JP2022514222A5 - - Google Patents

Info

Publication number
JP2022514222A5
JP2022514222A5 JP2021533423A JP2021533423A JP2022514222A5 JP 2022514222 A5 JP2022514222 A5 JP 2022514222A5 JP 2021533423 A JP2021533423 A JP 2021533423A JP 2021533423 A JP2021533423 A JP 2021533423A JP 2022514222 A5 JP2022514222 A5 JP 2022514222A5
Authority
JP
Japan
Prior art keywords
composition
composition according
surfactant
weight
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021533423A
Other languages
English (en)
Japanese (ja)
Other versions
JP7507155B2 (ja
JP2022514222A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/IB2019/060716 external-priority patent/WO2020121248A1/en
Publication of JP2022514222A publication Critical patent/JP2022514222A/ja
Publication of JP2022514222A5 publication Critical patent/JP2022514222A5/ja
Application granted granted Critical
Publication of JP7507155B2 publication Critical patent/JP7507155B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2021533423A 2018-12-12 2019-12-12 フッ素化アミンオキシド界面活性剤 Active JP7507155B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862778565P 2018-12-12 2018-12-12
US62/778,565 2018-12-12
PCT/IB2019/060716 WO2020121248A1 (en) 2018-12-12 2019-12-12 Fluorinated amine oxide surfactants

Publications (3)

Publication Number Publication Date
JP2022514222A JP2022514222A (ja) 2022-02-10
JP2022514222A5 true JP2022514222A5 (https=) 2022-12-21
JP7507155B2 JP7507155B2 (ja) 2024-06-27

Family

ID=69158147

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021533423A Active JP7507155B2 (ja) 2018-12-12 2019-12-12 フッ素化アミンオキシド界面活性剤

Country Status (5)

Country Link
US (1) US20220040655A1 (https=)
JP (1) JP7507155B2 (https=)
CN (1) CN113166634A (https=)
TW (1) TW202035361A (https=)
WO (1) WO2020121248A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114350366B (zh) * 2021-12-09 2023-04-18 湖北兴福电子材料股份有限公司 一种氮化硅与p型多晶硅等速蚀刻液
TWI895691B (zh) * 2023-02-14 2025-09-01 關東鑫林科技股份有限公司 蝕刻液組成物及使用其之蝕刻方法
CN118496473A (zh) * 2024-05-22 2024-08-16 智仑新材料科技(西安)有限公司 一种低氯环氧树脂的制备方法及一种除氯剂的制备方法

