JP2024504199A - 反射光学素子及び反射光学素子を修復し且つ／又は調整する方法 - Google Patents

反射光学素子及び反射光学素子を修復し且つ／又は調整する方法 Download PDF

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JP2024504199A
JP2024504199A JP2023545853A JP2023545853A JP2024504199A JP 2024504199 A JP2024504199 A JP 2024504199A JP 2023545853 A JP2023545853 A JP 2023545853A JP 2023545853 A JP2023545853 A JP 2023545853A JP 2024504199 A JP2024504199 A JP 2024504199A
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Prior art keywords
release layer
optical element
reflective
reflective optical
reactive release
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JP2023545853A
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Japanese (ja)
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JP2024504199A5 (https=
Inventor
ミューラー ロバート
シュトローベル セバスチャン
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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Publication of JP2024504199A publication Critical patent/JP2024504199A/ja
Publication of JP2024504199A5 publication Critical patent/JP2024504199A5/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2023545853A 2021-01-28 2022-01-25 反射光学素子及び反射光学素子を修復し且つ／又は調整する方法 Pending JP2024504199A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102021200748.1 2021-01-28
DE102021200748.1A DE102021200748A1 (de) 2021-01-28 2021-01-28 Reflektives optisches Element und Verfahren zur Reparatur und/oder Aufbereitung eines reflektiven optischen Elements
PCT/EP2022/051610 WO2022161942A1 (de) 2021-01-28 2022-01-25 Reflektives optisches element und verfahren zur reparatur und/oder aufbereitung eines reflektiven optischen elements

Publications (2)

Publication Number Publication Date
JP2024504199A true JP2024504199A (ja) 2024-01-30
JP2024504199A5 JP2024504199A5 (https=) 2025-02-03

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JP2023545853A Pending JP2024504199A (ja) 2021-01-28 2022-01-25 反射光学素子及び反射光学素子を修復し且つ／又は調整する方法

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JP (1) JP2024504199A (https=)
DE (1) DE102021200748A1 (https=)
WO (1) WO2022161942A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2026063242A1 (ja) * 2024-09-20 2026-03-26 Ａｇｃ株式会社 膜付き基板の再生方法、マスクブランク用ガラス基板の製造方法、および反射型マスクブランクの製造方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009504415A (ja) * 2005-08-22 2009-02-05 ロヴィアック・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング レーザーパルスで材料を除去する方法と装置
JP2012527356A (ja) * 2009-06-04 2012-11-08 コアレイズ オーワイ レーザを用いた基板加工方法及び装置
DE102013212467A1 (de) * 2013-06-27 2014-04-24 Carl Zeiss Smt Gmbh Entfernbare beschichtung eines optischen elements
US20160161857A1 (en) * 2014-12-04 2016-06-09 Globalfoundries Inc. Pellicle with aerogel support frame
JP2016523388A (ja) * 2013-06-27 2016-08-08 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光システムのミラー及びミラーを加工する方法
KR20160124878A (ko) * 2014-02-24 2016-10-28 가부시키가이샤 니콘 다층막 반사 미러 및 그 제조 방법, 및 노광 장치
JP2017008929A (ja) * 2015-06-07 2017-01-12 ゼネラル・エレクトリック・カンパニイ 付加製造方法及びろう付け可能な付加構造体を用いたハイブリッド物品

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10150874A1 (de) * 2001-10-04 2003-04-30 Zeiss Carl Optisches Element und Verfahren zu dessen Herstellung sowie ein Lithographiegerät und ein Verfahren zur Herstellung eines Halbleiterbauelements
JP3919599B2 (ja) * 2002-05-17 2007-05-30 キヤノン株式会社 光学素子、当該光学素子を有する光源装置及び露光装置
DE102012200454A1 (de) 2012-01-13 2013-01-03 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines reflektiven optischen Elements und reflektives optisches Element
DE102015103494B4 (de) 2015-03-10 2020-07-16 Friedrich-Schiller-Universität Jena Verfahren zur Herstellung eines Reflektorelements und Reflektorelement

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009504415A (ja) * 2005-08-22 2009-02-05 ロヴィアック・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング レーザーパルスで材料を除去する方法と装置
JP2012527356A (ja) * 2009-06-04 2012-11-08 コアレイズ オーワイ レーザを用いた基板加工方法及び装置
DE102013212467A1 (de) * 2013-06-27 2014-04-24 Carl Zeiss Smt Gmbh Entfernbare beschichtung eines optischen elements
JP2016523388A (ja) * 2013-06-27 2016-08-08 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光システムのミラー及びミラーを加工する方法
KR20160124878A (ko) * 2014-02-24 2016-10-28 가부시키가이샤 니콘 다층막 반사 미러 및 그 제조 방법, 및 노광 장치
JP2018185518A (ja) * 2014-02-24 2018-11-22 株式会社ニコン 多層膜反射鏡及びその製造方法、並びに露光装置
US20160161857A1 (en) * 2014-12-04 2016-06-09 Globalfoundries Inc. Pellicle with aerogel support frame
JP2017008929A (ja) * 2015-06-07 2017-01-12 ゼネラル・エレクトリック・カンパニイ 付加製造方法及びろう付け可能な付加構造体を用いたハイブリッド物品

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2026063242A1 (ja) * 2024-09-20 2026-03-26 Ａｇｃ株式会社 膜付き基板の再生方法、マスクブランク用ガラス基板の製造方法、および反射型マスクブランクの製造方法

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DE102021200748A1 (de) 2022-07-28

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