CN113166634A - 含氟氧化胺表面活性剂 - Google Patents

含氟氧化胺表面活性剂 Download PDF

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Publication number
CN113166634A
CN113166634A CN201980080746.9A CN201980080746A CN113166634A CN 113166634 A CN113166634 A CN 113166634A CN 201980080746 A CN201980080746 A CN 201980080746A CN 113166634 A CN113166634 A CN 113166634A
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China
Prior art keywords
composition
surfactant
cleaning
weight
aqueous
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Pending
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CN201980080746.9A
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English (en)
Chinese (zh)
Inventor
帕特里西亚·M·萨武
尼古拉斯·L·翁蒂特
贾森·M·克伦
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3M Innovative Properties Co
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3M Innovative Properties Co
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Publication of CN113166634A publication Critical patent/CN113166634A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K23/00—Use of substances as emulsifying, wetting, dispersing, or foam-producing agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C303/00—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides
    • C07C303/36—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of amides of sulfonic acids
    • C07C303/40—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of amides of sulfonic acids by reactions not involving the formation of sulfonamide groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C311/00—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
    • C07C311/01—Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms
    • C07C311/02—Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
    • C07C311/09—Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton the carbon skeleton being further substituted by at least two halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/12—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms
    • C07D295/125—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • C07D295/13—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/22—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with hetero atoms directly attached to ring nitrogen atoms
    • C07D295/26—Sulfur atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/004—Surface-active compounds containing F
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/66—Non-ionic compounds
    • C11D1/75—Amino oxides
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D17/00—Detergent materials or soaps characterised by their shape or physical properties
    • C11D17/0008—Detergent materials or soaps characterised by their shape or physical properties aqueous liquid non soap compositions
    • C11D17/0013—Liquid compositions with insoluble particles in suspension
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C11D3/042—Acids
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/28—Dry etching; Plasma etching; Reactive-ion etching of insulating materials
    • H10P50/282—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials
    • H10P50/283—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials by chemical means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/10—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H10P70/15—Cleaning before device manufacture, i.e. Begin-Of-Line process by wet cleaning only
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/20—Cleaning during device manufacture
    • H10P70/27—Cleaning during device manufacture during, before or after processing of conductive materials, e.g. polysilicon or amorphous silicon layers

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Weting (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
CN201980080746.9A 2018-12-12 2019-12-12 含氟氧化胺表面活性剂 Pending CN113166634A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862778565P 2018-12-12 2018-12-12
US62/778,565 2018-12-12
PCT/IB2019/060716 WO2020121248A1 (en) 2018-12-12 2019-12-12 Fluorinated amine oxide surfactants

Publications (1)

Publication Number Publication Date
CN113166634A true CN113166634A (zh) 2021-07-23

Family

ID=69158147

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201980080746.9A Pending CN113166634A (zh) 2018-12-12 2019-12-12 含氟氧化胺表面活性剂

Country Status (5)

Country Link
US (1) US20220040655A1 (https=)
JP (1) JP7507155B2 (https=)
CN (1) CN113166634A (https=)
TW (1) TW202035361A (https=)
WO (1) WO2020121248A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114350366A (zh) * 2021-12-09 2022-04-15 湖北兴福电子材料有限公司 一种氮化硅与p型多晶硅等速蚀刻液

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI895691B (zh) * 2023-02-14 2025-09-01 關東鑫林科技股份有限公司 蝕刻液組成物及使用其之蝕刻方法
CN118496473A (zh) * 2024-05-22 2024-08-16 智仑新材料科技（西安）有限公司 一种低氯环氧树脂的制备方法及一种除氯剂的制备方法

Citations (19)

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Publication number Priority date Publication date Assignee Title
US2759019A (en) * 1954-08-09 1956-08-14 Minnesota Mining & Mfg Perfluoro amine compounds and quaternary derivatives
GB1302612A (https=) * 1969-02-19 1973-01-10
US3772195A (en) * 1969-06-12 1973-11-13 Minnesota Mining & Mfg Fire extinguishing composition comprising a fluoroaliphatic surfactant fluorine-free surfactant
EP0621057A1 (fr) * 1993-04-23 1994-10-26 Elf Atochem S.A. Emulseurs pour extincteurs d'incendie portatifs
WO1997046283A1 (en) * 1996-06-06 1997-12-11 Minnesota Mining And Manufacturing Company Fire-fighting agents containing adsorbable fluorocarbon surfactants
WO1999029373A1 (en) * 1997-12-10 1999-06-17 Minnesota Mining And Manufacturing Company Fire-fighting agents containing adsorbable fluorocarbon surfactants
CN1694939A (zh) * 2002-11-08 2005-11-09 3M创新有限公司 用于缓冲酸蚀刻溶液的氟化表面活性剂
CN1694940A (zh) * 2002-11-08 2005-11-09 3M创新有限公司 用于含水酸蚀刻溶液的氟化表面活性剂
CN1926227A (zh) * 2004-03-03 2007-03-07 3M创新有限公司 用于水性清洗溶液的氟化磺酰胺表面活性剂
CN101094897A (zh) * 2004-12-30 2007-12-26 3M创新有限公司 单体含氟表面活性剂的组合物
CN101312943A (zh) * 2005-11-24 2008-11-26 3M创新有限公司 用于制备含氟聚合物的氟化表面活性剂
CN101331195A (zh) * 2005-12-22 2008-12-24 3M创新有限公司 氟化表面活性剂
CN101522733A (zh) * 2006-10-12 2009-09-02 3M创新有限公司 氟化表面活性剂及其制备方法
CN101568613A (zh) * 2006-12-20 2009-10-28 3M创新有限公司 化学-机械平面化组合物、系统及使用方法
CN101679790A (zh) * 2007-05-23 2010-03-24 3M创新有限公司 氟化表面活性剂的水性组合物及其使用方法
CN103098181A (zh) * 2010-09-08 2013-05-08 三菱瓦斯化学株式会社 用于抑制微细结构体的图案倒塌的处理液和使用其的微细结构体的制造方法
CN103125017A (zh) * 2010-09-28 2013-05-29 林纯药工业株式会社 蚀刻液组合物及蚀刻方法
CN104955854A (zh) * 2013-01-29 2015-09-30 3M创新有限公司 表面活性剂及其制备和使用方法
WO2018066538A1 (ja) * 2016-10-04 2018-04-12 Dic株式会社 消火薬剤