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2759019A (en) * 1954-08-09 1956-08-14 Minnesota Mining & Mfg Perfluoro amine compounds and quaternary derivatives
GB1302612A (https=) * 1969-02-19 1973-01-10
US3772195A (en) * 1969-06-12 1973-11-13 Minnesota Mining & Mfg Fire extinguishing composition comprising a fluoroaliphatic surfactant fluorine-free surfactant
DK0621057T3 (da) * 1993-04-23 1997-04-28 Atochem Elf Sa Emulgatorer til bærbare brandslukkere
AU2830997A (en) * 1996-06-06 1998-01-05 Minnesota Mining And Manufacturing Company Fire-fighting agents containing adsorbable fluorocarbon surfactants
EP1037693A1 (en) * 1997-12-10 2000-09-27 Minnesota Mining And Manufacturing Company Fire-fighting agents containing adsorbable fluorocarbon surfactants
US7169323B2 (en) * 2002-11-08 2007-01-30 3M Innovative Properties Company Fluorinated surfactants for buffered acid etch solutions
US6890452B2 (en) * 2002-11-08 2005-05-10 3M Innovative Properties Company Fluorinated surfactants for aqueous acid etch solutions
US7294610B2 (en) * 2004-03-03 2007-11-13 3M Innovative Properties Company Fluorinated sulfonamide surfactants for aqueous cleaning solutions
US7160850B2 (en) * 2004-12-30 2007-01-09 3M Innovative Properties Company Compositions of monomeric surfactants
GB0523853D0 (en) * 2005-11-24 2006-01-04 3M Innovative Properties Co Fluorinated surfactants for use in making a fluoropolymer
US7547732B2 (en) * 2005-08-30 2009-06-16 3M Innovative Properties Company Compositions of fluorochemical surfactants
JP2007088258A (ja) * 2005-09-22 2007-04-05 Fujifilm Corp 金属研磨液及びそれを用いる研磨方法
JP2007106958A (ja) * 2005-10-17 2007-04-26 Asahi Glass Co Ltd フッ素系界面活性剤
US7425374B2 (en) * 2005-12-22 2008-09-16 3M Innovative Properties Company Fluorinated surfactants
JP2010506978A (ja) * 2006-10-12 2010-03-04 スリーエム イノベイティブ プロパティズ カンパニー フッ素化界面活性剤及びその製造方法
US8591764B2 (en) * 2006-12-20 2013-11-26 3M Innovative Properties Company Chemical mechanical planarization composition, system, and method of use
KR20100017848A (ko) * 2007-05-23 2010-02-16 쓰리엠 이노베이티브 프로퍼티즈 컴파니 플루오르화 계면활성제의 수성 조성물 및 그의 사용 방법
JP5741589B2 (ja) * 2010-09-08 2015-07-01 三菱瓦斯化学株式会社 微細構造体のパターン倒壊抑制用処理液及びこれを用いた微細構造体の製造方法
JP5767796B2 (ja) * 2010-09-28 2015-08-19 林純薬工業株式会社 エッチング液組成物およびエッチング方法
JP6444316B2 (ja) * 2013-01-29 2018-12-26 スリーエム イノベイティブ プロパティズ カンパニー 界面活性剤並びにその製造及び使用方法
WO2017100045A1 (en) 2015-12-11 2017-06-15 3M Innovative Properties Company Fluorinated piperazine sulfonamides
TWI717526B (zh) * 2016-06-20 2021-02-01 盧森堡商Az電子材料盧森堡有限公司 清洗組成物、形成光阻圖案之方法及製造半導體裝置之方法
US20190217139A1 (en) * 2016-10-04 2019-07-18 Dic Corporation Fire extinguishing agent
US10822458B2 (en) * 2017-02-08 2020-11-03 Versum Materials Us, Llc Organoamino-functionalized linear and cyclic oligosiloxanes for deposition of silicon-containing films
JP7165017B2 (ja) * 2018-10-03 2022-11-02 三菱マテリアル電子化成株式会社 ペルフルオロエーテル含有化合物及びノニオン系含フッ素界面活性剤

Similar Documents

Publication Publication Date Title
JP5869720B2 (ja) 窒化チタンハードマスク及びエッチ残留物除去
CN104730870B (zh) 用于除去氮化钛硬掩模和蚀刻残留物的组合物
KR102058679B1 (ko) 구리막, 몰리브덴막 및 구리-몰리브덴 합금막의 식각액 조성물
JP2022514222A5 (https=)
TWI551681B (zh) 於cmp後使用之清潔組合物及其相關方法
JP2006510807A5 (https=)
KR20180062453A (ko) 질화티탄 하드 마스크의 선택적 제거 및 에치 잔류물 제거
JP2004510204A (ja) 芳香族酸阻害剤を含むフォトレジスト除去剤/洗浄液
JP3225471B2 (ja) 銅溶解剤
CN103459672A (zh) 蚀刻液
JP2007291505A (ja) 銅配線用洗浄剤
CN112877695A (zh) 铜铝膜蚀刻液
JP4576927B2 (ja) 洗浄用組成物及び洗浄方法
DE102006023506B4 (de) Wässrige Reinigungszusammensetzung zur Kupferverarbeitung von Halbleitern
JP4917872B2 (ja) 銅および/または銅合金用化学溶解処理液
JP2008144228A5 (ja) 金属用化学溶解処理液
JP7105084B2 (ja) エッチング液組成物
JP4483392B2 (ja) レジスト剥離用組成物
CN119581409A (zh) 一种用于提高集成电路多层布线钌cmp速率的方法
CN118756147A (zh) 一种环保光亮清洗剂及其制备方法
JP2004285417A (ja) スズホイスカ防止剤、及びこれを用いたホイスカ防止性スズメッキ物の製造方法
JP2022133629A (ja) アルミ配線の製造方法
JP2005162786A (ja) 洗浄液組成物
JPH06346264A (ja) スケールの除去組成物
JP2003297791A (ja) 半導体基板の処理液およびこれを用いる処理方法