024539666A (ja) 2024-10-29
JP2024539666A5 JP2024539666A5 (https=) 2025-09-24

Family

ID=86059546

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024523106A Pending JP2024539666A (ja) 2021-10-18 2022-09-16 電極に提供されるｒｆ信号間の位相差を決定するためのシステムおよび方法

Country Status (4)

Country Link
US (1) US20240404789A1 (https=)
JP (1) JP2024539666A (https=)
KR (1) KR20240090369A (https=)
WO (1) WO2023069211A1 (https=)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013250231A (ja) * 2012-06-04 2013-12-12 Daihen Corp 位相差検出装置、位相差検出プログラム及び位相差検出装置を用いたプラズマ処理システム
JP6449674B2 (ja) * 2015-02-23 2019-01-09 東京エレクトロン株式会社 プラズマ処理方法及びプラズマ処理装置
KR101736847B1 (ko) * 2015-11-03 2017-05-17 세메스 주식회사 플라즈마 발생 장치, 위상 차 조절 방법, 및 그를 이용한 기판 처리 장치
JP6997642B2 (ja) * 2018-01-30 2022-01-17 株式会社日立ハイテク プラズマ処理装置およびプラズマ処理方法
KR102913190B1 (ko) * 2018-11-21 2026-01-14 어플라이드 머티어리얼스, 인코포레이티드 위상 제어를 사용하여 플라즈마 분배를 조절하기 위한 디바이스 및 방법

Also Published As

Publication number Publication date
US20240404789A1 (en) 2024-12-05
KR20240090369A (ko) 2024-06-21
WO2023069211A1 (en) 2023-04-27

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