DE102021200748A1 - Reflektives optisches Element und Verfahren zur Reparatur und/oder Aufbereitung eines reflektiven optischen Elements - Google Patents

Reflektives optisches Element und Verfahren zur Reparatur und/oder Aufbereitung eines reflektiven optischen Elements Download PDF

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Publication number
DE102021200748A1
DE102021200748A1 DE102021200748.1A DE102021200748A DE102021200748A1 DE 102021200748 A1 DE102021200748 A1 DE 102021200748A1 DE 102021200748 A DE102021200748 A DE 102021200748A DE 102021200748 A1 DE102021200748 A1 DE 102021200748A1
Authority
DE
Germany
Prior art keywords
reactive
optical element
release layer
reflective optical
reflective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE102021200748.1A
Other languages
German (de)
English (en)
Inventor
Robert Müller
Sebastian Strobel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE102021200748.1A priority Critical patent/DE102021200748A1/de
Priority to PCT/EP2022/051610 priority patent/WO2022161942A1/de
Priority to JP2023545853A priority patent/JP2024504199A/ja
Publication of DE102021200748A1 publication Critical patent/DE102021200748A1/de
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE102021200748.1A 2021-01-28 2021-01-28 Reflektives optisches Element und Verfahren zur Reparatur und/oder Aufbereitung eines reflektiven optischen Elements Ceased DE102021200748A1 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
DE102021200748.1A DE102021200748A1 (de) 2021-01-28 2021-01-28 Reflektives optisches Element und Verfahren zur Reparatur und/oder Aufbereitung eines reflektiven optischen Elements
PCT/EP2022/051610 WO2022161942A1 (de) 2021-01-28 2022-01-25 Reflektives optisches element und verfahren zur reparatur und/oder aufbereitung eines reflektiven optischen elements
JP2023545853A JP2024504199A (ja) 2021-01-28 2022-01-25 反射光学素子及び反射光学素子を修復し且つ／又は調整する方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102021200748.1A DE102021200748A1 (de) 2021-01-28 2021-01-28 Reflektives optisches Element und Verfahren zur Reparatur und/oder Aufbereitung eines reflektiven optischen Elements

Publications (1)

Publication Number Publication Date
DE102021200748A1 true DE102021200748A1 (de) 2022-07-28

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
DE102021200748.1A Ceased DE102021200748A1 (de) 2021-01-28 2021-01-28 Reflektives optisches Element und Verfahren zur Reparatur und/oder Aufbereitung eines reflektiven optischen Elements

Country Status (3)

Country Link
JP (1) JP2024504199A (https=)
DE (1) DE102021200748A1 (https=)
WO (1) WO2022161942A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2026063242A1 (ja) * 2024-09-20 2026-03-26 Ａｇｃ株式会社 膜付き基板の再生方法、マスクブランク用ガラス基板の製造方法、および反射型マスクブランクの製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030214735A1 (en) 2002-05-17 2003-11-20 Fumitaro Masaki Optical element, and light source unit and exposure apparatus having the same
DE102012200454A1 (de) 2012-01-13 2013-01-03 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines reflektiven optischen Elements und reflektives optisches Element
DE102015103494A1 (de) 2015-03-10 2016-09-15 Friedrich-Schiller-Universität Jena Verfahren zur Herstellung eines Reflektorelements und Reflektorelement

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10150874A1 (de) * 2001-10-04 2003-04-30 Zeiss Carl Optisches Element und Verfahren zu dessen Herstellung sowie ein Lithographiegerät und ein Verfahren zur Herstellung eines Halbleiterbauelements
DE102005039833A1 (de) * 2005-08-22 2007-03-01 Rowiak Gmbh Vorrichtung und Verfahren zur Materialtrennung mit Laserpulsen
US9701581B2 (en) * 2009-06-04 2017-07-11 Corelase Oy Method and apparatus for processing substrates using a laser
JP6487424B2 (ja) * 2013-06-27 2019-03-20 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光システムのミラー及びミラーを加工する方法
DE102013212467A1 (de) * 2013-06-27 2014-04-24 Carl Zeiss Smt Gmbh Entfernbare beschichtung eines optischen elements
TWI643024B (zh) * 2014-02-24 2018-12-01 尼康股份有限公司 Multilayer film mirror, manufacturing method thereof and regeneration method, and exposure device
US9547232B2 (en) * 2014-12-04 2017-01-17 Globalfoundries Inc. Pellicle with aerogel support frame
US20160354842A1 (en) * 2015-06-07 2016-12-08 General Electric Company Additive manufacturing methods and hybrid articles using brazeable additive structures

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030214735A1 (en) 2002-05-17 2003-11-20 Fumitaro Masaki Optical element, and light source unit and exposure apparatus having the same
DE102012200454A1 (de) 2012-01-13 2013-01-03 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines reflektiven optischen Elements und reflektives optisches Element
DE102015103494A1 (de) 2015-03-10 2016-09-15 Friedrich-Schiller-Universität Jena Verfahren zur Herstellung eines Reflektorelements und Reflektorelement

Also Published As

Publication number Publication date
WO2022161942A1 (de) 2022-08-04
JP2024504199A (ja) 2024-01-30

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