JP2022105327A5 - - Google Patents

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Publication number
JP2022105327A5
JP2022105327A5 JP2021215365A JP2021215365A JP2022105327A5 JP 2022105327 A5 JP2022105327 A5 JP 2022105327A5 JP 2021215365 A JP2021215365 A JP 2021215365A JP 2021215365 A JP2021215365 A JP 2021215365A JP 2022105327 A5 JP2022105327 A5 JP 2022105327A5
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Japan
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mol
polymer
typically
formula
grams per
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JP2021215365A
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Japanese (ja)
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JP2022105327A (ja
JP7377848B2 (ja
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JP2021215365A 2020-12-31 2021-12-29 フォトレジスト組成物及びパターン形成方法 Active JP7377848B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US202063132686P 2020-12-31 2020-12-31
US63/132,686 2020-12-31

Publications (3)

Publication Number Publication Date
JP2022105327A JP2022105327A (ja) 2022-07-13
JP2022105327A5 true JP2022105327A5 (https=) 2023-09-20
JP7377848B2 JP7377848B2 (ja) 2023-11-10

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JP2021215365A Active JP7377848B2 (ja) 2020-12-31 2021-12-29 フォトレジスト組成物及びパターン形成方法

Country Status (5)

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US (1) US11940730B2 (https=)
JP (1) JP7377848B2 (https=)
KR (1) KR102711778B1 (https=)
CN (1) CN114690557B (https=)
TW (1) TW202236010A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020132749A (ja) * 2019-02-19 2020-08-31 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングMerck Patent GmbH ポリマー、ポリマーを含んでなる半導体組成物、および半導体組成物を用いた膜の製造方法

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08286384A (ja) 1995-04-14 1996-11-01 Hitachi Ltd パタン形成方法及びそれに用いるフォトレジスト材料
US7147983B1 (en) 1996-10-07 2006-12-12 Shipley Company, L.L.C. Dyed photoresists and methods and articles of manufacture comprising same
JPH10111563A (ja) 1996-10-07 1998-04-28 Hitachi Ltd パタン形成方法及びそれを用いた半導体装置の製造方法並びに感放射線組成物
US6451498B1 (en) * 1998-05-28 2002-09-17 Atotech Deutschland Gmbh Photosensitive composition
KR100549574B1 (ko) 1999-12-30 2006-02-08 주식회사 하이닉스반도체 유기 반사 방지막용 중합체 및 그의 제조방법
KR100721181B1 (ko) * 2000-06-30 2007-05-23 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100734249B1 (ko) * 2000-09-07 2007-07-02 삼성전자주식회사 축합환의 방향족 환을 포함하는 보호기를 가지는 감광성폴리머 및 이를 포함하는 레지스트 조성물
TW576859B (en) 2001-05-11 2004-02-21 Shipley Co Llc Antireflective coating compositions
US20030215736A1 (en) 2002-01-09 2003-11-20 Oberlander Joseph E. Negative-working photoimageable bottom antireflective coating
US7361447B2 (en) * 2003-07-30 2008-04-22 Hynix Semiconductor Inc. Photoresist polymer and photoresist composition containing the same
KR101156973B1 (ko) * 2005-03-02 2012-06-20 주식회사 동진쎄미켐 유기 반사방지막 형성용 유기 중합체 및 이를 포함하는 유기 조성물
JP4905811B2 (ja) 2006-08-24 2012-03-28 Jsr株式会社 イオンインプランテーション方法及びそれに用いる感放射線性樹脂組成物
US7838199B2 (en) * 2007-02-28 2010-11-23 Rohm And Haas Electronic Materials Llc Polymers and photoresist compositions
JP4905250B2 (ja) 2007-05-18 2012-03-28 住友化学株式会社 化学増幅型ポジ型レジスト組成物
US7932018B2 (en) * 2008-05-06 2011-04-26 Az Electronic Materials Usa Corp. Antireflective coating composition
KR20100047046A (ko) * 2008-10-28 2010-05-07 동우 화인켐 주식회사 아이-선 화학증폭형 포지티브 레지스트 조성물 및 이를 이용한 패턴형성방법
JP5746824B2 (ja) 2009-02-08 2015-07-08 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC 上塗りフォトレジストと共に使用するのに好適なコーティング組成物
EP2216683B1 (en) 2009-02-08 2018-11-14 Rohm and Haas Electronic Materials, L.L.C. Substrates coated with an antireflective composition and a photoresist
US8808960B2 (en) * 2009-03-11 2014-08-19 Sumitomo Chemical Company, Limited Compound and chemically amplified positive resist composition
US8883407B2 (en) 2009-06-12 2014-11-11 Rohm And Haas Electronic Materials Llc Coating compositions suitable for use with an overcoated photoresist
JP5806854B2 (ja) * 2011-05-12 2015-11-10 富士フイルム株式会社 ポジ型レジスト組成物、それを用いたレジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法及びエッチング処理を行う方法、並びに、高分子化合物
US8623589B2 (en) 2011-06-06 2014-01-07 Az Electronic Materials Usa Corp. Bottom antireflective coating compositions and processes thereof
US8715907B2 (en) 2011-08-10 2014-05-06 International Business Machines Corporation Developable bottom antireflective coating compositions for negative resists
US8932796B2 (en) 2011-11-10 2015-01-13 International Business Machines Corporation Hybrid photoresist composition and pattern forming method using thereof
US8697336B2 (en) 2011-12-15 2014-04-15 Az Electronic Materials Usa Corp. Composition for forming a developable bottom antireflective coating
US8999624B2 (en) 2012-06-29 2015-04-07 International Business Machines Corporation Developable bottom antireflective coating composition and pattern forming method using thereof
US8900797B2 (en) 2012-09-26 2014-12-02 Az Electronic Materials (Luxembourg) S.A.R.L. Developable bottom anti-reflective coating
US9502231B2 (en) * 2013-03-12 2016-11-22 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist layer and method
KR20140129934A (ko) 2013-04-30 2014-11-07 제일모직주식회사 광경화 조성물 및 이를 포함하는 봉지화된 장치
US9541829B2 (en) 2013-07-24 2017-01-10 Orthogonal, Inc. Cross-linkable fluorinated photopolymer
US10040965B2 (en) 2013-11-20 2018-08-07 Osaka Organic Chemical Industry Ltd. Clear coating composition
TWI584061B (zh) * 2014-08-27 2017-05-21 羅門哈斯電子材料有限公司 多重圖案的形成方法
KR102273332B1 (ko) 2015-03-31 2021-07-06 닛산 가가쿠 가부시키가이샤 양이온 중합성 레지스트 하층막 형성 조성물
TWI758326B (zh) 2016-09-16 2022-03-21 日商日產化學工業股份有限公司 保護膜形成組成物
US10527935B2 (en) * 2016-12-31 2020-01-07 Rohm And Haas Electronic Materials Llc Radiation-sensitive compositions and patterning and metallization processes
JP7347430B2 (ja) 2018-08-21 2023-09-20 Jsr株式会社 感光性樹脂組成物、レジストパターンの形成方法、メッキ造形物の製造方法、および半導体装置

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