JP2021132030A5 - - Google Patents
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- Publication number
- JP2021132030A5 JP2021132030A5 JP2021023211A JP2021023211A JP2021132030A5 JP 2021132030 A5 JP2021132030 A5 JP 2021132030A5 JP 2021023211 A JP2021023211 A JP 2021023211A JP 2021023211 A JP2021023211 A JP 2021023211A JP 2021132030 A5 JP2021132030 A5 JP 2021132030A5
- Authority
- JP
- Japan
- Prior art keywords
- charged particle
- particle beam
- objective lens
- lens assembly
- ray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US16/793,314 | 2020-02-18 | ||
| US16/793,314 US11257657B2 (en) | 2020-02-18 | 2020-02-18 | Charged particle beam device with interferometer for height measurement |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2021132030A JP2021132030A (ja) | 2021-09-09 |
| JP2021132030A5 true JP2021132030A5 (https=) | 2022-03-23 |
| JP7171795B2 JP7171795B2 (ja) | 2022-11-15 |
Family
ID=77272995
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021023211A Active JP7171795B2 (ja) | 2020-02-18 | 2021-02-17 | 高さ測定用の干渉計を有する荷電粒子ビーム装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US11257657B2 (https=) |
| JP (1) | JP7171795B2 (https=) |
| KR (1) | KR102493825B1 (https=) |
| CN (1) | CN113340927B (https=) |
| TW (1) | TWI790545B (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115083869B (zh) * | 2022-06-06 | 2025-09-26 | 惠然科技有限公司 | 机械对中装置及电子显微镜 |
| JP2025132046A (ja) * | 2024-02-29 | 2025-09-10 | リオン株式会社 | 粒子計測装置及び粒子計測方法 |
| WO2026062889A1 (ja) * | 2024-09-20 | 2026-03-26 | 株式会社日立ハイテク | 光学装置及び荷電粒子線装置 |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0221553A (ja) * | 1988-07-08 | 1990-01-24 | Nec Corp | 電子線測長装置 |
| JPH0262039A (ja) * | 1988-08-29 | 1990-03-01 | Hitachi Ltd | 多層素子の微細加工方法およびその装置 |
| US6765217B1 (en) * | 1998-04-28 | 2004-07-20 | Nikon Corporation | Charged-particle-beam mapping projection-optical systems and methods for adjusting same |
| US6232787B1 (en) * | 1999-01-08 | 2001-05-15 | Schlumberger Technologies, Inc. | Microstructure defect detection |
| US6912054B2 (en) * | 2001-08-28 | 2005-06-28 | Zygo Corporation | Interferometric stage system |
| JP3969640B2 (ja) * | 2002-04-10 | 2007-09-05 | 日本電信電話株式会社 | 荷電粒子ビーム描画装置およびそれを用いた描画方法 |
| US20050134865A1 (en) * | 2003-12-17 | 2005-06-23 | Asml Netherlands B.V. | Method for determining a map, device manufacturing method, and lithographic apparatus |
| US7835017B2 (en) * | 2004-12-22 | 2010-11-16 | Asml Netherlands B.V. | Lithographic apparatus, method of exposing a substrate, method of measurement, device manufacturing method, and device manufactured thereby |
| DE102007017630B4 (de) * | 2006-05-16 | 2009-08-20 | Vistec Semiconductor Systems Gmbh | Verfahren zum Steigern der Messgenauigkeit beim Bestimmen der Koordinaten von Strukturen auf einem Substrat |
| US10991545B2 (en) * | 2008-06-30 | 2021-04-27 | Nexgen Semi Holding, Inc. | Method and device for spatial charged particle bunching |
| US8970820B2 (en) * | 2009-05-20 | 2015-03-03 | Nikon Corporation | Object exchange method, exposure method, carrier system, exposure apparatus, and device manufacturing method |
| DE102010011898A1 (de) * | 2010-03-18 | 2011-09-22 | Carl Zeiss Nts Gmbh | Inspektionssystem |
| JP2012015227A (ja) * | 2010-06-30 | 2012-01-19 | Jeol Ltd | 電子線装置の位置決め方法及び装置 |
| GB201215546D0 (en) * | 2012-08-31 | 2012-10-17 | Infinitesima Ltd | Multiple probe detection and actuation |
| US8766213B2 (en) * | 2012-09-07 | 2014-07-01 | Fei Company | Automated method for coincident alignment of a laser beam and a charged particle beam |
| EP2755021B1 (en) * | 2013-01-15 | 2016-06-22 | Carl Zeiss Microscopy Ltd. | Method of analyzing a sample and charged particle beam device for analyzing a sample |
| US9366524B2 (en) * | 2013-10-08 | 2016-06-14 | Kla-Tencor Corporation | Alignment sensor and height sensor |
| CN108604522B (zh) * | 2016-03-28 | 2020-07-14 | 株式会社日立高新技术 | 带电粒子束装置以及带电粒子束装置的调整方法 |
| WO2018077873A1 (en) * | 2016-10-27 | 2018-05-03 | Asml Netherlands B.V. | System and method for determining and calibrating a position of a stage |
| US10453645B2 (en) * | 2016-12-01 | 2019-10-22 | Applied Materials Israel Ltd. | Method for inspecting a specimen and charged particle multi-beam device |
| US10777383B2 (en) * | 2017-07-10 | 2020-09-15 | Fei Company | Method for alignment of a light beam to a charged particle beam |
| WO2019064503A1 (ja) * | 2017-09-29 | 2019-04-04 | 株式会社ニコン | 電子ビーム装置、照明光学系、及びデバイス製造方法 |
| JP6981170B2 (ja) * | 2017-10-20 | 2021-12-15 | 株式会社ニューフレアテクノロジー | 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法 |
| US10593509B2 (en) * | 2018-07-17 | 2020-03-17 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device |
-
2020
- 2020-02-18 US US16/793,314 patent/US11257657B2/en active Active
-
2021
- 2021-02-09 TW TW110104870A patent/TWI790545B/zh active
- 2021-02-17 JP JP2021023211A patent/JP7171795B2/ja active Active
- 2021-02-18 KR KR1020210021944A patent/KR102493825B1/ko active Active
- 2021-02-18 CN CN202110189978.7A patent/CN113340927B/zh active Active
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