JP2022535399A5 - - Google Patents
Info
- Publication number
- JP2022535399A5 JP2022535399A5 JP2021571760A JP2021571760A JP2022535399A5 JP 2022535399 A5 JP2022535399 A5 JP 2022535399A5 JP 2021571760 A JP2021571760 A JP 2021571760A JP 2021571760 A JP2021571760 A JP 2021571760A JP 2022535399 A5 JP2022535399 A5 JP 2022535399A5
- Authority
- JP
- Japan
- Prior art keywords
- light
- angles
- detectors
- sample
- light source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201962856398P | 2019-06-03 | 2019-06-03 | |
| US62/856,398 | 2019-06-03 | ||
| US16/885,211 US11499924B2 (en) | 2019-06-03 | 2020-05-27 | Determining one or more characteristics of light in an optical system |
| US16/885,211 | 2020-05-27 | ||
| PCT/US2020/035629 WO2020247324A1 (en) | 2019-06-03 | 2020-06-02 | Determining one or more characteristics of light in an optical system |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2022535399A JP2022535399A (ja) | 2022-08-08 |
| JP2022535399A5 true JP2022535399A5 (enExample) | 2023-06-05 |
| JP7410982B2 JP7410982B2 (ja) | 2024-01-10 |
Family
ID=73549784
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021571760A Active JP7410982B2 (ja) | 2019-06-03 | 2020-06-02 | 光学システム内の光の１つ又は複数の特性の決定 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11499924B2 (enExample) |
| EP (1) | EP3973277A4 (enExample) |
| JP (1) | JP7410982B2 (enExample) |
| KR (1) | KR102695206B1 (enExample) |
| TW (1) | TWI828915B (enExample) |
| WO (1) | WO2020247324A1 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102020200158A1 (de) * | 2020-01-09 | 2021-07-15 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die EUV-Projektionslithografie |
| US11293880B2 (en) * | 2020-02-20 | 2022-04-05 | Kla Corporation | Method and apparatus for beam stabilization and reference correction for EUV inspection |
| JP2025080300A (ja) * | 2023-11-14 | 2025-05-26 | レーザーテック株式会社 | 光学装置及び光学装置の制御方法 |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5783758A (en) | 1980-09-04 | 1982-05-25 | Mitsubishi Heavy Ind Ltd | Gasket tightening method |
| DE10119072C1 (de) | 2001-04-12 | 2002-12-05 | Aixuv Gmbh | Reflektometeranordnung und Verfahren zur Bestimmung des Reflexionsvermögens ausgewählter Messorte von spektral abhängig reflektierenden Messobjekten |
| US6963395B2 (en) | 2001-07-09 | 2005-11-08 | The Regents Of The University Of California | Method and apparatus for inspecting an EUV mask blank |
| JP2004061177A (ja) * | 2002-07-25 | 2004-02-26 | Canon Inc | 光学装置及び測定方法、半導体デバイスの製造方法 |
| JP2005294087A (ja) | 2004-04-01 | 2005-10-20 | Nikon Corp | 光源ユニット、照明光学装置、露光装置および露光方法 |
| NL2003658A (en) | 2008-12-31 | 2010-07-01 | Asml Holding Nv | Euv mask inspection. |
| US8050380B2 (en) | 2009-05-05 | 2011-11-01 | Media Lario, S.R.L. | Zone-optimized mirrors and optical systems using same |
| DE102010062763A1 (de) | 2010-12-09 | 2012-06-14 | Carl Zeiss Smt Gmbh | Verfahren zum Vermessen eines optischen Systems |
| EP2663897A4 (en) | 2011-01-11 | 2018-01-03 | KLA-Tencor Corporation | Apparatus for euv imaging and methods of using same |
| JP5008012B2 (ja) * | 2011-01-28 | 2012-08-22 | レーザーテック株式会社 | 検査装置、及び検査方法 |
| JP5758727B2 (ja) | 2011-07-15 | 2015-08-05 | ルネサスエレクトロニクス株式会社 | マスク検査方法、およびマスク検査装置 |
| DE102013204442A1 (de) | 2013-03-14 | 2014-10-02 | Carl Zeiss Smt Gmbh | Optischer Wellenleiter zur Führung von Beleuchtungslicht |
| US9518935B2 (en) | 2013-07-29 | 2016-12-13 | Kla-Tencor Corporation | Monitoring changes in photomask defectivity |
| US20150192459A1 (en) | 2014-01-08 | 2015-07-09 | Kla-Tencor Corporation | Extreme ultra-violet (euv) inspection systems |
| US9625824B2 (en) | 2015-04-30 | 2017-04-18 | Taiwan Semiconductor Manufacturing Company, Ltd | Extreme ultraviolet lithography collector contamination reduction |
| US11002688B2 (en) | 2016-02-02 | 2021-05-11 | Steven M. Ebstein | System for actinic inspection of semiconductor masks |
| JP6004126B1 (ja) | 2016-03-02 | 2016-10-05 | レーザーテック株式会社 | 検査装置、及びそのフォーカス調整方法 |
| EP3559747B1 (de) * | 2016-12-20 | 2026-03-18 | EV Group E. Thallner GmbH | Vorrichtung und verfahren zur belichtung einer lichtempfindlichen schicht |
| NL2018855B1 (en) * | 2017-05-05 | 2018-11-14 | Illumina Inc | Laser line illuminator for high throughput sequencing |
| JP6249513B1 (ja) | 2017-03-27 | 2017-12-20 | レーザーテック株式会社 | 補正方法、補正装置及び検査装置 |
| JP6866471B2 (ja) * | 2017-03-27 | 2021-04-28 | ギガフォトン株式会社 | Ｅｕｖ光生成装置 |
| NL2020858A (en) | 2017-05-24 | 2018-12-04 | Asml Holding Nv | Alignment mark for two-dimensional alignment in an alignment system |
| EP3422102A1 (en) | 2017-06-26 | 2019-01-02 | ASML Netherlands B.V. | Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method |
| US10451979B2 (en) | 2017-09-29 | 2019-10-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus for EUV lithography and method of measuring focus |
| US10624196B1 (en) | 2018-09-27 | 2020-04-14 | Taiwan Semiconductor Manufacturing Co., Ltd. | Laser source device and extreme ultraviolet lithography device |
-
2020
- 2020-05-27 US US16/885,211 patent/US11499924B2/en active Active
- 2020-06-02 KR KR1020227000095A patent/KR102695206B1/ko active Active
- 2020-06-02 WO PCT/US2020/035629 patent/WO2020247324A1/en not_active Ceased
- 2020-06-02 JP JP2021571760A patent/JP7410982B2/ja active Active
- 2020-06-02 EP EP20817689.1A patent/EP3973277A4/en active Pending
- 2020-06-03 TW TW109118559A patent/TWI828915B/zh active
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