JPH11158630A - Vacuum transporting device - Google Patents

Vacuum transporting device

Info

Publication number
JPH11158630A
JPH11158630A JP32473597A JP32473597A JPH11158630A JP H11158630 A JPH11158630 A JP H11158630A JP 32473597 A JP32473597 A JP 32473597A JP 32473597 A JP32473597 A JP 32473597A JP H11158630 A JPH11158630 A JP H11158630A
Authority
JP
Japan
Prior art keywords
vacuum
vacuum chamber
rotating
rail
vessel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP32473597A
Other languages
Japanese (ja)
Inventor
Shinichi Yamabe
真一 山辺
Jiro Kawashima
二郎 川島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinmaywa Industries Ltd
Original Assignee
Shin Meiva Industry Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Meiva Industry Ltd filed Critical Shin Meiva Industry Ltd
Priority to JP32473597A priority Critical patent/JPH11158630A/en
Publication of JPH11158630A publication Critical patent/JPH11158630A/en
Withdrawn legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PROBLEM TO BE SOLVED: To decrease the sliding wearing parts in a vacuum chamber as few as possible, to drastically suppress the dust generation in the vacuum chamber and to prolong the life of the wearing parts in the vacuum chamber in the case of deposition of a substrate W by arranging plural revolving rollers supporting a body to be transported at right and left ends to the right and left side walls of the vacuum chamber 2 within a vacuum vessel for sputtering deposition in a line along the respective transport direction, rotating the same synchronously with these revolving rollers and putting the body to be transported into and out of the inside of the vacuum chamber. SOLUTION: The respective revolving shafts 13 of the plural revolving rollers 8, 8,... in the vacuum chamber 2 are projected airtightly through the side wall part 1a of the vessel 1 to the outside of the vessel 1 and driven side toothed pulleys 14 are fixed to the shaft ends thereof. Toothed belts are wound around the respective driven side toothed pulleys 14 and the driving side toothed pulleys 21 on the outside of the vacuum vessel 1 driven and connected to a drive motor 18. The outside of the vacuum vessel 1 is thereby provided with a synchronous rotating drive mechanism 10 for synchronously rotating the plural revolving rollers 8, 8.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、真空容器内の真空
室で被搬送体を搬送する真空搬送装置に関し、特に、そ
の搬送に伴う発塵を防止するための技術分野に属する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum transfer apparatus for transferring an object to be transferred in a vacuum chamber in a vacuum vessel, and more particularly to a technical field for preventing generation of dust accompanying the transfer.

【0002】[0002]

【従来の技術】一般に、工業用材料等の表面に薄膜を形
成するインライン型の成膜装置においては、その材料を
パレット等の被搬送体に支持した状態で、その被搬送体
を複数の真空容器(入口槽、加熱槽、分配槽、処理槽、
出口槽等)内の各真空室に順に搬入出させながら材料等
に対する成膜を行うようになっている。
2. Description of the Related Art Generally, in an in-line type film forming apparatus for forming a thin film on a surface of an industrial material or the like, a material to be transferred is supported by a pallet or the like and a plurality of vacuums are applied to the material to be transferred. Containers (inlet tank, heating tank, distribution tank, processing tank,
A film is formed on a material and the like while being sequentially carried into and out of each vacuum chamber in an outlet tank or the like.

【0003】このように、真空容器内の真空室で被搬送
体を搬送する真空搬送に用いられる真空搬送装置とし
て、従来、実公平5―38054号公報に示されるよう
に、真空室内の対向する左右側壁部に、被搬送体を左右
端部にて上載支持する複数の回転ローラをそれぞれ被搬
送体の搬送方向に沿って1列に並んで配置するととも
に、この左右各列の回転ローラ近くの真空室の側壁部に
それぞれ搬送方向に沿って延びる左右1対の駆動軸を支
持して、この各駆動軸と各列の回転ローラとをそれぞれ
傘歯車機構によって連結し、左右の駆動軸を真空容器外
からモータ等により回転駆動することで、複数の回転ロ
ーラを同期回転させて、その上に載置される被搬送体を
搬送するようにしたものが提案されている。
[0003] As described above, as disclosed in Japanese Utility Model Publication No. 5-38054, a conventional vacuum transfer apparatus used for vacuum transfer for transferring an object to be transferred in a vacuum chamber in a vacuum chamber is provided. On the left and right side wall portions, a plurality of rotary rollers for supporting the transported body on the left and right ends are arranged in a row along the transport direction of the transported body, and the rotating rollers near the rotary rollers in each of the left and right rows are arranged. A pair of left and right drive shafts extending along the transport direction are respectively supported on the side walls of the vacuum chamber, and the respective drive shafts and the rotating rollers in each row are connected by bevel gear mechanisms, respectively. There has been proposed an apparatus in which a plurality of rotating rollers are synchronously rotated by being rotationally driven by a motor or the like from the outside of the container to convey an object placed thereon.

【0004】[0004]

【発明が解決しようとする課題】しかし、上記従来のも
のでは、真空室内に回転ローラを同期回転させるための
駆動軸や傘歯車機構が収容されているので、真空室の容
積が大きくなって、排気性能が低下するばかりでなく、
真空室での摺動摩耗部分が多く、その摺動摩耗部分から
の発塵によって成膜に悪影響を及ぼす上に、真空室内に
ある摩耗部品の寿命が短く、その交換メンテナンスのた
めの間隔が短くなるという問題があり、さらに改良の余
地があった。
However, in the above-mentioned conventional apparatus, since the drive shaft and the bevel gear mechanism for synchronously rotating the rotating rollers are housed in the vacuum chamber, the volume of the vacuum chamber becomes large. Not only does the exhaust performance drop,
There are many sliding wear parts in the vacuum chamber, and dust generation from the sliding wear parts adversely affects film formation.In addition, the life of wear parts in the vacuum chamber is short, and the interval for replacement maintenance is short. And there was room for further improvement.

【0005】本発明は斯かる点に鑑みてなされたもので
あり、その目的は、上記した真空室内の複数の回転ロー
ラを同期回転させる機構を改良することにより、真空室
の容積を小さくするとともに、真空室内での摺動摩耗部
分を可及的に少なくして、真空室での発塵を大幅に抑制
し、真空室内の摩耗部品の長寿命化を図ることにある。
SUMMARY OF THE INVENTION The present invention has been made in view of the foregoing, and an object of the present invention is to reduce the volume of a vacuum chamber by improving the mechanism for synchronously rotating a plurality of rotating rollers in the vacuum chamber. Another object of the present invention is to minimize the sliding wear portion in the vacuum chamber as much as possible, greatly reduce dust generation in the vacuum chamber, and extend the life of wear parts in the vacuum chamber.

【0006】[0006]

【課題を解決するための手段】上記の目的を達成するた
めに、この発明では、回転ローラのみを真空室内に配置
し、その複数の回転ローラを同期回転させるための機構
は真空容器の外部に配置するようにした。
In order to achieve the above object, according to the present invention, only a rotating roller is disposed in a vacuum chamber, and a mechanism for synchronously rotating the plurality of rotating rollers is provided outside the vacuum vessel. It was arranged.

【0007】具体的には、請求項1の発明では、真空容
器内の真空室で被搬送体を搬送するようにした真空搬送
装置を前提とする。
More specifically, the invention of claim 1 is based on the premise of a vacuum transfer device that transfers a transferred object in a vacuum chamber in a vacuum vessel.

【0008】そして、上記真空室の対向する左右側壁部
にそれぞれ上記被搬送体の搬送方向に沿って並んで回転
可能に軸支され、被搬送体を左右端部にて移動可能に支
持する複数の回転ローラと、真空容器の外側に設けら
れ、上記複数の回転ローラを同期して回転させる同期回
転駆動機構とを備えたことを特徴としている。
[0008] A plurality of supporting members are rotatably supported side by side on the opposite left and right side walls of the vacuum chamber along the conveying direction of the conveyed object, and movably support the conveyed object at the left and right ends. And a synchronous rotation drive mechanism provided outside the vacuum vessel and synchronously rotating the plurality of rotation rollers.

【0009】上記の構成により、被搬送体を搬送すると
き、真空室の左右側壁部にそれぞれ被搬送体の搬送方向
に沿って並んで配置されている複数の回転ローラが同期
回転駆動機構の作動により同期して回転し、この複数の
回転ローラの同期回転により、被搬送体がその左右端部
を複数の回転ローラに支持された状態で順に搬送方向に
送られる。このことで被搬送体が真空室内を搬送され
る。
With the above arrangement, when the object to be transferred is transferred, a plurality of rotating rollers arranged side by side along the transfer direction of the transferred object on the left and right side walls of the vacuum chamber respectively operate the synchronous rotation drive mechanism. , And the conveyed objects are sequentially fed in the conveying direction by the synchronous rotation of the plurality of rotating rollers, with the left and right ends thereof supported by the plurality of rotating rollers. As a result, the transferred object is transferred in the vacuum chamber.

【0010】そのとき、上記複数の回転ローラを同期回
転させる同期回転駆動機構は真空容器の外側に設けら
れ、真空室内には複数の回転ローラのみが配置されてい
るので、同期回転駆動機構の摺動摩耗部分は真空室外に
位置し、真空室内では各回転ローラと被搬送体との接触
部分のみが摺動部分となる。このため、真空室内での摺
動摩耗部分からの発塵は極めて少なくなり、その発塵に
よる成膜処理等への悪影響を防止することができる。し
かも、真空室内にある摩耗部品の寿命を延ばすことがで
き、その交換メンテナンスの間隔を長くすることができ
る。
At this time, the synchronous rotation drive mechanism for synchronously rotating the plurality of rotation rollers is provided outside the vacuum vessel, and only the plurality of rotation rollers are disposed in the vacuum chamber. The moving wear portion is located outside the vacuum chamber, and only the contact portion between each rotating roller and the conveyed body becomes a sliding portion in the vacuum chamber. For this reason, the generation of dust from the sliding wear portion in the vacuum chamber is extremely reduced, and it is possible to prevent the dust from adversely affecting the film forming process and the like. In addition, the life of the wear parts in the vacuum chamber can be extended, and the interval between replacement maintenance can be extended.

【0011】請求項2の発明では、上記被搬送体の左右
端部に、それぞれ被搬送体の搬送方向に沿って互いに平
行に延びかつ回転ローラ上に載置されるレールを設け
て、回転ローラの回転により該回転ローラ上をレールが
送られて被搬送体が移動するように構成する。また、上
記回転ローラ外周において上記レールが載置される上端
以外の部分、ないし上記レールの下面及び左右両側面を
覆う遮蔽カバーを設ける。
According to a second aspect of the present invention, rails extending parallel to each other along the transport direction of the transported object and mounted on the rotary roller are provided at the left and right ends of the transported object, respectively. The rail is fed on the rotating roller by the rotation of, so that the transported object moves. In addition, a shielding cover is provided on the outer periphery of the rotating roller, which covers a portion other than the upper end on which the rail is mounted, or the lower surface and both right and left side surfaces of the rail.

【0012】こうすれば、上記回転ローラ外周における
上端以外の部分、ないしレールの下面及び左右両側面が
遮蔽カバーによって遮蔽されるので、例えば成膜部から
真空室内を飛来する成膜材料の蒸発成分が上記回転ロー
ラやレールに付着するのを遮蔽カバーで防止できる。こ
のため、その回転ローラやレールに付着した成膜付着物
による発塵を低減できるとともに、その清掃期間をも短
くすることができる。
[0012] With this arrangement, the portion other than the upper end of the outer periphery of the rotary roller, or the lower surface and the left and right side surfaces of the rail are shielded by the shielding covers, so that, for example, the evaporation component of the film-forming material flying from the film-forming section into the vacuum chamber. Can be prevented from adhering to the rotating roller and the rail by the shielding cover. For this reason, it is possible to reduce the generation of dust due to the deposited film adhered to the rotating roller or the rail, and to shorten the cleaning period.

【0013】その場合、請求項3の発明では、上記回転
ローラ外周の上端以外の部分ないしレールの下面及び左
右両側面と遮蔽カバーとの間に、気体分子の侵入による
真空放電不可能な微小間隔(例えば2〜5mm)の空隙
をあける構造とする。このことで、回転ローラ外周の上
端以外の部分ないしレールの下面及び左右両側面と遮蔽
カバーとの間の空隙に上記成膜材料等が回り込んで侵入
して回転ローラやレールに付着するのを防止できる。し
かも、上記空隙に気体分子も入り込み難くなり、その気
体分子による真空放電により回転ローラやレールが成膜
されて発塵の元となる副生成物を生成しなくなり、これ
らによって真空室での発塵をさらに低減することができ
る。
In this case, according to the third aspect of the present invention, a minute gap where vacuum discharge is impossible due to intrusion of gas molecules between a portion other than the upper end of the outer periphery of the rotary roller, the lower surface of the rail, and both right and left side surfaces and the shielding cover. (For example, 2 to 5 mm). This prevents the film-forming material or the like from entering the space other than the upper end of the outer periphery of the rotating roller or the gap between the lower surface and the left and right side surfaces of the rail and the shielding cover and entering and adhering to the rotating roller and the rail. Can be prevented. In addition, gas molecules are less likely to enter the gap, and the vacuum discharge by the gas molecules forms a film on the rotating roller and rail, so that by-products that are a source of dust are not generated, thereby generating dust in the vacuum chamber. Can be further reduced.

【0014】請求項4の発明では、上記同期回転駆動機
構は、回転ローラの回転軸の真空容器外側端部にそれぞ
れ取付固定された複数の従動側歯付プーリと、駆動手段
に連結された駆動側歯付プーリと、上記駆動側及び複数
の従動側歯付プーリに巻き掛けられた歯付ベルトとを備
えたものとする。こうすると、同期回転駆動機構の望ま
しい構成が容易に得られる。
According to a fourth aspect of the present invention, the synchronous rotary drive mechanism includes a plurality of driven toothed pulleys fixedly mounted on the outer end of the rotary shaft of the rotary roller at the outer side of the vacuum vessel, and a drive connected to the drive means. It is provided with a side toothed pulley and a toothed belt wound around the driving side and a plurality of driven side toothed pulleys. In this case, a desirable configuration of the synchronous rotation drive mechanism can be easily obtained.

【0015】[0015]

【発明の実施の形態】図1、図3及び図4は本発明の実
施形態に係る真空搬送装置を示し、1は図3及び図4で
左右方向に延びる断面矩形箱状のスパッタ処理用真空容
器で、この真空容器1は例えば他の処理を行う同様の2
つの真空容器(図示せず)に接続されていて、インライ
ン型のスパッタ装置を構成しており、真空容器1の内部
には真空室2が形成されている。また、図示しないが、
真空容器1の長さ方向の一端部には、入口側ゲート弁に
より開閉されかつ隣接する一方の真空容器に連通する入
口部が、また他端部には、出口側ゲート弁により開閉さ
れかつ隣接する他方の真空容器に連通する出口部がそれ
ぞれ開口されており、これらの各ゲート弁を開いた状態
で、ワークとしてのスパッタ成膜用基板Wを支持した被
搬送体40を真空室2内に搬入出し、また両ゲート弁の
閉じ状態で真空室2内を真空状態にするようにしてい
る。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIGS. 1, 3 and 4 show a vacuum transfer apparatus according to an embodiment of the present invention, and 1 is a vacuum for sputtering processing having a rectangular cross section extending in the left-right direction in FIGS. The vacuum vessel 1 is a similar vessel for performing other processing, for example.
The vacuum chamber 1 is connected to two vacuum vessels (not shown) to constitute an in-line type sputtering apparatus. A vacuum chamber 2 is formed inside the vacuum vessel 1. Although not shown,
At one end in the longitudinal direction of the vacuum vessel 1, an inlet is opened and closed by an inlet-side gate valve and communicates with one adjacent vacuum vessel, and at the other end is opened and closed by an outlet-side gate valve and is adjacent to the other. Each of the outlets communicating with the other vacuum vessel is opened, and in a state where each of these gate valves is opened, the transferred object 40 supporting the sputtering film formation substrate W as a work is placed in the vacuum chamber 2. The inside of the vacuum chamber 2 is brought into a vacuum state when carrying in and out, and both gate valves are closed.

【0016】上記真空容器1内の真空室2の底壁部に
は、ターゲット4及び磁石5,5,…を有するスパッタ
成膜部6が設けられており、真空室2の真空状態でスパ
ッタ成膜部6を作動させることで、被搬送体40に支持
されている基板Wに対しスパッタ成膜をするようになっ
ている。
A sputtering chamber 6 having a target 4 and magnets 5, 5,... Is provided on the bottom wall of the vacuum chamber 2 in the vacuum chamber 1. By operating the film unit 6, a sputter film is formed on the substrate W supported by the transferred object 40.

【0017】上記被搬送体40はスパッタ成膜対象であ
る基板W(ワーク)を支持して真空室2を移動するもの
で、真空容器1の長さ方向に沿って長い矩形板状の部材
からなり、その左右幅中間部には開口41が形成され、
この開口41の部分には基板Wが下面成膜部をさらすよ
うに載置されている。また、被搬送体40の左右端部下
面にはそれぞれ真空容器1の長さ方向(被搬送体40の
搬送方向)に互いに平行に延びる左右1対のレール4
2,42が一体に形成されている。
The transferred object 40 moves in the vacuum chamber 2 while supporting a substrate W (work) to be formed by sputtering. The transferred object 40 is formed of a rectangular plate-like member that is long along the length of the vacuum vessel 1. The opening 41 is formed in the middle part of the left and right width,
The substrate W is placed on the opening 41 so as to expose the lower surface film forming portion. A pair of left and right rails 4 extending parallel to each other in the length direction of the vacuum vessel 1 (the direction of transport of the transported object 40) are provided on the lower surfaces of the left and right end portions of the transported object 40, respectively.
2, 42 are integrally formed.

【0018】上記真空容器1の対向する左右側壁部1
a,1aの一方には、水平方向の軸心を有しかつ真空室
2内に臨む同径の複数の回転ローラ8,8,…が、また
他方には同様に同じ数の回転ローラ8,8,…がそれぞ
れ同じ高さ位置を被搬送体40の搬送方向に沿って一定
間隔をあけて並んだ状態で配置され、これら左右側壁部
1a,1aの回転ローラ8,8,…同士は互いに対応し
た位置に位置付けられている。そして、この左右に対応
する回転ローラ8,8同士の間隔は上記被搬送体40の
左右のレール42,42の間隔と同じとされており、被
搬送体40の左右のレール42,42をそれぞれ左右に
対応する回転ローラ8,8,…上に載置することで、回
転ローラ8,8,…により被搬送体40を左右端部にて
移動可能に支持し、この状態で各回転ローラ8の同期回
転により該回転ローラ8上でレール42を送って被搬送
体40を移動させ、真空室2で基板Wを搬送するように
している。
Right and left side wall portions 1 of the vacuum vessel 1 facing each other.
a, 1a have a plurality of rotating rollers 8, 8,... having a horizontal axis and facing the vacuum chamber 2 and having the same diameter, and the other has the same number of rotating rollers 8, Are arranged at the same height position at regular intervals along the transport direction of the transported body 40, and the rotating rollers 8, 8,... Of the left and right side wall portions 1a, 1a are mutually connected. It is located in the corresponding position. The interval between the left and right rotating rollers 8, 8 is the same as the interval between the left and right rails 42, 42 of the transported body 40. By being mounted on the left and right rotating rollers 8, 8,..., The transported body 40 is movably supported at the left and right ends by the rotating rollers 8, 8,. The rail 42 is fed on the rotating roller 8 by the synchronous rotation of the transfer roller 40 to move the transfer target 40, and the substrate W is transferred in the vacuum chamber 2.

