JP2021534317A - 複数の研削粒子を含む組成物およびその使用方法 - Google Patents
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- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 17
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- 241000272186 Falco columbarius Species 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
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- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical class [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
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- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 1
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- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
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- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical class OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- KHIWWQKSHDUIBK-UHFFFAOYSA-N periodic acid Chemical class OI(=O)(=O)=O KHIWWQKSHDUIBK-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 229920001495 poly(sodium acrylate) polymer Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000417 polynaphthalene Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
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- 150000003839 salts Chemical class 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 235000015424 sodium Nutrition 0.000 description 1
- GCLGEJMYGQKIIW-UHFFFAOYSA-H sodium hexametaphosphate Chemical compound [Na]OP1(=O)OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])O1 GCLGEJMYGQKIIW-UHFFFAOYSA-H 0.000 description 1
- 235000019982 sodium hexametaphosphate Nutrition 0.000 description 1
- 229920005552 sodium lignosulfonate Polymers 0.000 description 1
- NNMHYFLPFNGQFZ-UHFFFAOYSA-M sodium polyacrylate Chemical compound [Na+].[O-]C(=O)C=C NNMHYFLPFNGQFZ-UHFFFAOYSA-M 0.000 description 1
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- 239000003381 stabilizer Substances 0.000 description 1
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- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 1
- ZSDSQXJSNMTJDA-UHFFFAOYSA-N trifluralin Chemical compound CCCN(CCC)C1=C([N+]([O-])=O)C=C(C(F)(F)F)C=C1[N+]([O-])=O ZSDSQXJSNMTJDA-UHFFFAOYSA-N 0.000 description 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
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- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F7/00—Compounds of aluminium
- C01F7/02—Aluminium oxide; Aluminium hydroxide; Aluminates
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- C09G—POLISHING COMPOSITIONS; SKI WAXES
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- C09K3/00—Materials not provided for elsewhere
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- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F7/00—Compounds of aluminium
- C01F7/02—Aluminium oxide; Aluminium hydroxide; Aluminates
- C01F7/44—Dehydration of aluminium oxide or hydroxide, i.e. all conversions of one form into another involving a loss of water
- C01F7/441—Dehydration of aluminium oxide or hydroxide, i.e. all conversions of one form into another involving a loss of water by calcination
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- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/54—Particles characterised by their aspect ratio, i.e. the ratio of sizes in the longest to the shortest dimension
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
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Abstract
