JP2022523541A5 - - Google Patents

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Publication number
JP2022523541A5
JP2022523541A5 JP2021551898A JP2021551898A JP2022523541A5 JP 2022523541 A5 JP2022523541 A5 JP 2022523541A5 JP 2021551898 A JP2021551898 A JP 2021551898A JP 2021551898 A JP2021551898 A JP 2021551898A JP 2022523541 A5 JP2022523541 A5 JP 2022523541A5
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JP
Japan
Prior art keywords
porous plate
pores
processing chamber
shower head
head assembly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021551898A
Other languages
English (en)
Japanese (ja)
Other versions
JP2022523541A (ja
JP7680361B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2020/018679 external-priority patent/WO2020185360A1/en
Publication of JP2022523541A publication Critical patent/JP2022523541A/ja
Publication of JP2022523541A5 publication Critical patent/JP2022523541A5/ja
Application granted granted Critical
Publication of JP7680361B2 publication Critical patent/JP7680361B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2021551898A 2019-03-08 2020-02-18 処理チャンバ用の多孔性シャワーヘッド Active JP7680361B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201962815581P 2019-03-08 2019-03-08
US62/815,581 2019-03-08
PCT/US2020/018679 WO2020185360A1 (en) 2019-03-08 2020-02-18 Porous showerhead for a processing chamber

Publications (3)

Publication Number Publication Date
JP2022523541A JP2022523541A (ja) 2022-04-25
JP2022523541A5 true JP2022523541A5 (https=) 2023-02-28
JP7680361B2 JP7680361B2 (ja) 2025-05-20

Family

ID=72336172

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021551898A Active JP7680361B2 (ja) 2019-03-08 2020-02-18 処理チャンバ用の多孔性シャワーヘッド

Country Status (7)

Country Link
US (1) US11111582B2 (https=)
JP (1) JP7680361B2 (https=)
KR (1) KR102849949B1 (https=)
CN (1) CN113490765A (https=)
SG (1) SG11202108196QA (https=)
TW (1) TWI816990B (https=)
WO (1) WO2020185360A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024191656A1 (en) * 2023-03-15 2024-09-19 Silfex, Inc. Porous showerheads for substrate processing systems

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR950020993A (ko) 1993-12-22 1995-07-26 김광호 반도체 제조장치
JPH0878192A (ja) * 1994-09-06 1996-03-22 Fujitsu Ltd プラズマ処理装置及びプラズマ処理方法
JPH1027784A (ja) * 1996-05-08 1998-01-27 Tokyo Electron Ltd 減圧処理装置
US6182603B1 (en) 1998-07-13 2001-02-06 Applied Komatsu Technology, Inc. Surface-treated shower head for use in a substrate processing chamber
JP2003007682A (ja) 2001-06-25 2003-01-10 Matsushita Electric Ind Co Ltd プラズマ処理装置用の電極部材
US20050081788A1 (en) * 2002-03-15 2005-04-21 Holger Jurgensen Device for depositing thin layers on a substrate
JP2003282462A (ja) 2002-03-27 2003-10-03 Kyocera Corp シャワープレートとその製造方法及びそれを用いたシャワーヘッド
JP2004356124A (ja) * 2003-05-27 2004-12-16 Sumitomo Electric Ind Ltd 多孔質セラミックスを用いた半導体製造装置用部品及び半導体製造装置
JP2004352513A (ja) * 2003-05-27 2004-12-16 Sumitomo Electric Ind Ltd 窒化アルミニウム多孔質体を用いた半導体製造装置用部品及び半導体製造装置
JP4312063B2 (ja) * 2004-01-21 2009-08-12 日本エー・エス・エム株式会社 薄膜製造装置及びその方法
US20050279384A1 (en) * 2004-06-17 2005-12-22 Guidotti Emmanuel P Method and processing system for controlling a chamber cleaning process
JP5010234B2 (ja) * 2006-10-23 2012-08-29 北陸成型工業株式会社 ガス放出孔部材を一体焼結したシャワープレートおよびその製造方法
JP2008205219A (ja) * 2007-02-20 2008-09-04 Masato Toshima シャワーヘッドおよびこれを用いたｃｖｄ装置
CN100577866C (zh) * 2007-02-27 2010-01-06 中微半导体设备(上海)有限公司 应用于等离子体反应室中的气体喷头组件、其制造方法及其翻新再利用的方法
US20090226614A1 (en) * 2008-03-04 2009-09-10 Tokyo Electron Limited Porous gas heating device for a vapor deposition system
EP2362001A1 (en) * 2010-02-25 2011-08-31 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Method and device for layer deposition
KR101249999B1 (ko) * 2010-08-12 2013-04-03 주식회사 디엠에스 화학기상증착 장치
US8911553B2 (en) 2010-10-19 2014-12-16 Applied Materials, Inc. Quartz showerhead for nanocure UV chamber
US9827326B2 (en) * 2010-12-23 2017-11-28 Nektar Therapeutics Polymer-sunitinib conjugates
US20120312234A1 (en) * 2011-06-11 2012-12-13 Tokyo Electron Limited Process gas diffuser assembly for vapor deposition system
US9449795B2 (en) 2013-02-28 2016-09-20 Novellus Systems, Inc. Ceramic showerhead with embedded RF electrode for capacitively coupled plasma reactor
US10741365B2 (en) 2014-05-05 2020-08-11 Lam Research Corporation Low volume showerhead with porous baffle
US10378107B2 (en) * 2015-05-22 2019-08-13 Lam Research Corporation Low volume showerhead with faceplate holes for improved flow uniformity
US20170114462A1 (en) * 2015-10-26 2017-04-27 Applied Materials, Inc. High productivity pecvd tool for wafer processing of semiconductor manufacturing
US10186400B2 (en) * 2017-01-20 2019-01-22 Applied Materials, Inc. Multi-layer plasma resistant coating by atomic layer deposition
CN208098420U (zh) * 2018-02-11 2018-11-16 佛山华派机械科技有限公司 一种板状叠加式多孔喷头

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