JP2021516453A - ナノスケール整列3次元積層集積回路 - Google Patents
ナノスケール整列3次元積層集積回路 Download PDFInfo
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- JP2021516453A JP2021516453A JP2020565259A JP2020565259A JP2021516453A JP 2021516453 A JP2021516453 A JP 2021516453A JP 2020565259 A JP2020565259 A JP 2020565259A JP 2020565259 A JP2020565259 A JP 2020565259A JP 2021516453 A JP2021516453 A JP 2021516453A
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Abstract
Description
本出願は、その全体が参照により本明細書に組み込まれる、2017年12月22日に出願された「Nanoscale-Aligned 3D Stacked Integrated Circuit」という名称の米国仮特許出願第62/609,891号の優先権を主張する。
本発明は、概して、半導体製造に関し、より詳細には、ナノスケールアライン3次元(3D)積層集積回路に関する。
3D−IC SoCの合成は、市販の2D合成ツールを利用する。第1のパスでは、設計は、2D SoCで行われるのとまったく同じように合成される。配置が実行されると、3D配置認識合成が実行される。この合成パスでは、ツールは、正確な相互接続負荷及び遅延を得るために3D配置情報を有するので、より最適にセルを合成する。このプロセスフローも2D配置認識合成に類似しているが、この場合の配置情報は3次元である。
このセクションでは、ロジック/スタンダードセルの3D配置について説明する。本発明の方法では、設計ネットリストは、最初に、各モジュールネットリストが3D−IC SoC積層の異なる層上に配置される論理セルなどからなるように、複数のモジュールに分割される。次に、市販の2D EDAツールを使用して、3D積層の割り当てられた層内の各モジュールの2D配置が実行される。ネットリスト分割は、FM Min−Cut、Min−Flowなどの標準分割アルゴリズムを利用した社内ソリューションを使用して実行することができる。パーティショニングで生成されるモジュールは、モジュールペリフェラルに配置されるだけでなく、モジュール内の任意の場所に配置できる入出力ポートで構成される。その結果、社内で開発されたソフトウェアは、標準的なパーティショニングアルゴリズムを使用して、これらのポートの位置を生成する。複数のモジュールは、これらのポートを介して信号を転送する。これらのポートは、層間ビア(ILV)又はナノスケールのシリコン貫通ビア(nano−TSV)を介して接続できる。これらのポートの位置は、ILV及びTSVの熱的及び機械的安定性に基づいて制約される可能性がある。ポート位置が決定されると、タイミング・バジェット及びポート位置は、2D配置ツールに供給されて、各モジュールの配置を独立して実行し、同時に、全体的なタイミング及びパフォーマンスメトリックが測定されることを確実にする。合法的なセル配置を保証するために、TSV又はHFホールが通過するモジュール領域に配置又はルーティングブロックが形成される。即ち、社内で開発されたソフトウェアは、ILV/TSVロケーションでのDRC問題を回避する(設計ルールチェック)などのために、標準的なパーティショニングアルゴリズムを使用して、配置又はルーティングの妨害を生成する。
3D SoCのためのクロックツリー合成(CTS)は、既存の2D EDA配置及び経路(P&R)ツールを使用して実行することができる。設計が分割され、複数のモジュールに配置されると、クロックツリーを構築し、各モジュールに対して別々に最適化することができる。しかしながら、3Dクロックツリーの課題は、3Dクロックツリーが構築され得る複数のウェハにわたるプロセス変動を考慮しながら、セットアップ、ホールド等の違反がないことを保証することである。この問題を解決又は未然に防ぐために、複数の方法があり得る。可能な解決策の1つは、同じ層上への発射及び捕捉フロップの配置を制約することであり、即ち、データ経路のための発射及び捕捉フロップは、同じ層上に配置される必要がある。これは、社内ネットリスト分割ツールによって達成することができる。別の解決策は、最悪の場合のプロセス変動シナリオに違反がないことを保証するために、高いマージンを含めることである。
3D−IC SoCのためのルート方法は、各モジュール内の2Dルーティングと、ILV及びnano−TSVを使用する複数のモジュールにわたるルーティングとを含む。抵抗値とキャパシタンス値は正確に決定でき、次に議論する。3D−ICルーティング方法は、2Dルーティングと同じままである。各モジュールのルーティングは、2D P&Rツールを別々に使用して実施することができる。デザインルールチェック(DRC)障害がないことを保証するために、ILV及びTSV相互接続が配置される領域にルーティング・ブロッケージが形成される。
3D SoCの寄生抽出のための設計方法論は2D ASICとは異なる。抵抗値とキャパシタンス値は、TSVとILVとによって大きく変わる可能性がある。市販のEDAツールは、3D抽出を実行することができない。しかしながら、本発明の実施形態は、既存の2D抽出器を利用する3D抽出フローを利用する。このフローでは、まず、各モジュール又は層のレイアウト情報がストリーミングアウトされる。次に、すべてのモジュールのレイアウト/ルートデータが、Virtuoso(登録商標)などのレイアウトエディタツールにストリーミングされる。ストリーミングイン中に、特定のモジュールのレイアウトを必要に応じて反転させて、3D SoC積層と同じように見せることができる。そして、このレイアウト上でエクストラクタを実行する。得られた抵抗値と静電容量値は、TSVとILVを考慮して3Dレイアウトを考慮しており、正確であると期待される。
Claims (30)
- 3次元の(3D)システムオンチップ(SoC)を製造する方法であって、
層(k)2次元の(2D)ダイアレイを、層(k−1)ウェハの層(k−1)2Dダイアレイ上に組み立て、ここで、前記層(k−1)ウェハに2Dダイが配置され、前記kは1より大きい正の整数であり、前記2Dダイアレイは、単一の2Dダイと、2Dダイの連続するグループを形成する2Dダイの単一のアイランド、又は2Dダイの複数のアイランドを含み、
前記層(k)2Dダイアレイと前記層(k−1)2Dダイアレイとの間の潤滑された相対運動を可能にする流体を配置し、ここで、前記流体は、前記層(k)及び層(k−1)2Dダイアレイの精密なオーバーレイを可能にする
ことを特徴とする方法。 - 前記アセンブリが、層(k)ウェハの各2Dダイと前記層(k−1)ウェハの対応する2Dダイとの間の、サブ100nmオーバーレイ、サブ50nmオーバーレイ、サブ30nmオーバーレイ、サブ20nmオーバーレイ、サブ10nmオーバーレイ、及びサブ5nmオーバーレイのうちの1つを達成するように実行されることを特徴とする請求項1に記載の方法。
- 前記流体が、気体、液体、及びそれらの組み合わせのうちの1つを含み、前記組み合わせが、異種の気体及び液体部分、又は均質に混合された気体及び液体の一部を含むことを特徴とする請求項1に記載の方法。
- 前記2Dダイは、前記層(k−1)ウェハから前記2Dダイを解放するためのエッチャントのためのアクセスホールを含むことを特徴とする請求項1に記載の方法。
- さらに、前記3D SoC内でシリコン貫通ビアを可能にする導体を生成するために、前記アクセスホールを利用することを特徴とする請求項4に記載の方法。
- 前記SoCが、特定用途向け集積回路(ASIC)システムを含み、前記ASICシステムが、論理回路及びメモリ回路の精密なオーバーレイを可能にするピックアンドプレース法を用いて、3次元(3D)で設計及び製造された前記論理回路及びメモリ回路を含むことを特徴とする請求項1に記載の方法。
- 前記ASICシステムが、さらに、n個のベース層を含み、ここで、前記nは1より大きく、前記n個のベース層の1つ以上は、フェイス・ツー・フェイス、フェイス・ツー・バック、バック・ツー・バックのうち1つ以上に配置されることを特徴とする請求項6に記載の方法。
- 前記ASICシステムが、3次元の(3D)メモリ実装を伴う2次元の(2D)論理実装、2Dメモリ実装を伴う3D論理実装、及び3Dメモリ実装を伴う3D論理実装のうちのいずれかを使用して設計されることを特徴とする請求項6に記載の方法。
- 前記ASICシステムが、3Dスタティックランダムアクセスメモリ(SRAM)構成、即ち、3Dスタンドアロン積層SRAM及び3Dオンリービットセル積層SRAM、のうちの1以上において使用されることを特徴とする請求項6に記載の方法。
- 3次元の(3D)システムオンチップ(SoC)を製造する方法であって、
層(k)2次元の(2D)ダイアレイを、層(k−1)ウェハの層(k−1)2Dダイアレイ上に組み立て、ここで、前記層(k−1)ウェハに2Dダイが配置され、前記kは1より大きい正の整数であり、前記2Dダイアレイは、単一の2Dダイ、2Dダイの連続したグループを形成する2Dダイの単一のアイランド、又は2Dダイの複数のアイランドを含み、
層(k)ウェハ及び前記層(k−1)ウェハのそれぞれの2Dダイをピックアンドプレースプロセス中に使用されるエッチャントから保護するためのカプセル化層を提供する
ことを特徴とする方法。 - 前記カプセル化層が、相補型金属酸化膜半導体(CMOS)及び/又はIII−V半導体と適合性であることを特徴とする請求項10に記載の方法。
- 前記アセンブリが、前記層(k)ウェハの各2Dダイと前記層(k−1)ウェハの対応する2Dダイとの間の、サブ100nmオーバーレイ、サブ50nmオーバーレイ、サブ30nmオーバーレイ、サブ20nmオーバーレイ、サブ10nmオーバーレイ、及びサブ5nmオーバーレイのうちの1つを達成するように実行されることを特徴とする請求項10に記載の方法。
- 前記2Dダイは、前記層(k−1)ウェハから前記2Dダイを解放するためのエッチャントのためのアクセスホールを含むことを特徴とする請求項10に記載の方法。
- さらに、前記3D SoC内でシリコン貫通ビアを可能にする導体を生成するために、前記アクセスホールを利用することを特徴とする請求項13に記載の方法。
- 前記SoCが、特定用途向け集積回路(ASIC)システムを含み、前記ASICシステムが、論理回路及びメモリ回路の精密なオーバーレイを可能にする前記ピックアンドプレースプロセスを使用して、3次元(3D)で設計及び製造された前記論理回路及びメモリ回路を含むことを特徴とする請求項10に記載の方法。
- 前記ASICシステムが、n個のベース層をさらに含み、ここで、前記nは1より大きく、前記n個のベース層のうちの1つ以上は、フェイス・ツー・フェイス、フェイス・ツー・バック及びバック・ツー・バックのうちの1つ以上に配置されることを特徴とする請求項15に記載の方法。
- 前記ASICシステムが、3次元の(3D)メモリ実装を伴う2次元の(2D)論理実装、2Dメモリ実装を伴う3D論理実装、及び3Dメモリ実装を伴う3D論理実装のうちのいずれかを使用して設計されることを特徴とする請求項15に記載の方法。
- 前記ASICシステムが、3Dスタティックランダムアクセスメモリ(SRAM)構成、即ち、3Dスタンドアロン積層SRAM及び3Dオンリービットセル積層SRAMのうちの1以上において使用されることを特徴とする請求項15に記載の方法。
- 3次元の(3D)システムオンチップ(SoC)を製造するための方法であって、
層(k)2次元の(2D)ダイアレイを、層(k−1)ウェハの層(k−1)2Dダイアレイ上に組み立て、ここで、前記層(k−1)ウェハに2Dダイが配置され、前記kは1より大きい正の整数であり、前記2Dダイアレイは、単一の2Dダイ、2Dダイの連続したグループを形成する2Dダイの単一のアイランド、又は2Dダイの複数のアイランドを含み、前記2Dダイは10マイクロメートル未満の厚さを有する
ことを特徴とする方法。 - 前記アセンブリが、層(k)ウェハの各2Dダイと前記層(k−1)ウェハの対応する2Dダイとの間の、サブ100nmオーバーレイ、サブ50nmオーバーレイ、サブ30nmオーバーレイ、サブ20nmオーバーレイ、サブ10nmオーバーレイ、及びサブ5nmオーバーレイのうちの1つを達成するように実行されることを特徴とする請求項19に記載の方法。
- 前記2Dダイは、前記層(k−1)ウェハから前記2Dダイを解放するためのエッチャントのためのアクセスホールを含むことを特徴とする請求項19に記載の方法。
- さらに、前記3D SoC内でシリコン貫通ビアを可能にする導体を生成するために、前記アクセスホールを利用することを特徴とする請求項21に記載の方法。
- 前記SoCが、特定用途向け集積回路(ASIC)システムを含み、前記ASICシステムが、論理回路及びメモリ回路の精密なオーバーレイを可能にするピックアンドプレース法を用いて、3次元(3D)で設計及び製造された前記論理回路及びメモリ回路を含むことを特徴とする請求項19に記載の方法。
- 前記ASICシステムが、n個のベース層をさらに含み、ここで、前記nは1より大きく、前記n個のベース層のうちの1つ以上は、フェイス・ツー・フェイス、フェイス・ツー・バック及びバック・ツー・バックのうちの1つ以上に配置されることを特徴とする請求項23に記載の方法。
- 前記ASICシステムが、3次元の(3D)モリ実装を伴う2次元の(2D)論理実装、2Dメモリ実装を伴う3D論理実装、及び3Dメモリ実装を伴う3D論理実装のうちのいずれかを使用して設計されることを特徴とする請求項23に記載の方法。
- 前記ASICシステムが、3Dスタティックランダムアクセスメモリ(SRAM)構成、即ち、3Dスタンドアロン積層SRAM及び3Dオンリービットセル積層SRAMのうちの1つ以上において使用されることを特徴とする請求項23に記載の方法。
- 3次元の(3D)特定用途向け集積回路(ASIC)システムオンチップ(SoC)論理回路を設計するための電子設計自動化(EDA)方法論であって、
2次元の(2D)EDAソリューションと統合されたソフトウェアの組み合わせを含み、ここで、前記ソフトウェアは、3D設計ネットリストを2Dモジュールに分割するネットリスト分割アルゴリズムを含み、前記2D EDAソリューションは、合成、3D配置認識合成、配置、クロックツリー合成(CTS)、ルーティング、設計検証、及びサインオフ解析のうちの1つ以上を実行するために使用される
ことを特徴とするEDA方法論。 - 前記アルゴリズムは、ポートの位置を生成することと、配置又はルーティングの妨害を生成することとのうちの1つ以上を実行することを特徴とする請求項27に記載のEDA方法論。
- 前記ポートの前記位置は、層間ビア(ILV)及びシリコン貫通ビア(TSV)の熱的及び機械的安定性に基づいて制約されることを特徴とする請求項28に記載のEDA方法論。
- さらに、
レイアウト又はルートデータをレイアウトエディタツールにストリーミングし、ここで、特定のモジュールのレイアウトは、前記特定のモジュールの前記レイアウトを3D SoC積層と同一に見えるようにすることに応答してフリップされ、
前記レイアウトを考慮するとともに、ILV及びTSVを考慮して、抵抗値及びキャパシタンス値を取得する
ことを特徴とする請求項27に記載のEDA方法論。
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