JP2024501279A - 質量分析法を使用したラジカル粒子濃度のモニタリング - Google Patents

質量分析法を使用したラジカル粒子濃度のモニタリング Download PDF

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JP2024501279A
JP2024501279A JP2023538674A JP2023538674A JP2024501279A JP 2024501279 A JP2024501279 A JP 2024501279A JP 2023538674 A JP2023538674 A JP 2023538674A JP 2023538674 A JP2023538674 A JP 2023538674A JP 2024501279 A JP2024501279 A JP 2024501279A
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Prior art keywords
radical
aperture
flow channel
test chamber
gas
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Japanese (ja)
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JP2024501279A5 (https=
Inventor
ヤン・チャンロン
リュウ・ジミー
ブレッシング・ジェームズ・イー
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MKS Instruments Inc
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MKS Instruments Inc
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Publication of JP2024501279A publication Critical patent/JP2024501279A/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/62—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
    • G01N27/622—Ion mobility spectrometry
    • G01N27/623—Ion mobility spectrometry combined with mass spectrometry
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/0027—Methods for using particle spectrometers
    • H01J49/0031—Step by step routines describing the use of the apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/26—Mass spectrometers or separator tubes
    • H01J49/28—Static spectrometers
    • H01J49/282—Static spectrometers using electrostatic analysers

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Electrochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Molecular Biology (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
JP2023538674A 2020-12-23 2021-12-16 質量分析法を使用したラジカル粒子濃度のモニタリング Pending JP2024501279A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202063130257P 2020-12-23 2020-12-23
US63/130,257 2020-12-23
PCT/US2021/072969 WO2022140740A1 (en) 2020-12-23 2021-12-16 Monitoring radical particle concentration using mass spectrometry

Publications (2)

Publication Number Publication Date
JP2024501279A true JP2024501279A (ja) 2024-01-11
JP2024501279A5 JP2024501279A5 (https=) 2024-11-29

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JP2023538674A Pending JP2024501279A (ja) 2020-12-23 2021-12-16 質量分析法を使用したラジカル粒子濃度のモニタリング

Country Status (7)

Country Link
US (2) US11971386B2 (https=)
EP (1) EP4268261A1 (https=)
JP (1) JP2024501279A (https=)
KR (1) KR20230123998A (https=)
CN (1) CN116635976A (https=)
TW (1) TWI911359B (https=)
WO (1) WO2022140740A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022256295A1 (en) * 2021-06-01 2022-12-08 Inficon, Inc. Method of detecting radicals using mass spectrometry
US20230411129A1 (en) * 2022-06-15 2023-12-21 Applied Materials, Inc. Closed-loop control of plasma source via feedback from laser absorption species sensor
JP2026508739A (ja) * 2022-11-16 2026-03-12 エムケーエス インコーポレイテッド プロセスツール診断のためのラジカル検知
US20250308867A1 (en) * 2024-03-29 2025-10-02 Tokyo Electron Limited High-performance adaptable sampling system

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JPS5931550A (ja) * 1982-08-16 1984-02-20 Ulvac Corp プラズマエツチング中のラジカルおよび励起分子測定装置
JPH07122229A (ja) * 1993-10-25 1995-05-12 Kawasaki Steel Corp 質量分析装置
JPH08306671A (ja) * 1995-05-08 1996-11-22 Yasuhiro Horiike プラズマエッチング装置
JP2001023969A (ja) * 1999-07-13 2001-01-26 Matsushita Electronics Industry Corp 排ガスモニタを備えたプラズマ装置およびその動作方法
JP2001176807A (ja) * 1999-12-20 2001-06-29 Hitachi Ltd 半導体装置の製造装置、製造方法およびクリーニング方法

