JP2021528854A5 - - Google Patents
Info
- Publication number
- JP2021528854A5 JP2021528854A5 JP2020570899A JP2020570899A JP2021528854A5 JP 2021528854 A5 JP2021528854 A5 JP 2021528854A5 JP 2020570899 A JP2020570899 A JP 2020570899A JP 2020570899 A JP2020570899 A JP 2020570899A JP 2021528854 A5 JP2021528854 A5 JP 2021528854A5
- Authority
- JP
- Japan
- Prior art keywords
- fluid
- equipment
- support assembly
- parameter
- substrate support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US16/014,606 US10741429B2 (en) | 2018-06-21 | 2018-06-21 | Model-based control of substrate processing systems |
| US16/014,606 | 2018-06-21 | ||
| PCT/US2019/037234 WO2019245908A1 (en) | 2018-06-21 | 2019-06-14 | Model-based control of substrate processing systems |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2021528854A JP2021528854A (ja) | 2021-10-21 |
| JP2021528854A5 true JP2021528854A5 (https=) | 2022-06-17 |
| JP7454509B2 JP7454509B2 (ja) | 2024-03-22 |
Family
ID=68981660
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020570899A Active JP7454509B2 (ja) | 2018-06-21 | 2019-06-14 | 基板処理システムのモデルベースの制御 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US10741429B2 (https=) |
| JP (1) | JP7454509B2 (https=) |
| KR (3) | KR102915461B1 (https=) |
| WO (1) | WO2019245908A1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102858027B1 (ko) * | 2020-09-30 | 2025-09-11 | 가부시키가이샤 코쿠사이 엘렉트릭 | 기판 처리 장치, 온도 제어 프로그램, 반도체 장치의 제조 방법 및 온도 제어 방법 |
| US12130606B2 (en) * | 2021-12-22 | 2024-10-29 | Applied Materials, Inc. | Disturbance compensation for substrate processing recipes |
| JP7763421B2 (ja) * | 2021-12-24 | 2025-11-04 | Ｎｔｔ株式会社 | 温度制御装置、温度制御システム及び温度制御方法 |
| KR102952769B1 (ko) | 2022-12-07 | 2026-04-15 | 삼성전자주식회사 | 반도체 공정 설비용 온도 제어 시스템 및 온도 제어 방법 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5341663A (en) * | 1992-04-22 | 1994-08-30 | Aluminum Company Of America | Automatic process control and noise suppression |
| US6299753B1 (en) | 1999-09-01 | 2001-10-09 | Applied Materials, Inc. | Double pressure vessel chemical dispenser unit |
| US7376472B2 (en) * | 2002-09-11 | 2008-05-20 | Fisher-Rosemount Systems, Inc. | Integrated model predictive control and optimization within a process control system |
| JP2009064814A (ja) | 2007-09-04 | 2009-03-26 | Hitachi High-Technologies Corp | プラズマ処理装置 |
| JP5173500B2 (ja) * | 2008-03-11 | 2013-04-03 | 大日本スクリーン製造株式会社 | 処理液供給装置およびそれを備えた基板処理装置 |
| JP5540586B2 (ja) | 2009-07-01 | 2014-07-02 | ソニー株式会社 | 信号処理回路、ａｇｃ回路、および記録再生装置 |
| KR20110054837A (ko) | 2009-11-18 | 2011-05-25 | 삼성전자주식회사 | 온도제어시스템 |
| DE102010013568A1 (de) | 2010-03-30 | 2011-10-06 | Ksb Aktiengesellschaft | Entkopplung der Regelgrößen in einem Fluidfördersystem mit Totzeit |
| JP5604201B2 (ja) | 2010-07-15 | 2014-10-08 | 株式会社日立メディコ | 無駄時間補償装置及びこれを用いたｘ線ｃｔ装置 |
| US8825185B2 (en) * | 2011-01-04 | 2014-09-02 | Johnson Controls Technology Company | Delay compensation for feedback controllers |
| JP6034231B2 (ja) * | 2012-07-25 | 2016-11-30 | 株式会社Kelk | 半導体製造装置用温度調整装置、半導体製造におけるｐｉｄ定数演算方法、及び半導体製造装置用温度調整装置の運転方法 |
