JP2022510960A5 - - Google Patents

Info

Publication number
JP2022510960A5
JP2022510960A5 JP2021531105A JP2021531105A JP2022510960A5 JP 2022510960 A5 JP2022510960 A5 JP 2022510960A5 JP 2021531105 A JP2021531105 A JP 2021531105A JP 2021531105 A JP2021531105 A JP 2021531105A JP 2022510960 A5 JP2022510960 A5 JP 2022510960A5
Authority
JP
Japan
Prior art keywords
crossbar
mounting assembly
orifices
base
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021531105A
Other languages
English (en)
Japanese (ja)
Other versions
JP7607561B2 (ja
JP2022510960A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2019/064027 external-priority patent/WO2020117685A1/en
Publication of JP2022510960A publication Critical patent/JP2022510960A/ja
Publication of JP2022510960A5 publication Critical patent/JP2022510960A5/ja
Application granted granted Critical
Publication of JP7607561B2 publication Critical patent/JP7607561B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2021531105A 2018-12-03 2019-12-02 マランゴニ乾燥の方法及び装置 Active JP7607561B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862774746P 2018-12-03 2018-12-03
US62/774,746 2018-12-03
PCT/US2019/064027 WO2020117685A1 (en) 2018-12-03 2019-12-02 Methods and apparatus for marangoni drying

Publications (3)

Publication Number Publication Date
JP2022510960A JP2022510960A (ja) 2022-01-28
JP2022510960A5 true JP2022510960A5 (https=) 2022-12-08
JP7607561B2 JP7607561B2 (ja) 2024-12-27

Family

ID=70849332

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021531105A Active JP7607561B2 (ja) 2018-12-03 2019-12-02 マランゴニ乾燥の方法及び装置

Country Status (6)

Country Link
US (1) US11735438B2 (https=)
JP (1) JP7607561B2 (https=)
KR (1) KR102746809B1 (https=)
CN (1) CN113169098B (https=)
TW (1) TWI828815B (https=)
WO (1) WO2020117685A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20220282918A1 (en) * 2021-03-03 2022-09-08 Applied Materials, Inc. Drying system with integrated substrate alignment stage
EP4300556A1 (de) * 2022-06-27 2024-01-03 Siltronic AG Abdeckung für ein reinigungsmodul zum reinigen einer halbleiterscheibe und verfahren zum reinigen einer halbleiterscheibe in einer reinigungsstrasse

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5609305A (en) * 1994-09-19 1997-03-11 Vortec Corporation Apparatus for providing an air curtain
US5505645A (en) * 1994-11-28 1996-04-09 E D F Products, Inc. Floatable assembly for swimming pools
US6164297A (en) 1997-06-13 2000-12-26 Tokyo Electron Limited Cleaning and drying apparatus for objects to be processed
US5933902A (en) 1997-11-18 1999-08-10 Frey; Bernhard M. Wafer cleaning system
TW391895B (en) * 1998-10-02 2000-06-01 Ultra Clean Technology Asia Pt Method and apparatus for washing and drying semi-conductor devices
US6575177B1 (en) * 1999-04-27 2003-06-10 Applied Materials Inc. Semiconductor substrate cleaning system
ATE379847T1 (de) * 1999-07-02 2007-12-15 Matsushita Electric Industrial Co Ltd Anordnung zur herstellung von löthöckern auf halbleitersubstraten unter generierung elektrischer ladung, methode und anordnung zum entfernen dieser ladungen, und elektrische ladung generierendes halbleitersubstrat
US20020121289A1 (en) 2001-03-05 2002-09-05 Applied Materials, Inc. Spray bar
US20030192570A1 (en) * 2002-04-11 2003-10-16 Applied Materials, Inc. Method and apparatus for wafer cleaning
US20040031167A1 (en) 2002-06-13 2004-02-19 Stein Nathan D. Single wafer method and apparatus for drying semiconductor substrates using an inert gas air-knife
US20040200409A1 (en) * 2002-12-16 2004-10-14 Applied Materials, Inc. Scrubber with integrated vertical marangoni drying
JP4578381B2 (ja) * 2005-10-19 2010-11-10 東京エレクトロン株式会社 塗布方法及び塗布装置
US20080053486A1 (en) 2006-08-10 2008-03-06 Applied Materials, Inc. Semiconductor substrate cleaning apparatus
JP5220111B2 (ja) * 2008-07-29 2013-06-26 三菱電機株式会社 細孔放電加工装置及び放電加工方法
JP5966250B2 (ja) * 2011-03-16 2016-08-10 富士電機株式会社 基板支持治具
US8869422B2 (en) 2012-04-27 2014-10-28 Applied Materials, Inc. Methods and apparatus for marangoni substrate drying using a vapor knife manifold
US9728428B2 (en) * 2013-07-01 2017-08-08 Applied Materials, Inc. Single use rinse in a linear Marangoni drier
US9984867B2 (en) * 2014-12-19 2018-05-29 Applied Materials, Inc. Systems and methods for rinsing and drying substrates
US20160178279A1 (en) 2014-12-19 2016-06-23 Applied Materials, Inc. Substrate edge residue removal systems, apparatus, and methods
CN108257894B (zh) * 2018-01-12 2020-05-19 清华大学 晶圆干燥装置
CN108831849A (zh) * 2018-06-25 2018-11-16 清华大学 基于热马兰哥尼效应的晶圆干燥装置和干燥方法

Similar Documents

Publication Publication Date Title
JP2022510960A5 (https=)
JP7607561B2 (ja) マランゴニ乾燥の方法及び装置
JP6999070B1 (ja) めっきモジュールを調整する方法
US20150368079A1 (en) Load supporting and orienting apparatus for a lift device
JP2009226776A5 (https=)
TWI701360B (zh) 電流金屬沉積之方法
KR102316997B1 (ko) 브러쉬 세정 장치의 브러쉬 자세 셋팅 기구 및 그 방법 및 이를 적용한 세정 브러쉬 모듈
GB2583593A (en) An exercise apparatus
US4238664A (en) Burn-in knife with edge guide
CN105642463A (zh) 一种陶瓷加工用喷涂机构
TWI426252B (zh) 產品穩定性測試裝置
JP3784887B2 (ja) 基板搬送装置
KR20140047801A (ko) 탱크덮개 노즐 설치용 지그
KR101854036B1 (ko) 납땜용 인쇄회로기판 고정치구
FR2478681A1 (fr) Dispositif pour soutenir des balles de fibres, en particulier dans le brise-balles d'une filature
CN213310487U (zh) 一种牙齿模型夹装对位装置
CN204661817U (zh) 一种pcb喷锡治具
US4979662A (en) Desoldering vat
CN223527150U (zh) 长方形硅片花篮
CN222767299U (zh) 一种前脚板的加工设备
CN221454175U (zh) 一种电容器引脚调节装置
JPH03260085A (ja) 半導体ウエハ表面処理装置
KR20140003858U (ko) 사다리용 고정장치
JP2003124106A (ja) レジストノズルの乾燥防止方法、乾燥防止ポット及びその位置決め方法並びに位置決め用治具
JP2013118306A (ja) 基板の処理装置