JP2022086586A - Transport device, deposition apparatus, deposition method, and production method of electronic device - Google Patents

Transport device, deposition apparatus, deposition method, and production method of electronic device Download PDF

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JP2022086586A
JP2022086586A JP2020198684A JP2020198684A JP2022086586A JP 2022086586 A JP2022086586 A JP 2022086586A JP 2020198684 A JP2020198684 A JP 2020198684A JP 2020198684 A JP2020198684 A JP 2020198684A JP 2022086586 A JP2022086586 A JP 2022086586A
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transport
surface portion
substrate
roller
vapor deposition
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JP7191922B2 (en
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孝史 澁谷
Takashi Shibuya
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Canon Tokki Corp
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physical Vapour Deposition (AREA)
  • Rollers For Roller Conveyors For Transfer (AREA)

Abstract

To provide a dust collection cover provided on a transportation roller of an in-line type deposition apparatus which is highly effective in preventing defective film deposition or malfunction of the transportation roller.SOLUTION: A transport device in an in-line type deposition apparatus for depositing, while conveying a substrate, includes multiple transportation rollers for transporting a placed substrate, and a dust collection cover provided on each of the multiple transportation rollers, for enclosing the transportation roller. The dust collection cover includes a front surface part for covering a side face on the substrate side of the transportation roller, in the axial direction of the transportation roller, and an upper surface part for covering the upside of the transportation roller, and the upper surface part has an opening for exposing an upper peripheral surface of the transportation roller.SELECTED DRAWING: Figure 7

Description

本発明は、基板の搬送装置、成膜装置、成膜方法および電子デバイスの製造方法に関する。 The present invention relates to a substrate transfer device, a film forming apparatus, a film forming method, and a method for manufacturing an electronic device.

有機ＥＬディスプレイ等の製造においては、マスクを用いて基板上に蒸着物質を成膜するインライン型の成膜装置が知られている。引用文献１には、成膜のためのチャンバ内で基板を搬送しながら成膜を行う成膜装置が示されている。 In the manufacture of organic EL displays and the like, an in-line type film forming apparatus that deposits a vapor-deposited substance on a substrate using a mask is known. Reference 1 shows a film forming apparatus that performs film formation while transporting a substrate in a chamber for film formation.

特開２０１４－１７３１７０号公報Japanese Unexamined Patent Publication No. 2014-173170 特開２０１０－１４７２５６号公報Japanese Unexamined Patent Publication No. 2010-147256

ここで、搬送装置に設けられた搬送ローラと搬送される基板との接触によって生じた粉塵などが、搬送ローラの回転や蒸着源から放出される蒸着材料によって生じる気流によって舞い上がり、基板上や成膜装置の駆動部に付着し、成膜不良や搬送ローラの動作不良が生じることがある。これを防ぐために、搬送ローラにはカバーが設けられることがある（引用文献２）。 Here, dust and the like generated by the contact between the transport roller provided in the transport device and the substrate to be transported are blown up by the rotation of the transport roller and the air flow generated by the vapor deposition material discharged from the vapor deposition source, and are formed on the substrate or formed a film. It may adhere to the drive unit of the device, resulting in poor film formation or malfunction of the transport roller. In order to prevent this, the transport roller may be provided with a cover (Reference 2).

本発明は、成膜不良や搬送ローラの動作不良を防ぐ効果が高い、インライン型の成膜装置の搬送ローラに設けられるカバーを提供する。 The present invention provides a cover provided on a transfer roller of an in-line type film forming apparatus, which is highly effective in preventing film formation defects and malfunction of the transfer roller.

本発明の一側面によれば、基板を搬送しながら成膜するインライン型の成膜装置の搬送装置であって、
載置された基板を搬送する複数の搬送ローラと、
前記複数の搬送ローラ毎に設けられ、前記搬送ローラを囲む集塵カバーと、を備え、
前記集塵カバーは、
前記搬送ローラの軸方向で、前記搬送ローラの前記基板側の側面を覆う前面部と、
前記搬送ローラの上側を覆う上面部と、を含み、
前記上面部は、前記搬送ローラの上方周面を露出させる開口部を有する、
ことを特徴とする搬送装置が提供される。 According to one aspect of the present invention, it is a transport device of an in-line type film forming apparatus that forms a film while transporting a substrate.
With multiple transport rollers that transport the mounted substrate,
A dust collecting cover provided for each of the plurality of transport rollers and surrounding the transport rollers is provided.
The dust collecting cover is
A front portion that covers the side surface of the transfer roller on the substrate side in the axial direction of the transfer roller, and
Including an upper surface portion covering the upper side of the transfer roller,
The upper surface portion has an opening that exposes the upper peripheral surface of the transport roller.
A transport device characterized by this is provided.

本発明によれば、成膜不良や搬送ローラの動作不良を防ぐ効果が高い、インライン型の成膜装置の搬送ローラに設けられるカバーを提供することができる。 According to the present invention, it is possible to provide a cover provided on a transfer roller of an in-line type film forming apparatus, which is highly effective in preventing film formation defects and malfunction of the transfer roller.

一実施形態に係る成膜装置の概略図。The schematic diagram of the film forming apparatus which concerns on one Embodiment. 成膜装置の成膜処理を示す図。The figure which shows the film forming process of a film forming apparatus. 搬送ユニットと蒸着ユニットの分離を示す図。The figure which shows the separation of a transport unit and a vapor deposition unit. 一実施形態に係る搬送ユニットの概略図。The schematic diagram of the transport unit which concerns on one Embodiment. 搬送ユニットの面Ｘでの断面図。Sectional drawing of the transport unit in surface X. 搬送ユニットの面Ｙでの断面図。Sectional drawing of the transport unit on the surface Y. 搬送ローラおよび集塵カバーの構成の一例を示す図。The figure which shows an example of the structure of a transport roller and a dust collection cover. 搬送ローラおよび集塵カバーの構成の一例を示す図。The figure which shows an example of the structure of a transport roller and a dust collection cover. 搬送ローラおよび集塵カバーの構成の一例を示す図。The figure which shows an example of the structure of a transport roller and a dust collection cover. 搬送ローラおよび集塵カバーの構成の一例を示す図。The figure which shows an example of the structure of a transport roller and a dust collection cover.

以下、添付図面を参照して実施形態を詳しく説明する。尚、以下の実施形態は特許請求の範囲に係る発明を限定するものではない。実施形態には複数の特徴が記載されているが、これらの複数の特徴の全てが発明に必須のものとは限らず、また、複数の特徴は任意に組み合わせられてもよい。さらに、添付図面においては、同一若しくは同様の構成に同一の参照番号を付し、重複した説明は省略する。 Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. The following embodiments do not limit the invention according to the claims. Although a plurality of features are described in the embodiment, not all of the plurality of features are essential for the invention, and the plurality of features may be arbitrarily combined. Further, in the attached drawings, the same or similar configurations are given the same reference numbers, and duplicate explanations are omitted.

＜成膜装置の概要＞
図１（Ａ）および図１（Ｂ）は、本実施形態に係る成膜装置を示す概略図である。図１（Ａ）および図１（Ｂ）に示す本実施形態に係る成膜装置１は、基板を搬送しながら製膜するインライン型の成膜装置である。本実施形態に係る成膜装置１は、例えば、スマートフォン用の有機ＥＬ表示装置の表示パネルなどの電子デバイスの製造ラインに適用される。成膜装置１は、搬送ユニット２、蒸着ユニット３、フレーム４を含む。 <Overview of film forming equipment>
1 (A) and 1 (B) are schematic views showing a film forming apparatus according to the present embodiment. The film forming apparatus 1 according to the present embodiment shown in FIGS. 1 (A) and 1 (B) is an in-line type film forming apparatus that forms a film while conveying a substrate. The film forming apparatus 1 according to the present embodiment is applied to a manufacturing line of an electronic device such as a display panel of an organic EL display device for a smartphone. The film forming apparatus 1 includes a transport unit 2, a vapor deposition unit 3, and a frame 4.