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US7547732B2 (en) 2005-08-30 2009-06-16 3M Innovative Properties Company Compositions of fluorochemical surfactants
JP2007088258A (ja) * 2005-09-22 2007-04-05 Fujifilm Corp 金属研磨液及びそれを用いる研磨方法
JP2007106958A (ja) 2005-10-17 2007-04-26 Asahi Glass Co Ltd フッ素系界面活性剤
WO2017100045A1 (en) 2015-12-11 2017-06-15 3M Innovative Properties Company Fluorinated piperazine sulfonamides
US10451974B2 (en) 2016-06-20 2019-10-22 Az Electronic Materials (Luxembourg) S.A.R.L. Rinse composition, a method for forming resist patterns and a method for making semiconductor devices
US10822458B2 (en) * 2017-02-08 2020-11-03 Versum Materials Us, Llc Organoamino-functionalized linear and cyclic oligosiloxanes for deposition of silicon-containing films
JP7165017B2 (ja) 2018-10-03 2022-11-02 三菱マテリアル電子化成株式会社 ペルフルオロエーテル含有化合物及びノニオン系含フッ素界面活性剤

Patent Citations (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2759019A (en) * 1954-08-09 1956-08-14 Minnesota Mining & Mfg Perfluoro amine compounds and quaternary derivatives
GB1302612A (https=) * 1969-02-19 1973-01-10
US3772195A (en) * 1969-06-12 1973-11-13 Minnesota Mining & Mfg Fire extinguishing composition comprising a fluoroaliphatic surfactant fluorine-free surfactant
EP0621057A1 (fr) * 1993-04-23 1994-10-26 Elf Atochem S.A. Emulseurs pour extincteurs d'incendie portatifs
WO1997046283A1 (en) * 1996-06-06 1997-12-11 Minnesota Mining And Manufacturing Company Fire-fighting agents containing adsorbable fluorocarbon surfactants
WO1999029373A1 (en) * 1997-12-10 1999-06-17 Minnesota Mining And Manufacturing Company Fire-fighting agents containing adsorbable fluorocarbon surfactants
CN1694939A (zh) * 2002-11-08 2005-11-09 3M创新有限公司 用于缓冲酸蚀刻溶液的氟化表面活性剂
CN1694940A (zh) * 2002-11-08 2005-11-09 3M创新有限公司 用于含水酸蚀刻溶液的氟化表面活性剂
CN1926227A (zh) * 2004-03-03 2007-03-07 3M创新有限公司 用于水性清洗溶液的氟化磺酰胺表面活性剂
CN101094897A (zh) * 2004-12-30 2007-12-26 3M创新有限公司 单体含氟表面活性剂的组合物
CN101312943A (zh) * 2005-11-24 2008-11-26 3M创新有限公司 用于制备含氟聚合物的氟化表面活性剂
CN101331195A (zh) * 2005-12-22 2008-12-24 3M创新有限公司 氟化表面活性剂
CN101522733A (zh) * 2006-10-12 2009-09-02 3M创新有限公司 氟化表面活性剂及其制备方法
CN101568613A (zh) * 2006-12-20 2009-10-28 3M创新有限公司 化学-机械平面化组合物、系统及使用方法
CN101679790A (zh) * 2007-05-23 2010-03-24 3M创新有限公司 氟化表面活性剂的水性组合物及其使用方法
CN103098181A (zh) * 2010-09-08 2013-05-08 三菱瓦斯化学株式会社 用于抑制微细结构体的图案倒塌的处理液和使用其的微细结构体的制造方法
CN103125017A (zh) * 2010-09-28 2013-05-29 林纯药工业株式会社 蚀刻液组合物及蚀刻方法
CN104955854A (zh) * 2013-01-29 2015-09-30 3M创新有限公司 表面活性剂及其制备和使用方法
WO2018066538A1 (ja) * 2016-10-04 2018-04-12 Dic株式会社 消火薬剤

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114350366A (zh) * 2021-12-09 2022-04-15 湖北兴福电子材料有限公司 一种氮化硅与p型多晶硅等速蚀刻液
CN114350366B (zh) * 2021-12-09 2023-04-18 湖北兴福电子材料股份有限公司 一种氮化硅与p型多晶硅等速蚀刻液

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WO2020121248A1 (en) 2020-06-18
US20220040655A1 (en) 2022-02-10
JP2022514222A (ja) 2022-02-10
JP7507155B2 (ja) 2024-06-27
TW202035361A (zh) 2020-10-01

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Application publication date: 20210723