JP2024538473A5 - - Google Patents
Info
- Publication number
- JP2024538473A5 JP2024538473A5 JP2023577934A JP2023577934A JP2024538473A5 JP 2024538473 A5 JP2024538473 A5 JP 2024538473A5 JP 2023577934 A JP2023577934 A JP 2023577934A JP 2023577934 A JP2023577934 A JP 2023577934A JP 2024538473 A5 JP2024538473 A5 JP 2024538473A5
- Authority
- JP
- Japan
- Prior art keywords
- mesh
- repulsion
- energy
- charged particles
- detector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/494,784 US11749495B2 (en) | 2021-10-05 | 2021-10-05 | Bandpass charged particle energy filtering detector for charged particle tools |
| US17/494,784 | 2021-10-05 | ||
| PCT/US2022/045736 WO2023059686A1 (en) | 2021-10-05 | 2022-10-05 | Bandpass charged particle energy filtering detector for charged particle tools |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2024538473A JP2024538473A (ja) | 2024-10-23 |
| JP2024538473A5 true JP2024538473A5 (https=) | 2025-05-07 |
| JP7698745B2 JP7698745B2 (ja) | 2025-06-25 |
Family
ID=85775410
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023577934A Active JP7698745B2 (ja) | 2021-10-05 | 2022-10-05 | 荷電粒子ツールのためのバンドパス荷電粒子エネルギフィルタリング検出器 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US11749495B2 (https=) |
| EP (1) | EP4338189A4 (https=) |
| JP (1) | JP7698745B2 (https=) |
| KR (1) | KR20240072969A (https=) |
| CN (1) | CN117561586B (https=) |
| IL (1) | IL309272B2 (https=) |
| TW (1) | TWI888738B (https=) |
| WO (1) | WO2023059686A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2024185143A1 (https=) * | 2023-03-09 | 2024-09-12 | ||
| US20250239431A1 (en) * | 2024-01-24 | 2025-07-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Electron microscope detector and related methods |
Family Cites Families (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1596105A (en) * | 1978-02-20 | 1981-08-19 | Nat Res Dev | Electrostatic engergy analysis |
| GB8327737D0 (en) * | 1983-10-17 | 1983-11-16 | Texas Instruments Ltd | Electron detector |
| US4943769A (en) | 1989-03-21 | 1990-07-24 | International Business Machines Corporation | Apparatus and method for opens/shorts testing of capacitively coupled networks in substrates using electron beams |
| US5644132A (en) * | 1994-06-20 | 1997-07-01 | Opan Technologies Ltd. | System for high resolution imaging and measurement of topographic and material features on a specimen |
| US6847038B2 (en) * | 2002-07-15 | 2005-01-25 | Hitachi, Ltd. | Scanning electron microscope |
| US6501076B1 (en) * | 2000-10-11 | 2002-12-31 | Fei Company | Electron analyzer having an integrated low pass filter |
| JP3973372B2 (ja) * | 2001-03-23 | 2007-09-12 | 株式会社日立製作所 | 荷電粒子線を用いた基板検査装置および基板検査方法 |
| US7141791B2 (en) | 2004-09-07 | 2006-11-28 | Kla-Tencor Technologies Corporation | Apparatus and method for E-beam dark field imaging |
| US7276694B1 (en) | 2005-03-29 | 2007-10-02 | Kla-Tencor Technologies Corporation | Defect detection using energy spectrometer |
| US7804068B2 (en) * | 2006-11-15 | 2010-09-28 | Alis Corporation | Determining dopant information |
| GB0700754D0 (en) * | 2007-01-15 | 2007-02-21 | Oxford Instr Analytical Ltd | Charged particle analyser and method |
| US8698093B1 (en) | 2007-01-19 | 2014-04-15 | Kla-Tencor Corporation | Objective lens with deflector plates immersed in electrostatic lens field |
| JP5873227B2 (ja) * | 2007-12-06 | 2016-03-01 | エフ・イ−・アイ・カンパニー | デコレーションを用いたスライス・アンド・ビュー |
| US7714287B1 (en) | 2008-06-05 | 2010-05-11 | Kla-Tencor Corporation | Apparatus and method for obtaining topographical dark-field images in a scanning electron microscope |
| WO2010047378A1 (ja) * | 2008-10-24 | 2010-04-29 | 株式会社 日立ハイテクノロジーズ | 荷電粒子線装置 |
| US8222600B2 (en) * | 2009-05-24 | 2012-07-17 | El-Mul Technologies Ltd. | Charged particle detection system and method |
| US8237213B2 (en) | 2010-07-15 | 2012-08-07 | Micron Technology, Inc. | Memory arrays having substantially vertical, adjacent semiconductor structures and the formation thereof |
| JP5771628B2 (ja) * | 2010-12-16 | 2015-09-02 | 株式会社日立ハイテクノロジーズ | 走査電子顕微鏡及びそれを用いた測長方法 |
| US8334508B1 (en) | 2011-02-22 | 2012-12-18 | Electron Optica, Inc. | Mirror energy filter for electron beam apparatus |
| US8664594B1 (en) | 2011-04-18 | 2014-03-04 | Kla-Tencor Corporation | Electron-optical system for high-speed and high-sensitivity inspections |
| US8692204B2 (en) | 2011-04-26 | 2014-04-08 | Kla-Tencor Corporation | Apparatus and methods for electron beam detection |
