JP2022523692A5 - - Google Patents
Info
- Publication number
- JP2022523692A5 JP2022523692A5 JP2021543396A JP2021543396A JP2022523692A5 JP 2022523692 A5 JP2022523692 A5 JP 2022523692A5 JP 2021543396 A JP2021543396 A JP 2021543396A JP 2021543396 A JP2021543396 A JP 2021543396A JP 2022523692 A5 JP2022523692 A5 JP 2022523692A5
- Authority
- JP
- Japan
- Prior art keywords
- overlay
- measurement
- targets
- tool
- measurement results
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201962797557P | 2019-01-28 | 2019-01-28 | |
| US62/797,557 | 2019-01-28 | ||
| US16/741,574 | 2020-01-13 | ||
| US16/741,574 US11333982B2 (en) | 2019-01-28 | 2020-01-13 | Scaling metric for quantifying metrology sensitivity to process variation |
| PCT/US2020/014308 WO2020159737A1 (en) | 2019-01-28 | 2020-01-21 | Scaling metric for quantifying metrology sensitivity to process variation |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2022523692A JP2022523692A (ja) | 2022-04-26 |
| JP2022523692A5 true JP2022523692A5 (OSRAM) | 2023-01-30 |
| JP7303887B2 JP7303887B2 (ja) | 2023-07-05 |
Family
ID=71731223
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021543396A Active JP7303887B2 (ja) | 2019-01-28 | 2020-01-21 | プロセス変動に対する計量感度を定量するためのスケーリング指標 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11333982B2 (OSRAM) |
| JP (1) | JP7303887B2 (OSRAM) |
| KR (1) | KR102513718B1 (OSRAM) |
| CN (1) | CN113330550B (OSRAM) |
| TW (1) | TWI800708B (OSRAM) |
| WO (1) | WO2020159737A1 (OSRAM) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021107986A1 (en) * | 2019-11-28 | 2021-06-03 | Kla Corporation | Systems and methods for metrology optimization based on metrology landscapes |
| US12406891B2 (en) * | 2021-09-30 | 2025-09-02 | International Business Machines Corporation | Characterization of asymmetric material deposition for metrology |
| EP4338009A4 (en) * | 2021-10-21 | 2025-06-04 | KLA Corporation | INDUCED SHIFTS FOR IMPROVED OVERHEATING ERROR METROLOGY |
| US11861824B1 (en) * | 2022-02-03 | 2024-01-02 | Kla Corporation | Reference image grouping in overlay metrology |
| US12455509B2 (en) * | 2022-02-24 | 2025-10-28 | Nanya Technology Corporation | Semiconductor structure and system for manufacturing the same |
| KR102519813B1 (ko) | 2022-10-17 | 2023-04-11 | (주)오로스테크놀로지 | 오버레이 계측 장치 및 방법과 이를 위한 시스템 및 프로그램 |
| KR102662778B1 (ko) * | 2023-08-16 | 2024-04-30 | (주)오로스 테크놀로지 | 오버레이 계측 장치의 타겟 선정 방법 및 오버레이 계측 장치의 타겟 선정 시스템 |
| US12423803B2 (en) * | 2024-01-23 | 2025-09-23 | KLA Con | Predicting tool induced shift using Moiré overlay targets |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3391328B2 (ja) * | 1993-02-08 | 2003-03-31 | 株式会社ニコン | 位置合わせ方法、その位置合わせ方法を用いた露光方法、その露光方法を用いたデバイス製造方法、そのデバイス製造方法で製造されたデバイス、並びに位置合わせ装置、その位置合わせ装置を備えた露光装置 |
| US7791727B2 (en) | 2004-08-16 | 2010-09-07 | Asml Netherlands B.V. | Method and apparatus for angular-resolved spectroscopic lithography characterization |
| JP2006216796A (ja) * | 2005-02-03 | 2006-08-17 | Nikon Corp | 基準パターン情報の作成方法、位置計測方法、位置計測装置、露光方法、及び露光装置 |
| US8045786B2 (en) | 2006-10-24 | 2011-10-25 | Kla-Tencor Technologies Corp. | Waferless recipe optimization |
| US7873504B1 (en) | 2007-05-07 | 2011-01-18 | Kla-Tencor Technologies Corp. | Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout |
| NL2005162A (en) | 2009-07-31 | 2011-02-02 | Asml Netherlands Bv | Methods and scatterometers, lithographic systems, and lithographic processing cells. |
| KR20120058572A (ko) | 2009-08-24 | 2012-06-07 | 에이에스엠엘 네델란즈 비.브이. | 메트롤로지 방법 및 장치, 리소그래피 장치, 리소그래피 처리 셀 및 메트롤로지 타겟들을 포함하는 기판 |
| JP5377595B2 (ja) | 2011-03-25 | 2013-12-25 | 富士フイルム株式会社 | 着色感放射線性組成物、カラーフィルタ、着色パターンの製造方法、カラーフィルタの製造方法、固体撮像素子、及び液晶表示装置 |
| JP6099626B2 (ja) | 2011-04-06 | 2017-03-22 | ケーエルエー−テンカー コーポレイション | 向上したプロセス制御のための品質測定値を提供するための方法およびシステム |
| WO2015101460A1 (en) | 2013-12-30 | 2015-07-09 | Asml Netherlands B.V. | Method and apparatus for design of a metrology target |
| US10267746B2 (en) * | 2014-10-22 | 2019-04-23 | Kla-Tencor Corp. | Automated pattern fidelity measurement plan generation |
| SG11201703585RA (en) * | 2014-11-25 | 2017-06-29 | Kla Tencor Corp | Analyzing and utilizing landscapes |
| US9903711B2 (en) | 2015-04-06 | 2018-02-27 | KLA—Tencor Corporation | Feed forward of metrology data in a metrology system |
| KR20170124578A (ko) * | 2015-04-10 | 2017-11-10 | 에이에스엠엘 네델란즈 비.브이. | 검사와 계측을 위한 방법 및 장치 |
| WO2017093011A1 (en) | 2015-12-04 | 2017-06-08 | Asml Netherlands B.V. | Statistical hierarchical reconstruction from metrology data |
| KR102350572B1 (ko) * | 2016-02-22 | 2022-01-11 | 에이에스엠엘 네델란즈 비.브이. | 계측 데이터에 대한 기여도들의 분리 |
| IL265585B (en) * | 2016-09-27 | 2022-09-01 | Asml Netherlands Bv | Metrology recipe selection |
| WO2018106685A1 (en) | 2016-12-05 | 2018-06-14 | Lutron Electronics Co., Inc. | User interface for controlling intensity and color of a lighting load |
| US10901325B2 (en) | 2017-02-28 | 2021-01-26 | Kla-Tencor Corporation | Determining the impacts of stochastic behavior on overlay metrology data |
| KR102326192B1 (ko) * | 2017-05-03 | 2021-11-15 | 에이에스엠엘 네델란즈 비.브이. | 계측 파라미터 결정 및 계측 레시피 선택 |
-
2020
- 2020-01-13 US US16/741,574 patent/US11333982B2/en active Active
- 2020-01-21 KR KR1020217027493A patent/KR102513718B1/ko active Active
- 2020-01-21 JP JP2021543396A patent/JP7303887B2/ja active Active
- 2020-01-21 CN CN202080009804.1A patent/CN113330550B/zh active Active
- 2020-01-21 WO PCT/US2020/014308 patent/WO2020159737A1/en not_active Ceased
- 2020-01-22 TW TW109102368A patent/TWI800708B/zh active
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