搬送ユニット２は、基板上に形成する薄膜パターンに対応する開口パターンをもつメタルマスクなどのマスクによってマスクされた基板が配置されたマスクトレイを搬入口５から搬出口６まで搬送するための装置である。また、搬送ユニット２の底面には、蒸着ユニット３の蒸着源から放出された蒸着材料がマスクトレイに配置された基板に蒸着されるよう、開口が配置される。 The transport unit 2 is a device for transporting a mask tray on which a substrate masked by a mask such as a metal mask having an opening pattern corresponding to a thin film pattern formed on the substrate is arranged from the carry-in inlet 5 to the carry-out port 6. be. Further, an opening is arranged on the bottom surface of the transport unit 2 so that the vapor deposition material discharged from the vapor deposition source of the vapor deposition unit 3 is vapor-deposited on the substrate arranged on the mask tray.

蒸着ユニット３は、後述する蒸着源を有し、蒸着ユニット３の天面側には搬送ユニット２によって搬送される基板に蒸着材料を放出するための開口を有する。また、蒸着ユニット３またはフレーム４に配置された昇降機構４１およびスライド機構４２によって、後述する搬送ユニット２と蒸着ユニット３との分離が行われる。 The vapor deposition unit 3 has a vapor deposition source described later, and has an opening on the top surface side of the vapor deposition unit 3 for discharging the vapor deposition material to the substrate conveyed by the transfer unit 2. Further, the elevating mechanism 41 and the slide mechanism 42 arranged on the vapor deposition unit 3 or the frame 4 separate the transport unit 2 and the vapor deposition unit 3, which will be described later.

フレーム４は、搬送ユニット２と蒸着ユニット３とを支持するための構造である。本実施形態では、フレーム４が昇降機構４１およびスライド機構４２を備えるものとして説明を行うが、昇降機構およびスライド機構の少なくとも一つが蒸着ユニット３に備えられてもよい。 The frame 4 has a structure for supporting the transport unit 2 and the vapor deposition unit 3. In the present embodiment, it is assumed that the frame 4 includes the elevating mechanism 41 and the slide mechanism 42, but at least one of the elevating mechanism and the slide mechanism may be provided in the vapor deposition unit 3.

また、図１（Ｂ）に示すように、本実施形態では、成膜装置１は３つの蒸着ユニット３Ａ～３Ｃ（総称して蒸着ユニット３とする）を備え、搬送される基板に１種類以上の蒸着材料を連続して蒸着することができる。なお、図１（Ｂ）の例では、昇降機構４１は省略して示されている。蒸着ユニット３の数、およびそれぞれの蒸着ユニット３が放出する蒸着材料の種類は任意に変更可能である。また、昇降機構４１およびスライド機構４２は、複数の蒸着ユニット３をまとめて昇降またはスライドさせてもよいし、別個に昇降またはスライドさせてもよい。 Further, as shown in FIG. 1B, in the present embodiment, the film forming apparatus 1 includes three vapor deposition units 3A to 3C (collectively referred to as vapor deposition units 3), and one or more types are provided on the substrate to be conveyed. The vapor deposition material can be continuously vapor-deposited. In the example of FIG. 1B, the elevating mechanism 41 is omitted. The number of vapor deposition units 3 and the type of vapor deposition material emitted by each vapor deposition unit 3 can be arbitrarily changed. Further, the elevating mechanism 41 and the slide mechanism 42 may elevate or slide a plurality of vapor deposition units 3 together, or may elevate or slide them separately.

図２（Ａ）～図２（Ｄ）は、本実施形態に係る成膜装置１の成膜処理を示す。ここで、図１（Ａ）の成膜装置１の面ＸＺでの断面図を示す。なお、図２（Ａ）～図２（Ｄ）では、フレーム４は省略して示されている。 2 (A) to 2 (D) show the film forming process of the film forming apparatus 1 according to the present embodiment. Here, a cross-sectional view of the film forming apparatus 1 of FIG. 1A on the surface XZ is shown. In FIGS. 2A to 2D, the frame 4 is omitted.

図２（Ａ）は、基板が配置されたマスクトレイ２０１が搬入口５から搬入された状態の成膜装置１を示す。搬送ユニット２はそれぞれの蒸着ユニット３に対応する開口２１Ａ～２１Ｃ（総称して開口２１とする）を備える。蒸着ユニット３はそれぞれに対応する蒸着源３１Ａ～３１Ｃ（総称して蒸着源３１とする）を備える。図２（Ａ）において、搬入されたマスクトレイ２０１は、搬送ユニット２が備える複数の搬送ローラ２２によって、搬送ユニット２の開口２１上に搬送される。 FIG. 2A shows a film forming apparatus 1 in a state where the mask tray 201 on which the substrate is arranged is carried in from the carry-in inlet 5. The transport unit 2 includes openings 21A to 21C (collectively referred to as openings 21) corresponding to the respective vapor deposition units 3. The vapor deposition unit 3 includes the corresponding vapor deposition sources 31A to 31C (collectively referred to as the vapor deposition source 31). In FIG. 2A, the carried-in mask tray 201 is conveyed onto the opening 21 of the transfer unit 2 by a plurality of transfer rollers 22 included in the transfer unit 2.

図２（Ｂ）は、マスクトレイ２０１が開口２１Ａ上に搬送され、蒸着ユニット３Ａの蒸着源３１Ａから蒸着材料を放出している状態の成膜装置１を示す。図２（Ｂ）では、基板が搬送されている状態で、蒸着源３１Ａから上方に向かって蒸着材料が放出されている。これによって、マスクパターンに従って基板上に蒸着材料が蒸着される。本実施形態に係る成膜装置１は、マスクトレイ２０１が移動している状態で蒸着を行うものとして説明するが、マスクトレイ２０１が開口２１上に位置する状態で移動を一時停止または減速するようマスクトレイ２０１の搬送速度を制御してもよい。これによって、成膜装置１は基板上に適切な厚みの蒸着材料が蒸着するよう制御することができる。 FIG. 2B shows a film forming apparatus 1 in a state where the mask tray 201 is conveyed over the opening 21A and the vapor deposition material is discharged from the vapor deposition source 31A of the vapor deposition unit 3A. In FIG. 2B, the vapor deposition material is discharged upward from the vapor deposition source 31A while the substrate is being conveyed. As a result, the vapor deposition material is vapor-deposited on the substrate according to the mask pattern. The film forming apparatus 1 according to the present embodiment will be described as performing vapor deposition in a state where the mask tray 201 is moving, but the movement is temporarily stopped or decelerated while the mask tray 201 is located on the opening 21. The transport speed of the mask tray 201 may be controlled. As a result, the film forming apparatus 1 can control the vapor deposition material having an appropriate thickness to be deposited on the substrate.

図２（Ｃ）は、蒸着された基板が搬送ユニット２によって搬送され、次の蒸着ユニット３Ｂに対応する開口２１Ｂ上にマスクトレイ２０１が搬送されている状態を示す。ここで、蒸着ユニット３Ｂの蒸着源３１Ｂから蒸着材料が放出される。そして成膜装置１はマスクトレイ２０１の搬送を進めて次の蒸着ユニット３Ｃによって次の蒸着を行い、図２（Ｄ）に示すように、蒸着が完了したマスクトレイ２０１が、搬出口６から搬出される。このように、搬送ユニット２の搬送ローラ２２によって搬入口５から搬出口６まで搬送されるまでに複数の蒸着ユニット３から蒸着を行うことができる。 FIG. 2C shows a state in which the vapor-deposited substrate is transported by the transport unit 2 and the mask tray 201 is transported on the opening 21B corresponding to the next vapor deposition unit 3B. Here, the vapor deposition material is discharged from the vapor deposition source 31B of the vapor deposition unit 3B. Then, the film forming apparatus 1 advances the transfer of the mask tray 201 and performs the next vapor deposition by the next vapor deposition unit 3C, and as shown in FIG. 2D, the mask tray 201 in which the vapor deposition is completed is carried out from the carry-out port 6. Will be done. In this way, thin-film deposition can be performed from a plurality of thin-film deposition units 3 before being transported from the carry-in inlet 5 to the carry-out port 6 by the transfer roller 22 of the transfer unit 2.