| JP5663412B2 (ja) | 2011-06-16 | 2015-02-04 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| JP5860642B2 (ja) * | 2011-09-07 | 2016-02-16 | 株式会社日立ハイテクノロジーズ | 走査電子顕微鏡 |
| US8716662B1 (en) | 2012-07-16 | 2014-05-06 | Kla-Tencor Corporation | Methods and apparatus to review defects using scanning electron microscope with multiple electron beam configurations |
| US9384936B2 (en) * | 2013-03-25 | 2016-07-05 | Hermes Microvision Inc. | Energy filter for charged particle beam apparatus |
| US9000395B2 (en) | 2013-03-25 | 2015-04-07 | Hermes Microvision, Inc. | Energy filter for charged particle beam apparatus |
| JP6295027B2 (ja) * | 2013-04-03 | 2018-03-14 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置およびそれを用いた計測方法 |
| EP3203494B1 (en) * | 2014-09-24 | 2019-12-18 | National Institute for Materials Science | Energy-discrimination electron detector and scanning electron microscope in which same is used |
| JP6701228B2 (ja) * | 2015-03-24 | 2020-05-27 | ケーエルエー コーポレイション | 像ビームの安定化及び識別性が改善された荷電粒子顕微システム及び方法 |
| US10614992B2 (en) | 2015-07-15 | 2020-04-07 | National University Corporation NARA Institute of Science and Technology | Electrostatic lens, and parallel beam generation device and parallel beam convergence device which use electrostatic lens and collimator |
| JP6937254B2 (ja) * | 2018-02-08 | 2021-09-22 | 株式会社日立ハイテク | 検査システム、画像処理装置、および検査方法 |
| US11087956B2 (en) | 2018-06-29 | 2021-08-10 | Taiwan Semiconductor Manufacturing Co., Ltd. | Detection systems in semiconductor metrology tools |
| WO2020136044A2 (en) * | 2018-12-28 | 2020-07-02 | Asml Netherlands B.V. | Pulsed charged-particle beam system |
| WO2020141071A1 (en) * | 2018-12-31 | 2020-07-09 | Asml Netherlands B.V. | Method for calibrating a scanning charged particle microscope |
| US11961704B2 (en) * | 2019-07-02 | 2024-04-16 | Hitachi High-Tech Corporation | Charged particle beam system |
| JP2021034163A (ja) * | 2019-08-20 | 2021-03-01 | 株式会社日立ハイテク | 荷電粒子ビームシステム、及び重ね合わせずれ量測定方法 |
-
2021
- 2021-10-05 US US17/494,784 patent/US11749495B2/en active Active
-
2022
- 2022-06-30 TW TW111124423A patent/TWI888738B/zh active
- 2022-10-05 CN CN202280044103.0A patent/CN117561586B/zh active Active
- 2022-10-05 WO PCT/US2022/045736 patent/WO2023059686A1/en not_active Ceased
- 2022-10-05 JP JP2023577934A patent/JP7698745B2/ja active Active
- 2022-10-05 EP EP22879225.5A patent/EP4338189A4/en active Pending
- 2022-10-05 KR KR1020237043707A patent/KR20240072969A/ko active Pending
- 2022-10-05 IL IL309272A patent/IL309272B2/en unknown
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP7329637B2 (ja) | 電子ビームシステム及び方法 | |
| JP2024538473A5 (https=) | ||
| JP2012533855A5 (https=) | ||
| JP4913599B2 (ja) | 帯電粒子抽出デバイスおよびその設計方法 | |
| JP7116154B2 (ja) | 高解像度の電子ビーム装置 | |
| CN102598195B (zh) | 分布式离子源加速镜筒 | |
| WO2018096610A1 (ja) | 荷電粒子線装置 | |
| TW202006779A (zh) | 高效能檢查掃描電子顯微鏡裝置及其操作方法 | |
| JP6747687B2 (ja) | 収差補正装置、これを有するデバイス、および荷電粒子の収差を補正するための方法 | |
| IL309272B1 (en) | Bandpass charged particle energy filtering detector for charged particle tools | |
| JP6474359B2 (ja) | イオンビーム照射装置 | |
| TWI742223B (zh) | 電子束系統及方法，以及掃描電子顯微鏡 | |
| Groves | Charged particle optics theory: an introduction | |
| Mankos et al. | Electron–electron interactions in cathode objective lenses | |
| Musa et al. | Design and investigate the optical characteristics of single polepiece magnetics lenses | |
| JP7751929B1 (ja) | 荷電粒子銃 | |
| Ishii et al. | Reduction of the divergence angle of an incident beam to enhance the demagnification factor of a two-stage acceleration lens in a gas ion nanobeam system of several tens of keV | |
| Jansen | Historical notes | |
| Kuzuya et al. | Design of an Acceleration Gap for Brightness Enhancement in a Reactor-Based Slow Positron Beamline | |
| Ito et al. | Simulation of fogging electron trajectories in a scanning electron microscope | |
| Vijgen et al. | Improvement of beam properties by optimizing ion optics and minimizing beam interactions | |
| Fujita et al. | Multilevel visualization of local electric field at probe apex using scanning electron microscopy | |
| Krysztof et al. | Fabrication and Testing of the Projection Lens for Miniaturized Transmission Electron Microscope | |
| Macková | Description of contrast mechanisms in a scanning electron microscope | |
| Shcherbakov et al. | Development of an electron-beam welding unit for small-size pieces |