JP2024501279A5 - - Google Patents
Info
- Publication number
- JP2024501279A5 JP2024501279A5 JP2023538674A JP2023538674A JP2024501279A5 JP 2024501279 A5 JP2024501279 A5 JP 2024501279A5 JP 2023538674 A JP2023538674 A JP 2023538674A JP 2023538674 A JP2023538674 A JP 2023538674A JP 2024501279 A5 JP2024501279 A5 JP 2024501279A5
- Authority
- JP
- Japan
- Prior art keywords
- radical
- flow channel
- aperture
- test chamber
- ionizer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202063130257P | 2020-12-23 | 2020-12-23 | |
| US63/130,257 | 2020-12-23 | ||
| PCT/US2021/072969 WO2022140740A1 (en) | 2020-12-23 | 2021-12-16 | Monitoring radical particle concentration using mass spectrometry |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024501279A JP2024501279A (ja) | 2024-01-11 |
| JP2024501279A5 true JP2024501279A5 (https=) | 2024-11-29 |
Family
ID=80050861
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023538674A Pending JP2024501279A (ja) | 2020-12-23 | 2021-12-16 | 質量分析法を使用したラジカル粒子濃度のモニタリング |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US11971386B2 (https=) |
| EP (1) | EP4268261A1 (https=) |
| JP (1) | JP2024501279A (https=) |
| KR (1) | KR20230123998A (https=) |
| CN (1) | CN116635976A (https=) |
| TW (1) | TWI911359B (https=) |
| WO (1) | WO2022140740A1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022256295A1 (en) * | 2021-06-01 | 2022-12-08 | Inficon, Inc. | Method of detecting radicals using mass spectrometry |
| US20230411129A1 (en) * | 2022-06-15 | 2023-12-21 | Applied Materials, Inc. | Closed-loop control of plasma source via feedback from laser absorption species sensor |
| JP2026508739A (ja) * | 2022-11-16 | 2026-03-12 | エムケーエス インコーポレイテッド | プロセスツール診断のためのラジカル検知 |
| US20250308867A1 (en) * | 2024-03-29 | 2025-10-02 | Tokyo Electron Limited | High-performance adaptable sampling system |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2059675C3 (de) | 1970-12-04 | 1974-04-11 | Farbwerke Hoechst Ag, Vormals Meister Lucius & Bruening, 6000 Frankfurt | Verfahren zur Verbesserung der anwendungstechnischen Eigenschaften eines Disazopigmentes |
| JPS5931550A (ja) * | 1982-08-16 | 1984-02-20 | Ulvac Corp | プラズマエツチング中のラジカルおよび励起分子測定装置 |
| GB8602463D0 (en) | 1986-01-31 | 1986-03-05 | Vg Instr Group | Mass spectrometer |
| JPH07122229A (ja) * | 1993-10-25 | 1995-05-12 | Kawasaki Steel Corp | 質量分析装置 |
| JP3386287B2 (ja) * | 1995-05-08 | 2003-03-17 | 堀池 靖浩 | プラズマエッチング装置 |
| JP2001023969A (ja) * | 1999-07-13 | 2001-01-26 | Matsushita Electronics Industry Corp | 排ガスモニタを備えたプラズマ装置およびその動作方法 |
| JP2001176807A (ja) * | 1999-12-20 | 2001-06-29 | Hitachi Ltd | 半導体装置の製造装置、製造方法およびクリーニング方法 |
| JP2006501620A (ja) | 2002-09-30 | 2006-01-12 | 東京エレクトロン株式会社 | プラズマ処理システムとともに光学系を使用するための装置及び方法 |
| JP5469823B2 (ja) | 2008-04-25 | 2014-04-16 | アジレント・テクノロジーズ・インク | プラズマイオン源質量分析装置 |
| GB2470294B (en) | 2009-05-13 | 2014-02-26 | Micromass Ltd | Surface coating on sampling cone of mass spectrometer |
| US8471198B2 (en) * | 2009-05-13 | 2013-06-25 | Micromass Uk Limited | Mass spectrometer sampling cone with coating |
| KR20110103723A (ko) | 2010-03-15 | 2011-09-21 | 삼성전자주식회사 | 공정 모니터링 장치와, 이를 이용한 공정 모니터링 방법 |
| GB2498173C (en) | 2011-12-12 | 2018-06-27 | Thermo Fisher Scient Bremen Gmbh | Mass spectrometer vacuum interface method and apparatus |
| DE102013201499A1 (de) | 2013-01-30 | 2014-07-31 | Carl Zeiss Microscopy Gmbh | Verfahren zur massenspektrometrischen Untersuchung von Gasgemischen sowie Massenspektrometer hierzu |
| KR20140137172A (ko) | 2013-05-22 | 2014-12-02 | 최대규 | 자기 관리 기능을 갖는 원격 플라즈마 시스템 및 이의 자기 관리 방법 |
| US20140374583A1 (en) | 2013-06-24 | 2014-12-25 | Agilent Technologies, Inc. | Electron ionization (ei) utilizing different ei energies |
| US10473525B2 (en) | 2013-11-01 | 2019-11-12 | Tokyo Electron Limited | Spatially resolved optical emission spectroscopy (OES) in plasma processing |
| CN103715113B (zh) | 2013-12-13 | 2016-03-30 | 合肥京东方光电科技有限公司 | 一种刻蚀速率均一度的监测方法及装置 |
| US10319649B2 (en) | 2017-04-11 | 2019-06-11 | Applied Materials, Inc. | Optical emission spectroscopy (OES) for remote plasma monitoring |
| US10685819B2 (en) | 2017-05-25 | 2020-06-16 | Applied Materials, Inc. | Measuring concentrations of radicals in semiconductor processing |
| KR102025873B1 (ko) | 2018-04-02 | 2019-09-26 | 한국기계연구원 | 공정 모니터링을 위한 플라즈마 분석 장치 및 방법 |
| DE102018216623A1 (de) | 2018-09-27 | 2020-04-02 | Carl Zeiss Smt Gmbh | Massenspektrometer und Verfahren zur massenspektrometrischen Analyse eines Gases |
| JP7095579B2 (ja) * | 2018-12-05 | 2022-07-05 | 株式会社島津製作所 | 質量分析装置 |
| TWI897405B (zh) * | 2019-03-25 | 2025-09-11 | 日商亞多納富有限公司 | 半導體製造系統、其控制方法及控制該系統的電腦程式 |
| US11114286B2 (en) | 2019-04-08 | 2021-09-07 | Applied Materials, Inc. | In-situ optical chamber surface and process sensor |
| US11430643B2 (en) | 2020-09-29 | 2022-08-30 | Tokyo Electron Limited | Quantification of processing chamber species by electron energy sweep |
-
2021
- 2021-12-16 WO PCT/US2021/072969 patent/WO2022140740A1/en not_active Ceased
- 2021-12-16 JP JP2023538674A patent/JP2024501279A/ja active Pending
- 2021-12-16 EP EP21848503.5A patent/EP4268261A1/en active Pending
- 2021-12-16 US US17/644,704 patent/US11971386B2/en active Active
- 2021-12-16 CN CN202180084665.3A patent/CN116635976A/zh active Pending
- 2021-12-16 KR KR1020237023547A patent/KR20230123998A/ko active Pending
- 2021-12-21 TW TW110147914A patent/TWI911359B/zh active
-
2024
- 2024-03-29 US US18/621,600 patent/US12265057B2/en active Active
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