KR20240090369A - 전극들에 제공된 rf 신호들 사이의 위상차를 결정하기 위한 시스템들 및 방법들 - Google Patents

전극들에 제공된 rf 신호들 사이의 위상차를 결정하기 위한 시스템들 및 방법들 Download PDF

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Publication number
KR20240090369A
KR20240090369A KR1020247015376A KR20247015376A KR20240090369A KR 20240090369 A KR20240090369 A KR 20240090369A KR 1020247015376 A KR1020247015376 A KR 1020247015376A KR 20247015376 A KR20247015376 A KR 20247015376A KR 20240090369 A KR20240090369 A KR 20240090369A
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KR
South Korea
Prior art keywords
signal
time
phase difference
parameter
slave
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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KR1020247015376A
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English (en)
Korean (ko)
Inventor
알렉세이 엠. 마라크타노브
타쿠미 야나가와
파비오 리게티
저화 진
케네스 루케시
펠릭스 레이브 코자케비치
존 패트릭 홀랜드
Original Assignee
램 리써치 코포레이션
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Publication of KR20240090369A publication Critical patent/KR20240090369A/ko
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H01J37/32165—Plural frequencies
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/3299—Feedback systems

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
KR1020247015376A 2021-10-18 2022-09-16 전극들에 제공된 rf 신호들 사이의 위상차를 결정하기 위한 시스템들 및 방법들 Pending KR20240090369A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163257077P 2021-10-18 2021-10-18
US63/257,077 2021-10-18
PCT/US2022/043898 WO2023069211A1 (en) 2021-10-18 2022-09-16 Systems and methods for determining a phase difference between rf signals provided to electrodes

Publications (1)

Publication Number Publication Date
KR20240090369A true KR20240090369A (ko) 2024-06-21

Family

ID=86059546

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247015376A Pending KR20240090369A (ko) 2021-10-18 2022-09-16 전극들에 제공된 rf 신호들 사이의 위상차를 결정하기 위한 시스템들 및 방법들

Country Status (4)

Country Link
US (1) US20240404789A1 (https=)
JP (1) JP2024539666A (https=)
KR (1) KR20240090369A (https=)
WO (1) WO2023069211A1 (https=)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013250231A (ja) * 2012-06-04 2013-12-12 Daihen Corp 位相差検出装置、位相差検出プログラム及び位相差検出装置を用いたプラズマ処理システム
JP6449674B2 (ja) * 2015-02-23 2019-01-09 東京エレクトロン株式会社 プラズマ処理方法及びプラズマ処理装置
KR101736847B1 (ko) * 2015-11-03 2017-05-17 세메스 주식회사 플라즈마 발생 장치, 위상 차 조절 방법, 및 그를 이용한 기판 처리 장치
JP6997642B2 (ja) * 2018-01-30 2022-01-17 株式会社日立ハイテク プラズマ処理装置およびプラズマ処理方法
KR102913190B1 (ko) * 2018-11-21 2026-01-14 어플라이드 머티어리얼스, 인코포레이티드 위상 제어를 사용하여 플라즈마 분배를 조절하기 위한 디바이스 및 방법

Also Published As

Publication number Publication date
US20240404789A1 (en) 2024-12-05
JP2024539666A (ja) 2024-10-29
WO2023069211A1 (en) 2023-04-27

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