JP2022024950A - 低干渉光源とマルチパターン照明を利用した3次元光回折断層撮影方法および装置 - Google Patents
低干渉光源とマルチパターン照明を利用した3次元光回折断層撮影方法および装置 Download PDFInfo
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Abstract
Description
510:入射パターン制御部
520:光伝播部
530:イメージ測定部
540:計算部
Claims (10)
- 3次元光回折断層撮影装置を利用した低干渉光源とマルチパターン照明を利用した3次元光回折断層撮影方法であって、
複数のパターンを利用して試験片に光源を入射する段階、
イメージ測定部で前記試験片の異なる深さ(depth)位置上で異なる位置を測定するように構成され、前記試験片の2次元映像を測定する段階、および
互いに異なる前記パターンと互いに異なる前記深さ(depth)位置で測定した前記2次元映像に基づいて前記試験片の3次元屈折率情報を復元する段階
を含む、3次元光回折断層撮影方法。 - 前記試験片の2次元映像を測定する前に、前記試験片と前記イメージ測定部との間に光伝播部が位置して前記試験片と前記イメージ測定部との間に光の伝播を起こす段階
をさらに含む、請求項1に記載の3次元光回折断層撮影方法。 - 前記複数のパターンを利用して試験片に光源を入射する段階は、
少なくとも3つ以上の光照明パターンを使用し、光の強度は、空間周波数の座標系を基準として最外郭に位置し、前記最外郭として定義された地点で空間周波数が中心に移動しながら光の強度は減少する条件を満たすパターンを組み合わせて最終的な光学伝達関数(Optical Transfer Function:OTF)を生成するときに、各空間周波数の位置で光学伝達関数(OTF)値が最大限均一となるようにパターンを決定すること
を特徴とする、請求項1に記載の3次元光回折断層撮影方法。 - 前記複数のパターンを利用して試験片に光源を入射する段階は、
透過型または反射型ディスプレイ装置を使用するかパターンが記録された装置を使用して入射パターンを制御することにより、前記複数のパターンを利用して試験片に光源を入射すること
を特徴とする、請求項1に記載の3次元光回折断層撮影方法。 - 前記複数のパターンを利用して試験片に光源を入射する段階は、
固定された器具に異なる角度で入射する前記光源を使用して入射パターンを制御することにより、前記複数のパターンを利用して試験片に光源を入射すること
を特徴とする、請求項1に記載の3次元光回折断層撮影方法。 - 前記複数のパターンを利用して試験片に光源を入射する段階は、
前記光源と前記パターンを制御する入射パターン制御部が一体型で構成されたLEDアレイ(Light Emitting Device array)またはマイクロLEDアレイ(micro LED array)を使用することにより、前記複数のパターンを利用して試験片に光源を入射すること
を特徴とする、請求項1に記載の3次元光回折断層撮影方法。 - 前記2次元映像に基づいて前記試験片の3次元屈折率情報を復元する段階は、
振幅(amplitude)および位相(phase)による3D点拡がり関数(Point Spread Function:PSF)を計算し、それぞれ異なるz位置で測定された2次元映像i(x、y、z)情報に基づいてv(x、y、z)=amplitude(x、y、z)+i×phase(x、y、z)を再構成する方式により、前記試験片の3次元屈折率情報を復元すること
を特徴とする、請求項1に記載の3次元光回折断層撮影方法。 - 低干渉光源とマルチパターン照明を利用した3次元光回折断層撮影装置であって、
複数のパターンを利用して試験片に光源を入射する入射パターン制御部、
前記試験片の異なる深さ(depth)位置上で異なる位置を測定するように構成され、前記試験片の2次元映像を測定するイメージ測定部、および
互いに異なる前記パターンと互いに異なる前記深さ(depth)位置で測定した前記2次元映像に基づいて前記試験片の3次元屈折率情報を復元する計算部
を備える、3次元光回折断層撮影装置。 - 前記試験片と前記イメージ測定部との間に位置して前記試験片と前記イメージ測定部との間に光の伝播を起こす光伝播部
をさらに備える、請求項8に記載の3次元光回折断層撮影装置。 - 前記入射パターン制御部は、
少なくとも3つ以上の光照明パターンを使用し、光の強度は、空間周波数の座標系を基準として最外郭に位置し、前記最外郭として定義された地点で空間周波数が中心に移動しながら光の強度は減少する条件を満たすパターンを組み合わせて最終的な光学伝達関数(Optical Transfer Function:OTF)を生成するときに、各空間周波数の位置で光学伝達関数(OTF)値が最大限均一となるようにパターンを決定すること
を特徴とする、請求項8に記載の3次元光回折断層撮影装置。
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