KR20240072969A - 하전 입자 도구를 위한 대역 통과 하전 입자 에너지 필터링 검출기 - Google Patents

하전 입자 도구를 위한 대역 통과 하전 입자 에너지 필터링 검출기 Download PDF

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Publication number
KR20240072969A
KR20240072969A KR1020237043707A KR20237043707A KR20240072969A KR 20240072969 A KR20240072969 A KR 20240072969A KR 1020237043707 A KR1020237043707 A KR 1020237043707A KR 20237043707 A KR20237043707 A KR 20237043707A KR 20240072969 A KR20240072969 A KR 20240072969A
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South Korea
Prior art keywords
mesh
energy
repulsive
detector
specimen
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Pending
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KR1020237043707A
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English (en)
Korean (ko)
Inventor
요우페이 지앙
마이클 슈타이거발트
Original Assignee
케이엘에이 코포레이션
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Application filed by 케이엘에이 코포레이션 filed Critical 케이엘에이 코포레이션
Publication of KR20240072969A publication Critical patent/KR20240072969A/ko
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H01J2237/0492—Lens systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/05—Arrangements for energy or mass analysis
    • H01J2237/053—Arrangements for energy or mass analysis electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24475—Scattered electron detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24485—Energy spectrometers

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Tubes For Measurement (AREA)
KR1020237043707A 2021-10-05 2022-10-05 하전 입자 도구를 위한 대역 통과 하전 입자 에너지 필터링 검출기 Pending KR20240072969A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US17/494,784 US11749495B2 (en) 2021-10-05 2021-10-05 Bandpass charged particle energy filtering detector for charged particle tools
US17/494,784 2021-10-05
PCT/US2022/045736 WO2023059686A1 (en) 2021-10-05 2022-10-05 Bandpass charged particle energy filtering detector for charged particle tools

Publications (1)

Publication Number Publication Date
KR20240072969A true KR20240072969A (ko) 2024-05-24

Family

ID=85775410

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020237043707A Pending KR20240072969A (ko) 2021-10-05 2022-10-05 하전 입자 도구를 위한 대역 통과 하전 입자 에너지 필터링 검출기

Country Status (8)

Country Link
US (1) US11749495B2 (https=)
EP (1) EP4338189A4 (https=)
JP (1) JP7698745B2 (https=)
KR (1) KR20240072969A (https=)
CN (1) CN117561586B (https=)
IL (1) IL309272B2 (https=)
TW (1) TWI888738B (https=)
WO (1) WO2023059686A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2024185143A1 (https=) * 2023-03-09 2024-09-12
US20250239431A1 (en) * 2024-01-24 2025-07-24 Taiwan Semiconductor Manufacturing Company, Ltd. Electron microscope detector and related methods

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US4943769A (en) 1989-03-21 1990-07-24 International Business Machines Corporation Apparatus and method for opens/shorts testing of capacitively coupled networks in substrates using electron beams
US5644132A (en) * 1994-06-20 1997-07-01 Opan Technologies Ltd. System for high resolution imaging and measurement of topographic and material features on a specimen
US6847038B2 (en) * 2002-07-15 2005-01-25 Hitachi, Ltd. Scanning electron microscope
US6501076B1 (en) * 2000-10-11 2002-12-31 Fei Company Electron analyzer having an integrated low pass filter
JP3973372B2 (ja) * 2001-03-23 2007-09-12 株式会社日立製作所 荷電粒子線を用いた基板検査装置および基板検査方法
US7141791B2 (en) 2004-09-07 2006-11-28 Kla-Tencor Technologies Corporation Apparatus and method for E-beam dark field imaging
US7276694B1 (en) 2005-03-29 2007-10-02 Kla-Tencor Technologies Corporation Defect detection using energy spectrometer
US7804068B2 (en) * 2006-11-15 2010-09-28 Alis Corporation Determining dopant information
GB0700754D0 (en) * 2007-01-15 2007-02-21 Oxford Instr Analytical Ltd Charged particle analyser and method
US8698093B1 (en) 2007-01-19 2014-04-15 Kla-Tencor Corporation Objective lens with deflector plates immersed in electrostatic lens field
JP5873227B2 (ja) * 2007-12-06 2016-03-01 エフ・イ−・アイ・カンパニー デコレーションを用いたスライス・アンド・ビュー
US7714287B1 (en) 2008-06-05 2010-05-11 Kla-Tencor Corporation Apparatus and method for obtaining topographical dark-field images in a scanning electron microscope
WO2010047378A1 (ja) * 2008-10-24 2010-04-29 株式会社 日立ハイテクノロジーズ 荷電粒子線装置
US8222600B2 (en) * 2009-05-24 2012-07-17 El-Mul Technologies Ltd. Charged particle detection system and method
US8237213B2 (en) 2010-07-15 2012-08-07 Micron Technology, Inc. Memory arrays having substantially vertical, adjacent semiconductor structures and the formation thereof
JP5771628B2 (ja) * 2010-12-16 2015-09-02 株式会社日立ハイテクノロジーズ 走査電子顕微鏡及びそれを用いた測長方法
US8334508B1 (en) 2011-02-22 2012-12-18 Electron Optica, Inc. Mirror energy filter for electron beam apparatus
US8664594B1 (en) 2011-04-18 2014-03-04 Kla-Tencor Corporation Electron-optical system for high-speed and high-sensitivity inspections
US8692204B2 (en) 2011-04-26 2014-04-08 Kla-Tencor Corporation Apparatus and methods for electron beam detection
JP5663412B2 (ja) 2011-06-16 2015-02-04 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5860642B2 (ja) * 2011-09-07 2016-02-16 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
US8716662B1 (en) 2012-07-16 2014-05-06 Kla-Tencor Corporation Methods and apparatus to review defects using scanning electron microscope with multiple electron beam configurations
US9384936B2 (en) * 2013-03-25 2016-07-05 Hermes Microvision Inc. Energy filter for charged particle beam apparatus
US9000395B2 (en) 2013-03-25 2015-04-07 Hermes Microvision, Inc. Energy filter for charged particle beam apparatus
JP6295027B2 (ja) * 2013-04-03 2018-03-14 株式会社日立ハイテクノロジーズ 荷電粒子線装置およびそれを用いた計測方法
EP3203494B1 (en) * 2014-09-24 2019-12-18 National Institute for Materials Science Energy-discrimination electron detector and scanning electron microscope in which same is used
JP6701228B2 (ja) * 2015-03-24 2020-05-27 ケーエルエー コーポレイション 像ビームの安定化及び識別性が改善された荷電粒子顕微システム及び方法
US10614992B2 (en) 2015-07-15 2020-04-07 National University Corporation NARA Institute of Science and Technology Electrostatic lens, and parallel beam generation device and parallel beam convergence device which use electrostatic lens and collimator
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Also Published As

Publication number Publication date
WO2023059686A1 (en) 2023-04-13
IL309272B2 (en) 2025-10-01
IL309272B1 (en) 2025-06-01
US20230104558A1 (en) 2023-04-06
IL309272A (en) 2024-02-01
JP2024538473A (ja) 2024-10-23
JP7698745B2 (ja) 2025-06-25
EP4338189A1 (en) 2024-03-20
TW202336797A (zh) 2023-09-16
US11749495B2 (en) 2023-09-05
TWI888738B (zh) 2025-07-01
EP4338189A4 (en) 2025-07-30
CN117561586B (zh) 2024-11-15
CN117561586A (zh) 2024-02-13

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