FR3105793B1 - Composition prepolymere destinee a former une couche de contraste et procede de structuration d’un materiau d’interface - Google Patents

Composition prepolymere destinee a former une couche de contraste et procede de structuration d’un materiau d’interface Download PDF

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Publication number
FR3105793B1
FR3105793B1 FR1915800A FR1915800A FR3105793B1 FR 3105793 B1 FR3105793 B1 FR 3105793B1 FR 1915800 A FR1915800 A FR 1915800A FR 1915800 A FR1915800 A FR 1915800A FR 3105793 B1 FR3105793 B1 FR 3105793B1
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FR
France
Prior art keywords
prepolymer
crosslinking
structuring
prepolymer composition
interface material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1915800A
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English (en)
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FR3105793A1 (fr
Inventor
Xavier Chevalier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Arkema France SA
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Arkema France SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arkema France SA filed Critical Arkema France SA
Priority to FR1915800A priority Critical patent/FR3105793B1/fr
Priority to TW109145489A priority patent/TW202146482A/zh
Priority to CN202080091054.7A priority patent/CN114901729A/zh
Priority to EP20841739.4A priority patent/EP4077495A1/fr
Priority to US17/785,324 priority patent/US11868044B2/en
Priority to KR1020227021506A priority patent/KR20220123399A/ko
Priority to JP2022539681A priority patent/JP2023509016A/ja
Priority to PCT/EP2020/088006 priority patent/WO2021136793A1/fr
Publication of FR3105793A1 publication Critical patent/FR3105793A1/fr
Application granted granted Critical
Publication of FR3105793B1 publication Critical patent/FR3105793B1/fr
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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00Processes of treating or compounding macromolecular substances
    • C08J3/24Crosslinking, e.g. vulcanising, of macromolecules
    • C08J3/243Two or more independent types of crosslinking for one or more polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Laminated Bodies (AREA)
  • Materials For Photolithography (AREA)
  • Graft Or Block Polymers (AREA)
  • Formation Of Insulating Films (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Sampling And Sample Adjustment (AREA)

Abstract

L’invention concerne une composition prépolymère réticulable destinée à être utilisée comme couche de contraste. Elle concerne aussi un procédé de structuration d’un matériau d’interface. Ce procédé est caractérisé notamment par les étapes suivantes : déposer, sur un film de copolymère à blocs, une couche de composition prépolymère comprenant une pluralité de monomères fonctionnels et au moins un groupement fonctionnel réticulable au sein de sa chaine polymérique et d’autre part, deux agents de réticulation chimiquement différents, chaque agent étant apte à initier la réticulation dudit prépolymère en réponse à une stimulation qui lui est propre, soumettre l’empilement à une première stimulation localisée sur des premières zones, de manière à provoquer une réaction de réticulation des chaines moléculaires dudit prépolymère et soumettre l’empilement à une deuxième stimulation, de manière à provoquer une réticulation des chaines moléculaires dudit prépolymère par action dudit deuxième agent de réticulation dans des zones secondaires. Figure de l’abrégé : FIGURE 2
FR1915800A 2019-12-31 2019-12-31 Composition prepolymere destinee a former une couche de contraste et procede de structuration d’un materiau d’interface Active FR3105793B1 (fr)

Priority Applications (8)

Application Number Priority Date Filing Date Title
FR1915800A FR3105793B1 (fr) 2019-12-31 2019-12-31 Composition prepolymere destinee a former une couche de contraste et procede de structuration d’un materiau d’interface
TW109145489A TW202146482A (zh) 2019-12-31 2020-12-22 用於形成對比層之預聚物組成物及使界面材料結構化之方法
EP20841739.4A EP4077495A1 (fr) 2019-12-31 2020-12-29 Composition prepolymere destinee a former une couche de contraste et procede de structuration d'un materiau d'interface
US17/785,324 US11868044B2 (en) 2019-12-31 2020-12-29 Prepolymer composition intended to form a contrast layer and method for structuring an interface material
CN202080091054.7A CN114901729A (zh) 2019-12-31 2020-12-29 旨在用于形成对比层的预聚物组合物以及使界面材料结构化的方法
KR1020227021506A KR20220123399A (ko) 2019-12-31 2020-12-29 콘트라스트 층을 형성하도록 의도된 프리폴리머 조성물 및 계면 재료를 구조화하는 방법
JP2022539681A JP2023509016A (ja) 2019-12-31 2020-12-29 コントラスト層を形成するためのプレポリマー組成物及び界面材料を構造化するための方法
PCT/EP2020/088006 WO2021136793A1 (fr) 2019-12-31 2020-12-29 Composition prepolymere destinee a former une couche de contraste et procede de structuration d'un materiau d'interface

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1915800 2019-12-31
FR1915800A FR3105793B1 (fr) 2019-12-31 2019-12-31 Composition prepolymere destinee a former une couche de contraste et procede de structuration d’un materiau d’interface

Publications (2)

Publication Number Publication Date
FR3105793A1 FR3105793A1 (fr) 2021-07-02
FR3105793B1 true FR3105793B1 (fr) 2023-11-17

Family

ID=70918524

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1915800A Active FR3105793B1 (fr) 2019-12-31 2019-12-31 Composition prepolymere destinee a former une couche de contraste et procede de structuration d’un materiau d’interface

Country Status (8)

Country Link
US (1) US11868044B2 (fr)
EP (1) EP4077495A1 (fr)
JP (1) JP2023509016A (fr)
KR (1) KR20220123399A (fr)
CN (1) CN114901729A (fr)
FR (1) FR3105793B1 (fr)
TW (1) TW202146482A (fr)
WO (1) WO2021136793A1 (fr)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6168836B1 (en) * 1998-10-30 2001-01-02 Macdermid, Incorporated Process for plating upon a polymeric surface
US9080061B2 (en) * 2006-05-03 2015-07-14 Surface Solutions Laboratories Coating resins and coating with multiple crosslink functionalities
TWI561919B (en) * 2014-03-15 2016-12-11 Univ Texas Ordering block copolymers
FR3074180B1 (fr) * 2017-11-24 2021-01-01 Arkema France Procede de controle de la planeite d'un empilement polymerique
FR3074179B1 (fr) * 2017-11-24 2021-01-01 Arkema France Procede de controle de la planeite d'un empilement polymerique

Also Published As

Publication number Publication date
EP4077495A1 (fr) 2022-10-26
JP2023509016A (ja) 2023-03-06
US20230063847A1 (en) 2023-03-02
WO2021136793A1 (fr) 2021-07-08
KR20220123399A (ko) 2022-09-06
CN114901729A (zh) 2022-08-12
FR3105793A1 (fr) 2021-07-02
TW202146482A (zh) 2021-12-16
US11868044B2 (en) 2024-01-09

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