JP7277581B2 - グレートーンリソグラフィと傾斜エッチングを使用した、深さ調節された傾斜格子 - Google Patents
グレートーンリソグラフィと傾斜エッチングを使用した、深さ調節された傾斜格子 Download PDFInfo
- Publication number
- JP7277581B2 JP7277581B2 JP2021524031A JP2021524031A JP7277581B2 JP 7277581 B2 JP7277581 B2 JP 7277581B2 JP 2021524031 A JP2021524031 A JP 2021524031A JP 2021524031 A JP2021524031 A JP 2021524031A JP 7277581 B2 JP7277581 B2 JP 7277581B2
- Authority
- JP
- Japan
- Prior art keywords
- grating
- wedge
- structures
- depth
- waveguide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/01—Head-up displays
- G02B27/017—Head mounted
- G02B27/0172—Head mounted characterised by optical features
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0013—Means for improving the coupling-in of light from the light source into the light guide
- G02B6/0015—Means for improving the coupling-in of light from the light source into the light guide provided on the surface of the light guide or in the bulk of it
- G02B6/0016—Grooves, prisms, gratings, scattering particles or rough surfaces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P11/00—Apparatus or processes specially adapted for manufacturing waveguides or resonators, lines, or other devices of the waveguide type
- H01P11/001—Manufacturing waveguides or transmission lines of the waveguide type
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0081—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for altering, e.g. enlarging, the entrance or exit pupil
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0033—Means for improving the coupling-out of light from the light guide
- G02B6/0035—Means for improving the coupling-out of light from the light guide provided on the surface of the light guide or in the bulk of it
- G02B6/0038—Linear indentations or grooves, e.g. arc-shaped grooves or meandering grooves, extending over the full length or width of the light guide
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P3/00—Waveguides; Transmission lines of the waveguide type
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12083—Constructional arrangements
- G02B2006/12107—Grating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12176—Etching
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/01—Head-up displays
- G02B27/017—Head mounted
- G02B27/0172—Head mounted characterised by optical features
- G02B2027/0174—Head mounted characterised by optical features holographic
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/124—Geodesic lenses or integrated gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/136—Integrated optical circuits characterised by the manufacturing method by etching
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Optical Integrated Circuits (AREA)
- Optical Elements Other Than Lenses (AREA)
Description
Claims (15)
- 基板と、
前記基板上に配置された、複数の突起状の格子構造、および隣接する突起状の格子構造の間にそれぞれ存在する溝状のチャネルと、
を備え、
前記複数の突起状の格子構造の頂部が集合的に規定する上面が、湾曲面である、導波路構造。 - 前記湾曲面が、鞍点形状を有する、請求項1に記載の導波路構造。
- 前記湾曲面が、正の曲率を有する楕円放物面形状を有する、請求項1に記載の導波路構造。
- 前記湾曲面が、負の曲率を有する楕円放物面形状を有する、請求項1に記載の導波路構造。
- 前記複数の突起状の格子構造が、約1.3以上の屈折率を有する光学的に透明な材料から形成されている、請求項1から4のいずれか一項に記載の導波路構造。
- 導波路構造の製造方法であって、
