JP2021504113A5 - - Google Patents
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- Publication number
- JP2021504113A5 JP2021504113A5 JP2020528373A JP2020528373A JP2021504113A5 JP 2021504113 A5 JP2021504113 A5 JP 2021504113A5 JP 2020528373 A JP2020528373 A JP 2020528373A JP 2020528373 A JP2020528373 A JP 2020528373A JP 2021504113 A5 JP2021504113 A5 JP 2021504113A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- block copolymer
- temperature
- polymer
- prepolymer composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920001400 block copolymer Polymers 0.000 claims 30
- 238000000034 method Methods 0.000 claims 28
- 239000000203 mixture Substances 0.000 claims 17
- 229920000642 polymer Polymers 0.000 claims 11
- 238000004132 cross linking Methods 0.000 claims 8
- 230000009477 glass transition Effects 0.000 claims 7
- 238000004519 manufacturing process Methods 0.000 claims 6
- 238000005329 nanolithography Methods 0.000 claims 6
- 230000007935 neutral effect Effects 0.000 claims 6
- 230000008520 organization Effects 0.000 claims 6
- 239000000126 substance Substances 0.000 claims 6
- 238000010438 heat treatment Methods 0.000 claims 5
- 239000000178 monomer Substances 0.000 claims 5
- 229920001577 copolymer Polymers 0.000 claims 4
- 238000000407 epitaxy Methods 0.000 claims 4
- 239000000463 material Substances 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- 239000003054 catalyst Substances 0.000 claims 3
- 238000006243 chemical reaction Methods 0.000 claims 3
- 239000011248 coating agent Substances 0.000 claims 3
- 238000000576 coating method Methods 0.000 claims 3
- 238000000151 deposition Methods 0.000 claims 3
- 239000000539 dimer Substances 0.000 claims 3
- 125000000524 functional group Chemical group 0.000 claims 3
- 230000001939 inductive effect Effects 0.000 claims 3
- 230000008569 process Effects 0.000 claims 3
- 239000002904 solvent Substances 0.000 claims 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 claims 2
- 229920001651 Cyanoacrylate Polymers 0.000 claims 2
- 239000004593 Epoxy Substances 0.000 claims 2
- MWCLLHOVUTZFKS-UHFFFAOYSA-N Methyl cyanoacrylate Chemical compound COC(=O)C(=C)C#N MWCLLHOVUTZFKS-UHFFFAOYSA-N 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- 239000002253 acid Substances 0.000 claims 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims 2
- 230000003213 activating effect Effects 0.000 claims 2
- 239000003153 chemical reaction reagent Substances 0.000 claims 2
- 238000001459 lithography Methods 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- CXOFVDLJLONNDW-UHFFFAOYSA-N Phenytoin Chemical group N1C(=O)NC(=O)C1(C=1C=CC=CC=1)C1=CC=CC=C1 CXOFVDLJLONNDW-UHFFFAOYSA-N 0.000 claims 1
- 238000007259 addition reaction Methods 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 238000000137 annealing Methods 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 239000013626 chemical specie Substances 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 230000000694 effects Effects 0.000 claims 1
- 239000012530 fluid Substances 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 229910052732 germanium Inorganic materials 0.000 claims 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical group [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims 1
- 239000007943 implant Substances 0.000 claims 1
- 238000011065 in-situ storage Methods 0.000 claims 1
- 239000000976 ink Substances 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 239000012528 membrane Substances 0.000 claims 1
- 238000004377 microelectronic Methods 0.000 claims 1
- 239000002086 nanomaterial Substances 0.000 claims 1
- 230000003472 neutralizing effect Effects 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 239000005022 packaging material Substances 0.000 claims 1
- 239000003973 paint Substances 0.000 claims 1
- 230000037361 pathway Effects 0.000 claims 1
- 239000011877 solvent mixture Substances 0.000 claims 1
- 230000000638 stimulation Effects 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1761180 | 2017-11-24 | ||
| FR1761180A FR3074179B1 (fr) | 2017-11-24 | 2017-11-24 | Procede de controle de la planeite d'un empilement polymerique |
