JP2024034606A - Ｐｚｔ薄膜積層体の成膜方法およびｐｚｔ薄膜積層体 - Google Patents

Ｐｚｔ薄膜積層体の成膜方法およびｐｚｔ薄膜積層体 Download PDF

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Publication number
JP2024034606A
JP2024034606A JP2022138963A JP2022138963A JP2024034606A JP 2024034606 A JP2024034606 A JP 2024034606A JP 2022138963 A JP2022138963 A JP 2022138963A JP 2022138963 A JP2022138963 A JP 2022138963A JP 2024034606 A JP2024034606 A JP 2024034606A
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pzt
thin film
film laminate
layer
pzt thin
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Japanese (ja)
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JP2024034606A5 (https=
Inventor
耕平 松岡
Kohei Matsuoka
達朗 露木
Tatsuro Tsuyuki
宏樹 小林
Hiroki Kobayashi
祥貴 石渡
Yoshiki Ishiwatari
浩一 松本
Koichi Matsumoto
正樹 對馬
Masaki Tsushima
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Ulvac Inc
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Ulvac Inc
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Priority to JP2022138963A priority Critical patent/JP2024034606A/ja
Publication of JP2024034606A publication Critical patent/JP2024034606A/ja
Publication of JP2024034606A5 publication Critical patent/JP2024034606A5/ja
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JP2022138963A 2022-09-01 2022-09-01 Ｐｚｔ薄膜積層体の成膜方法およびｐｚｔ薄膜積層体 Pending JP2024034606A (ja)

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JP2022138963A JP2024034606A (ja) 2022-09-01 2022-09-01 Ｐｚｔ薄膜積層体の成膜方法およびｐｚｔ薄膜積層体

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JP2022138963A JP2024034606A (ja) 2022-09-01 2022-09-01 Ｐｚｔ薄膜積層体の成膜方法およびｐｚｔ薄膜積層体

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JP2024034606A true JP2024034606A (ja) 2024-03-13
JP2024034606A5 JP2024034606A5 (https=) 2025-07-25

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7839323B1 (ja) * 2025-02-04 2026-04-01 株式会社アルバック 多層構造体の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7839323B1 (ja) * 2025-02-04 2026-04-01 株式会社アルバック 多層構造体の製造方法

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