JP2022506595A - グレートーンリソグラフィと傾斜エッチングを使用した、深さ調節された傾斜格子 - Google Patents
グレートーンリソグラフィと傾斜エッチングを使用した、深さ調節された傾斜格子 Download PDFInfo
- Publication number
- JP2022506595A JP2022506595A JP2021524031A JP2021524031A JP2022506595A JP 2022506595 A JP2022506595 A JP 2022506595A JP 2021524031 A JP2021524031 A JP 2021524031A JP 2021524031 A JP2021524031 A JP 2021524031A JP 2022506595 A JP2022506595 A JP 2022506595A
- Authority
- JP
- Japan
- Prior art keywords
- wedge
- depth
- grid
- shaped structure
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005530 etching Methods 0.000 title claims abstract description 25
- 238000001459 lithography Methods 0.000 title claims description 19
- 238000000034 method Methods 0.000 claims abstract description 43
- 239000000758 substrate Substances 0.000 claims description 17
- 229920002120 photoresistant polymer Polymers 0.000 claims description 14
- 230000003287 optical effect Effects 0.000 claims description 11
- 239000012780 transparent material Substances 0.000 claims description 3
- 238000000206 photolithography Methods 0.000 abstract description 5
- 238000010586 diagram Methods 0.000 abstract description 4
- 230000008878 coupling Effects 0.000 description 15
- 238000010168 coupling process Methods 0.000 description 15
- 238000005859 coupling reaction Methods 0.000 description 15
- 239000000463 material Substances 0.000 description 9
- 238000001127 nanoimprint lithography Methods 0.000 description 6
- 230000003190 augmentative effect Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 3
- 238000013459 approach Methods 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P11/00—Apparatus or processes specially adapted for manufacturing waveguides or resonators, lines, or other devices of the waveguide type
- H01P11/001—Manufacturing waveguides or transmission lines of the waveguide type
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/01—Head-up displays
- G02B27/017—Head mounted
- G02B27/0172—Head mounted characterised by optical features
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0013—Means for improving the coupling-in of light from the light source into the light guide
- G02B6/0015—Means for improving the coupling-in of light from the light source into the light guide provided on the surface of the light guide or in the bulk of it
- G02B6/0016—Grooves, prisms, gratings, scattering particles or rough surfaces
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0081—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for altering, e.g. enlarging, the entrance or exit pupil
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0033—Means for improving the coupling-out of light from the light guide
- G02B6/0035—Means for improving the coupling-out of light from the light guide provided on the surface of the light guide or in the bulk of it
- G02B6/0038—Linear indentations or grooves, e.g. arc-shaped grooves or meandering grooves, extending over the full length or width of the light guide
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P3/00—Waveguides; Transmission lines of the waveguide type
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12083—Constructional arrangements
- G02B2006/12107—Grating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12176—Etching
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/01—Head-up displays
- G02B27/017—Head mounted
- G02B27/0172—Head mounted characterised by optical features
