JP2022539216A5 - - Google Patents

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Publication number
JP2022539216A5
JP2022539216A5 JP2021578031A JP2021578031A JP2022539216A5 JP 2022539216 A5 JP2022539216 A5 JP 2022539216A5 JP 2021578031 A JP2021578031 A JP 2021578031A JP 2021578031 A JP2021578031 A JP 2021578031A JP 2022539216 A5 JP2022539216 A5 JP 2022539216A5
Authority
JP
Japan
Prior art keywords
characteristic dimension
anisotropic
twice
dimension
anode orifice
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2021578031A
Other languages
English (en)
Japanese (ja)
Other versions
JP2022539216A (ja
Filing date
Publication date
Priority claimed from FR1907324A external-priority patent/FR3098341B1/fr
Application filed filed Critical
Publication of JP2022539216A publication Critical patent/JP2022539216A/ja
Publication of JP2022539216A5 publication Critical patent/JP2022539216A5/ja
Pending legal-status Critical Current

Links

JP2021578031A 2019-07-02 2020-06-30 荷電粒子のパルス発生器および荷電粒子のパルス発生器を使用するための方法 Pending JP2022539216A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1907324A FR3098341B1 (fr) 2019-07-02 2019-07-02 Generateur pulse de particules chargees electriquement et procede d’utilisation d’un generateur pulse de particules chargees electriquement
FR1907324 2019-07-02
PCT/EP2020/068427 WO2021001383A1 (fr) 2019-07-02 2020-06-30 Generateur pulse de particules chargees electriquement et procede d'utilisation d'un generateur pulse de particules chargees electriquement

Publications (2)

Publication Number Publication Date
JP2022539216A JP2022539216A (ja) 2022-09-07
JP2022539216A5 true JP2022539216A5 (https=) 2024-11-22

Family

ID=69375384

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021578031A Pending JP2022539216A (ja) 2019-07-02 2020-06-30 荷電粒子のパルス発生器および荷電粒子のパルス発生器を使用するための方法

Country Status (6)

Country Link
US (1) US12278082B2 (https=)
EP (1) EP3994714A1 (https=)
JP (1) JP2022539216A (https=)
CA (1) CA3145386A1 (https=)
FR (1) FR3098341B1 (https=)
WO (1) WO2021001383A1 (https=)

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2075379A (en) 1935-03-13 1937-03-30 Farnsworth Television Inc Time delay oscillator
JPS5842136A (ja) 1981-09-08 1983-03-11 Nec Corp 電子ビ−ム発生装置
US4703228A (en) * 1985-08-28 1987-10-27 Ga Technologies Inc. Apparatus and method for providing a modulated electron beam
JP2954963B2 (ja) 1990-02-16 1999-09-27 浜松ホトニクス株式会社 光電面利用電子源装置
JPH05128990A (ja) 1991-11-05 1993-05-25 Hitachi Ltd 荷電粒子銃
JPH06231724A (ja) * 1993-02-02 1994-08-19 Nissin Electric Co Ltd イオン注入装置
JPH09161660A (ja) * 1995-12-06 1997-06-20 Hitachi Ltd 電子線源および電子線装置
DE19627621C2 (de) 1996-07-09 1998-05-20 Bruker Saxonia Analytik Gmbh Ionenmobilitätsspektrometer
DE10245052A1 (de) 2002-09-26 2004-04-08 Leo Elektronenmikroskopie Gmbh Elektronenstrahlquelle und elektronenoptischer Apparat mit einer solchen
US8203120B2 (en) 2008-10-09 2012-06-19 California Institute Of Technology 4D imaging in an ultrafast electron microscope
JP6192097B2 (ja) * 2013-05-31 2017-09-06 国立研究開発法人物質・材料研究機構 フォトカソード型電子線源、その作成方法及びフォトカソード型電子線源システム
JP6401600B2 (ja) 2014-12-18 2018-10-10 浜松ホトニクス株式会社 ストリーク管及びそれを含むストリーク装置
JP2017130334A (ja) * 2016-01-20 2017-07-27 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置及び荷電粒子ビーム装置の画像形成方法
CN107449792B (zh) 2017-08-30 2023-05-26 中国科学院西安光学精密机械研究所 一种超紧凑型飞秒电子衍射装置
JP6500143B2 (ja) 2018-03-23 2019-04-10 株式会社日立ハイテクノロジーズ 試料観察方法

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