JP2021516871A - 静電チャックおよびその突出部を製造するための方法 - Google Patents
静電チャックおよびその突出部を製造するための方法 Download PDFInfo
- Publication number
- JP2021516871A JP2021516871A JP2020552750A JP2020552750A JP2021516871A JP 2021516871 A JP2021516871 A JP 2021516871A JP 2020552750 A JP2020552750 A JP 2020552750A JP 2020552750 A JP2020552750 A JP 2020552750A JP 2021516871 A JP2021516871 A JP 2021516871A
- Authority
- JP
- Japan
- Prior art keywords
- protrusions
- hydrogen
- support surface
- electrostatic chuck
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 57
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 23
- 229910003481 amorphous carbon Inorganic materials 0.000 claims abstract description 40
- 230000008569 process Effects 0.000 claims abstract description 25
- 239000010410 layer Substances 0.000 claims description 52
- 239000012790 adhesive layer Substances 0.000 claims description 43
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 34
- 229910052799 carbon Inorganic materials 0.000 claims description 23
- 230000001070 adhesive effect Effects 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 15
- 239000000853 adhesive Substances 0.000 claims description 14
- 229910002804 graphite Inorganic materials 0.000 claims description 11
- 239000010439 graphite Substances 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 238000000151 deposition Methods 0.000 claims description 10
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 6
- 229910052804 chromium Inorganic materials 0.000 claims description 6
- 239000011651 chromium Substances 0.000 claims description 6
- 239000010936 titanium Substances 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 238000001914 filtration Methods 0.000 claims description 3
- 239000002245 particle Substances 0.000 abstract description 19
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 12
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 12
- 239000001257 hydrogen Substances 0.000 abstract description 12
- 239000004065 semiconductor Substances 0.000 abstract description 5
- 230000002411 adverse Effects 0.000 abstract description 3
- 210000002304 esc Anatomy 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 abstract 1
- 230000000694 effects Effects 0.000 abstract 1
- 238000010587 phase diagram Methods 0.000 description 7
- 230000008021 deposition Effects 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 229910010293 ceramic material Inorganic materials 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000010297 mechanical methods and process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 229910000833 kovar Inorganic materials 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating or a hardness or a material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
- H01L21/6833—Details of electrostatic chucks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q3/00—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
- B23Q3/15—Devices for holding work using magnetic or electric force acting directly on the work
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/6875—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (12)
- 静電チャックであって、
ワークピースを担持するように構成された支持面と、
前記支持面上に間隔を置いて分布し、10−4Ω・cm〜109Ω・cmの範囲の抵抗率を有する水素フリーアモルファスカーボンによって形成された複数の突出部とを備える、静電チャック。 - 突出部の高さは、1μm〜3μmの範囲である、請求項1に記載の静電チャック。
- 少なくとも1つの接着層をさらに備え、各接着層は、前記複数の突出部と同数を有する複数の接着部を含み、前記複数の接着部のそれぞれは、前記支持面と前記複数の突出部のうちの対応する1つとの間に設けられる、請求項1に記載の静電チャック。
- 前記接着層の素材は、接着性を有する金属を含む、請求項3に記載の静電チャック。
- 前記金属はチタンまたはクロムを含む、請求項4に記載の静電チャック。
- 誘電体層、前記支持面として使用される前記誘電体層の上面、および、
前記誘電体層に配置された電極をさらに備える、請求項1から5のうちのいずれか1項に記載の静電チャック。 - 静電チャック上に複数の突出部を製造するための方法であって、