| KR101367086B1 (ko) | 2013-10-17 | 2014-02-24 | (주)테키스트 | 반도체 제조 설비를 위한 온도제어 시스템 |
| JP6362019B2 (ja) | 2013-12-09 | 2018-07-25 | 株式会社ニコン | 駆動システム及び駆動方法、露光装置及び露光方法、並びに防振装置及び防振方法 |
| US10007255B2 (en) | 2014-06-27 | 2018-06-26 | Sunedison Semiconductor Limited (Uen201334164H) | Systems and methods for controlling temperatures in an epitaxial reactor |
| US11837479B2 (en) | 2016-05-05 | 2023-12-05 | Applied Materials, Inc. | Advanced temperature control for wafer carrier in plasma processing chamber |
| US10522377B2 (en) | 2016-07-01 | 2019-12-31 | Lam Research Corporation | System and method for substrate support feed-forward temperature control based on RF power |
| US20180166300A1 (en) * | 2016-12-13 | 2018-06-14 | Lam Research Ag | Point-of-use mixing systems and methods for controlling temperatures of liquids dispensed at a substrate |
| US10121709B2 (en) * | 2017-01-24 | 2018-11-06 | Lam Research Corporation | Virtual metrology systems and methods for using feedforward critical dimension data to predict other critical dimensions of a wafer |
| KR102476377B1 (ko) * | 2017-09-18 | 2022-12-12 | 현대자동차주식회사 | 전력공급장치의 전압강하보상 제어 시스템 및 방법 |
-
2018
- 2018-06-21 US US16/014,606 patent/US10741429B2/en active Active
-
2019
- 2019-06-14 KR KR1020257003228A patent/KR102915461B1/ko active Active
- 2019-06-14 KR KR1020217001795A patent/KR102763350B1/ko active Active
- 2019-06-14 JP JP2020570899A patent/JP7454509B2/ja active Active
- 2019-06-14 KR KR1020267001517A patent/KR20260022464A/ko active Pending
- 2019-06-14 WO PCT/US2019/037234 patent/WO2019245908A1/en not_active Ceased
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2021528854A5 (https=) | ||
| US10394257B2 (en) | Flow control system | |
| JP5186530B2 (ja) | フローモニタリングおよび制御のためのシステムおよび方法 | |
| US6688532B2 (en) | Controller, temperature controller and heat processor using same | |
| DK2874039T3 (en) | Method of controlling a heat transfer system as well as such a heat transfer system | |
| CN107228693B (zh) | 用于测定气体的系统和方法 | |
| US8265795B2 (en) | Mass flow controller | |
| US20110000973A1 (en) | Device for control room temperature of each room adapted to heating environment and its method | |
| CN102235755A (zh) | 热水器水温控制方法与装置 | |
| JP2015158755A (ja) | 流量制御装置及び流量制御装置用プログラム | |
| RU2372554C2 (ru) | Способ эксплуатации прямоточного парогенератора | |
| KR20130117661A (ko) | 증기 발전소의 제어를 위한 모델 변수들을 결정하는 방법 및 장치, 증기 발생기용 제어 유닛 및 컴퓨터 프로그램 제품 | |
| JPH08312908A (ja) | 蒸気乾き度制御装置 | |
| KR100699085B1 (ko) | 온돌 난방 공간의 실내 및 바닥온도 동시 조절 시스템 | |
| US20170074694A1 (en) | Method of calculating output flow rate of flow rate controller | |
| JP2008217055A (ja) | マルチホップ無線システムの電力制御方法およびその電力制御システム | |
| JP3893115B2 (ja) | マスフローコントローラ | |
| KR101263240B1 (ko) | 적산열량계의 측정값을 이용한 오차 보정 제어 장치 및 방법 | |
| KR101632270B1 (ko) | 수가습 장치의 제어 방법 및 장치 | |
| JP6006950B2 (ja) | 流量試験装置 | |
| JP2011179708A (ja) | ボイラ水位制御方法及び装置 | |
| JPS59157433A (ja) | 温度制御方法 | |
| KR101842160B1 (ko) | 유량제어장치 및 방법 | |
| JPH04339218A (ja) | 熱式流量計 | |
| RU134814U1 (ru) | Устройство для автоматического управления выпарной установкой |