- G02B2027/0174—Head mounted characterised by optical features holographic
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/124—Geodesic lenses or integrated gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/136—Integrated optical circuits characterised by the manufacturing method by etching
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Optical Integrated Circuits (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
Description
Claims (15)
- 格子層を上に有する基板であって、くさび形構造が、前記格子層に形成され、前記くさび形構造が、
第1の端部、
第2の端部、および
前記第1の端部から前記第2の端部まで変化する深さ
を有する、基板、ならびに
前記格子層に形成された複数のチャネルであって、各チャネルが、複数の格子構造の一部を部分的に画定し、前記複数の格子構造の深さが、前記くさび形構造の前記第1の端部から前記くさび形構造の前記第2の端部まで変化する、複数のチャネル、
を備える導波路構造。 - 前記くさび形構造の前記深さが、前記第1の端部から前記第2の端部まで直線的に変化する、請求項1に記載の構造。
- 前記くさび形構造の前記深さが、前記第1の端部から前記第2の端部まで非直線的に変化する、請求項1に記載の構造。
- 前記くさび形構造の前記深さが、前記第1の端部から前記第2の端部まで振動する、請求項1に記載の構造。
- 格子層を上に有する基板、
前記格子層に形成されたくさび形構造であって、少なくとも第1の方向および3次元形状を規定する第2の方向に変化する深さを有するくさび形構造、ならびに
前記格子層に形成された複数のチャネルであって、各チャネルが、複数の格子構造の一部を部分的に画定し、前記複数の格子構造の深さが、前記くさび形構造によって規定されるように、前記第1の方向および前記第2の方向に変化する、複数のチャネル、
を備える導波路構造。 - 前記くさび形構造が、鞍点形状を有する、請求項5に記載の構造。
- 前記くさび形構造が、正の曲率を有する楕円放物面形状を有する、請求項5に記載の構造。
- 前記くさび形構造が、負の曲率を有する楕円放物面形状を有する、請求項5に記載の構造。
- 前記格子層が、約1.3以上の屈折率を有する光学的に透明な材料から形成されている、請求項1および5に記載の構造。
- 導波路構造を形成する方法であって、
グレースケールリソグラフィを使用して格子層にくさび形構造を形成することと、
前記格子層上にハードマスクおよびフォトレジストスタックを形成することと、
前記フォトレジストスタックをエッチングすることと、
前記格子層に複数の格子構造を形成することと
を含む方法。 - 前記フォトレジストスタックが、
光学平坦化層、および
フォトレジスト
を含む、請求項11に記載の方法。 - 前記くさび形構造は、第1の端部から第2の端部まで深さが変化する、請求項11に記載の方法。
- 前記くさび形構造の前記深さが、前記第1の端部から前記第2の端部まで直線的に変化する、請求項11に記載の方法。
- 前記くさび形構造の前記深さが、前記第1の端部から前記第2の端部まで非直線的に変化する、請求項11に記載の方法。
- 前記くさび形構造の前記深さが、前記第1の端部から前記第2の端部まで振動する、請求項11に記載の方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2023076535A JP2023113622A (ja) | 2018-11-07 | 2023-05-08 | グレートーンリソグラフィと傾斜エッチングを使用した、深さ調節された傾斜格子 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201862756988P | 2018-11-07 | 2018-11-07 | |
US62/756,988 | 2018-11-07 | ||
PCT/US2019/057517 WO2020096771A1 (en) | 2018-11-07 | 2019-10-23 | Depth-modulated slanted gratings using gray-tone lithography and slant etch |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023076535A Division JP2023113622A (ja) | 2018-11-07 | 2023-05-08 | グレートーンリソグラフィと傾斜エッチングを使用した、深さ調節された傾斜格子 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2022506595A true JP2022506595A (ja) | 2022-01-17 |
JP7277581B2 JP7277581B2 (ja) | 2023-05-19 |
Family
ID=70459560
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021524031A Active JP7277581B2 (ja) | 2018-11-07 | 2019-10-23 | グレートーンリソグラフィと傾斜エッチングを使用した、深さ調節された傾斜格子 |
JP2023076535A Pending JP2023113622A (ja) | 2018-11-07 | 2023-05-08 | グレートーンリソグラフィと傾斜エッチングを使用した、深さ調節された傾斜格子 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023076535A Pending JP2023113622A (ja) | 2018-11-07 | 2023-05-08 | グレートーンリソグラフィと傾斜エッチングを使用した、深さ調節された傾斜格子 |
Country Status (7)
Country | Link |
---|---|
US (1) | US11372149B2 (ja) |
EP (1) | EP3878047A4 (ja) |
JP (2) | JP7277581B2 (ja) |
KR (2) | KR102555958B1 (ja) |
CN (2) | CN112970145B (ja) |
TW (2) | TW202204951A (ja) |
WO (1) | WO2020096771A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7404371B2 (ja) | 2018-12-17 | 2023-12-25 | アプライド マテリアルズ インコーポレイテッド | 複数の格子を形成する方法 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11662524B2 (en) * | 2020-03-13 | 2023-05-30 | Applied Materials, Inc. | Forming variable depth structures with laser ablation |
WO2021233877A1 (en) * | 2020-05-18 | 2021-11-25 | Interdigital Ce Patent Holdings, Sas | High-uniformity high refractive index material transmissive and reflective diffraction gratings |
US11709422B2 (en) | 2020-09-17 | 2023-07-25 | Meta Platforms Technologies, Llc | Gray-tone lithography for precise control of grating etch depth |
US20220082739A1 (en) * | 2020-09-17 | 2022-03-17 | Facebook Technologies, Llc | Techniques for manufacturing variable etch depth gratings using gray-tone lithography |
US20230025444A1 (en) * | 2021-07-22 | 2023-01-26 | Lawrence Livermore National Security, Llc | Systems and methods for silicon microstructures fabricated via greyscale drie with soi release |
CN116068768A (zh) * | 2022-03-15 | 2023-05-05 | 嘉兴驭光光电科技有限公司 | 衍射光波导以及具有其的显示设备 |
CN115064853A (zh) * | 2022-05-22 | 2022-09-16 | 上海图灵智算量子科技有限公司 | 一种t形波导 |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002048907A (ja) * | 2000-08-01 | 2002-02-15 | Canon Inc | 回折光学素子の製作方法 |
JP2004053992A (ja) * | 2002-07-22 | 2004-02-19 | Hitachi Cable Ltd | 回折格子、波長合分波器及びこれらを用いた波長多重信号光伝送モジュール |
JP2013210680A (ja) * | 2007-11-06 | 2013-10-10 | Seiko Epson Corp | 回折光学素子とその製造方法、及びレーザー加工方法 |
US20160035539A1 (en) * | 2014-07-30 | 2016-02-04 | Lauri SAINIEMI | Microfabrication |
US20160033539A1 (en) * | 2013-04-16 | 2016-02-04 | Shenzhen Mindray Bio-Medical Electronics Co., Ltd. | System and method of component analysis and automatic analysis device using same |
US20160033784A1 (en) * | 2014-07-30 | 2016-02-04 | Tapani Levola | Optical Components |
US20170003504A1 (en) * | 2015-06-30 | 2017-01-05 | Tuomas Vallius | Diffractive optical elements with graded edges |
CN106842397A (zh) * | 2017-01-05 | 2017-06-13 | 苏州苏大维格光电科技股份有限公司 | 一种树脂全息波导镜片及其制备方法、及三维显示装置 |
JP2017534352A (ja) * | 2014-10-21 | 2017-11-24 | カール ツァイス スマート オプティクス ゲーエムベーハーCarl Zeiss Smart Optics Gmbh | 結像光学系およびスマートグラス |
US20180052276A1 (en) * | 2016-08-22 | 2018-02-22 | Magic Leap, Inc. | Diffractive eyepiece |
JP2018506743A (ja) * | 2015-02-12 | 2018-03-08 | カール・ツァイス・スマート・オプティクス・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングCarl Zeiss Smart Optics GmbH | 光学要素 |
WO2018067500A1 (en) * | 2016-10-05 | 2018-04-12 | Magic Leap, Inc. | Fabricating non-uniform diffraction gratings |
Family Cites Families (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61241712A (ja) * | 1985-04-18 | 1986-10-28 | Matsushita Electric Ind Co Ltd | 導波光入出力装置 |
JPS62296102A (ja) * | 1986-06-17 | 1987-12-23 | Nec Corp | 導波路グレ−テイング結合器 |
CA2197706A1 (en) * | 1997-02-14 | 1998-08-14 | Peter Ehbets | Method of fabricating apodized phase mask |
US6410213B1 (en) * | 1998-06-09 | 2002-06-25 | Corning Incorporated | Method for making optical microstructures having profile heights exceeding fifteen microns |
US6847491B1 (en) | 1999-09-27 | 2005-01-25 | Arrayed Fiberoptics Corporation | Hybrid microlens array |
US7194164B2 (en) * | 2000-03-16 | 2007-03-20 | Lightsmyth Technologies Inc | Distributed optical structures with improved diffraction efficiency and/or improved optical coupling |
US6522403B2 (en) * | 2000-12-04 | 2003-02-18 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Computed tomography imaging spectrometer (CTIS) with 2D reflective grating for ultraviolet to long-wave infrared detection especially useful for surveying transient events |
JP2002189112A (ja) | 2000-12-22 | 2002-07-05 | Canon Inc | 回折光学素子の製造方法、回折光学素子の製造方法によって製造したことを特徴とする回折光学素子製造用金型、回折光学素子、および該回折光学素子を有する光学系、光学機器、露光装置、デバイス製造方法、デバイス |