S1において、ワークピースを担持するための前記静電チャックの支持面上にパターン化されたマスクを形成することと、
S2において、グラファイトターゲットを使用することによって炭素プラズマを発生させ、前記マスクによって覆われたエリアと、前記マスクによって覆われていないエリアとの両方の前記支持面上に水素フリーアモルファスカーボン層を堆積することと、
S3において、支持面上に間隔を置いて分布した突出部であって、10−4Ω・cm〜109Ω・cmの範囲の抵抗率を有する水素フリーアモルファスカーボンでできた複数の突出部を形成するように、前記マスクを除去することとを含む、方法。 - S1の後に、および、S2の前に、
S12において、前記マスクによって覆われたエリアと、前記マスクによって覆われていないエリアとの両方の前記支持面上に接着層を堆積することと、
S2において、前記グラファイトターゲットを使用して、前記炭素プラズマを発生し、前記接着層上に前記水素フリーアモルファスカーボン層を堆積することと、
S3において、前記支持面上に間隔を置いて分布した前記接着層を構成する複数の接着部と、前記複数の接着部のうちの対応する1つに設けられた前記複数の突出部とを形成するように、前記マスクを除去することとをさらに含む、請求項7に記載の方法。 - 前記接着層の素材は、チタンまたはクロムのような金属を含む、請求項8に記載の方法。
- S2において、プロセス温度は80℃より高くない、請求項7に記載の方法。
- S2は、
S21、前記グラファイトターゲットを使用して、前記炭素プラズマを発生させることと、
S22、前記炭素プラズマが前記支持面に向かって移動し、前記マスクによって覆われた、および、前記マスクによって覆われていない前記支持面の上に前記水素フリーアモルファスカーボン層が堆積されるとき、磁場を使用して、前記炭素プラズマをフィルタリングおよび/または集束することをさらに含む、請求項7記載の方法。 - 突出部の高さは、1μm〜3μmの範囲である、請求項7に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810271475.2 | 2018-03-29 | ||
CN201810271475.2A CN108538776B (zh) | 2018-03-29 | 2018-03-29 | 静电卡盘及其制造方法 |
PCT/CN2019/080031 WO2019184968A1 (zh) | 2018-03-29 | 2019-03-28 | 静电卡盘及其凸点制造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2021516871A true JP2021516871A (ja) | 2021-07-08 |
JP7119113B2 JP7119113B2 (ja) | 2022-08-16 |
Family
ID=63482448
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020552750A Active JP7119113B2 (ja) | 2018-03-29 | 2019-03-28 | 静電チャックおよびその突出部を製造するための方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US11309208B2 (ja) |
JP (1) | JP7119113B2 (ja) |
KR (1) | KR102428288B1 (ja) |
CN (1) | CN108538776B (ja) |
SG (1) | SG11202009425SA (ja) |
TW (1) | TWI689413B (ja) |
WO (1) | WO2019184968A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108538776B (zh) * | 2018-03-29 | 2021-11-16 | 北京北方华创微电子装备有限公司 | 静电卡盘及其制造方法 |
CN110119073A (zh) * | 2019-05-08 | 2019-08-13 | 深圳市华星光电技术有限公司 | 阵列曝光机的卡盘的修复方法、卡盘及阵列曝光机 |
CN110158029B (zh) * | 2019-07-05 | 2020-07-17 | 北京北方华创微电子装备有限公司 | 掩膜结构和fcva设备 |
CN112018021A (zh) * | 2020-10-16 | 2020-12-01 | 苏州芯慧联半导体科技有限公司 | 具有可再生性能的静电卡盘及其成型方法 |
US11699611B2 (en) | 2021-02-23 | 2023-07-11 | Applied Materials, Inc. | Forming mesas on an electrostatic chuck |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6423193B1 (en) * | 1999-08-30 | 2002-07-23 | Case Western Reserve University | Nitrogen doped carbon electrodes |
JP2007527625A (ja) * | 2004-02-24 | 2007-09-27 | アプライド マテリアルズ インコーポレイテッド | 汚染物質削減基板移送およびサポートシステム |
US20170140970A1 (en) * | 2015-11-17 | 2017-05-18 | Applied Materials, Inc. | Substrate support assembly with deposited surface features |
JP2018014515A (ja) * | 2017-09-07 | 2018-01-25 | 松田産業株式会社 | 静電チャック及びその製造方法並びに静電チャックの再生方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5583736A (en) * | 1994-11-17 | 1996-12-10 | The United States Of America As Represented By The Department Of Energy | Micromachined silicon electrostatic chuck |
US5903428A (en) * | 1997-09-25 | 1999-05-11 | Applied Materials, Inc. | Hybrid Johnsen-Rahbek electrostatic chuck having highly resistive mesas separating the chuck from a wafer supported thereupon and method of fabricating same |
US20030047283A1 (en) * | 2001-09-10 | 2003-03-13 | Applied Materials, Inc. | Apparatus for supporting a substrate and method of fabricating same |
CN1727410A (zh) * | 2005-07-26 | 2006-02-01 | 武汉大学 | 一种纳米复合类金刚石涂层及其制备方法 |
CN102002683B (zh) * | 2010-12-10 | 2012-09-05 | 厦门大学 | 一种含氢类金刚石膜的制备方法 |
CN102328904B (zh) * | 2011-09-30 | 2015-05-13 | 上海丽恒光微电子科技有限公司 | Mems器件的形成方法 |
CN105226049B (zh) * | 2014-06-26 | 2019-02-26 | 中芯国际集成电路制造(上海)有限公司 | 用于互连层结构的掩膜组件及互连层的制作方法 |