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DE2059675C3 (de) 1970-12-04 1974-04-11 Farbwerke Hoechst Ag, Vormals Meister Lucius & Bruening, 6000 Frankfurt Verfahren zur Verbesserung der anwendungstechnischen Eigenschaften eines Disazopigmentes
GB8602463D0 (en) 1986-01-31 1986-03-05 Vg Instr Group Mass spectrometer
JP2006501620A (ja) 2002-09-30 2006-01-12 東京エレクトロン株式会社 プラズマ処理システムとともに光学系を使用するための装置及び方法
JP5469823B2 (ja) 2008-04-25 2014-04-16 アジレント・テクノロジーズ・インク プラズマイオン源質量分析装置
GB2470294B (en) 2009-05-13 2014-02-26 Micromass Ltd Surface coating on sampling cone of mass spectrometer
US8471198B2 (en) * 2009-05-13 2013-06-25 Micromass Uk Limited Mass spectrometer sampling cone with coating
KR20110103723A (ko) 2010-03-15 2011-09-21 삼성전자주식회사 공정 모니터링 장치와, 이를 이용한 공정 모니터링 방법
GB2498173C (en) 2011-12-12 2018-06-27 Thermo Fisher Scient Bremen Gmbh Mass spectrometer vacuum interface method and apparatus
DE102013201499A1 (de) 2013-01-30 2014-07-31 Carl Zeiss Microscopy Gmbh Verfahren zur massenspektrometrischen Untersuchung von Gasgemischen sowie Massenspektrometer hierzu
KR20140137172A (ko) 2013-05-22 2014-12-02 최대규 자기 관리 기능을 갖는 원격 플라즈마 시스템 및 이의 자기 관리 방법
US20140374583A1 (en) 2013-06-24 2014-12-25 Agilent Technologies, Inc. Electron ionization (ei) utilizing different ei energies
US10473525B2 (en) 2013-11-01 2019-11-12 Tokyo Electron Limited Spatially resolved optical emission spectroscopy (OES) in plasma processing
CN103715113B (zh) 2013-12-13 2016-03-30 合肥京东方光电科技有限公司 一种刻蚀速率均一度的监测方法及装置
US10319649B2 (en) 2017-04-11 2019-06-11 Applied Materials, Inc. Optical emission spectroscopy (OES) for remote plasma monitoring
US10685819B2 (en) 2017-05-25 2020-06-16 Applied Materials, Inc. Measuring concentrations of radicals in semiconductor processing
KR102025873B1 (ko) 2018-04-02 2019-09-26 한국기계연구원 공정 모니터링을 위한 플라즈마 분석 장치 및 방법
DE102018216623A1 (de) 2018-09-27 2020-04-02 Carl Zeiss Smt Gmbh Massenspektrometer und Verfahren zur massenspektrometrischen Analyse eines Gases
JP7095579B2 (ja) * 2018-12-05 2022-07-05 株式会社島津製作所 質量分析装置
TWI897405B (zh) * 2019-03-25 2025-09-11 日商亞多納富有限公司 半導體製造系統、其控制方法及控制該系統的電腦程式
US11114286B2 (en) 2019-04-08 2021-09-07 Applied Materials, Inc. In-situ optical chamber surface and process sensor
US11430643B2 (en) 2020-09-29 2022-08-30 Tokyo Electron Limited Quantification of processing chamber species by electron energy sweep

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5931550A (ja) * 1982-08-16 1984-02-20 Ulvac Corp プラズマエツチング中のラジカルおよび励起分子測定装置
JPH07122229A (ja) * 1993-10-25 1995-05-12 Kawasaki Steel Corp 質量分析装置
JPH08306671A (ja) * 1995-05-08 1996-11-22 Yasuhiro Horiike プラズマエッチング装置
JP2001023969A (ja) * 1999-07-13 2001-01-26 Matsushita Electronics Industry Corp 排ガスモニタを備えたプラズマ装置およびその動作方法
JP2001176807A (ja) * 1999-12-20 2001-06-29 Hitachi Ltd 半導体装置の製造装置、製造方法およびクリーニング方法

Also Published As

Publication number Publication date
US12265057B2 (en) 2025-04-01
TWI911359B (zh) 2026-01-11
US20240264116A1 (en) 2024-08-08
US20220196597A1 (en) 2022-06-23
WO2022140740A1 (en) 2022-06-30
EP4268261A1 (en) 2023-11-01
CN116635976A (zh) 2023-08-22
TW202236347A (zh) 2022-09-16
KR20230123998A (ko) 2023-08-24
US11971386B2 (en) 2024-04-30

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