続いて、図３（Ａ）および図３（Ｂ）を参照して、搬送ユニット２と蒸着ユニット３との分離について説明する。蒸着ユニット３の蒸着源３１から放出された蒸着材料が搬送ユニット２の側壁や天面に付着し、落下して搬送中の基板に付着することで、蒸着処理が失敗する場合がある。また、搬送ユニット２の側壁や天面に付着した蒸着材料が落下して搬送ローラ２２に付着することで搬送している基板が汚損したり、搬送ローラ２２の動作不良が生じる場合がある。このため、搬送ユニット２の側壁や天面には防着板が設けられ、防着板を定期的に洗浄または交換するメンテナンスが必要になる。 Subsequently, the separation of the transport unit 2 and the vapor deposition unit 3 will be described with reference to FIGS. 3 (A) and 3 (B). The vapor deposition material discharged from the vapor deposition source 31 of the vapor deposition unit 3 adheres to the side wall or the top surface of the transport unit 2, drops and adheres to the substrate being transported, and the vapor deposition process may fail. Further, the thin-film deposition material adhering to the side wall or the top surface of the transport unit 2 may fall and adhere to the transport roller 22, so that the substrate being transported may be soiled or the transport roller 22 may malfunction. Therefore, a protective plate is provided on the side wall and the top surface of the transport unit 2, and maintenance is required to periodically clean or replace the protective plate.

また、搬送ローラ２２とマスクトレイ２０１との接触によって生じる粉塵が、搬送ローラの回転や蒸着材料の放出によって生じる気流によって舞い上がり、基板や成膜装置１の駆動構造に付着し、成膜処理の失敗や搬送ユニット２の動作不良が生じる場合がある。このため、搬送ローラ２２には、生じた粉塵が散らばることを防ぐための集塵カバーが設けられ、集塵カバーの交換または清掃などのメンテナンスを定期的に行うことがある。 Further, the dust generated by the contact between the transport roller 22 and the mask tray 201 flies up due to the air flow generated by the rotation of the transport roller and the discharge of the vapor-deposited material, adheres to the substrate and the drive structure of the film forming apparatus 1, and the film forming process fails. Or the transport unit 2 may malfunction. Therefore, the transport roller 22 is provided with a dust collecting cover for preventing the generated dust from being scattered, and maintenance such as replacement or cleaning of the dust collecting cover may be performed periodically.

このような場合、搬送ユニット２と蒸着ユニット３とを分離し、搬送ユニット２の底面側の開口２１から搬送ユニット２内の搬送空間にアクセスすることで、メンテナンスの際の作業の利便性が向上する。搬送ユニット２と蒸着ユニット３との分離では、図３（Ａ）に示すように、フレーム４が備える昇降機構４１によって、蒸着ユニット３が搬送ユニット２に対して相対的に下方に移動する。なお、本実施形態に係る蒸着ユニット３は、後述するように、搬送ユニット２と接続された場合に開口２１よりもＺ軸上方に進入する部分を備えるため、昇降機構４１による蒸着ユニット３の降下が必要となる。これによって、搬送ユニット２に対して水平方向に蒸着ユニット３が移動することが可能となる。 In such a case, the transport unit 2 and the vapor deposition unit 3 are separated, and the transport space in the transport unit 2 is accessed from the opening 21 on the bottom surface side of the transport unit 2, thereby improving the convenience of work during maintenance. do. In the separation of the transport unit 2 and the vapor deposition unit 3, as shown in FIG. 3A, the vapor deposition unit 3 moves downward relative to the transport unit 2 by the elevating mechanism 41 provided in the frame 4. As will be described later, the thin-film deposition unit 3 according to the present embodiment includes a portion that enters above the Z-axis from the opening 21 when connected to the transport unit 2, so that the vapor deposition unit 3 is lowered by the elevating mechanism 41. Is required. This makes it possible for the vapor deposition unit 3 to move in the horizontal direction with respect to the transport unit 2.

続いて、図３（Ｂ）に示すように、フレーム４が備えるスライド機構４２によって、蒸着ユニット３が搬送ユニット２に対して相対的に水平に移動する。これによって、フレーム４に保持された搬送ユニット２の下方から搬送ユニット２内部の搬送空間にアクセスすることができ、メンテナンスの利便性を向上することができる。また、蒸着ユニット３の上方から蒸着ユニット３内にアクセスすることができるため、蒸着ユニット３のメンテナンスの利便性も向上することができる。 Subsequently, as shown in FIG. 3B, the slide mechanism 42 included in the frame 4 causes the vapor deposition unit 3 to move relatively horizontally with respect to the transport unit 2. As a result, the transport space inside the transport unit 2 can be accessed from below the transport unit 2 held by the frame 4, and the convenience of maintenance can be improved. Further, since the inside of the vapor deposition unit 3 can be accessed from above the vapor deposition unit 3, the convenience of maintenance of the vapor deposition unit 3 can be improved.

続いて、図４に、搬送ユニット２の構造を示す。搬送ユニット２は、底面の開口２１、複数の搬送ローラ２２、天面防着部２３、側壁防着部２４、筐体２５、天面蓋２６を含む。なお、図４において側壁防着部２４は一部のみが図示されている。 Subsequently, FIG. 4 shows the structure of the transport unit 2. The transport unit 2 includes an opening 21 on the bottom surface, a plurality of transport rollers 22, a top surface protection portion 23, a side wall protection portion 24, a housing 25, and a top surface lid 26. In FIG. 4, only a part of the side wall adhesive portion 24 is shown.

天面防着部２３は、搬送ユニット２内の搬送路の天面側に蒸着する蒸着材料の除去などのメンテナンスを容易にするように、筐体２５から取り外し可能に配置される。本実施形態では、天面蓋２６に天面防着部２３が配置され、筐体２５から天面蓋２６を取り外すと、天面蓋２６とともに天面防着部２３も筐体２５から取り外される。また、天面防着部２３は複数の防着板（天面防着板）によって形成され、それぞれの天面防着板は別個に筐体２５または天面蓋２６から取り外すことができる。天面蓋２６が複数の天面防着板を支持する構造については図５および図６を参照して後述する。また、筐体２５、天面蓋２６、および天面防着部２３の詳細な構造については図５および図６を参照して後述する。 The top surface protective portion 23 is detachably arranged from the housing 25 so as to facilitate maintenance such as removal of the vapor-deposited material deposited on the top surface side of the transport path in the transport unit 2. In the present embodiment, the top protection portion 23 is arranged on the top cover 26, and when the top cover 26 is removed from the housing 25, the top protection portion 23 is also removed from the housing 25 together with the top lid 26. .. Further, the top surface protection portion 23 is formed of a plurality of protection plates (top surface protection plates), and each top surface protection plate can be separately removed from the housing 25 or the top surface lid 26. The structure in which the top cover 26 supports the plurality of top protection plates will be described later with reference to FIGS. 5 and 6. Further, the detailed structure of the housing 25, the top cover 26, and the top protection portion 23 will be described later with reference to FIGS. 5 and 6.

側壁防着部２４は、搬送ユニット２内の筐体２５の側壁から脱着可能な防着板を含み、筐体２５の内側の側壁に蒸着材料が蒸着することを防ぐ。メンテナンスの際には、側壁防着部２４を筐体２５から取り外し、交換又は洗浄することでメンテナンス作業を容易に行うことができる。なお、本実施形態に係る側壁防着部２４も複数の側壁防着板によって形成され、それぞれの側壁防着板も別個に筐体２５から取り外すことができる。 The side wall protective portion 24 includes a protective plate that can be attached to and detached from the side wall of the housing 25 in the transport unit 2 to prevent the vapor deposition material from being deposited on the inner side wall of the housing 25. At the time of maintenance, the maintenance work can be easily performed by removing the side wall adhesive portion 24 from the housing 25, replacing it, or cleaning it. The side wall protective portion 24 according to the present embodiment is also formed by a plurality of side wall protective plates, and each side wall protective plate can also be separately removed from the housing 25.

