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JPH08286384A
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1995-04-14 |
1996-11-01 |
Hitachi Ltd |
パタン形成方法及びそれに用いるフォトレジスト材料
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1996-10-07 |
2006-12-12 |
Shipley Company, L.L.C. |
Dyed photoresists and methods and articles of manufacture comprising same
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JPH10111563A
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1996-10-07 |
1998-04-28 |
Hitachi Ltd |
パタン形成方法及びそれを用いた半導体装置の製造方法並びに感放射線組成物
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1998-05-28 |
2002-09-17 |
Atotech Deutschland Gmbh |
Photosensitive composition
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KR100549574B1
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1999-12-30 |
2006-02-08 |
주식회사 하이닉스반도체 |
유기 반사 방지막용 중합체 및 그의 제조방법
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KR100721181B1
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2000-06-30 |
2007-05-23 |
주식회사 하이닉스반도체 |
유기반사방지막 조성물 및 그의 제조방법
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KR100734249B1
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2000-09-07 |
2007-07-02 |
삼성전자주식회사 |
축합환의 방향족 환을 포함하는 보호기를 가지는 감광성폴리머 및 이를 포함하는 레지스트 조성물
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2001-05-11 |
2004-02-21 |
Shipley Co Llc |
Antireflective coating compositions
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2002-01-09 |
2003-11-20 |
Oberlander Joseph E. |
Negative-working photoimageable bottom antireflective coating
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2003-07-30 |
2008-04-22 |
Hynix Semiconductor Inc. |
Photoresist polymer and photoresist composition containing the same
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KR101156973B1
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2005-03-02 |
2012-06-20 |
주식회사 동진쎄미켐 |
유기 반사방지막 형성용 유기 중합체 및 이를 포함하는 유기 조성물
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JP4905811B2
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2006-08-24 |
2012-03-28 |
Jsr株式会社 |
イオンインプランテーション方法及びそれに用いる感放射線性樹脂組成物
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2007-02-28 |
2010-11-23 |
Rohm And Haas Electronic Materials Llc |
Polymers and photoresist compositions
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2007-05-18 |
2012-03-28 |
住友化学株式会社 |
化学増幅型ポジ型レジスト組成物
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2008-05-06 |
2011-04-26 |
Az Electronic Materials Usa Corp. |
Antireflective coating composition
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KR20100047046A
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2008-10-28 |
2010-05-07 |
동우 화인켐 주식회사 |
아이-선 화학증폭형 포지티브 레지스트 조성물 및 이를 이용한 패턴형성방법
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JP5746824B2
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2009-02-08 |
2015-07-08 |
ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC |
上塗りフォトレジストと共に使用するのに好適なコーティング組成物
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EP2216683B1
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2009-02-08 |
2018-11-14 |
Rohm and Haas Electronic Materials, L.L.C. |
Substrates coated with an antireflective composition and a photoresist
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2009-03-11 |
2014-08-19 |
Sumitomo Chemical Company, Limited |
Compound and chemically amplified positive resist composition
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2009-06-12 |
2014-11-11 |
Rohm And Haas Electronic Materials Llc |
Coating compositions suitable for use with an overcoated photoresist
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2011-05-12 |
2015-11-10 |
富士フイルム株式会社 |
ポジ型レジスト組成物、それを用いたレジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法及びエッチング処理を行う方法、並びに、高分子化合物
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2011-06-06 |
2014-01-07 |
Az Electronic Materials Usa Corp. |
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2011-08-10 |
2014-05-06 |
International Business Machines Corporation |
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2011-11-10 |
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International Business Machines Corporation |
Hybrid photoresist composition and pattern forming method using thereof
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2011-12-15 |
2014-04-15 |
Az Electronic Materials Usa Corp. |
Composition for forming a developable bottom antireflective coating
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2012-06-29 |
2015-04-07 |
International Business Machines Corporation |
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2012-09-26 |
2014-12-02 |
Az Electronic Materials (Luxembourg) S.A.R.L. |
Developable bottom anti-reflective coating
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2013-03-12 |
2016-11-22 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Photoresist layer and method
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KR20140129934A
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2013-04-30 |
2014-11-07 |
제일모직주식회사 |
광경화 조성물 및 이를 포함하는 봉지화된 장치
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2013-07-24 |
2017-01-10 |
Orthogonal, Inc. |
Cross-linkable fluorinated photopolymer
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2013-11-20 |
2018-08-07 |
Osaka Organic Chemical Industry Ltd. |
Clear coating composition
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2014-08-27 |
2017-05-21 |
羅門哈斯電子材料有限公司 |
多重圖案的形成方法
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KR102273332B1
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2015-03-31 |
2021-07-06 |
닛산 가가쿠 가부시키가이샤 |
양이온 중합성 레지스트 하층막 형성 조성물
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TWI758326B
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2016-09-16 |
2022-03-21 |
日商日產化學工業股份有限公司 |
保護膜形成組成物
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2016-12-31 |
2020-01-07 |
Rohm And Haas Electronic Materials Llc |
Radiation-sensitive compositions and patterning and metallization processes
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JP7347430B2
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2018-08-21 |
2023-09-20 |
Jsr株式会社 |
感光性樹脂組成物、レジストパターンの形成方法、メッキ造形物の製造方法、および半導体装置
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