JP2024516540A - 3次元(3d)垂直スパイラルインダクタおよび変圧器 - Google Patents

3次元(3d)垂直スパイラルインダクタおよび変圧器 Download PDF

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Publication number
JP2024516540A
JP2024516540A JP2023561208A JP2023561208A JP2024516540A JP 2024516540 A JP2024516540 A JP 2024516540A JP 2023561208 A JP2023561208 A JP 2023561208A JP 2023561208 A JP2023561208 A JP 2023561208A JP 2024516540 A JP2024516540 A JP 2024516540A
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Japan
Prior art keywords
spiral coil
spiral
coil
layers
conductive layers
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Pending
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JP2023561208A
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English (en)
Japanese (ja)
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JP2024516540A5 (enExample
Inventor
シア・リ
ビン・ヤン
ハイニン・ヤン
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クアルコム,インコーポレイテッド
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Publication of JP2024516540A publication Critical patent/JP2024516540A/ja
Publication of JP2024516540A5 publication Critical patent/JP2024516540A5/ja
Pending legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00Details of transformers or inductances, in general
    • H01F27/28Coils; Windings; Conductive connections
    • H01F27/29Terminals; Tapping arrangements for signal inductances
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F17/00Fixed inductances of the signal type
    • H01F17/0006Printed inductances
    • H01F17/0013Printed inductances with stacked layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00Details of transformers or inductances, in general
    • H01F27/28Coils; Windings; Conductive connections
    • H01F27/2804Printed windings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/04Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
    • H01F41/041Printed circuit coils
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00Resistors, capacitors or inductors
    • H10D1/20Inductors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F17/00Fixed inductances of the signal type
    • H01F17/0006Printed inductances
    • H01F2017/0073Printed inductances with a special conductive pattern, e.g. flat spiral
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00Details of transformers or inductances, in general
    • H01F27/28Coils; Windings; Conductive connections
    • H01F27/2804Printed windings
    • H01F2027/2809Printed windings on stacked layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00Details of transformers or inductances, in general
    • H01F27/28Coils; Windings; Conductive connections
    • H01F27/2804Printed windings
    • H01F2027/2819Planar transformers with printed windings, e.g. surrounded by two cores and to be mounted on printed circuit

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Coils Or Transformers For Communication (AREA)
  • Coils Of Transformers For General Uses (AREA)
  • Manufacturing Cores, Coils, And Magnets (AREA)
  • Semiconductor Integrated Circuits (AREA)
JP2023561208A 2021-04-09 2022-02-08 3次元(3d)垂直スパイラルインダクタおよび変圧器 Pending JP2024516540A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US17/226,744 2021-04-09
US17/226,744 US12051534B2 (en) 2021-04-09 2021-04-09 Three dimensional (3D) vertical spiral inductor and transformer
PCT/US2022/070566 WO2022217169A1 (en) 2021-04-09 2022-02-08 Three dimensional (3d) vertical spiral inductor and transformer

Publications (2)

Publication Number Publication Date
JP2024516540A true JP2024516540A (ja) 2024-04-16
JP2024516540A5 JP2024516540A5 (enExample) 2025-01-23

Family

ID=80461320

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023561208A Pending JP2024516540A (ja) 2021-04-09 2022-02-08 3次元(3d)垂直スパイラルインダクタおよび変圧器

Country Status (8)

Country Link
US (1) US12051534B2 (enExample)
EP (1) EP4320634A1 (enExample)
JP (1) JP2024516540A (enExample)
KR (1) KR20230169949A (enExample)
CN (1) CN117063250A (enExample)
BR (1) BR112023019892A2 (enExample)
TW (1) TW202240614A (enExample)
WO (1) WO2022217169A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12224253B2 (en) * 2021-09-20 2025-02-11 Intel Corporation Magnetic inductor device and method
US12249618B2 (en) * 2022-02-28 2025-03-11 Analog Devices International Unlimited Company Shaped metal edge for galvanic or capacitive isolator
CN118919219A (zh) * 2024-08-13 2024-11-08 成都兴仁科技有限公司 一种三维立体pcb电感的结构

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US20070155152A1 (en) * 2005-12-29 2007-07-05 Kang Myung Ii Method of manufacturing a copper inductor
JP2012222252A (ja) * 2011-04-12 2012-11-12 Renesas Electronics Corp 半導体装置
JP2013038138A (ja) * 2011-08-04 2013-02-21 Renesas Electronics Corp 半導体装置