グレースケールリソグラフィを使用して格子層の一部を除去することにより、前記格子層の断面方向で深さが変化するくさび形構造を、前記格子層内に形成することと、
前記格子層上にハードマスクおよびフォトレジストスタックを形成することと、
前記フォトレジストスタックおよび前記ハードマスクをエッチングすることと、
前記くさび形構造が形成された個所において、前記格子層内に、複数の突起状の格子構造、および隣接する突起状の格子構造の間にそれぞれ存在する溝状のチャネルを形成することと
を含む製造方法。 - 前記フォトレジストスタックが、
光学平坦化層、および
フォトレジスト
を含む、請求項6に記載の製造方法。 - 前記複数の突起状の格子構造、および隣接する突起状の格子構造の間にそれぞれ存在する溝状の前記チャネルを形成することが、残存する前記ハードマスクを介して、前記格子層をエッチングすることを含む、請求項6または7に記載の製造方法。
- 前記くさび形構造の前記深さが、直線的に変化する、請求項6から8のいずれか一項に記載の製造方法。
- 前記くさび形構造の前記深さが、非直線的に変化する、請求項6から8のいずれか一項に記載の製造方法。
- 前記くさび形構造の前記深さが、振動するように変化する、請求項6から8のいずれか一項に記載の製造方法。
- 前記くさび形構造の底面が、前記格子層内に湾曲面を規定する、請求項6から8のいずれか一項に記載の製造方法。
- 前記湾曲面が、鞍点形状を有する、請求項12に記載の製造方法。
- 前記湾曲面が、正の曲率を有する楕円放物面形状を有する、請求項12に記載の製造方法。
- 前記湾曲面が、負の曲率を有する楕円放物面形状を有する、請求項12に記載の製造方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2023076535A JP2023113622A (ja) | 2018-11-07 | 2023-05-08 | グレートーンリソグラフィと傾斜エッチングを使用した、深さ調節された傾斜格子 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201862756988P | 2018-11-07 | 2018-11-07 | |
US62/756,988 | 2018-11-07 | ||
PCT/US2019/057517 WO2020096771A1 (en) | 2018-11-07 | 2019-10-23 | Depth-modulated slanted gratings using gray-tone lithography and slant etch |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023076535A Division JP2023113622A (ja) | 2018-11-07 | 2023-05-08 | グレートーンリソグラフィと傾斜エッチングを使用した、深さ調節された傾斜格子 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2022506595A JP2022506595A (ja) | 2022-01-17 |
JP7277581B2 true JP7277581B2 (ja) | 2023-05-19 |
Family
ID=70459560
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021524031A Active JP7277581B2 (ja) | 2018-11-07 | 2019-10-23 | グレートーンリソグラフィと傾斜エッチングを使用した、深さ調節された傾斜格子 |
JP2023076535A Pending JP2023113622A (ja) | 2018-11-07 | 2023-05-08 | グレートーンリソグラフィと傾斜エッチングを使用した、深さ調節された傾斜格子 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023076535A Pending JP2023113622A (ja) | 2018-11-07 | 2023-05-08 | グレートーンリソグラフィと傾斜エッチングを使用した、深さ調節された傾斜格子 |
Country Status (7)
Country | Link |
---|---|
US (1) | US11372149B2 (ja) |
EP (1) | EP3878047A4 (ja) |
JP (2) | JP7277581B2 (ja) |
KR (2) | KR20230112154A (ja) |
CN (2) | CN112970145B (ja) |
TW (2) | TW202204951A (ja) |
WO (1) | WO2020096771A1 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11554445B2 (en) | 2018-12-17 | 2023-01-17 | Applied Materials, Inc. | Methods for controlling etch depth by localized heating |
US11662524B2 (en) * | 2020-03-13 | 2023-05-30 | Applied Materials, Inc. | Forming variable depth structures with laser ablation |
WO2021233877A1 (en) * | 2020-05-18 | 2021-11-25 | Interdigital Ce Patent Holdings, Sas | High-uniformity high refractive index material transmissive and reflective diffraction gratings |
US20220082739A1 (en) * | 2020-09-17 | 2022-03-17 | Facebook Technologies, Llc | Techniques for manufacturing variable etch depth gratings using gray-tone lithography |
US11709422B2 (en) | 2020-09-17 | 2023-07-25 | Meta Platforms Technologies, Llc | Gray-tone lithography for precise control of grating etch depth |
US20230025444A1 (en) * | 2021-07-22 | 2023-01-26 | Lawrence Livermore National Security, Llc | Systems and methods for silicon microstructures fabricated via greyscale drie with soi release |
