KR102695206B1 - 광학 시스템에서 광의 하나 이상의 특성 결정 - Google Patents
광학 시스템에서 광의 하나 이상의 특성 결정 Download PDFInfo
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- KR102695206B1 KR102695206B1 KR1020227000095A KR20227000095A KR102695206B1 KR 102695206 B1 KR102695206 B1 KR 102695206B1 KR 1020227000095 A KR1020227000095 A KR 1020227000095A KR 20227000095 A KR20227000095 A KR 20227000095A KR 102695206 B1 KR102695206 B1 KR 102695206B1
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Classifications
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- G01N21/84—Systems specially adapted for particular applications
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- G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
- G01N2223/052—Investigating materials by wave or particle radiation by diffraction, scatter or reflection reflection
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Environmental & Geological Engineering (AREA)
- Engineering & Computer Science (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201962856398P | 2019-06-03 | 2019-06-03 | |
| US62/856,398 | 2019-06-03 | ||
| US16/885,211 US11499924B2 (en) | 2019-06-03 | 2020-05-27 | Determining one or more characteristics of light in an optical system |
| US16/885,211 | 2020-05-27 | ||
| PCT/US2020/035629 WO2020247324A1 (en) | 2019-06-03 | 2020-06-02 | Determining one or more characteristics of light in an optical system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20220004833A KR20220004833A (ko) | 2022-01-11 |
| KR102695206B1 true KR102695206B1 (ko) | 2024-08-13 |
Family
ID=73549784
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020227000095A Active KR102695206B1 (ko) | 2019-06-03 | 2020-06-02 | 광학 시스템에서 광의 하나 이상의 특성 결정 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11499924B2 (enExample) |
| EP (1) | EP3973277A4 (enExample) |
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| DE102020200158A1 (de) * | 2020-01-09 | 2021-07-15 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die EUV-Projektionslithografie |
| US11293880B2 (en) * | 2020-02-20 | 2022-04-05 | Kla Corporation | Method and apparatus for beam stabilization and reference correction for EUV inspection |
| JP2025080300A (ja) * | 2023-11-14 | 2025-05-26 | レーザーテック株式会社 | 光学装置及び光学装置の制御方法 |
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- 2020-05-27 US US16/885,211 patent/US11499924B2/en active Active
- 2020-06-02 KR KR1020227000095A patent/KR102695206B1/ko active Active
- 2020-06-02 WO PCT/US2020/035629 patent/WO2020247324A1/en not_active Ceased
- 2020-06-02 JP JP2021571760A patent/JP7410982B2/ja active Active
- 2020-06-02 EP EP20817689.1A patent/EP3973277A4/en active Pending
- 2020-06-03 TW TW109118559A patent/TWI828915B/zh active
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| US20030043370A1 (en) | 2001-07-09 | 2003-03-06 | The Regents Of The University Of California | Method and apparatus for inspecting an EUV mask blank |
| JP2010261951A (ja) | 2009-05-05 | 2010-11-18 | Media Lario Srl | ゾーン最適化ミラー及び同ミラーを用いた光学系 |
| US20130271749A1 (en) | 2010-12-09 | 2013-10-17 | Carl Zeiss Smt Gmbh | Method for measuring an optical system |
| US20150029498A1 (en) | 2013-07-29 | 2015-01-29 | Kla-Tencor Corporation | Monitoring changes in photomask defectivity |
| US20170256045A1 (en) | 2016-03-02 | 2017-09-07 | Lasertec Corporation | Inspection apparatus and its focus adjustment method |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2020247324A1 (en) | 2020-12-10 |
| US20200378901A1 (en) | 2020-12-03 |
| JP2022535399A (ja) | 2022-08-08 |
| KR20220004833A (ko) | 2022-01-11 |
| US11499924B2 (en) | 2022-11-15 |
| JP7410982B2 (ja) | 2024-01-10 |
| EP3973277A4 (en) | 2023-06-07 |
| EP3973277A1 (en) | 2022-03-30 |
| TWI828915B (zh) | 2024-01-11 |
| TW202113330A (zh) | 2021-04-01 |
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