FR3105793B1 - Composition prepolymere destinee a former une couche de contraste et procede de structuration d’un materiau d’interface - Google Patents
Composition prepolymere destinee a former une couche de contraste et procede de structuration d’un materiau d’interface Download PDFInfo
- Publication number
- FR3105793B1 FR3105793B1 FR1915800A FR1915800A FR3105793B1 FR 3105793 B1 FR3105793 B1 FR 3105793B1 FR 1915800 A FR1915800 A FR 1915800A FR 1915800 A FR1915800 A FR 1915800A FR 3105793 B1 FR3105793 B1 FR 3105793B1
- Authority
- FR
- France
- Prior art keywords
- prepolymer
- crosslinking
- structuring
- prepolymer composition
- interface material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title abstract 3
- 239000000463 material Substances 0.000 title abstract 2
- 238000004132 cross linking Methods 0.000 abstract 3
- 230000000638 stimulation Effects 0.000 abstract 3
- 239000003431 cross linking reagent Substances 0.000 abstract 2
- 229920001400 block copolymer Polymers 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 125000000524 functional group Chemical group 0.000 abstract 1
- 230000000977 initiatory effect Effects 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/24—Crosslinking, e.g. vulcanising, of macromolecules
- C08J3/243—Two or more independent types of crosslinking for one or more polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Laminated Bodies (AREA)
- Materials For Photolithography (AREA)
- Graft Or Block Polymers (AREA)
- Formation Of Insulating Films (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Sampling And Sample Adjustment (AREA)
Abstract
L’invention concerne une composition prépolymère réticulable destinée à être utilisée comme couche de contraste. Elle concerne aussi un procédé de structuration d’un matériau d’interface. Ce procédé est caractérisé notamment par les étapes suivantes : déposer, sur un film de copolymère à blocs, une couche de composition prépolymère comprenant une pluralité de monomères fonctionnels et au moins un groupement fonctionnel réticulable au sein de sa chaine polymérique et d’autre part, deux agents de réticulation chimiquement différents, chaque agent étant apte à initier la réticulation dudit prépolymère en réponse à une stimulation qui lui est propre, soumettre l’empilement à une première stimulation localisée sur des premières zones, de manière à provoquer une réaction de réticulation des chaines moléculaires dudit prépolymère et soumettre l’empilement à une deuxième stimulation, de manière à provoquer une réticulation des chaines moléculaires dudit prépolymère par action dudit deuxième agent de réticulation dans des zones secondaires. Figure de l’abrégé : FIGURE 2
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1915800A FR3105793B1 (fr) | 2019-12-31 | 2019-12-31 | Composition prepolymere destinee a former une couche de contraste et procede de structuration d’un materiau d’interface |
TW109145489A TW202146482A (zh) | 2019-12-31 | 2020-12-22 | 用於形成對比層之預聚物組成物及使界面材料結構化之方法 |
EP20841739.4A EP4077495A1 (fr) | 2019-12-31 | 2020-12-29 | Composition prepolymere destinee a former une couche de contraste et procede de structuration d'un materiau d'interface |
US17/785,324 US11868044B2 (en) | 2019-12-31 | 2020-12-29 | Prepolymer composition intended to form a contrast layer and method for structuring an interface material |
CN202080091054.7A CN114901729A (zh) | 2019-12-31 | 2020-12-29 | 旨在用于形成对比层的预聚物组合物以及使界面材料结构化的方法 |
KR1020227021506A KR20220123399A (ko) | 2019-12-31 | 2020-12-29 | 콘트라스트 층을 형성하도록 의도된 프리폴리머 조성물 및 계면 재료를 구조화하는 방법 |
JP2022539681A JP2023509016A (ja) | 2019-12-31 | 2020-12-29 | コントラスト層を形成するためのプレポリマー組成物及び界面材料を構造化するための方法 |
PCT/EP2020/088006 WO2021136793A1 (fr) | 2019-12-31 | 2020-12-29 | Composition prepolymere destinee a former une couche de contraste et procede de structuration d'un materiau d'interface |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1915800 | 2019-12-31 | ||
FR1915800A FR3105793B1 (fr) | 2019-12-31 | 2019-12-31 | Composition prepolymere destinee a former une couche de contraste et procede de structuration d’un materiau d’interface |
Publications (2)
Publication Number | Publication Date |
---|---|
FR3105793A1 FR3105793A1 (fr) | 2021-07-02 |
FR3105793B1 true FR3105793B1 (fr) | 2023-11-17 |
Family
ID=70918524
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR1915800A Active FR3105793B1 (fr) | 2019-12-31 | 2019-12-31 | Composition prepolymere destinee a former une couche de contraste et procede de structuration d’un materiau d’interface |
Country Status (8)
Country | Link |
---|---|
US (1) | US11868044B2 (fr) |
EP (1) | EP4077495A1 (fr) |
JP (1) | JP2023509016A (fr) |
KR (1) | KR20220123399A (fr) |
CN (1) | CN114901729A (fr) |
FR (1) | FR3105793B1 (fr) |
TW (1) | TW202146482A (fr) |
WO (1) | WO2021136793A1 (fr) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6168836B1 (en) * | 1998-10-30 | 2001-01-02 | Macdermid, Incorporated | Process for plating upon a polymeric surface |
US9080061B2 (en) * | 2006-05-03 | 2015-07-14 | Surface Solutions Laboratories | Coating resins and coating with multiple crosslink functionalities |
TWI561919B (en) * | 2014-03-15 | 2016-12-11 | Univ Texas | Ordering block copolymers |
FR3074180B1 (fr) * | 2017-11-24 | 2021-01-01 | Arkema France | Procede de controle de la planeite d'un empilement polymerique |
FR3074179B1 (fr) * | 2017-11-24 | 2021-01-01 | Arkema France | Procede de controle de la planeite d'un empilement polymerique |
-
2019
- 2019-12-31 FR FR1915800A patent/FR3105793B1/fr active Active
-
2020
- 2020-12-22 TW TW109145489A patent/TW202146482A/zh unknown
- 2020-12-29 JP JP2022539681A patent/JP2023509016A/ja active Pending
- 2020-12-29 CN CN202080091054.7A patent/CN114901729A/zh active Pending
- 2020-12-29 WO PCT/EP2020/088006 patent/WO2021136793A1/fr unknown
- 2020-12-29 EP EP20841739.4A patent/EP4077495A1/fr active Pending
- 2020-12-29 US US17/785,324 patent/US11868044B2/en active Active
- 2020-12-29 KR KR1020227021506A patent/KR20220123399A/ko unknown
Also Published As
Publication number | Publication date |
---|---|
EP4077495A1 (fr) | 2022-10-26 |
JP2023509016A (ja) | 2023-03-06 |
US20230063847A1 (en) | 2023-03-02 |
WO2021136793A1 (fr) | 2021-07-08 |
KR20220123399A (ko) | 2022-09-06 |
CN114901729A (zh) | 2022-08-12 |
FR3105793A1 (fr) | 2021-07-02 |
TW202146482A (zh) | 2021-12-16 |
US11868044B2 (en) | 2024-01-09 |
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