CN116068768A (zh) * | 2022-03-15 | 2023-05-05 | 嘉兴驭光光电科技有限公司 | 衍射光波导以及具有其的显示设备 |
CN115064853A (zh) * | 2022-05-22 | 2022-09-16 | 上海图灵智算量子科技有限公司 | 一种t形波导 |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002048907A (ja) | 2000-08-01 | 2002-02-15 | Canon Inc | 回折光学素子の製作方法 |
JP2004053992A (ja) | 2002-07-22 | 2004-02-19 | Hitachi Cable Ltd | 回折格子、波長合分波器及びこれらを用いた波長多重信号光伝送モジュール |
JP2013210680A (ja) | 2007-11-06 | 2013-10-10 | Seiko Epson Corp | 回折光学素子とその製造方法、及びレーザー加工方法 |
US20160033784A1 (en) | 2014-07-30 | 2016-02-04 | Tapani Levola | Optical Components |
US20160035539A1 (en) | 2014-07-30 | 2016-02-04 | Lauri SAINIEMI | Microfabrication |
US20170003504A1 (en) | 2015-06-30 | 2017-01-05 | Tuomas Vallius | Diffractive optical elements with graded edges |
CN106842397A (zh) | 2017-01-05 | 2017-06-13 | 苏州苏大维格光电科技股份有限公司 | 一种树脂全息波导镜片及其制备方法、及三维显示装置 |
JP2017534352A (ja) | 2014-10-21 | 2017-11-24 | カール ツァイス スマート オプティクス ゲーエムベーハーCarl Zeiss Smart Optics Gmbh | 結像光学系およびスマートグラス |
US20180052276A1 (en) | 2016-08-22 | 2018-02-22 | Magic Leap, Inc. | Diffractive eyepiece |
JP2018506743A (ja) | 2015-02-12 | 2018-03-08 | カール・ツァイス・スマート・オプティクス・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングCarl Zeiss Smart Optics GmbH | 光学要素 |
WO2018067500A1 (en) | 2016-10-05 | 2018-04-12 | Magic Leap, Inc. | Fabricating non-uniform diffraction gratings |
Family Cites Families (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61241712A (ja) * | 1985-04-18 | 1986-10-28 | Matsushita Electric Ind Co Ltd | 導波光入出力装置 |
JPS62296102A (ja) * | 1986-06-17 | 1987-12-23 | Nec Corp | 導波路グレ−テイング結合器 |
CA2197706A1 (en) * | 1997-02-14 | 1998-08-14 | Peter Ehbets | Method of fabricating apodized phase mask |
US6410213B1 (en) * | 1998-06-09 | 2002-06-25 | Corning Incorporated | Method for making optical microstructures having profile heights exceeding fifteen microns |
US6847491B1 (en) | 1999-09-27 | 2005-01-25 | Arrayed Fiberoptics Corporation | Hybrid microlens array |
US7194164B2 (en) * | 2000-03-16 | 2007-03-20 | Lightsmyth Technologies Inc | Distributed optical structures with improved diffraction efficiency and/or improved optical coupling |
US6522403B2 (en) * | 2000-12-04 | 2003-02-18 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Computed tomography imaging spectrometer (CTIS) with 2D reflective grating for ultraviolet to long-wave infrared detection especially useful for surveying transient events |
JP2002189112A (ja) | 2000-12-22 | 2002-07-05 | Canon Inc | 回折光学素子の製造方法、回折光学素子の製造方法によって製造したことを特徴とする回折光学素子製造用金型、回折光学素子、および該回折光学素子を有する光学系、光学機器、露光装置、デバイス製造方法、デバイス |
US6975765B2 (en) * | 2003-05-06 | 2005-12-13 | New Light Industries, Ltd. | Optically variable form birefringent structure and method and system and method for reading same |
ATE426828T1 (de) | 2005-03-31 | 2009-04-15 | Pgt Photonics Spa | Verfahren zur herstellung eines umlenkspiegels in optischen wellenleiterbauelementen |
CN1932602A (zh) | 2005-09-14 | 2007-03-21 | 鸿富锦精密工业(深圳)有限公司 | 导光板 |
EP2118693A4 (en) * | 2007-02-23 | 2011-08-10 | Nanocomp Ltd | METHOD FOR THE DESIGN OF A BENDING GRID STRUCTURE AND A BENDING GRID STRUCTURE |
