JP2023506824A - 多層構造の無機物層を含む分離膜一体型電極の製造方法及びそれによる分離膜一体型電極 - Google Patents
多層構造の無機物層を含む分離膜一体型電極の製造方法及びそれによる分離膜一体型電極 Download PDFInfo
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Abstract
Description
S1)直径が500nm~3μmのベーマイト(第1無機物粒子)とNMP溶媒(第1溶媒)と分散剤を投入して撹拌した第1無機物混合液を製造した後、PVdFバインダー(第1バインダー高分子)とNMP溶媒(第1溶媒)を混合した第1バインダー溶液を前記第1無機物混合液と混合することで、スラリー粒子の直径がD50を基準に500nm~3μmであり、粘度が10000cP(固形分含量約29重量%)である第1無機物層スラリーを製造する。
実施例1-2は実施例1-1の場合と同様に形成するが、第1無機物層の厚さが10μm、第2無機物層の厚さが10μmになるように単位セルを形成する。
比較例1は前記実施例1-1のS1)段階を経ず、前記S4)段階で前記単位電極の前記負極活物質層上に第2無機物層スラリーを塗布してから乾燥して厚さ20μmの第2無機物層のみを形成する点を除き、同様な段階を経て比較例1の単位セルを形成する。
比較例2は、前記実施例1-2でS1)段階の第1無機物層スラリーの粘度が2000cP(固形分含量約20重量%)である点を除き、同様な段階を経て比較例2の単位セルを形成する。
前記実施例及び比較例による単位セルを0.3Cで充電し、0.3Cで放電して初期容量を測定した後、下記表1に示した。
前記実施例及び比較例による単位セルを0.3Cで充電及び放電して1サイクルを実施した後、0.3Cで充電して4.2Vまで完全充電させた後(SOC 100)、第1サイクルの放電容量の50%のみを0.3Cで放電してDOD50(=SOC 50)を維持した。DOD50(=SOC50%)状態で3Cで10秒間放電して単位セルの抵抗を測定した。下記表1はDOD50(=SOC 50)のときの抵抗を示す。
前記実施例及び比較例による単位セルに対して45℃の条件で充放電を50サイクル実施して、一番目放電容量に比べて50サイクル後の放電容量を計算した。ここで、充電は0.3Cで4.2Vになるまで充電し、放電は1Cの定電流で2.5Vになるまで放電した。これを下記の表1及び図7に示した。図7で、グラフは上から下にそれぞれ実施例1-1、実施例1-2、比較例1、比較例2である。
110 負極集電体
120 正極集電体
20、200 電極活物質層
210 負極活物質層
220 正極活物質層
250 単位電極
30 無機物層
300 第1無機物層
310 第1無機物粒子
400 第2無機物層
410 第2無機物粒子
S1)直径が500nm~3μmのベーマイト(第1無機物粒子)とNMP溶媒(第1溶媒)と分散剤を投入して撹拌した第1無機物溶液を製造した後、PVdFバインダー(第1バインダー高分子)とNMP溶媒(第1溶媒)を混合した第1バインダー溶液を前記第1無機物溶液と混合することで、スラリー粒子の直径がD50を基準に500nm~3μmであり、粘度が10000cP(固形分含量約29重量%)である第1無機物層スラリーを製造する。
Claims (19)
- S1)第1無機物粒子及び第1バインダーを含み、粘度が5000cP~20000cPである第1無機物層スラリーを製造する段階と、
S2)第2無機物粒子及び第2バインダーを含む第2無機物層スラリーを製造する段階と、
S3)電極集電体の少なくとも一面に電極活物質層が形成された単位電極を準備する段階と、
S4)前記S3)段階の単位電極の電極活物質層の少なくとも一面に前記第1無機物スラリーから構成された第1無機物層を形成し、前記第1無機物層上に前記第2無機物スラリーから構成された第2無機物層を形成する段階と、
を含み、
前記第1無機物粒子のD50直径は前記単位電極の電極活物質層の気孔サイズより大きく、前記第2無機物粒子の直径は前記第1無機物粒子のD50直径より小さく、
前記S1)段階~S3)段階は順序に関係なく実施するか、2個以上を同時に実施することができる、分離膜一体型電極の製造方法。 - 前記S1)段階は、
前記第1無機物粒子と第1溶媒を混合して第1無機物溶液を製造する段階と、
前記第1バインダー高分子と前記第1溶媒を混合して第1バインダー溶液を製造する段階と、
前記第1無機物溶液と前記第1バインダー溶液を混合して第1無機物層スラリーを製造する段階と、を含む、請求項1に記載の分離膜一体型電極の製造方法。 - 前記S2)段階は、
前記第2無機物粒子と第2溶媒を混合して第2無機物溶液を製造する段階と、
前記第2バインダー高分子と前記第2溶媒を混合して第2バインダー溶液を製造する段階と、
前記第2無機物溶液と前記第2バインダー溶液を混合して第2無機物層スラリーを製造する段階と、を含む、請求項1に記載の分離膜一体型電極の製造方法。 - 前記第1無機物粒子の直径は500nm~3μmであり、
前記第2無機物粒子の直径は20nm~300nmである、請求項1に記載の分離膜一体型電極の製造方法。 - 前記S1)段階の第1無機物層スラリー及び/または前記S2)段階の第2無機物層スラリーに分散剤をさらに含む、請求項1に記載の分離膜一体型電極の製造方法。
- 前記第2無機物粒子は直径の相異なる粒子が混合されている、請求項1に記載の分離膜一体型電極の製造方法。
- 前記第2無機物粒子は、前記S2)段階で粒子の直径が小さい順に順次混合する段階をさらに含むことにより製造される、請求項6に記載の分離膜一体型電極の製造方法。
- 前記第2無機物粒子を混合するとき、粒径の小さい粒子を混合する段階と粒径の大きい粒子を混合する段階との間に分散剤を混合する段階をさらに含む、請求項7に記載の分離膜一体型電極の製造方法。
- 前記第1無機物層スラリーは前記第2無機物層スラリーより粘度が高い、請求項1に記載の分離膜一体型電極の製造方法。
- 前記第2無機物層スラリーの粘度は300cP~3000cPである、請求項1に記載の分離膜一体型電極の製造方法。
- 前記S4)段階で、前記第1無機物層スラリーと前記第2無機物層スラリーを前記単位電極の電極活物質層の少なくとも一面に同時にコーティングする、請求項1に記載の分離膜一体型電極の製造方法。
- 前記S4)段階で、前記単位電極の電極活物質層の少なくとも一面に前記第1無機物層スラリーを塗布してから乾燥して前記第1無機物層を形成し、前記第1無機物層上に前記第2無機物層スラリーを塗布してから乾燥して第2無機物層を形成する、請求項1に記載の分離膜一体型電極の製造方法。
- 前記第1無機物層及び/または前記第2無機物層を形成した後、それぞれラミネーションする段階をさらに含む、請求項12に記載の分離膜一体型電極の製造方法。
- 前記ラミネーションは、20℃~200℃で実施する、請求項13に記載の分離膜一体型電極の製造方法。
- 前記第1無機物粒子及び/または前記第2無機物粒子は、AlOOH、Al(OH)3、及びAl2O3の中で少なくとも1種以上を含む、請求項1に記載の分離膜一体型電極の製造方法。
- 前記第2無機物粒子は表面改質されたものを含む、請求項1に記載の分離膜一体型電極の製造方法。
- 請求項1から16のいずれか一項に記載の分離膜一体型電極の製造方法によって製造された、分離膜一体型電極。
- 請求項17に記載の分離膜一体型電極を少なくとも1層以上積層し、これをラミネーションして単位セルを製造する段階を含む、電極組立体の製造方法。
- 請求項17に記載の分離膜一体型電極を含む、電極組立体。
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