天面蓋２６は、筐体２５の天面側に配置され、天面蓋２６を上方に持ち上げることで筐体２５から天面蓋２６を取り外すことができる。これによって、筐体２５の天面側から搬送空間にアクセスすることができる。すなわち、天面蓋２６は搬送ユニット２の内部の搬送空間の天井を形成する天井部であり、筐体２５は搬送空間の側壁を形成する側壁部である。また、天面防着部２３は搬送空間の天井部を覆う防着部であり、側壁防着部２４は搬送空間の側壁部を覆う防着部である。 The top cover 26 is arranged on the top surface side of the housing 25, and the top cover 26 can be removed from the housing 25 by lifting the top cover 26 upward. As a result, the transport space can be accessed from the top surface side of the housing 25. That is, the top cover 26 is a ceiling portion that forms the ceiling of the transport space inside the transport unit 2, and the housing 25 is a side wall portion that forms the side wall of the transport space. Further, the top surface protection portion 23 is a protection portion that covers the ceiling portion of the transport space, and the side wall protection portion 24 is a protection portion that covers the side wall portion of the transport space.

続いて、図５を参照して搬送ユニット２の詳細な構造について説明する。図５は、図４の面４０１での搬送ユニット２の断面図である。また、図５では、蒸着ユニット３も図示されている。 Subsequently, the detailed structure of the transport unit 2 will be described with reference to FIG. FIG. 5 is a cross-sectional view of the transport unit 2 on the surface 401 of FIG. Further, in FIG. 5, the vapor deposition unit 3 is also shown.

図５では、天面蓋２６にはガイドローラ２７が配置され、天面防着板５０１～５０４は、ガイドローラ２７によって支持される。すなわち、ガイドローラ２７と、天面防着板５０１～５０４のガイドローラ２７に当接する部分が、天面蓋２６に沿って防着板を移動可能に支持するスライド構造（着脱構造）として機能する。本実施形態では、ガイドローラ２７の移動方向は、基板の搬送方向と交差する方向であり、図５ではＹ軸方向である。なお、図５の例では、天面蓋２６にガイドローラ２７が配置され、天面防着板５０１～５０４は、ガイドローラ２７が転動する転動面を含むものとして図示している。しかしながら別の例では、天面蓋２６にレールが配置され、当該レールに沿って転動するローラが天面防着板５０１～５０４に配置されてもよい。また、天面蓋２６が天面防着板５０１～５０４を着脱可能に支持する着脱構造としては、スライド構造以外にもフック型の留め部材などの任意の構造を用いてもよい。 In FIG. 5, a guide roller 27 is arranged on the top cover 26, and the top protective plates 501 to 504 are supported by the guide roller 27. That is, the portion of the top surface protective plates 501 to 504 that abuts on the guide roller 27 functions as a slide structure (detachable structure) that movably supports the protective plate along the top cover 26. .. In the present embodiment, the moving direction of the guide roller 27 is a direction intersecting the transport direction of the substrate, and is the Y-axis direction in FIG. In the example of FIG. 5, the guide roller 27 is arranged on the top cover 26, and the top surface protective plates 501 to 504 are shown to include a rolling surface on which the guide roller 27 rolls. However, in another example, a rail may be arranged on the top cover 26, and rollers rolling along the rail may be arranged on the top protective plates 501 to 504. Further, as the detachable structure in which the top cover 26 detachably supports the top protective plates 501 to 504, any structure such as a hook type fastening member may be used in addition to the slide structure.

また、円５０６～５０８に示すように、天面防着板と水平な面においてスライド方向と交差する方向で隣り合う天面防着板はラビリンス構造を形成する。ここでラビリンス構造とは、防着板が覆う面に対して垂直な方向、すなわち上下方向で隣接する防着板が重なり合うことを意味する。天面防着板５０１～５０４では、上下（Ｚ軸）方向で隣接する防着板が重なり合う。これによって、隣接する天面防着板５０１～５０４の位置が多少変化しても、天面防着板５０１～５０４が搬送空間の天井の内面を覆うことができ、ガイドローラ２７、天面蓋２６、および筐体２５に蒸着材料が付着することを防ぐことができる。 Further, as shown in circles 506 to 508, the top surface protective plates adjacent to each other in the direction intersecting the slide direction on the horizontal surface with the top surface protective plate form a labyrinth structure. Here, the labyrinth structure means that adjacent protective plates overlap each other in the direction perpendicular to the surface covered by the protective plates, that is, in the vertical direction. In the top surface protective plates 501 to 504, adjacent protective plates overlap in the vertical (Z-axis) direction. As a result, even if the positions of the adjacent top protection plates 501 to 504 change slightly, the top protection plates 501 to 504 can cover the inner surface of the ceiling of the transport space, and the guide roller 27 and the top cover can be covered. It is possible to prevent the vapor deposition material from adhering to the 26 and the housing 25.

また、円５０９に示すように、筐体２５の側面に取りつけられ、搬送空間の側面を覆う側壁防着部２４は、側壁防着部２４に隣接する天面防着板５０１とラビリンス構造を形成する。これによって、天面防着板５０１の位置が多少変化しても、ガイドローラ２７、天面蓋２６、および筐体２５に蒸着材料が付着することを防ぐことができる。 Further, as shown in the circle 509, the side wall protective portion 24 attached to the side surface of the housing 25 and covering the side surface of the transport space forms a labyrinth structure with the top surface protective plate 501 adjacent to the side wall protective portion 24. do. As a result, even if the position of the top surface protective plate 501 is slightly changed, it is possible to prevent the vapor-filmed material from adhering to the guide roller 27, the top surface lid 26, and the housing 25.

また、本実施形態に係る天面蓋２６は、筐体２５との係合構造を有し、筐体２５と天面蓋２６との係合を解除することで筐体２５から取り外すことができる。筐体２５から天面蓋２６を取り外す際には、天面蓋２６に設けられたフック穴５０５にクレーンのフックを取りつけることで、クレーンを用いて天面蓋２６を取り外すことができる。 Further, the top cover 26 according to the present embodiment has an engaging structure with the housing 25, and can be removed from the housing 25 by disengaging the housing 25 from the top lid 26. .. When removing the top cover 26 from the housing 25, the top lid 26 can be removed using the crane by attaching the hook of the crane to the hook hole 505 provided in the top lid 26.

続いて、図６を参照して搬送ユニット２の詳細な構造について説明する。図６では、図４の面４０２での搬送ユニット２の断面図である。また、図６では蒸着ユニット３も図示されている。 Subsequently, the detailed structure of the transport unit 2 will be described with reference to FIG. FIG. 6 is a cross-sectional view of the transport unit 2 on the surface 402 of FIG. Further, in FIG. 6, the vapor deposition unit 3 is also shown.

図６では、ガイドローラ２７のスライド方向上の一方では搬送ユニット２の筐体２５または天面蓋２６に設けられたストッパ６０６に当たる。また、スライド方向上の他方ではカバー２８に当たる。カバー２８は、ガイドローラ２７によって天面防着板６０１～６０５を取り外し可能にするか否かを切り替え可能な係止構造である。図６の例では、カバー２８は天面防着板６０１～６０５を天面蓋２６から個別に取り外すことはできない閉状態である。一方、図８を参照して後述するように、カバー２８を開状態に切り替えることで、閉状態でカバー２８が覆っていた筐体２５の開口から天面防着板６０１～６０５をガイドローラ２７に沿って個別に取り外すことができる。また、筐体２５の開口から個別にガイドローラ２７に沿って天面防着板を取りつけて、ストッパ６０６または既に取りつけられた他の天面防着板に当接するまでスライドさせることで、天面防着板をスライド方向で位置合わせすることなく取りつけることができる。このように、脱着構造としてスライド構造を採用することで、天面防着板を着脱する際の作業の効率が向上する。 In FIG. 6, one of the guide rollers 27 in the sliding direction corresponds to the stopper 606 provided on the housing 25 or the top cover 26 of the transport unit 2. The other side in the slide direction hits the cover 28. The cover 28 has a locking structure in which it is possible to switch whether or not the top surface protective plates 601 to 605 are removable by the guide roller 27. In the example of FIG. 6, the cover 28 is in a closed state in which the top surface protective plates 601 to 605 cannot be individually removed from the top surface lid 26. On the other hand, as will be described later with reference to FIG. 8, by switching the cover 28 to the open state, the top surface protective plates 601 to 605 are guided by the guide rollers 27 from the opening of the housing 25 covered by the cover 28 in the closed state. Can be removed individually along. Further, the top surface protective plate is individually attached from the opening of the housing 25 along the guide roller 27, and the top surface is slid until it comes into contact with the stopper 606 or another top surface protective plate already attached. The protective plate can be attached without aligning in the sliding direction. As described above, by adopting the slide structure as the detachable structure, the efficiency of the work when attaching and detaching the top surface protective plate is improved.

また、円６０７～６１０に示すように、スライド方向で隣り合う防着板同士も、ラビリンス構造を形成する。これによって、スライド方向で前後の隣接する天面防着板６０１～６０５の位置が多少変化しても、ガイドローラ２７、天面蓋２６、および筐体２５に蒸着材料が付着することを防ぐことができる。 Further, as shown in circles 607 to 610, the protective plates adjacent to each other in the slide direction also form a labyrinth structure. This prevents the vapor-filmed material from adhering to the guide roller 27, the top cover 26, and the housing 25 even if the positions of the front and rear adjacent top protection plates 601 to 605 are slightly changed in the slide direction. Can be done.

また、スライド方向で同一列の天面防着板６０１～６０５は、同じ形状を有する。これによって、防着板を設置する順序を考慮する必要がなく、天面防着板を着脱する作業が容易になる。 Further, the top surface protective plates 601 to 605 in the same row in the slide direction have the same shape. As a result, it is not necessary to consider the order in which the protective plates are installed, and the work of attaching and detaching the top protective plates becomes easy.

また、円６１１～６１２に示すように、筐体２５の側面に取りつけられ、搬送空間の側面を覆う側壁防着部２４は、側壁防着部２４に隣接する天面防着板６０１、６０５とラビリンス構造を形成する。これによって、天面防着板６０１、６０５の位置が多少変化しても、ガイドローラ２７、天面蓋２６、および筐体２５に蒸着材料が付着することを防ぐことができる。 Further, as shown in circles 611 to 612, the side wall protective portions 24 which are attached to the side surfaces of the housing 25 and cover the side surfaces of the transport space are the top surface protective plates 601 and 605 adjacent to the side wall protective portions 24. Form a labyrinth structure. As a result, even if the positions of the top surface protective plates 601 and 605 are slightly changed, it is possible to prevent the vapor deposition material from adhering to the guide roller 27, the top surface lid 26, and the housing 25.

また、搬送ローラ２２は、シャフト６２１を介して搬送ローラ駆動部６２２によって駆動される。 Further, the transfer roller 22 is driven by the transfer roller drive unit 622 via the shaft 621.

＜搬送ローラ２２と集塵カバーの構成＞
続いて、図７（Ａ）～図１０（Ｂ）を参照して、搬送ローラ２２と集塵カバーの構成の一例について説明する。なお、なお、図７（Ａ）～図１０（Ｂ）において、同様の構成については同一の参照符号を使用する。本実施形態に係る搬送ユニット２に設けられる複数の搬送ローラ２２のそれぞれは集塵カバーを有する。搬送ローラごとに集塵カバーを設けることで、搬送ローラ２２とマスクトレイ２０１との接触などによって生じた粉塵が蒸着ユニット側に落下することを防ぐことができる。 <Structure of transport roller 22 and dust collection cover>
Subsequently, an example of the configuration of the transport roller 22 and the dust collection cover will be described with reference to FIGS. 7 (A) to 10 (B). Note that, in FIGS. 7A to 10B, the same reference numerals are used for the same configuration. Each of the plurality of transport rollers 22 provided in the transport unit 2 according to the present embodiment has a dust collecting cover. By providing a dust collecting cover for each transport roller, it is possible to prevent dust generated by contact between the transport roller 22 and the mask tray 201 from falling to the vapor deposition unit side.

図７（Ａ）および図７（Ｂ）において、集塵カバーは、図７（Ａ）で網掛けおよびハッチングで示す集塵カバーパーツ７００および図７（Ｂ）で網掛けおよびハッチングで示す集塵カバーパーツ７１０を含む。集塵カバーパーツ７００は、上面部７０１、側面部７０２、取り付け部７０３、底面部７０４、逆流防止部７０５、背面部７０６を含む。集塵カバーパーツ７００および７１０は、ネジ７２０によって脱着可能に係合され、搬送ローラ２２を囲む。なお、図７（Ａ）、図７（Ｂ）において、集塵カバーパーツ７１０は説明を容易にするために透過して図示しているが、集塵カバーパーツ７１０を構成する材料を限定するものではなく、任意の材料を使用することができる。また、後述する図８（Ａ）～図１０（Ｂ）の集塵カバーパーツについても同様である。一例では、集塵カバーパーツ７００および７１０は非磁性体の材料によって構成される。これによって、マグネットによって集塵カバーが磁化して粉塵が付着することを防ぎ、メンテナンス時に粉塵を取り除くことが容易になる。 In FIGS. 7 (A) and 7 (B), the dust collecting cover is the dust collecting cover part 700 shown by shading and hatching in FIG. 7 (A) and the dust collecting covered by shading and hatching in FIG. 7 (B). Includes cover parts 710. The dust collecting cover part 700 includes an upper surface portion 701, a side surface portion 702, a mounting portion 703, a bottom surface portion 704, a backflow prevention portion 705, and a back surface portion 706. The dust collection cover parts 700 and 710 are detachably engaged with each other by screws 720 and surround the transport roller 22. In FIGS. 7A and 7B, the dust collecting cover part 710 is shown transparently for the sake of simplicity, but the materials constituting the dust collecting cover part 710 are limited. Instead, any material can be used. The same applies to the dust collecting cover parts shown in FIGS. 8 (A) to 10 (B), which will be described later. In one example, the dust collector cover parts 700 and 710 are made of a non-magnetic material. This prevents the dust collection cover from being magnetized by the magnet and adhering to the dust, which makes it easy to remove the dust during maintenance.

上面部７０１は、搬送ローラ２２に載置されたマスクトレイ２０１の搬送を可能にしながら搬送ローラ２２の周面の上側の少なくとも一部を覆うように、上方周面を露出させる開口部を備える。上面部７０１は、鉛直方向（上下方向、Ｚ軸方向）で、搬送ローラ２２の周面の上側を覆っている。換言すると、鉛直方向で上方から見た時、搬送ローラ２２の周面の一部が、上面部７０１によって覆い隠されている。これによって、載置された基板の搬送を行いながら、集塵カバー内に溜まった粉塵が集塵カバー外に出ないようにすることができる。図７（Ａ）に示す上面部７０１は、搬送ローラ２２の回転軸と垂直な面でハの字型の形状をしている。具体的には、搬送方向に沿って並ぶ２つの上面部７０１の間に開口がある。それぞれの上面部７０１についてみると、開口側の端が、開口とは反対側の端よりも、鉛直方向において高い位置にある。すなわち、上面部７０１は、鉛直方向および搬送方向に対してローラ側に傾斜している一対の傾斜部であり、搬送ローラ２２の鉛直方向で上方の周面の接線と平行な角度を有する。これによって、集塵カバーの上面部に粉塵が堆積することを防ぐことができる。また、搬送されるマスクトレイ２０１が自重により撓み、上面部７０１に当接した際に、マスクトレイ２０１を搬送ローラ２２の上方周面に導くガイドとして動作することができる。 The upper surface portion 701 is provided with an opening that exposes the upper peripheral surface so as to cover at least a part of the upper side of the peripheral surface of the transport roller 22 while enabling the transfer of the mask tray 201 mounted on the transfer roller 22. The upper surface portion 701 covers the upper side of the peripheral surface of the transport roller 22 in the vertical direction (vertical direction, Z-axis direction). In other words, when viewed from above in the vertical direction, a part of the peripheral surface of the transport roller 22 is covered by the upper surface portion 701. As a result, it is possible to prevent the dust collected in the dust collection cover from coming out of the dust collection cover while transporting the mounted substrate. The upper surface portion 701 shown in FIG. 7A has a V-shaped shape on a plane perpendicular to the rotation axis of the transport roller 22. Specifically, there is an opening between two upper surface portions 701 arranged along the transport direction. Looking at each upper surface portion 701, the end on the opening side is higher in the vertical direction than the end on the side opposite to the opening. That is, the upper surface portion 701 is a pair of inclined portions inclined toward the roller side with respect to the vertical direction and the transport direction, and has an angle parallel to the tangent line of the upper peripheral surface in the vertical direction of the transport roller 22. This makes it possible to prevent dust from accumulating on the upper surface of the dust collection cover. Further, when the mask tray 201 to be transported bends due to its own weight and comes into contact with the upper surface portion 701, it can operate as a guide for guiding the mask tray 201 to the upper peripheral surface of the transport roller 22.

側面部７０２は、背面部７０６および上面部７０１と連結され、搬送ローラ２２の回転軸と平行な平面のうち、搬送ローラ２２の周面に対向する鉛直面を覆う。換言すると、側面部７０２は、搬送ローラ２２の回転軸方向（Ｙ軸方向）に垂直で、かつ、鉛直方向（Ｚ軸方向）に垂直な方向（Ｘ軸方向、搬送方向）で、搬送ローラ２２の周面を覆っている。すなわち、Ｘ軸方向から見ると、搬送ローラ２２の周面は側面部７０２によって覆い隠されている。また、側面部７０２は、集塵カバーパーツ７１０を支持する構造を有する。集塵カバーパーツ７００は取り付け部７０３を介して集塵カバーパーツ７００を搬送ローラ２２のシャフトカバー７５０に固定される。底面部７０４には、トレイ７１２の下方に配置される、マグネット７５１が配置される。逆流防止部７０５は、集塵カバーに溜まった粉塵が搬送ローラ２２の回転などによって生じた気流によって舞い上がり集塵カバー外に出ることを防ぐ。背面部７０６は、回転軸方向で、搬送ローラ２２のシャフト側の側面を覆い、側面部７０２、底面部７０４に連結される。 The side surface portion 702 is connected to the back surface portion 706 and the upper surface portion 701, and covers a vertical surface facing the peripheral surface of the transport roller 22 in a plane parallel to the rotation axis of the transport roller 22. In other words, the side surface portion 702 is perpendicular to the rotation axis direction (Y-axis direction) of the transfer roller 22 and in the direction perpendicular to the vertical direction (Z-axis direction) (X-axis direction, transfer direction). It covers the peripheral surface of. That is, when viewed from the X-axis direction, the peripheral surface of the transport roller 22 is covered by the side surface portion 702. Further, the side surface portion 702 has a structure for supporting the dust collecting cover part 710. In the dust collecting cover part 700, the dust collecting cover part 700 is fixed to the shaft cover 750 of the transport roller 22 via the mounting portion 703. A magnet 751 arranged below the tray 712 is arranged on the bottom surface portion 704. The backflow prevention unit 705 prevents the dust collected in the dust collection cover from flying up due to the air flow generated by the rotation of the transport roller 22 and the like and coming out of the dust collection cover. The back surface portion 706 covers the side surface of the transport roller 22 on the shaft side in the direction of the rotation axis, and is connected to the side surface portion 702 and the bottom surface portion 704.

続いて、図７（Ｂ）を参照して集塵カバーパーツ７１０の構成を説明する。集塵カバーパーツ７１０は、前面部７１１、トレイ７１２、および側面部７１３を含む。前面部７１１は、搬送ローラ２２の回転軸に垂直な面であって、基板側の面を覆う。前面部７１１は、搬送ローラ２２の回転軸方向で、搬送ローラ２２の基板側の側面を覆っている。換言すると、搬送ローラ２２の回転軸方向において、基板側から見たときに、送ローラ２２の基板側の側面が、前面部７１１によって覆い隠される。トレイ７１２は、搬送ローラ２２の下方に配置される。トレイ７１２は、上が開放された箱状の形状（凹形状）をしており、上方からの粉塵を効率よく溜めることができる搬送ローラ２２の下方周面を覆う。また、トレイ７１２は前面部７１１に連結される。側面部７１３は、集塵カバーパーツ７００の側面部７０２に着脱可能に連結される。 Subsequently, the configuration of the dust collecting cover part 710 will be described with reference to FIG. 7 (B). The dust collecting cover part 710 includes a front portion 711, a tray 712, and a side portion 713. The front surface portion 711 is a surface perpendicular to the rotation axis of the transport roller 22 and covers the surface on the substrate side. The front surface portion 711 covers the side surface of the transfer roller 22 on the substrate side in the direction of the rotation axis of the transfer roller 22. In other words, in the rotation axis direction of the transport roller 22, the side surface of the feed roller 22 on the substrate side is covered by the front surface portion 711 when viewed from the substrate side. The tray 712 is arranged below the transport roller 22. The tray 712 has a box-like shape (concave shape) with an open top, and covers the lower peripheral surface of the transport roller 22 capable of efficiently collecting dust from above. Further, the tray 712 is connected to the front surface portion 711. The side surface portion 713 is detachably connected to the side surface portion 702 of the dust collecting cover part 700.

これによって、集塵カバーに粉塵が溜まった際には、集塵カバーパーツ７１０を集塵カバーパーツ７００から取り外すことでトレイ７１２に溜まった粉塵を効率的に除去することができる。また、集塵カバーパーツ７１０は非磁性体でできており、マグネットは集塵カバーパーツ７００側に設けられている。このため、集塵カバーパーツ７１０を集塵カバーパーツ７００から取り外して、集塵カバーパーツ７１０から粉塵を除去する際には粉塵をトレイ７１２から取り除きやすい。 As a result, when dust is accumulated on the dust collection cover, the dust collected on the tray 712 can be efficiently removed by removing the dust collection cover part 710 from the dust collection cover part 700. Further, the dust collecting cover part 710 is made of a non-magnetic material, and a magnet is provided on the dust collecting cover part 700 side. Therefore, when the dust collecting cover part 710 is removed from the dust collecting cover part 700 and the dust is removed from the dust collecting cover part 710, it is easy to remove the dust from the tray 712.

続いて、図８（Ａ）および図８（Ｂ）を参照して、搬送ローラ２２と集塵カバーの構成の一例について説明する。集塵カバーは、図８（Ａ）で網掛けおよびハッチングで示す集塵カバーパーツ８００および図８（Ｂ）で網掛けおよびハッチングで示す集塵カバーパーツ８１０を含む。 Subsequently, an example of the configuration of the transport roller 22 and the dust collection cover will be described with reference to FIGS. 8 (A) and 8 (B). The dust collection cover includes the dust collection cover part 800 shown by shading and hatching in FIG. 8 (A) and the dust collection cover part 810 shown by shading and hatching in FIG. 8 (B).

集塵カバーパーツ８００は、側面部８０２、取り付け部８０３、底面部８０４、背面部８０６を含む。また、集塵カバーパーツ８１０は、上面部８０１、前面部８１１、トレイ８１２、および側面部８１３を含む。 The dust collecting cover part 800 includes a side surface portion 802, a mounting portion 803, a bottom surface portion 804, and a back surface portion 806. Further, the dust collecting cover part 810 includes an upper surface portion 801 and a front surface portion 811, a tray 812, and a side surface portion 813.