US6975765B2 (en) * | 2003-05-06 | 2005-12-13 | New Light Industries, Ltd. | Optically variable form birefringent structure and method and system and method for reading same |
WO2006102917A1 (en) | 2005-03-31 | 2006-10-05 | Pirelli & C. S.P.A. | Method to fabricate a redirecting mirror in optical waveguide devices |
CN1932602A (zh) * | 2005-09-14 | 2007-03-21 | 鸿富锦精密工业(深圳)有限公司 | 导光板 |
EP2118693A4 (en) * | 2007-02-23 | 2011-08-10 | Nanocomp Ltd | METHOD FOR THE DESIGN OF A BENDING GRID STRUCTURE AND A BENDING GRID STRUCTURE |
CN102047160B (zh) * | 2008-05-19 | 2014-11-19 | Imec公司 | 集成光子器件 |
US20110044582A1 (en) * | 2009-08-21 | 2011-02-24 | Microsoft Corporation | Efficient collimation of light with optical wedge |
KR20130058291A (ko) * | 2011-11-25 | 2013-06-04 | 한국전자통신연구원 | 그레이팅 커플러 |
KR20140039584A (ko) * | 2012-09-24 | 2014-04-02 | 한국전자통신연구원 | 단일 반사형 전반사 에첼 격자 필터를 갖는 광 필터 및 이를 포함하는 광도파로 소자 |
KR20140078184A (ko) * | 2012-12-17 | 2014-06-25 | 한국전자통신연구원 | 도파로 구조체 및 이를 구비하는 배열-도파로 격자 |
US9239432B2 (en) * | 2013-03-14 | 2016-01-19 | Micron Technology, Inc. | Photonics grating coupler and method of manufacture |
US20150118832A1 (en) * | 2013-10-24 | 2015-04-30 | Applied Materials, Inc. | Methods for patterning a hardmask layer for an ion implantation process |
US20150348787A1 (en) * | 2014-05-28 | 2015-12-03 | Globalfoundries Inc. | Semiconductor devices and methods for forming a gate with reduced defects |
US9741581B2 (en) * | 2016-01-11 | 2017-08-22 | Globalfoundries Inc. | Using tensile mask to minimize buckling in substrate |
US9885870B2 (en) * | 2016-04-25 | 2018-02-06 | Microsoft Technology Licensing, Llc | Diffractive optical elements with analog modulations and switching |
KR102654870B1 (ko) * | 2016-11-09 | 2024-04-05 | 삼성전자주식회사 | 3차원 영상 디스플레이용 백라이트 유닛 및 그 제조방법 |
US10534115B1 (en) * | 2017-09-22 | 2020-01-14 | Facebook Technologies, Llc | Gray-tone electron-beam lithography |
CN111065942B (zh) * | 2017-10-24 | 2022-01-07 | 株式会社Lg化学 | 衍射导光板和制造衍射导光板的方法 |
CA3078896A1 (en) * | 2017-11-06 | 2019-05-09 | Magic Leap, Inc. | Method and system for tunable gradient patterning using a shadow mask |
US10818499B2 (en) * | 2018-02-21 | 2020-10-27 | Varian Semiconductor Equipment Associates, Inc. | Optical component having variable depth gratings and method of formation |
US10732351B2 (en) * | 2018-04-23 | 2020-08-04 | Facebook Technologies, Llc | Gratings with variable depths formed using planarization for waveguide displays |
US10649141B1 (en) * | 2018-04-23 | 2020-05-12 | Facebook Technologies, Llc | Gratings with variable etch heights for waveguide displays |
US11067726B2 (en) * | 2018-04-23 | 2021-07-20 | Facebook Technologies, Llc | Gratings with variable depths for waveguide displays |
US11137536B2 (en) * | 2018-07-26 | 2021-10-05 | Facebook Technologies, Llc | Bragg-like gratings on high refractive index material |
-
2019
- 2019-10-22 TW TW110137509A patent/TW202204951A/zh unknown
- 2019-10-22 TW TW108138019A patent/TWI745770B/zh active
- 2019-10-23 KR KR1020217017085A patent/KR102555958B1/ko active IP Right Grant
- 2019-10-23 CN CN201980073438.3A patent/CN112970145B/zh active Active
- 2019-10-23 KR KR1020237023334A patent/KR20230112154A/ko not_active Application Discontinuation
- 2019-10-23 WO PCT/US2019/057517 patent/WO2020096771A1/en unknown
- 2019-10-23 JP JP2021524031A patent/JP7277581B2/ja active Active
- 2019-10-23 CN CN202310137557.9A patent/CN116184568A/zh active Pending
- 2019-10-23 EP EP19881960.9A patent/EP3878047A4/en active Pending
