JP2024122352A - 濃度制御装置、原料気化システム、濃度制御方法及び濃度制御プログラム - Google Patents

濃度制御装置、原料気化システム、濃度制御方法及び濃度制御プログラム Download PDF

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Publication number
JP2024122352A
JP2024122352A JP2023029849A JP2023029849A JP2024122352A JP 2024122352 A JP2024122352 A JP 2024122352A JP 2023029849 A JP2023029849 A JP 2023029849A JP 2023029849 A JP2023029849 A JP 2023029849A JP 2024122352 A JP2024122352 A JP 2024122352A
Authority
JP
Japan
Prior art keywords
concentration
raw material
flow rate
gas
control device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023029849A
Other languages
English (en)
Japanese (ja)
Other versions
JP2024122352A5 (cg-RX-API-DMAC7.html
Inventor
興太郎 瀧尻
Kotaro Takijiri
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Horiba Stec Co Ltd
Original Assignee
Horiba Stec Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Horiba Stec Co Ltd filed Critical Horiba Stec Co Ltd
Priority to JP2023029849A priority Critical patent/JP2024122352A/ja
Priority to KR1020240025209A priority patent/KR20240133605A/ko
Priority to TW113106614A priority patent/TW202448566A/zh
Priority to US18/588,463 priority patent/US20240286060A1/en
Priority to CN202410213862.6A priority patent/CN118564832A/zh
Publication of JP2024122352A publication Critical patent/JP2024122352A/ja
Publication of JP2024122352A5 publication Critical patent/JP2024122352A5/ja
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/0082—Regulation; Control
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01B—BOILING; BOILING APPARATUS ; EVAPORATION; EVAPORATION APPARATUS
    • B01B1/00—Boiling; Boiling apparatus for physical or chemical purposes ; Evaporation in general
    • B01B1/005—Evaporation for physical or chemical purposes; Evaporation apparatus therefor, e.g. evaporation of liquids for gas phase reactions
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D11/00—Control of flow ratio
    • G05D11/02—Controlling ratio of two or more flows of fluid or fluent material
    • G05D11/13—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means
    • G05D11/135—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by sensing at least one property of the mixture
    • G05D11/138—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by sensing at least one property of the mixture by sensing the concentration of the mixture, e.g. measuring pH value
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17D—PIPE-LINE SYSTEMS; PIPE-LINES
    • F17D3/00—Arrangements for supervising or controlling working operations
    • F17D3/01—Arrangements for supervising or controlling working operations for controlling, signalling, or supervising the conveyance of a product
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C7/00—Methods or apparatus for discharging liquefied, solidified, or compressed gases from pressure vessels, not covered by another subclass
    • F17C7/02—Discharging liquefied gases
    • F17C7/04—Discharging liquefied gases with change of state, e.g. vaporisation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17D—PIPE-LINE SYSTEMS; PIPE-LINES
    • F17D1/00—Pipe-line systems
    • F17D1/02—Pipe-line systems for gases or vapours
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
    • G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
    • G05B13/04—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators
    • G05B13/048—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators using a predictor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0604—Process monitoring, e.g. flow or thickness monitoring

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemical & Material Sciences (AREA)
  • Artificial Intelligence (AREA)
  • Software Systems (AREA)
  • Medical Informatics (AREA)
  • Evolutionary Computation (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Health & Medical Sciences (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Feedback Control In General (AREA)
  • Control Of Non-Electrical Variables (AREA)
JP2023029849A 2023-02-28 2023-02-28 濃度制御装置、原料気化システム、濃度制御方法及び濃度制御プログラム Pending JP2024122352A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2023029849A JP2024122352A (ja) 2023-02-28 2023-02-28 濃度制御装置、原料気化システム、濃度制御方法及び濃度制御プログラム
KR1020240025209A KR20240133605A (ko) 2023-02-28 2024-02-21 농도 제어 장치, 원료 기화 시스템, 농도 제어 방법, 및 농도 제어 프로그램을 격납한 기록 매체
TW113106614A TW202448566A (zh) 2023-02-28 2024-02-23 濃度控制裝置、原料氣化系統、濃度控制方法和存儲有濃度控制程式的存儲介質
US18/588,463 US20240286060A1 (en) 2023-02-28 2024-02-27 Concentration control device, raw material vaporization system, concentration control method, and recording medium storing concentration control program
CN202410213862.6A CN118564832A (zh) 2023-02-28 2024-02-27 浓度控制装置、原料气化系统、浓度控制方法和存储有浓度控制程序的存储介质

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2023029849A JP2024122352A (ja) 2023-02-28 2023-02-28 濃度制御装置、原料気化システム、濃度制御方法及び濃度制御プログラム

Publications (2)

Publication Number Publication Date
JP2024122352A true JP2024122352A (ja) 2024-09-09
JP2024122352A5 JP2024122352A5 (cg-RX-API-DMAC7.html) 2026-01-26

Family

ID=92461882

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023029849A Pending JP2024122352A (ja) 2023-02-28 2023-02-28 濃度制御装置、原料気化システム、濃度制御方法及び濃度制御プログラム

Country Status (5)

Country Link
US (1) US20240286060A1 (cg-RX-API-DMAC7.html)
JP (1) JP2024122352A (cg-RX-API-DMAC7.html)
KR (1) KR20240133605A (cg-RX-API-DMAC7.html)
CN (1) CN118564832A (cg-RX-API-DMAC7.html)
TW (1) TW202448566A (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7829898B1 (ja) * 2025-03-31 2026-03-16 株式会社エイシング 遅れ補償システム、方法、及びプログラム

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7829898B1 (ja) * 2025-03-31 2026-03-16 株式会社エイシング 遅れ補償システム、方法、及びプログラム

Also Published As

Publication number Publication date
US20240286060A1 (en) 2024-08-29
CN118564832A (zh) 2024-08-30
KR20240133605A (ko) 2024-09-04
TW202448566A (zh) 2024-12-16

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