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US6667536B2 (en) * 2001-06-28 2003-12-23 Agere Systems Inc. Thin film multi-layer high Q transformer formed in a semiconductor substrate
US6949442B2 (en) * 2003-05-05 2005-09-27 Infineon Technologies Ag Methods of forming MIM capacitors
TWI226647B (en) * 2003-06-11 2005-01-11 Via Tech Inc Inductor formed between two layout layers
US7253497B2 (en) 2003-07-02 2007-08-07 Lsi Corporation Integrated circuit with inductor having horizontal magnetic flux lines
US6903644B2 (en) * 2003-07-28 2005-06-07 Taiwan Semiconductor Manufacturing Company, Ltd. Inductor device having improved quality factor
US7436281B2 (en) * 2004-07-30 2008-10-14 Texas Instruments Incorporated Method to improve inductance with a high-permeability slotted plate core in an integrated circuit
US20080204183A1 (en) * 2007-02-23 2008-08-28 Infineon Technologies Ag 3d-coil for saving area used by inductances
US7812424B2 (en) * 2007-12-21 2010-10-12 Infineon Technologies Ag Moisture barrier capacitors in semiconductor components
US8101495B2 (en) * 2008-03-13 2012-01-24 Infineon Technologies Ag MIM capacitors in semiconductor components
US8143987B2 (en) * 2010-04-07 2012-03-27 Xilinx, Inc. Stacked dual inductor structure
US9559053B2 (en) * 2011-04-21 2017-01-31 Taiwan Semiconductor Manufacturing Company, Ltd. Compact vertical inductors extending in vertical planes
US20140203404A1 (en) * 2013-01-21 2014-07-24 Qualcomm Incorporated Spiral metal-on-metal (smom) capacitors, and related systems and methods
US8836079B2 (en) * 2013-01-24 2014-09-16 Qualcomm Incorporated Metal-on-metal (MoM) capacitors having laterally displaced layers, and related systems and methods
US9373434B2 (en) * 2013-06-20 2016-06-21 Taiwan Semiconductor Manufacturing Co., Ltd. Inductor assembly and method of using same
TW201532247A (zh) * 2013-10-16 2015-08-16 康佛森智財管理公司 形成嵌入動態隨機存取記憶體電容器的成本效益佳的方法
TW201545184A (zh) * 2014-05-23 2015-12-01 力晶科技股份有限公司 電容器結構及其製造方法
US9831171B2 (en) * 2014-11-12 2017-11-28 Infineon Technologies Ag Capacitors with barrier dielectric layers, and methods of formation thereof
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US10643782B2 (en) * 2016-10-28 2020-05-05 Delta Electronics (Shanghai) Co., Ltd. Magnetic component and power module
US10559530B2 (en) * 2017-12-27 2020-02-11 International Business Machines Corporation Forming dual metallization interconnect structures in single metallization level
US10686031B2 (en) * 2018-03-27 2020-06-16 Qualcomm Incorporated Finger metal-oxide-metal (FMOM) capacitor
US10553339B1 (en) * 2018-03-30 2020-02-04 Universal Lighting Technologies, Inc. Common-mode choke with integrated RF inductor winding
FR3082046A1 (fr) * 2018-05-30 2019-12-06 Commissariat A L'energie Atomique Et Aux Energies Alternatives Circuit integre comportant une inductance
US10972001B2 (en) * 2018-08-13 2021-04-06 Intel Corporation Multi-terminal inductors for voltage regulators
US11011303B2 (en) * 2018-08-21 2021-05-18 Globalfoundries U.S. Inc. Dummy fill with eddy current self-canceling element for inductor component
JP7163962B2 (ja) * 2018-08-30 2022-11-01 株式会社村田製作所 電力分配/結合回路および電力分配/結合部品
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Patent Citations (4)

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JP2005285970A (ja) * 2004-03-29 2005-10-13 Fujitsu Ltd 多層配線構造
US20070155152A1 (en) * 2005-12-29 2007-07-05 Kang Myung Ii Method of manufacturing a copper inductor
JP2012222252A (ja) * 2011-04-12 2012-11-12 Renesas Electronics Corp 半導体装置
JP2013038138A (ja) * 2011-08-04 2013-02-21 Renesas Electronics Corp 半導体装置

Also Published As

Publication number Publication date
US20220328237A1 (en) 2022-10-13
TW202240614A (zh) 2022-10-16
KR20230169949A (ko) 2023-12-18
CN117063250A (zh) 2023-11-14
EP4320634A1 (en) 2024-02-14
WO2022217169A1 (en) 2022-10-13
US12051534B2 (en) 2024-07-30
BR112023019892A2 (pt) 2023-11-14

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