| PCT/FR2018/052964 WO2019102160A1 (fr) | 2017-11-24 | 2018-11-23 | Procede de fabrication d'un empilement polymerique plan |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2021504113A JP2021504113A (ja) | 2021-02-15 |
| JP2021504113A5 true JP2021504113A5 (enExample) | 2021-12-16 |
Family
ID=61003217
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020528373A Pending JP2021504113A (ja) | 2017-11-24 | 2018-11-23 | 平坦なポリマースタックを製造するための方法 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US11454880B2 (enExample) |
| EP (1) | EP3714328A1 (enExample) |
| JP (1) | JP2021504113A (enExample) |
| KR (1) | KR20200088449A (enExample) |
| CN (1) | CN111615666B (enExample) |
| FR (1) | FR3074179B1 (enExample) |
| SG (1) | SG11202004857VA (enExample) |
| TW (1) | TWI806914B (enExample) |
| WO (1) | WO2019102160A1 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR3101354A1 (fr) * | 2019-10-01 | 2021-04-02 | Arkema France | Sous-couche neutre pour copolymère à blocs et empilement polymérique comprenant une telle sous-couche recouverte d’un film de copolymère à blocs |
| FR3101355A1 (fr) * | 2019-10-01 | 2021-04-02 | Arkema France | Sous-couche neutre pour copolymère à blocs et empilement polymérique comprenant une telle sous-couche recouverte d’un film de copolymère à blocs |
| FR3105786A1 (fr) | 2019-12-31 | 2021-07-02 | Arkema France | Procédé de nanostructuration d’un substrat |
| FR3105793B1 (fr) | 2019-12-31 | 2023-11-17 | Arkema France | Composition prepolymere destinee a former une couche de contraste et procede de structuration d’un materiau d’interface |
| FR3105755A1 (fr) | 2019-12-31 | 2021-07-02 | Arkema France | Procédé de fabrication d’une couche d’arrêt de gravure pour nanolithographie par autoassemblage dirigé |
| CN114551225B (zh) * | 2020-11-25 | 2025-07-25 | 浙江大学 | 一种手性导向的嵌段共聚物自组装光刻的方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6258514B1 (en) * | 1999-03-10 | 2001-07-10 | Lsi Logic Corporation | Top surface imaging technique using a topcoat delivery system |
| US6917399B2 (en) * | 2001-02-22 | 2005-07-12 | 3M Innovative Properties Company | Optical bodies containing cholesteric liquid crystal material and methods of manufacture |
| US20070254244A1 (en) * | 2006-05-01 | 2007-11-01 | Taiwan Semiconductor Manufacturing Co., | Method of forming a resist structure |
| EP2216683B1 (en) * | 2009-02-08 | 2018-11-14 | Rohm and Haas Electronic Materials, L.L.C. | Substrates coated with an antireflective composition and a photoresist |
| US9157008B2 (en) | 2012-02-10 | 2015-10-13 | Board Of Regents, The University Of Texas System | Anhydride copolymer top coats for orientation control of thin film block copolymers |
| US9802400B2 (en) * | 2013-06-24 | 2017-10-31 | Dow Global Technologies Llc | Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers |
| JP6249714B2 (ja) * | 2013-10-25 | 2017-12-20 | 東京応化工業株式会社 | 相分離構造を含む構造体の製造方法 |
| TWI648320B (zh) * | 2014-01-23 | 2019-01-21 | 東京應化工業股份有限公司 | 含相分離結構之結構體之製造方法、圖型形成方法、微細圖型形成方法 |
| JP6650879B2 (ja) * | 2014-03-15 | 2020-02-19 | ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム | ブロックコポリマーの秩序化 |
| JP6298691B2 (ja) * | 2014-04-09 | 2018-03-20 | 東京応化工業株式会社 | 相分離構造を含む構造体の製造方法及びトップコート膜の成膜方法 |
| CN104817713B (zh) * | 2015-05-21 | 2017-11-21 | 西安工业大学 | 一种聚合物混合加工的方法 |
| FR3037070B1 (fr) * | 2015-06-02 | 2019-05-31 | Arkema France | Procede de controle de l'energie de surface a l'interface entre un copolymere a blocs et un autre compose |
| FR3037071B1 (fr) | 2015-06-02 | 2019-06-21 | Arkema France | Procede de reduction de la defectivite d'un film de copolymere a blocs |
-
2017
- 2017-11-24 FR FR1761180A patent/FR3074179B1/fr not_active Expired - Fee Related
-
2018
- 2018-10-30 TW TW107138304A patent/TWI806914B/zh not_active IP Right Cessation
- 2018-11-23 SG SG11202004857VA patent/SG11202004857VA/en unknown
- 2018-11-23 EP EP18822429.9A patent/EP3714328A1/fr not_active Withdrawn
- 2018-11-23 JP JP2020528373A patent/JP2021504113A/ja active Pending
- 2018-11-23 US US16/766,491 patent/US11454880B2/en active Active
- 2018-11-23 WO PCT/FR2018/052964 patent/WO2019102160A1/fr not_active Ceased
- 2018-11-23 KR KR1020207018083A patent/KR20200088449A/ko not_active Ceased
- 2018-11-23 CN CN201880086931.4A patent/CN111615666B/zh not_active Expired - Fee Related
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