US20160230269A1 (en) * | 2015-02-06 | 2016-08-11 | Applied Materials, Inc. | Radially outward pad design for electrostatic chuck surface |
JP6132957B2 (ja) * | 2015-10-13 | 2017-05-24 | ヤス カンパニー リミテッド | 帯電処理による基板チャッキング方法及びシステム |
CN107154376A (zh) * | 2016-03-03 | 2017-09-12 | 北京华卓精科科技股份有限公司 | 静电卡盘装置 |
US11086234B2 (en) * | 2017-11-08 | 2021-08-10 | Asml Netherlands B.V. | Substrate holder and a method of manufacturing a device |
CN108538776B (zh) * | 2018-03-29 | 2021-11-16 | 北京北方华创微电子装备有限公司 | 静电卡盘及其制造方法 |
-
2018
- 2018-03-29 CN CN201810271475.2A patent/CN108538776B/zh active Active
-
2019
- 2019-03-28 SG SG11202009425SA patent/SG11202009425SA/en unknown
- 2019-03-28 TW TW108111076A patent/TWI689413B/zh active
- 2019-03-28 WO PCT/CN2019/080031 patent/WO2019184968A1/zh active Application Filing
- 2019-03-28 JP JP2020552750A patent/JP7119113B2/ja active Active
- 2019-03-28 KR KR1020207027042A patent/KR102428288B1/ko active IP Right Grant
- 2019-03-28 US US17/040,888 patent/US11309208B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6423193B1 (en) * | 1999-08-30 | 2002-07-23 | Case Western Reserve University | Nitrogen doped carbon electrodes |
JP2007527625A (ja) * | 2004-02-24 | 2007-09-27 | アプライド マテリアルズ インコーポレイテッド | 汚染物質削減基板移送およびサポートシステム |
US20170140970A1 (en) * | 2015-11-17 | 2017-05-18 | Applied Materials, Inc. | Substrate support assembly with deposited surface features |
JP2018014515A (ja) * | 2017-09-07 | 2018-01-25 | 松田産業株式会社 | 静電チャック及びその製造方法並びに静電チャックの再生方法 |
Also Published As
Publication number | Publication date |
---|---|
KR102428288B1 (ko) | 2022-08-02 |
SG11202009425SA (en) | 2020-10-29 |
WO2019184968A1 (zh) | 2019-10-03 |
TWI689413B (zh) | 2020-04-01 |
JP7119113B2 (ja) | 2022-08-16 |
KR20200121864A (ko) | 2020-10-26 |
US20210005496A1 (en) | 2021-01-07 |
TW201941922A (zh) | 2019-11-01 |
CN108538776B (zh) | 2021-11-16 |
US11309208B2 (en) | 2022-04-19 |
CN108538776A (zh) | 2018-09-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7119113B2 (ja) | 静電チャックおよびその突出部を製造するための方法 | |
JP5524213B2 (ja) | 調整可能な電気抵抗率を有するウェーハ処理装置 | |
JP5580760B2 (ja) | 多点クランプを用いた物理蒸着装置及び方法 | |
JPH04277648A (ja) | ダイヤモンド・コーティングを施した静電チャック | |
CN103794460A (zh) | 用于半导体装置性能改善的涂层 | |
TW201119522A (en) | Plasma processing apparatus and electrode for same | |
JP2008520087A (ja) | 封入型ウェーハプロセス機器とその作製方法 | |
CN108346611B (zh) | 静电吸盘及其制作方法与等离子体处理装置 | |
TWI831061B (zh) | 高溫雙極靜電卡盤 | |
US20030047283A1 (en) | Apparatus for supporting a substrate and method of fabricating same | |
JPWO2007043519A1 (ja) | 静電吸着機能を有するウエハ加熱装置 | |
JP2011179119A (ja) | 熱拡散器を用いた物理蒸着装置及び方法 | |
JPH033249A (ja) | 基板保持装置 | |
JP6630025B1 (ja) | 半導体製造用部品、複合体コーティング層を含む半導体製造用部品及びその製造方法 | |
CN104241183A (zh) | 静电吸盘的制造方法,静电吸盘及等离子体处理装置 | |
US11821082B2 (en) | Reduced defect deposition processes | |
CN104241181B (zh) | 静电吸盘的制造方法,静电吸盘及等离子体处理装置 | |
TW202234573A (zh) | 具有差異化的陶瓷的靜電卡盤 | |
JP4666817B2 (ja) | 高誘電体のエッチング装置 | |
KR101605704B1 (ko) | 대면적 바이폴라 정전척의 제조방법 및 이에 의해 제조된 대면적 바이폴라 정전척 | |
TW202230446A (zh) | 用於限制直流放電的雙極靜電卡緊 | |
US20110209989A1 (en) | Physical vapor deposition with insulated clamp | |
JP2002368070A (ja) | 成膜方法 | |
JPWO2020036715A5 (ja) | ||
JPH06450Y2 (ja) | コイル可動式イオンプレ−テイング装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20201016 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20211119 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20211124 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220222 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20220726 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20220803 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7119113 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |