JP2024530617A5 - - Google Patents
Info
- Publication number
- JP2024530617A5 JP2024530617A5 JP2024505253A JP2024505253A JP2024530617A5 JP 2024530617 A5 JP2024530617 A5 JP 2024530617A5 JP 2024505253 A JP2024505253 A JP 2024505253A JP 2024505253 A JP2024505253 A JP 2024505253A JP 2024530617 A5 JP2024530617 A5 JP 2024530617A5
- Authority
- JP
- Japan
- Prior art keywords
- focusing
- optical axis
- laser beam
- euv
- target region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP21188167.7 | 2021-07-28 | ||
| EP21188167.7A EP4125165B1 (de) | 2021-07-28 | 2021-07-28 | Fokussiereinrichtung mit einer parallel oder deckungsgleich zu einer targetebene verlaufenden bildebene |
| PCT/EP2022/071088 WO2023006821A1 (de) | 2021-07-28 | 2022-07-27 | Fokussiereinrichtung mit einer parallel oder deckungsgleich zu einer targetebene verlaufenden bildebene |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024530617A JP2024530617A (ja) | 2024-08-23 |
| JP2024530617A5 true JP2024530617A5 (https=) | 2025-08-04 |
Family
ID=77103962
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024505253A Pending JP2024530617A (ja) | 2021-07-28 | 2022-07-27 | ターゲット平面に対して平行にまたはターゲット平面に一致して延在する像平面を有するフォーカシング装置 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US20240168306A1 (https=) |
| EP (1) | EP4125165B1 (https=) |
| JP (1) | JP2024530617A (https=) |
| KR (1) | KR20240037266A (https=) |
| CN (1) | CN117769793A (https=) |
| IL (1) | IL310429A (https=) |
| TW (1) | TWI845996B (https=) |
| WO (1) | WO2023006821A1 (https=) |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5458243B2 (ja) * | 2007-10-25 | 2014-04-02 | 国立大学法人大阪大学 | Ｅｕｖ光の放射方法、および前記ｅｕｖ光を用いた感応基板の露光方法 |
| US9265136B2 (en) * | 2010-02-19 | 2016-02-16 | Gigaphoton Inc. | System and method for generating extreme ultraviolet light |
| JP5758662B2 (ja) * | 2011-03-23 | 2015-08-05 | 国立大学法人大阪大学 | 極端紫外光生成装置及び極端紫外光生成方法 |
| WO2013161760A1 (ja) * | 2012-04-27 | 2013-10-31 | ギガフォトン株式会社 | レーザシステム及び極端紫外光生成システム |
| WO2015036024A1 (de) | 2013-09-12 | 2015-03-19 | Trumpf Laser- Und Systemtechnik Gmbh | Strahlführungseinrichtung und euv-strahlungserzeugungsvorrichtung mit einer überlagerungseinrichtung |
| WO2015036025A1 (de) | 2013-09-12 | 2015-03-19 | Trumpf Laser- Und Systemtechnik Gmbh | Strahlführungseinrichtung und euv-strahlungserzeugungsvorrichtung mit einer überlagerungseinrichtung |
| US9360600B2 (en) * | 2013-11-20 | 2016-06-07 | Asml Netherlands B.V. | System and method for correcting the focus of a laser beam |
| JP6556250B2 (ja) * | 2015-11-06 | 2019-08-07 | ギガフォトン株式会社 | 極端紫外光生成装置 |
| WO2017137074A1 (de) * | 2016-02-10 | 2017-08-17 | Trumpf Lasersystems For Semiconductor Manufacturing Gmbh | Treiberlaseranordnung mit einem optischen isolator und euv-strahlungserzeugungsvorrichtung damit |
| CN111955058B (zh) * | 2018-04-03 | 2025-06-17 | Asml荷兰有限公司 | 光束的空间调制 |
-
2021
- 2021-07-28 EP EP21188167.7A patent/EP4125165B1/de active Active
-
2022
- 2022-07-27 TW TW111128178A patent/TWI845996B/zh active
- 2022-07-27 IL IL310429A patent/IL310429A/en unknown
- 2022-07-27 CN CN202280052584.XA patent/CN117769793A/zh active Pending
- 2022-07-27 KR KR1020247004446A patent/KR20240037266A/ko active Pending
- 2022-07-27 WO PCT/EP2022/071088 patent/WO2023006821A1/de not_active Ceased
- 2022-07-27 JP JP2024505253A patent/JP2024530617A/ja active Pending
-
2024
- 2024-01-24 US US18/420,916 patent/US20240168306A1/en active Pending
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