Description
実施形態1.アルミナを含む複数の研削粒子を含む組成物であって、
複数の研削粒子が、少なくとも20接合点/ミクロン2の平均メソ分岐指数および少なくとも5ミクロンのメジアン粒子径(D50)を有するメソ多孔性を含む、組成物。
複数の研削粒子が、少なくとも5体積%の多孔性および7.5以下の半100パーセント分布値(D100−D0)/D50を含む、組成物。
ワークピースに対して複数の研削粒子を移動させることを含み、複数の研削粒子が、アルミナを含み、かつ
a)少なくとも20接合点/ミクロン2の平均メソ分岐指数および少なくとも5ミクロンのメジアン粒子径(D50)、
b)少なくとも5体積%の多孔性および7.5以下の半100パーセント分布値(D100−D0)/D50、または
c)これらの任意の組み合わせのうちの少なくとも1つをさらに含む、方法。
a)複数の研削粒子が、複数の研削粒子の総重量に対して少なくとも60重量%かつ95重量%以下のアルミナを含む、
b)複数の研削粒子が、遷移アルミナを含む、
c)複数の研削粒子が、アルファアルミナを含む、
d)複数の研削粒子が、式Cp=Ca/Ctによって定義されるような、少なくとも0.1かつ10以下のアルミナ相含有比率(Cp)を含み、式中、Caは、複数の研削粒子中のアルファアルミナの含有量(体積%)を表し、Ctは、複数の研削粒子中の遷移相アルミナの含有量(体積%)を表す、
e)複数の研削粒子が、複数の研削粒子の総体積に対して少なくとも30体積%〜50体積%以下の範囲内の多孔性を含む、
f)複数の研削粒子が、少なくとも55接合点/ミクロン2〜150接合点/ミクロン2以下の範囲内の平均メソ分岐指数を有するメソ多孔性を含む、
g)複数の研削粒子が、少なくとも0.001ミクロン〜2ミクロン以下の範囲内の平均細孔径を有する、
h)複数の研削粒子が、少なくとも1m2/g〜20m2/g以下の範囲内の表面積を含む、
i)またはこれらの任意の組み合わせ。
a)メジアン粒子径が、少なくとも5ミクロンかつ6000ミクロン以下の範囲内である、
b)複数の研削粒子が、少なくとも8ミクロン〜20,000ミクロン以下の範囲内の100パーセント分布値(D100−D10)を有する、
c)複数の研削粒子の80パーセント分布(D90−D10)が、少なくとも7ミクロン〜8000ミクロン以下の範囲内にある、
d)複数の研削粒子が、少なくとも0.00025〜1500以下の範囲内の半80パーセント分布値((D90−D10)/D50)を含む、
e)複数の研削粒子が、少なくとも0.001〜7以下の範囲内に半100分布値((D100−D0)/D50)を含む、
f)複数の研削粒子が、少なくとも5ミクロン〜6000ミクロン以下の範囲内の平均粒子径を含む、
g)複数の研削粒子が、少なくとも2.3〜10以下の範囲内の歪度を含む、
h)複数の研削粒子が、少なくとも4.5〜20以下の範囲内の尖度を含む、
i)複数の研削粒子が、単峰性分布を定義する、
j)またはこれらの任意の組み合わせ。
研磨性能の試験および比較。
Claims (15)
- アルミナを含む複数の研削粒子を含む組成物であって、
前記複数の研削粒子が、少なくとも55接合点(junction)/ミクロン2の平均メソ分岐指数(meso branching index)および少なくとも5ミクロンのメジアン粒子径(D50)を有するメソ多孔性を含む、組成物。 - アルミナを含む複数の研削粒子を含む組成物であって、
前記複数の研削粒子が、少なくとも5体積%の多孔性および7.5以下の半100パーセント分布値(D100−D0)/D50を含む、組成物。 - 前記複数の研削粒子が、少なくとも55接合点/ミクロン2の平均メソ分岐指数および少なくとも5ミクロンのメジアン粒子径(D50)を有するメソ多孔性を含む、請求項2に記載の組成物。
- 前記複数の研削粒子の粒子径分布が、少なくとも3.0かつ20以下の分散を有する、請求項1、2、または3のいずれかに記載の組成物。
- 前記分散が、少なくとも3.0かつ8以下である、請求項4に記載の組成物。
- 前記複数の研削粒子が、アルファアルミナから本質的になる、請求項1、2、または3のいずれか一項に記載の組成物。
- 前記複数の研削粒子の前記メジアン粒子径(D50)が、少なくとも5ミクロンかつ20ミクロン以下である、請求項1または3に記載の組成物。
- 前記複数の研削粒子が、少なくとも2.5の歪度を含む、請求項1、2、または3のいずれか一項に記載の組成物。
- 前記複数の研削粒子が、少なくとも30体積%かつ55体積%以下の多孔性を含む、請求項1、2、または3のいずれか一項に記載の組成物。
- 前記複数の研削粒子が、少なくとも4m2/gかつ20m2/g以下の平均表面積を含む、請求項1、2、または3のいずれか一項に記載の組成物。
- 前記複数の研削粒子が、20ミクロン以下の平均粒子径を有する、請求項1、2、または3のいずれか一項に記載の組成物。
- 液体担体と、請求項1、2、または3のいずれか一項に記載の複数の粒子と、を含む、研削スラリー。
- 前記複数の研削粒子が、単峰性分布を定義する、請求項1、2、または3のいずれか一項に記載の組成物。
- ワークピースにおいて材料除去プロセスを実施するための方法であって、
ワークピースに対して複数の研削粒子を移動させることを含み、前記複数の研削粒子が、アルミナを含み、かつ
a)少なくとも55接合点/ミクロン2の平均メソ分岐指数および少なくとも5ミクロンのメジアン粒子径(D50)、
b)少なくとも5体積%の多孔性および7.5以下の半100パーセント分布値(D100−D0)/D50、または
c)これらの任意の組み合わせのうちの少なくとも1つをさらに含む、方法。 - 前記複数の研削粒子の粒子径分布が、少なくとも3.0かつ20以下の分散を有する、請求項14に記載の方法。
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Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63288909A (ja) * | 1987-02-19 | 1988-11-25 | ケラモント、リサーチ、コーポレーション | サブミクロン粒径を有するα−アルミナ粉末を得る方法 |
JPH07206432A (ja) * | 1993-11-25 | 1995-08-08 | Sumitomo Chem Co Ltd | α−アルミナ粉末及びその製造方法 |
JP2001302235A (ja) * | 2000-04-25 | 2001-10-31 | Sumitomo Chem Co Ltd | α−アルミナ粒子の製造方法 |
JP2003517993A (ja) * | 1999-12-21 | 2003-06-03 | ダブリュー・アール・グレイス・アンド・カンパニー−コネチカット | アルミナ三水化物から生じさせた高い細孔容積と高い表面積を有する酸化アルミニウム複合体そしてこれの製造および使用方法 |
JP2006124622A (ja) * | 2004-11-01 | 2006-05-18 | Ishihara Chem Co Ltd | 研磨用α−アルミナ組成物、及びその製造方法 |
JP2016521235A (ja) * | 2013-04-05 | 2016-07-21 | スリーエム イノベイティブ プロパティズ カンパニー | 焼結された研磨粒子、それを作製する方法、及びそれを含む研磨物品 |
CN106698489A (zh) * | 2017-01-04 | 2017-05-24 | 杭州智华杰科技有限公司 | 一种高切削高亮度氧化铝抛光粉的制备方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0543347A1 (de) * | 1991-11-22 | 1993-05-26 | H.C. Starck GmbH & Co. KG | Verfahren zur Herstellung von alpha-Aluminiumoxid-Pulver |