図７（Ａ）および７（Ｂ）では、上面部７０１が背面部７０６を備える集塵カバーパーツ７００に設けられていた。一方、図８（Ａ）および８（Ｂ）に示す集塵カバーパーツ８００および８１０では、上面部８０１が前面部８１１を備える集塵カバーパーツ８１０に設けられている。また、側面部８０２は図７（Ａ）に示す側面部７０２に比べて面積が小さい。このため、集塵カバーパーツ８１０を集塵カバーパーツ８００から取り外した場合に搬送ローラ２２のメンテナンスが容易となる。 In FIGS. 7A and 7B, the upper surface portion 701 is provided on the dust collecting cover part 700 provided with the back surface portion 706. On the other hand, in the dust collecting cover parts 800 and 810 shown in FIGS. 8A and 8B, the upper surface portion 801 is provided on the dust collecting cover part 810 provided with the front surface portion 811. Further, the side surface portion 802 has a smaller area than the side surface portion 702 shown in FIG. 7 (A). Therefore, when the dust collecting cover part 810 is removed from the dust collecting cover part 800, the maintenance of the transport roller 22 becomes easy.

続いて、図９（Ａ）および図９（Ｂ）を参照して、搬送ローラ２２と集塵カバーの構成の一例について説明する。集塵カバーは、図９（Ａ）で網掛けおよびハッチングで示す集塵カバーパーツ８００および図８（Ｂ）で網掛けおよびハッチングで示す集塵カバーパーツ８１０を含む。図９（Ａ）および図９（Ｂ）に示す集塵カバーにおいて、集塵カバーパーツ９００および９１０によって上面部が形成される。すなわち、上面部を形成するハの字型の二枚の板は、一方が集塵カバーパーツ９００に、他方が集塵カバーパーツ９１０に設けられる。 Subsequently, an example of the configuration of the transport roller 22 and the dust collection cover will be described with reference to FIGS. 9 (A) and 9 (B). The dust collection cover includes the dust collection cover part 800 shown by shading and hatching in FIG. 9A and the dust collection cover part 810 shown by shading and hatching in FIG. 8B. In the dust collecting cover shown in FIGS. 9 (A) and 9 (B), the upper surface portion is formed by the dust collecting cover parts 900 and 910. That is, the two V-shaped plates forming the upper surface portion are provided on the dust collecting cover part 900 on one side and on the dust collecting cover part 910 on the other side.

また、図１０（Ａ）および図１０（Ｂ）を参照して、搬送ローラ２２と集塵カバーの構成の一例について説明する。集塵カバーは、図１０（Ａ）で網掛けおよびハッチングで示す集塵カバーパーツ１０００および図１０（Ｂ）で網掛けおよびハッチングで示す集塵カバーパーツ１０１０を含む。図１０（Ａ）および図１０（Ｂ）に示すように、前面部は集塵カバーパーツ１０００および１０１０によって形成され、集塵カバーパーツ１０１０は集塵カバーパーツ１０００に対して着脱可能である。 Further, an example of the configuration of the transport roller 22 and the dust collection cover will be described with reference to FIGS. 10 (A) and 10 (B). The dust collecting cover includes the dust collecting cover part 1000 shown by shading and hatching in FIG. 10 (A) and the dust collecting cover part 1010 shown by shading and hatching in FIG. 10 (B). As shown in FIGS. 10A and 10B, the front surface portion is formed by the dust collecting cover parts 1000 and 1010, and the dust collecting cover part 1010 is removable from the dust collecting cover part 1000.

図７（Ａ）～図１０（Ｂ）に示す集塵カバーは、搬送ローラ２２の大きさ（直径）ごとに異なる集塵カバーが適用されてもよいし、搬送ローラ２２が配置される位置によって異なる集塵カバーが適用されてもよい。 As the dust collecting cover shown in FIGS. 7 (A) to 10 (B), a different dust collecting cover may be applied depending on the size (diameter) of the transport roller 22, or depending on the position where the transport roller 22 is arranged. Different dust covers may be applied.

＜他の実施形態＞
本実施形態では、搬送ローラ２２ごとに集塵カバーが設けられる。これは、搬送ローラ２２が搬送方向の異なる間隔で配置されるため、１つの集塵カバーが複数の搬送ローラを囲むようにすると、搬送ローラ２２の間隔に応じて異なる寸法の集塵カバーを設計する必要があるためである。しかしながら、１つの集塵カバーは、搬送方向で連続した複数の搬送ローラを囲むように設計されてもよい。例えば、搬送方向で連続した２つの搬送ローラの組が、搬送方向の異なる間隔で配置される場合には、１つの集塵カバーは搬送方向で連続した２つの搬送ローラを囲むように設計されてもよい。 <Other embodiments>
In this embodiment, a dust collecting cover is provided for each transport roller 22. This is because the transport rollers 22 are arranged at different intervals in the transport direction. Therefore, if one dust collecting cover surrounds a plurality of transport rollers, a dust collection cover having different dimensions is designed according to the spacing of the transport rollers 22. Because it is necessary to do. However, one dust collection cover may be designed to surround a plurality of transport rollers that are continuous in the transport direction. For example, if a set of two transport rollers that are continuous in the transport direction are arranged at different intervals in the transport direction, one dust collection cover is designed to surround the two transport rollers that are continuous in the transport direction. May be good.

発明は上記実施形態に制限されるものではなく、発明の精神及び範囲から離脱することなく、様々な変更及び変形が可能である。従って、発明の範囲を公にするために請求項を添付する。 The invention is not limited to the above embodiment, and various modifications and modifications can be made without departing from the spirit and scope of the invention. Therefore, a claim is attached to publicize the scope of the invention.

１ 成膜装置、２ 搬送ユニット、３ 蒸着ユニット、２２ 搬送ローラ、７００ 集塵カバーパーツ、７０１ 上面部、７１０ 集塵カバーパーツ、７５１ マグネット 1 film forming device, 2 transfer unit, 3 thin film deposition unit, 22 transfer roller, 700 dust collection cover parts, 701 top surface, 710 dust collection cover parts, 751 magnet

Claims (12)