【0019】真空容器1の外側には、上記複数の回転ロ
ーラ8,8,…を同期して回転させる歯付ベルト伝動機
構からなる同期回転駆動機構10が設けられている。す
なわち、上記各回転ローラ8は、真空容器1の側壁部1
aをシール部材11によって気密状にかつ回転可能に貫
通する水平方向の回転軸13の内端部(真空容器1内側
の端部)に回転一体に取付固定されている。この各回転
軸13の外端部(真空容器1外側の端部)には従動側歯
付プーリ14が回転一体に取付固定され、これら複数の
従動側歯付プーリ14,14,…の径及び歯数は互いに
同じとされている。
On the outside of the vacuum container 1, there is provided a synchronous rotation drive mechanism 10 comprising a toothed belt transmission mechanism for synchronously rotating the plurality of rotating rollers 8, 8,. That is, each of the rotating rollers 8 is attached to the side wall 1 of the vacuum vessel 1.
a is rotatably attached and fixed to an inner end (an end inside the vacuum vessel 1) of a horizontal rotating shaft 13 which penetrates a through a seal member 11 in an airtight manner and rotatably. A driven toothed pulley 14 is attached and fixed to the outer end (the end outside the vacuum vessel 1) of each rotary shaft 13 so as to rotate integrally therewith. The diameters of the plurality of driven toothed pulleys 14, 14,. The number of teeth is the same as each other.

【0020】一方、真空容器1の長さ方向一端部の上面
には左右水平方向に延びる駆動軸16が左右の軸受部1
7,17によって回転可能に支持され、この駆動軸16
の端部は真空容器1の左右側壁部1a,1aよりも幅方
向外側に突出している。この駆動軸16の一端部には駆
動手段としての正逆転可能な駆動モータ18の出力軸が
ギヤボックス19内のギヤ機構(図示せず)を介して駆
動連結されている。さらに、駆動軸16の両端部にはそ
れぞれ左右の駆動側歯付プーリ21,21が回転一体に
取付固定され、この左右の駆動側歯付プーリ21,21
と、上記真空容器1の側壁部1a外側の左右の複数の従
動側歯付プーリ14,14,…との間にはそれぞれ歯付
ベルト22,22が巻き掛けられており、駆動モータ1
8の作動により駆動軸16を駆動側歯付プーリ21,2
1と共に回転させて、その駆動側歯付プーリ21,21
の回転により歯付ベルト22,22を介して左右の複数
の従動側歯付プーリ14,14,…を同じ方向に回転さ
せることにより、この各従動側歯付プーリ14に回転軸
13を介して回転一体に連結されている回転ローラ8を
他の回転ローラ8,8,…と同じ回転速度で同期して回
転させ、その上の被搬送体40を送り移動させるように
している。尚、図中、23〜26は各歯付ベルト22を
各歯付プーリ14,21に巻き付けるためにサーペンタ
イン状に彎曲させるガイドプーリである。
On the other hand, a drive shaft 16 extending horizontally in the left-right direction is provided on the upper surface of one end in the longitudinal direction of the vacuum vessel 1.
7, 17 rotatably supported by the drive shaft 16
Are protruded outward in the width direction from the left and right side walls 1a, 1a of the vacuum vessel 1. An output shaft of a drive motor 18 that can be rotated forward and backward as drive means is drivingly connected to one end of the drive shaft 16 via a gear mechanism (not shown) in a gear box 19. Further, right and left drive-side toothed pulleys 21 and 21 are fixed to both ends of the drive shaft 16 so as to rotate integrally therewith.
And a plurality of right and left driven toothed pulleys 14, 14,... On the outside of the side wall 1 a of the vacuum vessel 1, respectively.
8, the drive shaft 16 is moved to the drive-side toothed pulleys 21 and
1 and the drive-side toothed pulleys 21, 21
Are rotated in the same direction via the toothed belts 22, 22 via the toothed belts 22, 22, so that the driven toothed pulleys 14, 14,. The rotating roller 8 connected integrally with the rotation is rotated synchronously with the other rotating rollers 8, 8,... At the same rotational speed, and the transported object 40 thereon is fed and moved. In the drawing, reference numerals 23 to 26 denote guide pulleys which bend in a serpentine shape in order to wind each toothed belt 22 around each toothed pulley 14, 21.

【0021】また、図1に示すように、真空容器1の側
壁部1a内面には、上記回転軸13を気密シールするシ
ール部材11の真空室2内側部分、各回転ローラ8外周
において上記被搬送体40下面の各レール42が載置さ
れる上端以外の部分、ないし上記レール42の下面及び
左右両側面を覆う金属製の遮蔽カバー27が取り付けら
れている。この遮蔽カバー27は、シール部材11の真
空室2内側部分を密着して覆う断面矩形状の第1カバー
28と、この第1カバー28の下面に固定された断面略
L字状の第2カバー29とに分割され、第1カバー28
の真空室2中央側先端面と第2カバー29との間に、上
記レール42を収容するための溝状のレール収容部30
と、この溝状レール収容部30の底面に部分的に開口
し、各回転ローラ8を収容するための円柱空間からなる
ローラ収容部31とが形成されている。
As shown in FIG. 1, the inner surface of the side wall 1a of the vacuum vessel 1 has a portion inside the vacuum chamber 2 of a sealing member 11 for hermetically sealing the rotating shaft 13 and the outer periphery of each rotating roller 8 to be transported. A metal shielding cover 27 that covers the lower surface of the body 40 other than the upper end on which the rails 42 are mounted, or the lower surface and the left and right side surfaces of the rail 42 is attached. The shielding cover 27 includes a first cover 28 having a rectangular section and covering the inside of the vacuum chamber 2 of the seal member 11 in close contact, and a second cover having a substantially L-shaped section fixed to the lower surface of the first cover 28. 29 and the first cover 28
A groove-shaped rail accommodating portion 30 for accommodating the rail 42 is provided between the center end surface of the vacuum chamber 2 and the second cover 29.
And a roller accommodating portion 31 which is partially open on the bottom surface of the grooved rail accommodating portion 30 and is formed of a cylindrical space for accommodating each of the rotating rollers 8.