DE69324582T2 (de) | 1992-06-02 | 1999-09-09 | Sumitomo Chemical Co. | Alpha-aluminiumoxid |
US5277702A (en) * | 1993-03-08 | 1994-01-11 | St. Gobain/Norton Industrial Ceramics Corp. | Plately alumina |
US6602439B1 (en) | 1997-02-24 | 2003-08-05 | Superior Micropowders, Llc | Chemical-mechanical planarization slurries and powders and methods for using same |
US6403526B1 (en) * | 1999-12-21 | 2002-06-11 | W. R. Grace & Co.-Conn. | Alumina trihydrate derived high pore volume, high surface area aluminum oxide composites and methods of their preparation and use |
MY118582A (en) | 2000-05-12 | 2004-12-31 | Kao Corp | Polishing composition |
US6488767B1 (en) | 2001-06-08 | 2002-12-03 | Advanced Technology Materials, Inc. | High surface quality GaN wafer and method of fabricating same |
US6800271B2 (en) | 2002-04-01 | 2004-10-05 | Council Of Scientific And Industrial Research | Process for the preparation of nanosized iron oxide by biomimetic route |
US7422730B2 (en) * | 2003-04-02 | 2008-09-09 | Saint-Gobain Ceramics & Plastics, Inc. | Nanoporous ultrafine α-alumina powders and sol-gel process of preparing same |
US7344988B2 (en) | 2003-10-27 | 2008-03-18 | Dupont Air Products Nanomaterials Llc | Alumina abrasive for chemical mechanical polishing |
TWI417245B (zh) * | 2008-06-13 | 2013-12-01 | Fujimi Inc | 氧化鋁粒子及含有該氧化鋁粒子之研磨用組成物 |
EP2358637A1 (en) | 2008-12-17 | 2011-08-24 | Evonik Degussa GmbH | Process for preparing an aluminium oxide powder having a high alpha-al2o3 content |
CN101831244A (zh) | 2010-05-10 | 2010-09-15 | 上海高纳粉体技术有限公司 | 高精度氧化铝抛光液及其制备方法 |
CN104114666B (zh) | 2011-12-30 | 2016-06-08 | 圣戈班磨料磨具有限公司 | 研磨制品及其形成方法 |
EP2810997A1 (en) | 2013-06-05 | 2014-12-10 | Basf Se | A chemical mechanical polishing (cmp) composition |
EP3261114B1 (en) | 2015-02-19 | 2021-01-13 | Fujimi Incorporated | Composition for silicon wafer polishing and polishing method |
-
2019
- 2019-08-09 EP EP19848248.1A patent/EP3833721A4/en active Pending
- 2019-08-09 MX MX2021001465A patent/MX2021001465A/es unknown
- 2019-08-09 US US16/537,264 patent/US11674065B2/en active Active
- 2019-08-09 KR KR1020217007274A patent/KR102652102B1/ko active IP Right Grant
- 2019-08-09 MY MYPI2021000679A patent/MY195316A/en unknown
- 2019-08-09 WO PCT/US2019/045999 patent/WO2020033889A1/en unknown
- 2019-08-09 CA CA3108938A patent/CA3108938A1/en not_active Abandoned
- 2019-08-09 JP JP2021531616A patent/JP7284263B2/ja active Active
- 2019-08-09 CN CN201980052667.7A patent/CN112566992A/zh active Pending
- 2019-08-12 TW TW108128655A patent/TWI745732B/zh active
-
2021
- 2021-02-16 ZA ZA2021/01061A patent/ZA202101061B/en unknown
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63288909A (ja) * | 1987-02-19 | 1988-11-25 | ケラモント、リサーチ、コーポレーション | サブミクロン粒径を有するα−アルミナ粉末を得る方法 |
JPH07206432A (ja) * | 1993-11-25 | 1995-08-08 | Sumitomo Chem Co Ltd | α−アルミナ粉末及びその製造方法 |
JP2003517993A (ja) * | 1999-12-21 | 2003-06-03 | ダブリュー・アール・グレイス・アンド・カンパニー−コネチカット | アルミナ三水化物から生じさせた高い細孔容積と高い表面積を有する酸化アルミニウム複合体そしてこれの製造および使用方法 |
JP2001302235A (ja) * | 2000-04-25 | 2001-10-31 | Sumitomo Chem Co Ltd | α−アルミナ粒子の製造方法 |
JP2006124622A (ja) * | 2004-11-01 | 2006-05-18 | Ishihara Chem Co Ltd | 研磨用α−アルミナ組成物、及びその製造方法 |
JP2016521235A (ja) * | 2013-04-05 | 2016-07-21 | スリーエム イノベイティブ プロパティズ カンパニー | 焼結された研磨粒子、それを作製する方法、及びそれを含む研磨物品 |
CN106698489A (zh) * | 2017-01-04 | 2017-05-24 | 杭州智华杰科技有限公司 | 一种高切削高亮度氧化铝抛光粉的制备方法 |
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