KR20230175295A - 유도형 자기 조립 적용을 위한 향상된 동역학을 갖는 멀티피치 허용 가능한 블록 공중합체 - Google Patents

유도형 자기 조립 적용을 위한 향상된 동역학을 갖는 멀티피치 허용 가능한 블록 공중합체 Download PDF

Info

Publication number
KR20230175295A
KR20230175295A KR1020237040476A KR20237040476A KR20230175295A KR 20230175295 A KR20230175295 A KR 20230175295A KR 1020237040476 A KR1020237040476 A KR 1020237040476A KR 20237040476 A KR20237040476 A KR 20237040476A KR 20230175295 A KR20230175295 A KR 20230175295A
Authority
KR
South Korea
Prior art keywords
block copolymer
oligo
alkyl
group
flexible tether
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020237040476A
Other languages
English (en)
Korean (ko)
Inventor
엠디 에스. 라만
두라이라지 바스카란
진 리
사친 보바드
은정 정
종 리
Original Assignee
메르크 파텐트 게엠베하
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 메르크 파텐트 게엠베하 filed Critical 메르크 파텐트 게엠베하
Publication of KR20230175295A publication Critical patent/KR20230175295A/ko
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/32—Monomers containing only one unsaturated aliphatic radical containing two or more rings
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Graft Or Block Polymers (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Polyesters Or Polycarbonates (AREA)
KR1020237040476A 2021-04-23 2022-04-21 유도형 자기 조립 적용을 위한 향상된 동역학을 갖는 멀티피치 허용 가능한 블록 공중합체 Pending KR20230175295A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163178612P 2021-04-23 2021-04-23
US63/178,612 2021-04-23
PCT/EP2022/060506 WO2022223670A1 (en) 2021-04-23 2022-04-21 Multi-pitch tolerable block copolymers with enhanced kinetics for directed self-assembly applications

Publications (1)

Publication Number Publication Date
KR20230175295A true KR20230175295A (ko) 2023-12-29

Family

ID=81749458

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020237040476A Pending KR20230175295A (ko) 2021-04-23 2022-04-21 유도형 자기 조립 적용을 위한 향상된 동역학을 갖는 멀티피치 허용 가능한 블록 공중합체

Country Status (7)

Country Link
US (1) US20240247093A1 (https=)
EP (1) EP4326791A1 (https=)
JP (1) JP2024514938A (https=)
KR (1) KR20230175295A (https=)
CN (1) CN117279967A (https=)
TW (1) TW202302684A (https=)
WO (1) WO2022223670A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20250048789A (ko) * 2022-08-16 2025-04-10 메르크 파텐트 게엠베하 유도 자기 조립을 위한 낮은 Tg 다중 테더 공중합된 디블록 공중합체
WO2026041747A1 (en) 2024-08-22 2026-02-26 Merck Patent Gmbh Carbon and silicone enriched new high-chi block copolymers of novel architectures for thin-film self-assembly applications

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5292820A (en) * 1990-01-16 1994-03-08 Mobil Oil Corporation Solid elastomeric block copolymers
WO1997041160A1 (en) * 1996-04-26 1997-11-06 N V Raychem S A Alkyl methacrylate polymers
JP4612272B2 (ja) * 2002-12-27 2011-01-12 日本曹達株式会社 高分子固体電解質用組成物
WO2005056739A1 (en) * 2003-11-26 2005-06-23 Arkema Inc. Controlled radical acrylic copolymer thickeners
US7709687B2 (en) * 2006-02-21 2010-05-04 Council Of Scientific & Industrial Research Dicarbanionic initiator, a process for the preparation and use thereof
US9372398B2 (en) * 2012-03-02 2016-06-21 Wisconsin Alumni Research Foundation Patterning in the directed assembly of block copolymers using triblock or multiblock copolymers
US10259907B2 (en) * 2015-02-20 2019-04-16 Az Electronic Materials (Luxembourg) S.À R.L. Block copolymers with surface-active junction groups, compositions and processes thereof
US10781279B2 (en) * 2016-11-22 2020-09-22 3M Innovative Properties Company Pentablock copolymers
EP3911688A1 (en) * 2019-01-17 2021-11-24 Merck Patent GmbH ENHANCED DIRECTED SELF-ASSEMBLY IN THE PRESENCE OF LOW Tg OLIGOMERS FOR PATTERN FORMATION

Also Published As

Publication number Publication date
US20240247093A1 (en) 2024-07-25
CN117279967A (zh) 2023-12-22
WO2022223670A1 (en) 2022-10-27
EP4326791A1 (en) 2024-02-28
JP2024514938A (ja) 2024-04-03
TW202302684A (zh) 2023-01-16

Similar Documents

Publication Publication Date Title
TWI535770B (zh) 用於導向自組裝嵌段共聚物之中性層組合物及其方法
TWI832955B (zh) 在低玻璃轉移溫度（Ｔｇ）寡聚物存在下用於形成圖案的增強定向自組裝
KR102561427B1 (ko) 폴리스티렌-b-폴리(메틸 메타크릴레이트) 이블록 공중합체 및 이의 배합물의 콘택홀 자기 조립을 위한 고속 가교성 중성 하지층
KR20230175295A (ko) 유도형 자기 조립 적용을 위한 향상된 동역학을 갖는 멀티피치 허용 가능한 블록 공중합체
KR20250048789A (ko) 유도 자기 조립을 위한 낮은 Tg 다중 테더 공중합된 디블록 공중합체
KR20250145104A (ko) 지향적 자가 조립 응용분야에서 자가 조립된 모폴로지를 개선하기 위한 블록 공중합체 배합물
KR102956167B1 (ko) 패턴 형성을 위한 낮은 Tg 올리고머의 존재 하에서의 향상된 유도 자가 조립
KR20250004089A (ko) 이블록 공중합체의 유도 자기 조립을 위한 SiARC 기판 상용성을 개선하기 위한 히드록실 단량체를 함유하는 신규한 중성 매트의 개발
EP4388021A2 (en) Development of novel hydrophilic pinning mat
KR20240096879A (ko) 폴리(스티렌) 및 폴리(메틸 메타크릴레이트) 함유 세그먼트를 지닌 블록 공중합체의 자기 조립을 위한 조정 가능한 극성을 갖는 중성 브러시

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

D13 Search requested

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D13-SRH-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000