KR20230123998A - 질량 분석법을 사용하는 라디칼 입자 농도 모니터링 - Google Patents

질량 분석법을 사용하는 라디칼 입자 농도 모니터링 Download PDF

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Publication number
KR20230123998A
KR20230123998A KR1020237023547A KR20237023547A KR20230123998A KR 20230123998 A KR20230123998 A KR 20230123998A KR 1020237023547 A KR1020237023547 A KR 1020237023547A KR 20237023547 A KR20237023547 A KR 20237023547A KR 20230123998 A KR20230123998 A KR 20230123998A
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KR
South Korea
Prior art keywords
radical
test chamber
flow channel
gas
particles
Prior art date
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Pending
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KR1020237023547A
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English (en)
Korean (ko)
Inventor
쳉롱 양
지미 리우
제임스 이. 블레싱
Original Assignee
엠케이에스 인스트루먼츠 인코포레이티드
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Application filed by 엠케이에스 인스트루먼츠 인코포레이티드 filed Critical 엠케이에스 인스트루먼츠 인코포레이티드
Publication of KR20230123998A publication Critical patent/KR20230123998A/ko
Pending legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/0027Methods for using particle spectrometers
    • H01J49/0031Step by step routines describing the use of the apparatus
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/62Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
    • G01N27/622Ion mobility spectrometry
    • G01N27/623Ion mobility spectrometry combined with mass spectrometry
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • H01J49/10Ion sources; Ion guns
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/26Mass spectrometers or separator tubes
    • H01J49/28Static spectrometers
    • H01J49/282Static spectrometers using electrostatic analysers

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Electrochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Molecular Biology (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
KR1020237023547A 2020-12-23 2021-12-16 질량 분석법을 사용하는 라디칼 입자 농도 모니터링 Pending KR20230123998A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202063130257P 2020-12-23 2020-12-23
US63/130,257 2020-12-23
PCT/US2021/072969 WO2022140740A1 (en) 2020-12-23 2021-12-16 Monitoring radical particle concentration using mass spectrometry

Publications (1)

Publication Number Publication Date
KR20230123998A true KR20230123998A (ko) 2023-08-24

Family

ID=80050861

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020237023547A Pending KR20230123998A (ko) 2020-12-23 2021-12-16 질량 분석법을 사용하는 라디칼 입자 농도 모니터링

Country Status (7)

Country Link
US (2) US11971386B2 (https=)
EP (1) EP4268261A1 (https=)
JP (1) JP2024501279A (https=)
KR (1) KR20230123998A (https=)
CN (1) CN116635976A (https=)
TW (1) TWI911359B (https=)
WO (1) WO2022140740A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022256295A1 (en) * 2021-06-01 2022-12-08 Inficon, Inc. Method of detecting radicals using mass spectrometry
US20230411129A1 (en) * 2022-06-15 2023-12-21 Applied Materials, Inc. Closed-loop control of plasma source via feedback from laser absorption species sensor
JP2026508739A (ja) * 2022-11-16 2026-03-12 エムケーエス インコーポレイテッド プロセスツール診断のためのラジカル検知
US20250308867A1 (en) * 2024-03-29 2025-10-02 Tokyo Electron Limited High-performance adaptable sampling system

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DE2059675C3 (de) 1970-12-04 1974-04-11 Farbwerke Hoechst Ag, Vormals Meister Lucius & Bruening, 6000 Frankfurt Verfahren zur Verbesserung der anwendungstechnischen Eigenschaften eines Disazopigmentes
JPS5931550A (ja) * 1982-08-16 1984-02-20 Ulvac Corp プラズマエツチング中のラジカルおよび励起分子測定装置
GB8602463D0 (en) 1986-01-31 1986-03-05 Vg Instr Group Mass spectrometer
JPH07122229A (ja) * 1993-10-25 1995-05-12 Kawasaki Steel Corp 質量分析装置
JP3386287B2 (ja) * 1995-05-08 2003-03-17 堀池 靖浩 プラズマエッチング装置
JP2001023969A (ja) * 1999-07-13 2001-01-26 Matsushita Electronics Industry Corp 排ガスモニタを備えたプラズマ装置およびその動作方法
JP2001176807A (ja) * 1999-12-20 2001-06-29 Hitachi Ltd 半導体装置の製造装置、製造方法およびクリーニング方法
JP2006501620A (ja) 2002-09-30 2006-01-12 東京エレクトロン株式会社 プラズマ処理システムとともに光学系を使用するための装置及び方法
JP5469823B2 (ja) 2008-04-25 2014-04-16 アジレント・テクノロジーズ・インク プラズマイオン源質量分析装置
GB2470294B (en) 2009-05-13 2014-02-26 Micromass Ltd Surface coating on sampling cone of mass spectrometer
US8471198B2 (en) * 2009-05-13 2013-06-25 Micromass Uk Limited Mass spectrometer sampling cone with coating
KR20110103723A (ko) 2010-03-15 2011-09-21 삼성전자주식회사 공정 모니터링 장치와, 이를 이용한 공정 모니터링 방법
GB2498173C (en) 2011-12-12 2018-06-27 Thermo Fisher Scient Bremen Gmbh Mass spectrometer vacuum interface method and apparatus
DE102013201499A1 (de) 2013-01-30 2014-07-31 Carl Zeiss Microscopy Gmbh Verfahren zur massenspektrometrischen Untersuchung von Gasgemischen sowie Massenspektrometer hierzu
KR20140137172A (ko) 2013-05-22 2014-12-02 최대규 자기 관리 기능을 갖는 원격 플라즈마 시스템 및 이의 자기 관리 방법
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CN103715113B (zh) 2013-12-13 2016-03-30 合肥京东方光电科技有限公司 一种刻蚀速率均一度的监测方法及装置
US10319649B2 (en) 2017-04-11 2019-06-11 Applied Materials, Inc. Optical emission spectroscopy (OES) for remote plasma monitoring
US10685819B2 (en) 2017-05-25 2020-06-16 Applied Materials, Inc. Measuring concentrations of radicals in semiconductor processing
KR102025873B1 (ko) 2018-04-02 2019-09-26 한국기계연구원 공정 모니터링을 위한 플라즈마 분석 장치 및 방법
DE102018216623A1 (de) 2018-09-27 2020-04-02 Carl Zeiss Smt Gmbh Massenspektrometer und Verfahren zur massenspektrometrischen Analyse eines Gases
JP7095579B2 (ja) * 2018-12-05 2022-07-05 株式会社島津製作所 質量分析装置
TWI897405B (zh) * 2019-03-25 2025-09-11 日商亞多納富有限公司 半導體製造系統、其控制方法及控制該系統的電腦程式
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Also Published As

Publication number Publication date
US12265057B2 (en) 2025-04-01
TWI911359B (zh) 2026-01-11
US20240264116A1 (en) 2024-08-08
US20220196597A1 (en) 2022-06-23
WO2022140740A1 (en) 2022-06-30
EP4268261A1 (en) 2023-11-01
CN116635976A (zh) 2023-08-22
TW202236347A (zh) 2022-09-16
JP2024501279A (ja) 2024-01-11
US11971386B2 (en) 2024-04-30

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