JP2024514938A - 誘導自己集合用途のための増強された速度を有するマルチピッチ許容ブロックコポリマー - Google Patents

誘導自己集合用途のための増強された速度を有するマルチピッチ許容ブロックコポリマー Download PDF

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Publication number
JP2024514938A
JP2024514938A JP2023564413A JP2023564413A JP2024514938A JP 2024514938 A JP2024514938 A JP 2024514938A JP 2023564413 A JP2023564413 A JP 2023564413A JP 2023564413 A JP2023564413 A JP 2023564413A JP 2024514938 A JP2024514938 A JP 2024514938A
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block copolymer
tethered
alkyl
oligoflexible
group
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Japanese (ja)
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JP2024514938A5 (https=
Inventor
ラーマン・エムディー・エス
バスカラン・ドゥライラジュ
リー・ジン
ボバーデ・サチン
チョン・ウンジョン
リー・ジョン
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Merck Patent GmbH
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Merck Patent GmbH
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Publication of JP2024514938A publication Critical patent/JP2024514938A/ja
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/32—Monomers containing only one unsaturated aliphatic radical containing two or more rings
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Graft Or Block Polymers (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Polyesters Or Polycarbonates (AREA)
JP2023564413A 2021-04-23 2022-04-21 誘導自己集合用途のための増強された速度を有するマルチピッチ許容ブロックコポリマー Pending JP2024514938A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163178612P 2021-04-23 2021-04-23
US63/178,612 2021-04-23
PCT/EP2022/060506 WO2022223670A1 (en) 2021-04-23 2022-04-21 Multi-pitch tolerable block copolymers with enhanced kinetics for directed self-assembly applications

Publications (2)

Publication Number Publication Date
JP2024514938A true JP2024514938A (ja) 2024-04-03
JP2024514938A5 JP2024514938A5 (https=) 2025-02-27

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JP2023564413A Pending JP2024514938A (ja) 2021-04-23 2022-04-21 誘導自己集合用途のための増強された速度を有するマルチピッチ許容ブロックコポリマー

Country Status (7)

Country Link
US (1) US20240247093A1 (https=)
EP (1) EP4326791A1 (https=)
JP (1) JP2024514938A (https=)
KR (1) KR20230175295A (https=)
CN (1) CN117279967A (https=)
TW (1) TW202302684A (https=)
WO (1) WO2022223670A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20250048789A (ko) * 2022-08-16 2025-04-10 메르크 파텐트 게엠베하 유도 자기 조립을 위한 낮은 Tg 다중 테더 공중합된 디블록 공중합체
WO2026041747A1 (en) 2024-08-22 2026-02-26 Merck Patent Gmbh Carbon and silicone enriched new high-chi block copolymers of novel architectures for thin-film self-assembly applications

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05262836A (ja) * 1991-07-25 1993-10-12 Mobil Oil Corp 固体エラストマーブロック共重合体
JP2004213940A (ja) * 2002-12-27 2004-07-29 Nippon Soda Co Ltd 高分子固体電解質用組成物
CN101410403A (zh) * 2006-02-21 2009-04-15 科学与工业研究委员会 新型的双负碳离子引发剂及其制备方法与用途
US20130230705A1 (en) * 2012-03-02 2013-09-05 Wisconsin Alumni Research Foundation Patterning in the directed assembly of block copolymers using triblock or multiblock copolymers
JP2019534368A (ja) * 2016-11-22 2019-11-28 スリーエム イノベイティブ プロパティズ カンパニー ペンタブロックコポリマー

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997041160A1 (en) * 1996-04-26 1997-11-06 N V Raychem S A Alkyl methacrylate polymers
WO2005056739A1 (en) * 2003-11-26 2005-06-23 Arkema Inc. Controlled radical acrylic copolymer thickeners
US10259907B2 (en) * 2015-02-20 2019-04-16 Az Electronic Materials (Luxembourg) S.À R.L. Block copolymers with surface-active junction groups, compositions and processes thereof
EP3911688A1 (en) * 2019-01-17 2021-11-24 Merck Patent GmbH ENHANCED DIRECTED SELF-ASSEMBLY IN THE PRESENCE OF LOW Tg OLIGOMERS FOR PATTERN FORMATION

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05262836A (ja) * 1991-07-25 1993-10-12 Mobil Oil Corp 固体エラストマーブロック共重合体
JP2004213940A (ja) * 2002-12-27 2004-07-29 Nippon Soda Co Ltd 高分子固体電解質用組成物
CN101410403A (zh) * 2006-02-21 2009-04-15 科学与工业研究委员会 新型的双负碳离子引发剂及其制备方法与用途
US20130230705A1 (en) * 2012-03-02 2013-09-05 Wisconsin Alumni Research Foundation Patterning in the directed assembly of block copolymers using triblock or multiblock copolymers
JP2019534368A (ja) * 2016-11-22 2019-11-28 スリーエム イノベイティブ プロパティズ カンパニー ペンタブロックコポリマー

Also Published As

Publication number Publication date
US20240247093A1 (en) 2024-07-25
KR20230175295A (ko) 2023-12-29
CN117279967A (zh) 2023-12-22
WO2022223670A1 (en) 2022-10-27
EP4326791A1 (en) 2024-02-28
TW202302684A (zh) 2023-01-16

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