基板を搬送しながら成膜するインライン型の成膜装置の搬送装置であって、
載置された基板を搬送する複数の搬送ローラと、
前記複数の搬送ローラごとに設けられ、前記搬送ローラを囲むカバーと、を備え、
前記カバーは、
前記搬送ローラの回転軸方向で、前記搬送ローラの前記基板側の側面を覆う前面部と、
鉛直方向で、前記搬送ローラの周面の上側を覆う上面部と、を含み、
前記上面部は、前記搬送ローラの前記周面の一部を露出させる開口を有する、
ことを特徴とする搬送装置。 It is a transport device of an in-line type film forming device that forms a film while transporting a substrate.
With multiple transport rollers that transport the mounted substrate,
A cover provided for each of the plurality of transport rollers and surrounding the transport rollers is provided.
The cover is
A front portion that covers the side surface of the transfer roller on the substrate side in the direction of the rotation axis of the transfer roller, and a front portion.
Including a top surface portion that covers the upper side of the peripheral surface of the transport roller in the vertical direction.
The upper surface portion has an opening that exposes a part of the peripheral surface of the transport roller.
A transport device characterized by that. 前記上面部は、基板の搬送方向に対して傾斜していることを特徴とする請求項１に記載の搬送装置。 The transport device according to claim 1, wherein the upper surface portion is inclined with respect to the transport direction of the substrate. 前記上面部は、前記搬送方向に沿って並ぶ第１の傾斜部と第２の傾斜部とを含み、
前記第１の傾斜部と前記第２の傾斜部の間に前記開口があり、
前記第１の傾斜部と前記第２の傾斜部とのそれぞれは、前記開口の側の端が、前記搬送方向において前記開口とは反対側の端よりも、前記鉛直方向において高くなるように傾斜していることを特徴とする請求項２に記載の搬送装置。 The upper surface portion includes a first inclined portion and a second inclined portion arranged along the transport direction.
There is the opening between the first inclined portion and the second inclined portion.
Each of the first inclined portion and the second inclined portion is inclined so that the end on the side of the opening is higher in the vertical direction than the end on the side opposite to the opening in the transport direction. The transport device according to claim 2, wherein the transport device is characterized by the above. 前記カバーは、前記回転軸方向に垂直で、かつ、前記鉛直方向に垂直な方向で、前記搬送ローラの前記周面を覆う側面部を備え、
前記前面部は、前記側面部から着脱可能であることを特徴とする請求項１から３の何れか１項に記載の搬送装置。 The cover includes a side surface portion that covers the peripheral surface of the transport roller in a direction perpendicular to the rotation axis direction and perpendicular to the vertical direction.
The transport device according to any one of claims 1 to 3, wherein the front surface portion is removable from the side surface portion. 前記上面部は、前記側面部に連結されていることを特徴とする請求項４に記載の搬送装置。 The transport device according to claim 4, wherein the upper surface portion is connected to the side surface portion. 前記上面部は、前記前面部に連結されていることを特徴とする請求項４に記載の搬送装置。 The transport device according to claim 4, wherein the upper surface portion is connected to the front surface portion. 前記カバーは、
前記搬送ローラの前記回転軸方向で、前記搬送ローラのシャフト側の側面を覆う背面部と、
前記搬送ローラの前記回転軸方向に垂直で、かつ、前記鉛直方向に垂直な方向で、前記搬送ローラの前記周面を覆う側面部と、
を備え、
前記側面部は、前記背面部に対して着脱可能であり、
前記前面部は前記側面部と連結されていることを特徴とする請求項１から３の何れか１項に記載の搬送装置。 The cover is
A back surface portion that covers the side surface of the transport roller on the shaft side in the direction of the rotation axis of the transport roller.
A side surface portion of the transport roller that covers the peripheral surface of the transport roller in a direction perpendicular to the rotation axis direction and perpendicular to the vertical direction.
Equipped with
The side surface portion is removable from the back surface portion and is removable.
The transport device according to any one of claims 1 to 3, wherein the front surface portion is connected to the side surface portion. 前記カバーは、前記搬送ローラの下方周面を覆うトレイを備え、
前記トレイは、前記前面部に連結されていることを特徴とする請求項１から７のいずれか１項に記載の搬送装置。 The cover comprises a tray covering the lower peripheral surface of the transport roller.
The transport device according to any one of claims 1 to 7, wherein the tray is connected to the front surface portion. 前記トレイの下方にマグネットが配置されることを特徴とする請求項８に記載の搬送装置。 The transport device according to claim 8, wherein a magnet is arranged below the tray. 基板を搬送しながら成膜するインライン型の成膜装置であって、
基板を搬送する搬送ユニットと、
前記搬送ユニットの下方に配置され、前記搬送ユニットによって搬送される基板に蒸着材料を放出する蒸着ユニットと、
を備え、
前記搬送ユニットは、
載置された基板を搬送する複数の搬送ローラと、
前記複数の搬送ローラごとに設けられ、前記搬送ローラを囲むカバーと、を備え、
前記カバーは、
前記搬送ローラの回転軸方向で、前記搬送ローラの前記基板側の側面を覆う前面部と、
鉛直方向で、前記搬送ローラの周面の上側を覆う上面部と、を含み、
前記上面部は、前記搬送ローラの前記周面の一部を露出させる開口を有する、
ことを特徴とする成膜装置。 It is an in-line type film forming device that forms a film while transporting a substrate.
A transport unit that transports the board and
A thin-film deposition unit that is placed below the transport unit and discharges the vapor-deposited material onto the substrate transported by the transport unit.
Equipped with
The transport unit is
With multiple transport rollers that transport the mounted substrate,
A cover provided for each of the plurality of transport rollers and surrounding the transport rollers is provided.
The cover is
A front portion that covers the side surface of the transfer roller on the substrate side in the direction of the rotation axis of the transfer roller, and a front portion.
Including a top surface portion that covers the upper side of the peripheral surface of the transport roller in the vertical direction.
The upper surface portion has an opening that exposes a part of the peripheral surface of the transport roller.
A film forming apparatus characterized by this. 請求項１から９のいずれか１項に記載の搬送装置によって前記基板を搬送する搬送工程と、
搬送される前記基板に蒸着材料を放出する蒸着工程と、を有する
ことを特徴とする成膜方法。 The transport step of transporting the substrate by the transport device according to any one of claims 1 to 9.
A film forming method comprising a vapor deposition step of discharging a vapor deposition material onto the substrate to be conveyed. 請求項１から９のいずれか１項に記載の搬送装置によって前記基板を搬送する搬送工程と、
搬送される前記基板に蒸着材料を放出する蒸着工程と、を有する
ことを特徴とする電子デバイスの製造方法。 The transport step of transporting the substrate by the transport device according to any one of claims 1 to 9.
A method for manufacturing an electronic device, comprising: a vapor deposition step of discharging a vapor deposition material onto the substrate to be conveyed.
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63171425A (en) * 1987-01-08 1988-07-15 Fuji Photo Film Co Ltd Manufacture of magnetic recording medium
JP2005046832A (en) * 2003-07-16 2005-02-24 Sekisui Chem Co Ltd Surface treatment apparatus
US20060196414A1 (en) * 2005-03-03 2006-09-07 Applied Films Gmbh & Co., Kg System for coating a substrate, and an insert element
JP2007204823A (en) * 2006-02-03 2007-08-16 Dainippon Printing Co Ltd Film deposition apparatus
JP2011513588A (en) * 2008-02-28 2011-04-28 アプライド マテリアルズ インコーポレイテッド Back coating prevention apparatus, coating chamber having back coating prevention apparatus, and coating method
JP2018172212A (en) * 2017-03-31 2018-11-08 平田機工株式会社 Roller assembly, roller unit and conveyor device

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11158630A (en) * 1997-11-26 1999-06-15 Shin Meiwa Ind Co Ltd Vacuum transporting device
JP5042206B2 (en) 2008-12-18 2012-10-03 株式会社アルバック Substrate transfer apparatus and film forming apparatus using the same
TW201346050A (en) * 2012-02-06 2013-11-16 Tokyo Electron Ltd Film-forming apparatus and film-forming method
TWI575330B (en) * 2012-03-27 2017-03-21 尼康股份有限公司 Mask transferring apparatus, mask holding apparatus, substrate processing apparatus, and device manufacturing method
JP5951532B2 (en) 2013-03-12 2016-07-13 住友重機械工業株式会社 Deposition equipment
JP2020152954A (en) * 2019-03-19 2020-09-24 東レエンジニアリング株式会社 Film deposition apparatus
JP7324028B2 (en) * 2019-03-28 2023-08-09 日東電工株式会社 Glass substrate conveying device, laminated glass manufacturing device, and laminated glass manufacturing method

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63171425A (en) * 1987-01-08 1988-07-15 Fuji Photo Film Co Ltd Manufacture of magnetic recording medium
JP2005046832A (en) * 2003-07-16 2005-02-24 Sekisui Chem Co Ltd Surface treatment apparatus
US20060196414A1 (en) * 2005-03-03 2006-09-07 Applied Films Gmbh & Co., Kg System for coating a substrate, and an insert element
JP2006257546A (en) * 2005-03-03 2006-09-28 Applied Films Gmbh & Co Kg System for coating substrate, and insert element
JP2007204823A (en) * 2006-02-03 2007-08-16 Dainippon Printing Co Ltd Film deposition apparatus
JP2011513588A (en) * 2008-02-28 2011-04-28 アプライド マテリアルズ インコーポレイテッド Back coating prevention apparatus, coating chamber having back coating prevention apparatus, and coating method
JP2018172212A (en) * 2017-03-31 2018-11-08 平田機工株式会社 Roller assembly, roller unit and conveyor device

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