- 2019-10-24 US US16/662,086 patent/US11372149B2/en active Active
-
2023
- 2023-05-08 JP JP2023076535A patent/JP2023113622A/ja active Pending
Patent Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002048907A (ja) * | 2000-08-01 | 2002-02-15 | Canon Inc | 回折光学素子の製作方法 |
JP2004053992A (ja) * | 2002-07-22 | 2004-02-19 | Hitachi Cable Ltd | 回折格子、波長合分波器及びこれらを用いた波長多重信号光伝送モジュール |
JP2013210680A (ja) * | 2007-11-06 | 2013-10-10 | Seiko Epson Corp | 回折光学素子とその製造方法、及びレーザー加工方法 |
US20160033539A1 (en) * | 2013-04-16 | 2016-02-04 | Shenzhen Mindray Bio-Medical Electronics Co., Ltd. | System and method of component analysis and automatic analysis device using same |
US20160035539A1 (en) * | 2014-07-30 | 2016-02-04 | Lauri SAINIEMI | Microfabrication |
US20160033784A1 (en) * | 2014-07-30 | 2016-02-04 | Tapani Levola | Optical Components |
JP2017534352A (ja) * | 2014-10-21 | 2017-11-24 | カール ツァイス スマート オプティクス ゲーエムベーハーCarl Zeiss Smart Optics Gmbh | 結像光学系およびスマートグラス |
JP2018506743A (ja) * | 2015-02-12 | 2018-03-08 | カール・ツァイス・スマート・オプティクス・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングCarl Zeiss Smart Optics GmbH | 光学要素 |
US20170003504A1 (en) * | 2015-06-30 | 2017-01-05 | Tuomas Vallius | Diffractive optical elements with graded edges |
US20180052276A1 (en) * | 2016-08-22 | 2018-02-22 | Magic Leap, Inc. | Diffractive eyepiece |
WO2018039278A1 (en) * | 2016-08-22 | 2018-03-01 | Magic Leap, Inc. | Multi-layer diffractive eyepiece |
WO2018067500A1 (en) * | 2016-10-05 | 2018-04-12 | Magic Leap, Inc. | Fabricating non-uniform diffraction gratings |
CN106842397A (zh) * | 2017-01-05 | 2017-06-13 | 苏州苏大维格光电科技股份有限公司 | 一种树脂全息波导镜片及其制备方法、及三维显示装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7404371B2 (ja) | 2018-12-17 | 2023-12-25 | アプライド マテリアルズ インコーポレイテッド | 複数の格子を形成する方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20210069739A (ko) | 2021-06-11 |
TW202204951A (zh) | 2022-02-01 |
TW202024700A (zh) | 2020-07-01 |
KR20230112154A (ko) | 2023-07-26 |
US11372149B2 (en) | 2022-06-28 |
KR102555958B1 (ko) | 2023-07-13 |
CN116184568A (zh) | 2023-05-30 |
WO2020096771A1 (en) | 2020-05-14 |
JP7277581B2 (ja) | 2023-05-19 |
JP2023113622A (ja) | 2023-08-16 |
CN112970145A (zh) | 2021-06-15 |
CN112970145B (zh) | 2023-03-17 |
EP3878047A1 (en) | 2021-09-15 |
TWI745770B (zh) | 2021-11-11 |
US20200142120A1 (en) | 2020-05-07 |
EP3878047A4 (en) | 2022-08-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7277581B2 (ja) | グレートーンリソグラフィと傾斜エッチングを使用した、深さ調節された傾斜格子 | |
EP3824331B1 (en) | Variable height slanted grating method | |
US10690831B2 (en) | Anisotropically formed diffraction grating device | |
CA3004319A1 (en) | Metasurfaces for redirecting light and methods for fabricating | |
TW201940925A (zh) | 控制用於ar波導組合器的光栅外耦合強度 | |
US11852833B2 (en) | Metasurface waveguide couplers | |
TW202210883A (zh) | 光學元件的製造方法、光學元件、和用於製造光學元件的設備 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210713 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20210713 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20220629 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20220802 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20221101 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20221214 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20230404 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20230508 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7277581 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |