JP2022103594A - リードフレーム、リードフレームの製造方法及び半導体装置 - Google Patents
リードフレーム、リードフレームの製造方法及び半導体装置 Download PDFInfo
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Abstract
Description
まず、第1実施形態について説明する。第1実施形態はリードフレームに関する。
まず、リードフレームの構造について説明する。図1は、第1実施形態に係るリードフレームを示す上面図である。図2は、図1中の一部を拡大して示す図である。図3は、第1実施形態に係るリードフレームを示す断面図である。図3(a)は、図1及び図2中のIIIa-IIIa線に沿った断面図に相当し、図3(b)は、図1及び図2中のIIIb-IIIb線に沿った断面図に相当し、図3(c)は、図1及び図2中のIIIc-IIIc線に沿った断面図に相当する。
次に、第1実施形態に係るリードフレーム100の製造方法について説明する。図7~図13は、第1実施形態に係るリードフレーム100の製造方法を示す図である。図7(a)~図13(a)は上面図であり、図7(b)~図13(b)はそれぞれ図7(a)~図13(a)中のI-I線に沿った断面図である。図8~図13は、個片化領域Cの1つを示す。
次に、第2実施形態について説明する。第2実施形態は、第1実施形態に係るリードフレーム100を用いて製造された半導体装置に関する。
まず、半導体装置の構造について説明する。図15は、第2実施形態に係る半導体装置を示す断面図である。
次に、第2実施形態に係る半導体装置200について説明する。図16~図19は、第2実施形態に係る半導体装置200の製造方法を示す図である。図16(a)~図19(a)は上面図であり、図16(b)~図19(b)はそれぞれ図16(a)~図19(a)中のI-I線に沿った断面図である。
次に、第2実施形態の変形例について説明する。図21は、第2実施形態の変形例に係る半導体装置を示す断面図である。
10:板材
11:ダイパッド
12:リード
17:接着剤
19:溶剤成分
20:半導体チップ
40:樹脂部
100A:上面
100B:下面
101:基部
102:粗化面
110:第1領域
116:Agペースト
117:溶剤成分
120:第2領域
121:粗化領域
122:粗化緩和領域
200、200A:半導体装置
Claims (10)
- 一方の面に、半導体チップが搭載される第1領域と、前記第1領域の周囲の第2領域と、を有するリードフレームであって、
前記第2領域は、
粗化領域と、
前記粗化領域と前記第1領域との間に設けられ、前記粗化領域よりも平坦度が高い粗化緩和領域と、
を有することを特徴とするリードフレーム。 - 前記第1領域が、粗化領域を有することを特徴とする請求項1に記載のリードフレーム。
- 前記一方の面とは反対側の他方の面が、粗化領域を有することを特徴とする請求項1又は2に記載のリードフレーム。
- 前記粗化領域のSレシオは1.05~2.20であり、
前記粗化緩和領域のSレシオは1.01~1.10であることを特徴とする請求項1乃至3のいずれか1項に記載のリードフレーム。 - 前記リードフレームがダイパッドを有し、
前記ダイパッドの一方の面に、前記第1領域と前記第2領域とが設けられていることを特徴とする請求項1乃至4のいずれか1項に記載のリードフレーム。 - 一方の面に、半導体チップが搭載される第1領域と、前記第1領域の周囲の第2領域と、を有するリードフレームの製造方法であって、
リードフレームの基材の少なくとも前記一方の面に粗化面を形成する工程と、
前記第2領域の一部の粗化面を潰して、前記粗化面を備えた粗化領域と、前記粗化領域と前記第1領域との間に設けられ、前記粗化領域よりも平坦度が高い粗化緩和領域と、を形成する工程と、
を有することを特徴とするリードフレームの製造方法。 - 前記粗化面を形成する工程において、前記粗化面を、前記第1領域にも形成することを特徴とする請求項6に記載のリードフレームの製造方法。
- 前記粗化面を形成する工程において、前記粗化面を、前記一方の面とは反対側の他方の面にも形成することを特徴とする請求項6又は7に記載のリードフレームの製造方法。
- 前記粗化面のSレシオは1.05~2.20とし、
前記粗化緩和領域のSレシオは1.01~1.10とすることを特徴とする請求項6乃至8のいずれか1項に記載のリードフレームの製造方法。 - 請求項1乃至5のいずれか1項に記載のリードフレームと、
前記第1領域の上に接着剤を用いて搭載された半導体チップと、
前記第2領域に接触し、前記半導体チップを封止する封止樹脂と、
を有することを特徴とする半導体装置。
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JP2020218326A JP7494107B2 (ja) | 2020-12-28 | 2020-12-28 | リードフレーム、リードフレームの製造方法及び半導体装置 |
US17/644,640 US20220208664A1 (en) | 2020-12-28 | 2021-12-16 | Lead frame, method of making lead frame, and semiconductor device |
CN202111585482.8A CN114695303A (zh) | 2020-12-28 | 2021-12-22 | 引线框架、引线框架的制造方法以及半导体装置 |
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