【0022】そして、図2に拡大詳示するように、上記
遮蔽カバー27におけるレール収容部30とその内部に
収容されるレール42との間、及び遮蔽カバー27の各
ローラ収容部31とその内部に収容される各回転ローラ
8との間、すなわち各回転ローラ8外周の上端以外の部
分ないしレール42の下面及び左右両側面と遮蔽カバー
27との間には、気体分子の侵入による真空放電不可能
な微小間隔dの空隙33があけられている。すなわち、
この空隙33の間隔dはd=2〜5mmの範囲に設定さ
れ、この範囲内で真空室2の真空圧に応じて適宜変更さ
れる。
As shown in detail in FIG. 2, between the rail accommodating portion 30 of the shielding cover 27 and the rail 42 accommodated therein, and between the roller accommodating portions 31 of the shielding cover 27 and the interior thereof. A vacuum discharge due to intrusion of gas molecules between each of the rotating rollers 8 accommodated in the cover, that is, between a portion other than the upper end of the outer periphery of each of the rotating rollers 8 or the lower surface and both right and left side surfaces of the rail 42 and the shielding cover 27. Voids 33 with possible minute intervals d are provided. That is,
The interval d of the gap 33 is set in a range of d = 2 to 5 mm, and is appropriately changed within this range according to the vacuum pressure of the vacuum chamber 2.

【0023】したがって、この実施形態においては、真
空容器1内の真空室2が真空状態にあるとき、その入口
側ゲート弁の開弁により真空容器1の入口が開かれて、
真空室2が隣接する一方の真空容器内に連通される。こ
の状態で、真空容器1の入口から基板Wを支持した被搬
送体40が真空室2に搬入されると、この搬入に伴い、
真空室2の左右側面にそれぞれ搬送方向に沿って並んで
配置されている複数の回転ローラ8,8,…が駆動モー
タ18の作動により同期して同じ方向に同じ速度で回転
し、この複数の回転ローラ8,8,…の回転により、被
搬送体40がその左右端部下面のレール42,42をそ
れぞれ搬送方向に並んだ複数の回転ローラ8,8,…に
上載支持せしめた状態で搬送方向に送られ、このことで
被搬送体40が基板Wと共に真空室2内まで搬送され
る。このとき、真空容器1の側壁部1a内面に遮蔽カバ
ー27が取り付けられているので、この各遮蔽カバー2
7のレール収容部30に上記被搬送体40の左右端部に
固定した各レール42が収容される。また、各遮蔽カバ
ー27の各ローラ収容部31には各回転ローラ8が収容
されている。
Therefore, in this embodiment, when the vacuum chamber 2 in the vacuum vessel 1 is in a vacuum state, the inlet of the vacuum vessel 1 is opened by opening the inlet-side gate valve,
A vacuum chamber 2 communicates with one of the adjacent vacuum vessels. In this state, when the transported object 40 supporting the substrate W is loaded into the vacuum chamber 2 from the entrance of the vacuum vessel 1,
A plurality of rotary rollers 8, 8,... Arranged on the left and right side surfaces of the vacuum chamber 2 along the transport direction respectively rotate in the same direction at the same speed by the operation of the drive motor 18, and the plurality of rotary rollers 8, 8,. By the rotation of the rotating rollers 8, 8,..., The transported body 40 is transported in a state where the rails 42, 42 on the lower surfaces of the left and right ends thereof are mounted on the plurality of rotating rollers 8, 8,. The transported object 40 is transported together with the substrate W into the vacuum chamber 2. At this time, since the shielding cover 27 is attached to the inner surface of the side wall 1a of the vacuum vessel 1,
Each of the rails 42 fixed to the left and right ends of the transported body 40 is accommodated in the rail accommodation section 30 of No. 7. In addition, each of the rotation rollers 8 is accommodated in each of the roller accommodation portions 31 of each of the shielding covers 27.

【0024】この後、入口側ゲート弁の閉弁により真空
容器1の入口が閉じられて真空室2が密閉された後、そ
の真空室2の真空圧が所定圧になり、その真空状態でス
パッタ成膜部6が作動して、そのターゲット4から飛び
出した成膜材料成分が基板Wに蒸着して基板Wの成膜処
理が行われる。
Thereafter, the inlet of the vacuum vessel 1 is closed by closing the gate valve on the inlet side, and the vacuum chamber 2 is sealed. After that, the vacuum pressure in the vacuum chamber 2 becomes a predetermined pressure. The film forming unit 6 is operated, and the film forming material component that has protruded from the target 4 is deposited on the substrate W, and the film forming process on the substrate W is performed.

【0025】その際、上記のように、遮蔽カバー27の
レール収容部30に被搬送体40の各レール42が、ま
た各ローラ収容部31に各回転ローラ8がそれぞれ収容
されているので、各レール42の下面及び左右両側面、
各回転ローラ8外周においてレール42が載置される上
端以外の部分がいずれも遮蔽カバー27により覆われる
こととなる。このことで、成膜のためにスパッタ成膜部
6のターゲット4から真空室2内を飛来する成膜材料の
蒸発成分が上記各回転ローラ8や各レール42に付着す
るのを遮蔽カバー27によって防止することができる。
しかも、上記各回転ローラ8外周の上端以外の部分ない
しレール42の下面及び左右両側面と遮蔽カバー27と
の間の空隙33は微小間隔d(d=2〜5mm)である
ので、この空隙33に成膜材料が回り込んで侵入して回
転ローラ8やレール42に付着するのを防止することが
できる。また同時に、上記空隙33に真空室2内の気体
分子も入り込み難くなり、その気体分子による真空放電
により回転ローラ8やレール42が成膜されて発塵の元
となる副生成物を生成せず、これらによって真空室2で
の発塵をさらに低減することができる。その結果、回転
ローラ8やレール42に付着した成膜付着物による発塵
を大幅に低減できるとともに、その清掃期間をも短くす
ることができる。
At this time, as described above, the rails 42 of the transported body 40 are accommodated in the rail accommodating portion 30 of the shielding cover 27, and the rotating rollers 8 are accommodated in the roller accommodating portions 31, respectively. The underside of the rail 42 and the left and right sides,
Any portion other than the upper end on which the rail 42 is mounted on the outer periphery of each rotating roller 8 is covered with the shielding cover 27. Thus, the shielding cover 27 prevents the evaporation component of the film-forming material flying from the target 4 of the sputter film-forming unit 6 into the vacuum chamber 2 from adhering to each of the rotating rollers 8 and each of the rails 42. Can be prevented.
Moreover, the gap 33 between the shielding cover 27 and the portion other than the upper end of the outer periphery of each of the rotary rollers 8 or the lower surface and the left and right side surfaces of the rail 42 is a minute interval d (d = 2 to 5 mm). It is possible to prevent the film-forming material from entering around and entering the rotating roller 8 and the rail 42. At the same time, gas molecules in the vacuum chamber 2 are also unlikely to enter the gap 33, and the rotary rollers 8 and the rails 42 are formed into a film by vacuum discharge by the gas molecules, so that by-products that generate dust are not generated. Thus, dust generation in the vacuum chamber 2 can be further reduced. As a result, it is possible to greatly reduce dust generation due to film-deposited matter adhering to the rotating roller 8 and the rails 42 and shorten the cleaning period.

【0026】このような基板Wの成膜処理後、出口側ゲ
ート弁の開弁により真空容器1の出口が開けられ、上記
搬入時と同様に、駆動モータ18の作動による複数の回
転ローラ8,8,…の同期回転によって被搬送体40が
基板Wを支持した状態で真空室2から搬出され、隣接す
る他方の真空容器内に供給される。
After the film formation process on the substrate W, the outlet of the vacuum vessel 1 is opened by opening the outlet side gate valve, and the plurality of rotating rollers 8 and By the synchronous rotation of 8,..., The transported object 40 is carried out of the vacuum chamber 2 while supporting the substrate W, and supplied into the other adjacent vacuum vessel.

【0027】この実施形態では、上記複数の回転ローラ
8,8,…を同期回転させる同期回転駆動機構10、具
体的には各回転ローラ8の回転軸13に取付固定された
複数の従動側歯付プーリ14,14,…、駆動モータ1
8、その駆動モータ18に連結された駆動軸16、その
両端に固定された駆動側歯付プーリ21,21、駆動側
及び複数の従動側歯付プーリ21,14に巻き掛けられ
た歯付ベルト22、ガイドプーリ23〜26等はいずれ
も真空容器1の外側に設けられ、真空室2内には複数の
回転ローラ8,8,…のみが配置されているので、同期
回転駆動機構10の摺動摩耗部分は真空容器1外に位置
し、真空室2内には各回転ローラ8と被搬送体40のレ
ール42との接触部分のみの摺動部分が形成される。こ
のため、真空室2内での摺動摩耗部分からの発塵が極め
て少なくなり、その発塵によるスパッタ成膜処理への悪
影響を防止することができる。しかも、真空室2内にあ
る摩耗部品の寿命を延長して、その交換メンテナンスの
間隔を長くすることができる。
In this embodiment, a synchronous rotation drive mechanism 10 for synchronously rotating the plurality of rotating rollers 8, 8,..., Specifically, a plurality of driven side teeth mounted and fixed to a rotating shaft 13 of each rotating roller 8. Pulleys 14, 14, ..., drive motor 1
8, a drive shaft 16 connected to the drive motor 18, drive-side toothed pulleys 21 and 21 fixed to both ends thereof, a toothed belt wound around the drive-side and a plurality of driven-side toothed pulleys 21 and 14. 22 and the guide pulleys 23 to 26 are provided outside the vacuum vessel 1 and only a plurality of rotating rollers 8, 8,... The moving wear portion is located outside the vacuum chamber 1, and a sliding portion of only the contact portion between each rotating roller 8 and the rail 42 of the transported body 40 is formed in the vacuum chamber 2. For this reason, the generation of dust from the sliding wear portion in the vacuum chamber 2 is extremely reduced, and it is possible to prevent the dust from adversely affecting the sputtering film forming process. In addition, the life of the worn parts in the vacuum chamber 2 can be extended, and the interval of replacement maintenance can be extended.

【0028】尚、上記実施形態では、複数の回転ローラ
8,8,…を同期回転させる同期回転駆動機構10を歯
付ベルト伝動機構で構成しているが、歯車機構で構成す
ることもできる。
In the above embodiment, the synchronous rotation drive mechanism 10 for synchronously rotating the plurality of rotating rollers 8, 8,... Is constituted by a toothed belt transmission mechanism, but may be constituted by a gear mechanism.

【0029】また、上記実施形態では、スパッタ成膜部
6を真空容器1の底壁部に配置しているが、上壁部や基
板Wの搬送に邪魔にならない側壁部1aに配置してもよ
い。
In the above-described embodiment, the sputter film forming section 6 is disposed on the bottom wall of the vacuum vessel 1. However, the sputter film forming section 6 may be disposed on the upper wall or the side wall 1a which does not hinder the transfer of the substrate W. Good.

【0030】また、本発明は上記実施形態の如きスパッ
タ装置以外の他の成膜装置にも適用でき、さらには真空
容器内の真空室で被搬送体を搬送する場合であれば適用
できる。
The present invention can be applied to a film forming apparatus other than the sputtering apparatus as in the above-described embodiment, and can be applied to a case where a transferred object is transferred in a vacuum chamber in a vacuum vessel.

【0031】[0031]

【発明の効果】以上説明した如く、請求項1の発明によ
ると、真空容器内の真空室の対向する左右側壁部に、被
搬送体を左右端部にて支持する複数の回転ローラをそれ
ぞれ被搬送体の搬送方向に沿って並んで配置し、これら
複数の回転ローラを同期回転させる同期回転駆動機構を
真空容器の外側に設けたことにより、真空室の容積を小
さくすることができ、イニシャルガスが少なく、排気性
能を向上させ得る。しかも、真空室の容積が小さく、同
期回転駆動機構を外側に存在させたということは、真空
室に暴露している構造物の表面積が小さいということに
なり、これから放出されるガスが減少して、排気性能を
さらに向上させ得ることになる。また、真空室内での摺
動摩耗部分からの発塵を極めて少なくして、その発塵に
よる成膜処理等への悪影響の防止を図るとともに、真空
室内にある摩耗部品を高寿命化してその交換メンテナン
スの間隔の延長を図ることができる。
As described above, according to the first aspect of the present invention, a plurality of rotating rollers for supporting the object to be transported at the left and right ends are respectively provided on the opposite left and right side walls of the vacuum chamber in the vacuum vessel. By disposing the synchronous rotation drive mechanism for synchronously rotating the plurality of rotating rollers outside the vacuum vessel, the volume of the vacuum chamber can be reduced, and the initial gas can be reduced. And exhaust performance can be improved. In addition, the fact that the volume of the vacuum chamber is small and that the synchronous rotation drive mechanism is present outside means that the surface area of the structure exposed to the vacuum chamber is small, and the gas released from this is reduced. Thus, the exhaust performance can be further improved. In addition, the generation of dust from sliding abrasion parts in the vacuum chamber is extremely reduced to prevent adverse effects on the film forming process due to the generation of dust, and the life of wear parts in the vacuum chamber is extended to replace them. The maintenance interval can be extended.

【0032】請求項2の発明によると、被搬送体の左右
端部にそれぞれ回転ローラ上に載置されるレールを設け
て、回転ローラの回転によりレールが送られて被搬送体
が移動するようにするとともに、回転ローラ外周上端以
外の部分ないしレールの下面及び左右両側面を遮蔽カバ
ーで覆う構成としたことにより、例えば成膜装置からの
成膜材料が回転ローラやレールに付着するのを防止で
き、その回転ローラやレールへの成膜付着物による発塵
の低減及びその清掃期間の短縮化を図ることができる。
According to the second aspect of the present invention, rails to be mounted on the rotating rollers are provided at the left and right ends of the transported body, respectively, so that the rails are fed by the rotation of the rotating rollers to move the transported body. In addition, the parts other than the upper end of the outer periphery of the rotating roller, or the lower surface and the left and right side surfaces of the rail are covered with shielding covers, so that, for example, the film forming material from the film forming apparatus is prevented from adhering to the rotating roller and the rail. Thus, it is possible to reduce the generation of dust due to the film deposition on the rotating rollers and rails, and to shorten the cleaning period.

【0033】請求項3の発明によると、上記回転ローラ
外周上端以外の部分ないしレールの下面及び左右両側面
と遮蔽カバーとの間に形成される空隙を、気体分子の侵
入による真空放電不可能な微小間隔としたことにより、
その回転ローラ外周上端以外の部分ないしレールの下面
及び左右両側面と遮蔽カバーとの間の空隙に成膜材料が
侵入して回転ローラやレールに付着するのを防止できる
とともに、その空隙に入り込んだ気体分子による真空放
電により回転ローラやレールに発塵の元となる副生成物
が生成されるのも防いで、真空室での発塵のより一層の
低減を図ることができる。
According to the third aspect of the present invention, the space other than the upper end of the outer periphery of the rotary roller or the gap formed between the lower surface and the right and left side surfaces of the rail and the shielding cover cannot be vacuum-discharged due to gas molecules entering. By making it a minute interval,
It is possible to prevent the film-forming material from entering the gaps between the shield cover and the lower part of the outer periphery of the rotating roller or the gap between the lower and right and left side surfaces and the shielding cover, and to prevent the film-forming material from adhering to the rotating roller and the rail, and entering the gap. The generation of by-products that generate dust on the rotating rollers and rails due to vacuum discharge caused by gas molecules is also prevented, and dust generation in the vacuum chamber can be further reduced.

【0034】請求項4の発明によると、上記同期回転駆
動機構を歯付ベルト伝動機構で構成したことにより、同
期回転駆動機構の望ましい構成が容易に得られる。
According to the fourth aspect of the present invention, since the synchronous rotation drive mechanism is constituted by a toothed belt transmission mechanism, a desirable configuration of the synchronous rotation drive mechanism can be easily obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】図3のI−I線拡大断面図である。FIG. 1 is an enlarged cross-sectional view taken along line II of FIG.

【図2】図1における遮蔽カバー周辺部の拡大断面図で
ある。
FIG. 2 is an enlarged sectional view of a portion around a shielding cover in FIG. 1;

【図3】本発明の実施形態に係る真空搬送装置を示す平
面断面図である。
FIG. 3 is a plan sectional view showing a vacuum transfer device according to the embodiment of the present invention.

【図4】本発明の実施形態に係る真空搬送装置の側面図
である。
FIG. 4 is a side view of the vacuum transfer device according to the embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 真空容器 1a 側壁部 2 真空室 6 スパッタ成膜部 8 回転ローラ 10 同期回転駆動機構 13 回転軸 14 従動側歯付プーリ 18 駆動モータ(駆動手段) 21 駆動側歯付プーリ 22 歯付ベルト 27 遮蔽カバー 33 空隙 d 空隙の間隔 40 被搬送体 42 レール W 基板 DESCRIPTION OF SYMBOLS 1 Vacuum container 1a Side wall part 2 Vacuum chamber 6 Sputter deposition part 8 Rotary roller 10 Synchronous rotation drive mechanism 13 Rotary shaft 14 Driven side toothed pulley 18 Drive motor (drive means) 21 Drive side toothed pulley 22 Toothed belt 27 Shield Cover 33 Air gap d Air gap distance 40 Carrier 42 Rail W Board

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 真空容器内の真空室で被搬送体を搬送す
るようにした真空搬送装置において、 上記真空室の対向する左右側壁部にそれぞれ被搬送体の
搬送方向に沿って並んで回転可能に軸支され、上記被搬
送体を左右端部にて移動可能に支持する複数の回転ロー
ラと、 真空容器の外側に設けられ、上記複数の回転ローラを同
期して回転させる同期回転駆動機構とを備えたことを特
徴とする真空搬送装置。
1. A vacuum transfer apparatus in which a transferred object is transferred in a vacuum chamber in a vacuum vessel, wherein the left and right side walls of the vacuum chamber are rotatable along the transfer direction of the transferred object. A plurality of rotating rollers rotatably supported at the left and right ends of the conveyed body, and a synchronous rotation driving mechanism provided outside the vacuum vessel and synchronously rotating the plurality of rotating rollers. A vacuum transfer device comprising:
【請求項2】 請求項1の真空搬送装置において、 被搬送体の左右端部にはそれぞれ被搬送体の搬送方向に
沿って互いに平行に延びかつ回転ローラ上に載置される
レールが設けられていて、回転ローラの回転により該回
転ローラ上をレールが送られて被搬送体が移動するよう
に構成されており、 上記回転ローラ外周において上記レールが載置される上
端以外の部分、ないし上記レールの下面及び左右両側面
を覆う遮蔽カバーが設けられていることを特徴とする真
空搬送装置。
2. The vacuum transfer apparatus according to claim 1, wherein left and right ends of the transferred object are provided with rails extending parallel to each other along the transfer direction of the transferred object and mounted on rotating rollers. The rail is fed on the rotating roller by the rotation of the rotating roller, so that the transported object moves, and a portion of the outer periphery of the rotating roller other than the upper end on which the rail is mounted, or A vacuum transfer device comprising a shielding cover for covering a lower surface of a rail and both left and right side surfaces.
【請求項3】 請求項2の真空搬送装置において、 回転ローラ外周の上端以外の部分ないしレールの下面及
び左右両側面と遮蔽カバーとの間に、気体分子の侵入に
よる真空放電不可能な微小間隔の空隙があけられている
ことを特徴とする真空搬送装置。
3. The vacuum conveying device according to claim 2, wherein a vacuum discharge is not possible due to intrusion of gas molecules between a portion other than the upper end of the outer periphery of the rotating roller, the lower surface of the rail, and both right and left side surfaces and the shielding cover. A vacuum transfer device characterized by having a void.
【請求項4】 請求項1〜3のいずれかの真空搬送装置
において、 同期回転駆動機構は、回転ローラの回転軸の真空容器外
側端部にそれぞれ取付固定された複数の従動側歯付プー
リと、 駆動手段に連結された駆動側歯付プーリと、 上記駆動側及び複数の従動側歯付プーリに巻き掛けられ
た歯付ベルトとを備えてなることを特徴とする真空搬送
装置。
4. The vacuum transfer device according to claim 1, wherein the synchronous rotation drive mechanism comprises: a plurality of driven toothed pulleys fixedly attached to an outer end of the rotary shaft of the rotary shaft on the outer side of the vacuum container; A vacuum transfer device comprising: a driving-side toothed pulley connected to a driving unit; and a toothed belt wound around the driving-side and a plurality of driven-side toothed pulleys.
JP32473597A 1997-11-26 1997-11-26 Vacuum transporting device Withdrawn JPH11158630A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32473597A JPH11158630A (en) 1997-11-26 1997-11-26 Vacuum transporting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32473597A JPH11158630A (en) 1997-11-26 1997-11-26 Vacuum transporting device

Publications (1)

Publication Number Publication Date
JPH11158630A true JPH11158630A (en) 1999-06-15

Family

ID=18169111

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32473597A Withdrawn JPH11158630A (en) 1997-11-26 1997-11-26 Vacuum transporting device

Country Status (1)

Country Link
JP (1) JPH11158630A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004059032A1 (en) * 2002-12-26 2004-07-15 Toppan Printing Co., Ltd. Vacuum deposition apparatus and vapor-deposited film manufacturing method
JP2008261058A (en) * 2001-02-08 2008-10-30 Semiconductor Energy Lab Co Ltd Film deposition apparatus and method for manufacturing light-emitting apparatus
US8016490B2 (en) 2005-01-31 2011-09-13 Nsk Ltd. Thin-wall bearing
WO2018172277A1 (en) * 2017-03-24 2018-09-27 Nexwafe Gmbh Process chamber guide, process chamber, and method for guiding a substrate carrier in a process position
CN114574813A (en) * 2020-11-30 2022-06-03 佳能特机株式会社 Conveying device, film forming method, method for manufacturing electronic device, and film forming device

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008261058A (en) * 2001-02-08 2008-10-30 Semiconductor Energy Lab Co Ltd Film deposition apparatus and method for manufacturing light-emitting apparatus
EP1593754A4 (en) * 2002-12-26 2011-03-23 Toppan Printing Co Ltd Vacuum deposition apparatus and method of producing vapor-deposited film
JPWO2004059032A1 (en) * 2002-12-26 2006-04-27 凸版印刷株式会社 Vacuum deposition apparatus and deposited film manufacturing method
EP1593754A1 (en) * 2002-12-26 2005-11-09 Toppan Printing Co., Ltd. Vacuum deposition apparatus and method of producing vapor-deposited film
US7754015B2 (en) 2002-12-26 2010-07-13 Toppan Printing Co., Ltd. Vacuum vapor-deposition apparatus and method of producing vapor-deposited film
JP4529688B2 (en) * 2002-12-26 2010-08-25 凸版印刷株式会社 Vacuum deposition apparatus and deposited film manufacturing method
WO2004059032A1 (en) * 2002-12-26 2004-07-15 Toppan Printing Co., Ltd. Vacuum deposition apparatus and vapor-deposited film manufacturing method
US8016490B2 (en) 2005-01-31 2011-09-13 Nsk Ltd. Thin-wall bearing
WO2018172277A1 (en) * 2017-03-24 2018-09-27 Nexwafe Gmbh Process chamber guide, process chamber, and method for guiding a substrate carrier in a process position
CN110520557A (en) * 2017-03-24 2019-11-29 奈克斯沃夫有限公司 Processing chamber guiding device, processing chamber and for by substrate holder guide to processing position at method
JP2020516061A (en) * 2017-03-24 2020-05-28 ネックスヴァーフェ・ゲー・エム・ベー・ハーNexwafe Gmbh Process chamber guide, process chamber and method of guiding a substrate carrier to a process position
CN114574813A (en) * 2020-11-30 2022-06-03 佳能特机株式会社 Conveying device, film forming method, method for manufacturing electronic device, and film forming device
CN114574813B (en) * 2020-11-30 2023-07-25 佳能特机株式会社 Conveying device, film forming method, method for manufacturing electronic device, and film forming device

Similar Documents

Publication Publication Date Title
US6027618A (en) Compact in-line film deposition system
KR100361130B1 (en) Substrate processing apparatus and substrate processing method
JP3909888B2 (en) Tray transfer type in-line deposition system
JPH08213446A (en) Processing equipment
KR100269010B1 (en) 3-D Shell or Thin Film Substrate Thin Film Deposition Vacuum Processing Equipment
KR0165850B1 (en) Pressure reduced chamber system having a filter means
CN110777337A (en) Film forming apparatus and method for manufacturing electronic device
JPWO2018084286A1 (en) Deposition equipment
JP6379318B1 (en) Film forming apparatus, film forming method, and solar cell manufacturing method
JPH11158630A (en) Vacuum transporting device
JPS61112312A (en) Vacuum continuous treater
JP2008019094A5 (en)
KR101511179B1 (en) Film forming apparatus and carrier tray for the same
JPH09142665A (en) Belt conveyor for carrying powder
JP2009108384A (en) Film-forming apparatus
JP3769425B2 (en) Electronic component manufacturing apparatus and electronic component manufacturing method
CN216237258U (en) Open-close type shielding component and film deposition device with same
JP6055229B2 (en) To-be-processed object conveyance mechanism and vacuum processing apparatus
JPH09111453A (en) Vacuum substrate transporting device and vacuum substrate transporting method
JPH0952607A (en) Clean roller conveyor
US11869791B2 (en) Vacuum processing apparatus
WO2020144891A1 (en) Vacuum processing apparatus
JP3666636B2 (en) Substrate processing equipment
JPH01268870A (en) Vertical tray conveying-type sputtering device
JP4065997B2 (en) Carriage transfer device

Legal Events

Date Code Title Description
A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 20050201