CN102047160B (zh) * | 2008-05-19 | 2014-11-19 | Imec公司 | 集成光子器件 |
US20110044582A1 (en) * | 2009-08-21 | 2011-02-24 | Microsoft Corporation | Efficient collimation of light with optical wedge |
KR20130058291A (ko) * | 2011-11-25 | 2013-06-04 | 한국전자통신연구원 | 그레이팅 커플러 |
KR20140039584A (ko) * | 2012-09-24 | 2014-04-02 | 한국전자통신연구원 | 단일 반사형 전반사 에첼 격자 필터를 갖는 광 필터 및 이를 포함하는 광도파로 소자 |
KR20140078184A (ko) * | 2012-12-17 | 2014-06-25 | 한국전자통신연구원 | 도파로 구조체 및 이를 구비하는 배열-도파로 격자 |
US9239432B2 (en) * | 2013-03-14 | 2016-01-19 | Micron Technology, Inc. | Photonics grating coupler and method of manufacture |
CN104111341B (zh) * | 2013-04-16 | 2017-10-17 | 深圳迈瑞生物医疗电子股份有限公司 | 自动分析装置及其分析方法和分析系统 |
US20150118832A1 (en) * | 2013-10-24 | 2015-04-30 | Applied Materials, Inc. | Methods for patterning a hardmask layer for an ion implantation process |
US20150348787A1 (en) * | 2014-05-28 | 2015-12-03 | Globalfoundries Inc. | Semiconductor devices and methods for forming a gate with reduced defects |
US9741581B2 (en) * | 2016-01-11 | 2017-08-22 | Globalfoundries Inc. | Using tensile mask to minimize buckling in substrate |
US9885870B2 (en) * | 2016-04-25 | 2018-02-06 | Microsoft Technology Licensing, Llc | Diffractive optical elements with analog modulations and switching |
KR102654870B1 (ko) * | 2016-11-09 | 2024-04-05 | 삼성전자주식회사 | 3차원 영상 디스플레이용 백라이트 유닛 및 그 제조방법 |
US10534115B1 (en) * | 2017-09-22 | 2020-01-14 | Facebook Technologies, Llc | Gray-tone electron-beam lithography |
CN111065942B (zh) * | 2017-10-24 | 2022-01-07 | 株式会社Lg化学 | 衍射导光板和制造衍射导光板的方法 |
CN111566544B (zh) * | 2017-11-06 | 2021-11-19 | 奇跃公司 | 利用阴影掩模实现可调梯度图案化的方法和系统 |
US10818499B2 (en) * | 2018-02-21 | 2020-10-27 | Varian Semiconductor Equipment Associates, Inc. | Optical component having variable depth gratings and method of formation |
US11067726B2 (en) * | 2018-04-23 | 2021-07-20 | Facebook Technologies, Llc | Gratings with variable depths for waveguide displays |
US10649141B1 (en) * | 2018-04-23 | 2020-05-12 | Facebook Technologies, Llc | Gratings with variable etch heights for waveguide displays |
US10732351B2 (en) * | 2018-04-23 | 2020-08-04 | Facebook Technologies, Llc | Gratings with variable depths formed using planarization for waveguide displays |
US11137536B2 (en) * | 2018-07-26 | 2021-10-05 | Facebook Technologies, Llc | Bragg-like gratings on high refractive index material |
-
2019
- 2019-10-22 TW TW110137509A patent/TW202204951A/zh unknown
- 2019-10-22 TW TW108138019A patent/TWI745770B/zh active
- 2019-10-23 JP JP2021524031A patent/JP7277581B2/ja active Active
- 2019-10-23 WO PCT/US2019/057517 patent/WO2020096771A1/en unknown
- 2019-10-23 KR KR1020237023334A patent/KR20230112154A/ko not_active Application Discontinuation
- 2019-10-23 CN CN201980073438.3A patent/CN112970145B/zh active Active
- 2019-10-23 EP EP19881960.9A patent/EP3878047A4/en active Pending
- 2019-10-23 KR KR1020217017085A patent/KR102555958B1/ko active IP Right Grant
- 2019-10-23 CN CN202310137557.9A patent/CN116184568A/zh active Pending
- 2019-10-24 US US16/662,086 patent/US11372149B2/en active Active
-
2023
