JP2024502353A5 - - Google Patents
Info
- Publication number
- JP2024502353A5 JP2024502353A5 JP2023541312A JP2023541312A JP2024502353A5 JP 2024502353 A5 JP2024502353 A5 JP 2024502353A5 JP 2023541312 A JP2023541312 A JP 2023541312A JP 2023541312 A JP2023541312 A JP 2023541312A JP 2024502353 A5 JP2024502353 A5 JP 2024502353A5
- Authority
- JP
- Japan
- Prior art keywords
- mol
- range
- composition according
- component
- repeating unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202163134608P | 2021-01-07 | 2021-01-07 | |
| US63/134,608 | 2021-01-07 | ||
| US202163280310P | 2021-11-17 | 2021-11-17 | |
| US63/280,310 | 2021-11-17 | ||
| PCT/EP2022/050108 WO2022148759A1 (en) | 2021-01-07 | 2022-01-05 | Positive-working photoresist composition with improved pattern profile and depth of focus (dof) |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2024502353A JP2024502353A (ja) | 2024-01-18 |
| JP2024502353A5 true JP2024502353A5 (cg-RX-API-DMAC10.html) | 2024-10-11 |
| JP7763254B2 JP7763254B2 (ja) | 2025-10-31 |
Family
ID=80001573
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023541312A Active JP7763254B2 (ja) | 2021-01-07 | 2022-01-05 | 改善されたパターンプロファイル及び焦点深度（ｄｏｆ）を有するポジ作動型フォトレジスト組成物 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20240045333A1 (cg-RX-API-DMAC10.html) |
| EP (1) | EP4275093A1 (cg-RX-API-DMAC10.html) |
| JP (1) | JP7763254B2 (cg-RX-API-DMAC10.html) |
| KR (1) | KR102939423B1 (cg-RX-API-DMAC10.html) |
| WO (1) | WO2022148759A1 (cg-RX-API-DMAC10.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4433873A2 (en) * | 2021-11-17 | 2024-09-25 | Merck Patent GmbH | Compositions and methods for improving metal structure fabrication by wet chemical etch |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3434340B2 (ja) * | 1994-03-29 | 2003-08-04 | 東京応化工業株式会社 | 高感度ポジ型ホトレジスト組成物 |
| US5853954A (en) * | 1996-12-18 | 1998-12-29 | Clariant Finance (Bvi) Limited | Fractionated novolak resin and photoresist composition therefrom |
| JP2002090991A (ja) * | 2000-09-13 | 2002-03-27 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物 |
| DE60103771T2 (de) * | 2000-10-13 | 2005-08-25 | Clariant Finance (Bvi) Ltd., Road Town | Fraktionierung von harzen mit einem statischen mischer und einer flüssig-flüssig zentrifuge |
| JP3738420B2 (ja) * | 2001-11-16 | 2006-01-25 | 東京応化工業株式会社 | ポジ型ホトレジスト組成物および傾斜インプランテーションプロセス用薄膜レジストパターンの形成方法 |
| US6733949B2 (en) * | 2002-04-11 | 2004-05-11 | Clariant Finance (Bvi) Limited | Novolak resin mixtures and photosensitive compositions comprising the same |
| KR101632965B1 (ko) * | 2008-12-29 | 2016-06-24 | 삼성디스플레이 주식회사 | 포토레지스트 조성물 및 박막 트랜지스터 기판의 제조 방법 |
| KR20140043322A (ko) * | 2011-02-25 | 2014-04-09 | 스미또모 베이크라이트 가부시키가이샤 | 포토레지스트용 수지 조성물 |
| KR102012830B1 (ko) * | 2013-05-21 | 2019-11-05 | 동우 화인켐 주식회사 | 포지티브 포토레지스트 조성물 |
-
2022
- 2022-01-05 US US18/256,340 patent/US20240045333A1/en active Pending
- 2022-01-05 KR KR1020237026880A patent/KR102939423B1/ko active Active
- 2022-01-05 WO PCT/EP2022/050108 patent/WO2022148759A1/en not_active Ceased
- 2022-01-05 EP EP22700574.1A patent/EP4275093A1/en active Pending
- 2022-01-05 JP JP2023541312A patent/JP7763254B2/ja active Active
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