JP2023113850A5 - - Google Patents
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- Publication number
- JP2023113850A5 JP2023113850A5 JP2023093767A JP2023093767A JP2023113850A5 JP 2023113850 A5 JP2023113850 A5 JP 2023113850A5 JP 2023093767 A JP2023093767 A JP 2023093767A JP 2023093767 A JP2023093767 A JP 2023093767A JP 2023113850 A5 JP2023113850 A5 JP 2023113850A5
- Authority
- JP
- Japan
- Prior art keywords
- ring
- processing system
- substrate processing
- substrate
- support surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021018937 | 2021-02-09 | ||
| JP2021018937 | 2021-02-09 | ||
| PCT/JP2022/004058 WO2022172827A1 (ja) | 2021-02-09 | 2022-02-02 | 基板処理システム及び搬送方法 |
| JP2022580577A JP7293517B2 (ja) | 2021-02-09 | 2022-02-02 | 基板処理システム及び搬送方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022580577A Division JP7293517B2 (ja) | 2021-02-09 | 2022-02-02 | 基板処理システム及び搬送方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2023113850A JP2023113850A (ja) | 2023-08-16 |
| JP2023113850A5 true JP2023113850A5 (https=) | 2025-06-20 |
Family
ID=82838802
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022580577A Active JP7293517B2 (ja) | 2021-02-09 | 2022-02-02 | 基板処理システム及び搬送方法 |
| JP2023093767A Pending JP2023113850A (ja) | 2021-02-09 | 2023-06-07 | 基板処理システム及び搬送方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022580577A Active JP7293517B2 (ja) | 2021-02-09 | 2022-02-02 | 基板処理システム及び搬送方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US12165893B2 (https=) |
| JP (2) | JP7293517B2 (https=) |
| KR (3) | KR20250163393A (https=) |
| CN (1) | CN116057676A (https=) |
| TW (2) | TWI868422B (https=) |
| WO (1) | WO2022172827A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12581825B2 (en) | 2021-04-23 | 2026-03-17 | Applied Materials, Inc. | Conductive oxide overhang structures for OLED devices |
| KR20220156138A (ko) * | 2021-05-17 | 2022-11-25 | 세메스 주식회사 | 링 캐리어 및 기판 처리 시스템 |
| KR20250084933A (ko) * | 2022-09-30 | 2025-06-11 | 도쿄엘렉트론가부시키가이샤 | 기판 처리 시스템 |
| CN120770070A (zh) * | 2023-03-17 | 2025-10-10 | 东京毅力科创株式会社 | 等离子体处理系统和环状构件的高度的估计方法 |
| US20240339352A1 (en) * | 2023-04-07 | 2024-10-10 | Applied Materials, Inc. | Susceptor for process chamber |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10658222B2 (en) * | 2015-01-16 | 2020-05-19 | Lam Research Corporation | Moveable edge coupling ring for edge process control during semiconductor wafer processing |
| US9881820B2 (en) * | 2015-10-22 | 2018-01-30 | Lam Research Corporation | Front opening ring pod |
| US9892956B1 (en) * | 2016-10-12 | 2018-02-13 | Lam Research Corporation | Wafer positioning pedestal for semiconductor processing |
| US11043400B2 (en) * | 2017-12-21 | 2021-06-22 | Applied Materials, Inc. | Movable and removable process kit |
| KR102433436B1 (ko) * | 2018-07-04 | 2022-08-17 | 삼성전자주식회사 | 기판 처리 시스템, 기판 처리 시스템에서의 에지 링 정렬 검사 방법 및 이를 수행하기 위한 원반형 비젼 센서 |
| JP7129325B2 (ja) * | 2018-12-14 | 2022-09-01 | 東京エレクトロン株式会社 | 搬送方法及び搬送システム |
| JP7134104B2 (ja) | 2019-01-09 | 2022-09-09 | 東京エレクトロン株式会社 | プラズマ処理装置およびプラズマ処理装置の載置台 |
| US20200234928A1 (en) * | 2019-01-17 | 2020-07-23 | Applied Materials, Inc. | Semiconductor plasma processing equipment with wafer edge plasma sheath tuning ability |
| TWM588883U (zh) * | 2019-05-10 | 2020-01-01 | 美商蘭姆研究公司 | 半導體製程模組的中環 |
| JP7345289B2 (ja) * | 2019-06-18 | 2023-09-15 | 東京エレクトロン株式会社 | 基板処理装置、基板処理システム及び基板搬送方法 |
| JP7465733B2 (ja) * | 2019-09-26 | 2024-04-11 | 東京エレクトロン株式会社 | 基板支持器及びプラズマ処理装置 |
| KR102747645B1 (ko) * | 2019-10-10 | 2024-12-27 | 삼성전자주식회사 | 정전 척 및 상기 정전 척을 포함하는 기판 처리 장치 |
-
2022
- 2022-02-02 CN CN202280006376.6A patent/CN116057676A/zh active Pending
- 2022-02-02 KR KR1020257035980A patent/KR20250163393A/ko active Pending
- 2022-02-02 KR KR1020237008746A patent/KR102642683B1/ko active Active
- 2022-02-02 WO PCT/JP2022/004058 patent/WO2022172827A1/ja not_active Ceased
- 2022-02-02 KR KR1020247006382A patent/KR102879372B1/ko active Active
- 2022-02-02 JP JP2022580577A patent/JP7293517B2/ja active Active
- 2022-02-08 TW TW111104566A patent/TWI868422B/zh active
- 2022-02-08 TW TW113146605A patent/TW202514806A/zh unknown
-
2023
- 2023-03-13 US US18/182,716 patent/US12165893B2/en active Active
- 2023-06-07 JP JP2023093767A patent/JP2023113850A/ja active Pending
-
2024
- 2024-10-25 US US18/927,144 patent/US20250054793A1/en active Pending
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