- 2023-05-08 JP JP2023076535A patent/JP2023113622A/ja active Pending
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002048907A (ja) | 2000-08-01 | 2002-02-15 | Canon Inc | 回折光学素子の製作方法 |
JP2004053992A (ja) | 2002-07-22 | 2004-02-19 | Hitachi Cable Ltd | 回折格子、波長合分波器及びこれらを用いた波長多重信号光伝送モジュール |
JP2013210680A (ja) | 2007-11-06 | 2013-10-10 | Seiko Epson Corp | 回折光学素子とその製造方法、及びレーザー加工方法 |
US20160033784A1 (en) | 2014-07-30 | 2016-02-04 | Tapani Levola | Optical Components |
US20160035539A1 (en) | 2014-07-30 | 2016-02-04 | Lauri SAINIEMI | Microfabrication |
JP2017534352A (ja) | 2014-10-21 | 2017-11-24 | カール ツァイス スマート オプティクス ゲーエムベーハーCarl Zeiss Smart Optics Gmbh | 結像光学系およびスマートグラス |
JP2018506743A (ja) | 2015-02-12 | 2018-03-08 | カール・ツァイス・スマート・オプティクス・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングCarl Zeiss Smart Optics GmbH | 光学要素 |
US20170003504A1 (en) | 2015-06-30 | 2017-01-05 | Tuomas Vallius | Diffractive optical elements with graded edges |
US20180052276A1 (en) | 2016-08-22 | 2018-02-22 | Magic Leap, Inc. | Diffractive eyepiece |
WO2018039278A1 (en) | 2016-08-22 | 2018-03-01 | Magic Leap, Inc. | Multi-layer diffractive eyepiece |
WO2018067500A1 (en) | 2016-10-05 | 2018-04-12 | Magic Leap, Inc. | Fabricating non-uniform diffraction gratings |
CN106842397A (zh) | 2017-01-05 | 2017-06-13 | 苏州苏大维格光电科技股份有限公司 | 一种树脂全息波导镜片及其制备方法、及三维显示装置 |
Also Published As
Publication number | Publication date |
---|---|
WO2020096771A1 (en) | 2020-05-14 |
TWI745770B (zh) | 2021-11-11 |
US11372149B2 (en) | 2022-06-28 |
KR20230112154A (ko) | 2023-07-26 |
CN116184568A (zh) | 2023-05-30 |
CN112970145B (zh) | 2023-03-17 |
TW202204951A (zh) | 2022-02-01 |
JP2023113622A (ja) | 2023-08-16 |
JP2022506595A (ja) | 2022-01-17 |
CN112970145A (zh) | 2021-06-15 |
KR20210069739A (ko) | 2021-06-11 |
US20200142120A1 (en) | 2020-05-07 |
EP3878047A1 (en) | 2021-09-15 |
KR102555958B1 (ko) | 2023-07-13 |
EP3878047A4 (en) | 2022-08-10 |
TW202024700A (zh) | 2020-07-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7277581B2 (ja) | グレートーンリソグラフィと傾斜エッチングを使用した、深さ調節された傾斜格子 | |
EP3824331B1 (en) | Variable height slanted grating method | |
TWI721208B (zh) | 奈米光柵方法及設備 | |
CN113167943A (zh) | 各向异性地形成的衍射光栅设备 | |
CA3004319A1 (en) | Metasurfaces for redirecting light and methods for fabricating | |
JP7293352B2 (ja) | 角度付き格子の形成 | |
JP2023105236A (ja) | 格子結合器の片側パターン化を使用した光学接眼レンズ | |
TWI801904B (zh) | 光學元件的製造方法、光學元件、和用於製造光學元件的設備 | |
US20230375835A1 (en) | Metasurface waveguide couplers | |
KR20230118552A (ko) | 증강 현실 또는 가상 현실 디스플레이용 도파관 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210713 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20210713 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20220629 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20220802 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20221101 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20221214 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20230404 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20230508 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7277581 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |