JP2021124690A - 光学装置、物品製造方法および光学部材製造方法 - Google Patents
光学装置、物品製造方法および光学部材製造方法 Download PDFInfo
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- JP2021124690A JP2021124690A JP2020020076A JP2020020076A JP2021124690A JP 2021124690 A JP2021124690 A JP 2021124690A JP 2020020076 A JP2020020076 A JP 2020020076A JP 2020020076 A JP2020020076 A JP 2020020076A JP 2021124690 A JP2021124690 A JP 2021124690A
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- Prior art keywords
- film
- optical
- optical device
- light
- photocatalytic
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- 230000003287 optical effect Effects 0.000 title claims abstract description 165
- 238000004519 manufacturing process Methods 0.000 title claims description 23
- 239000010408 film Substances 0.000 claims abstract description 277
- 230000001699 photocatalysis Effects 0.000 claims abstract description 43
- 239000012788 optical film Substances 0.000 claims abstract description 27
- 238000000034 method Methods 0.000 claims abstract description 22
- 230000031700 light absorption Effects 0.000 claims abstract description 21
- 239000011941 photocatalyst Substances 0.000 claims description 50
- 239000000758 substrate Substances 0.000 claims description 45
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 32
- 239000000463 material Substances 0.000 claims description 28
- 239000012528 membrane Substances 0.000 claims description 18
- 239000000356 contaminant Substances 0.000 claims description 12
- 230000035945 sensitivity Effects 0.000 claims description 9
- 230000008569 process Effects 0.000 claims description 7
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 5
- 206010034972 Photosensitivity reaction Diseases 0.000 claims description 5
- 229910001882 dioxygen Inorganic materials 0.000 claims description 5
- 230000036211 photosensitivity Effects 0.000 claims description 5
- 150000004812 organic fluorine compounds Chemical class 0.000 claims description 4
- -1 perfluoroalkyl compound Chemical class 0.000 claims description 4
- 229920001774 Perfluoroether Polymers 0.000 claims description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 20
- 229910052753 mercury Inorganic materials 0.000 description 20
- 230000003595 spectral effect Effects 0.000 description 18
- 239000011521 glass Substances 0.000 description 15
- 239000000126 substance Substances 0.000 description 14
- 238000002834 transmittance Methods 0.000 description 14
- 238000005286 illumination Methods 0.000 description 13
- 229920003986 novolac Polymers 0.000 description 9
- 239000003344 environmental pollutant Substances 0.000 description 8
- 231100000719 pollutant Toxicity 0.000 description 8
- 229910010413 TiO 2 Inorganic materials 0.000 description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
- 230000003749 cleanliness Effects 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 238000006552 photochemical reaction Methods 0.000 description 3
- 239000005394 sealing glass Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 238000004378 air conditioning Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- YIXJRHPUWRPCBB-UHFFFAOYSA-N magnesium nitrate Chemical compound [Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O YIXJRHPUWRPCBB-UHFFFAOYSA-N 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000002957 persistent organic pollutant Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 241000276498 Pollachius virens Species 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
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- 238000000151 deposition Methods 0.000 description 1
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- 238000003384 imaging method Methods 0.000 description 1
- 231100001240 inorganic pollutant Toxicity 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
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- 238000001228 spectrum Methods 0.000 description 1
- 210000004243 sweat Anatomy 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Optics & Photonics (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Atmospheric Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Inorganic Chemistry (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Microscoopes, Condenser (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020020076A JP2021124690A (ja) | 2020-02-07 | 2020-02-07 | 光学装置、物品製造方法および光学部材製造方法 |
| KR1020210005691A KR20210101129A (ko) | 2020-02-07 | 2021-01-15 | 광학장치, 물품제조방법 및 광학부재 제조방법 |
| CN202110147111.5A CN113311667A (zh) | 2020-02-07 | 2021-02-03 | 光学装置、物品制造方法以及光学部件制造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020020076A JP2021124690A (ja) | 2020-02-07 | 2020-02-07 | 光学装置、物品製造方法および光学部材製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2021124690A true JP2021124690A (ja) | 2021-08-30 |
| JP2021124690A5 JP2021124690A5 (ko) | 2023-02-07 |
Family
ID=77370664
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020020076A Withdrawn JP2021124690A (ja) | 2020-02-07 | 2020-02-07 | 光学装置、物品製造方法および光学部材製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2021124690A (ko) |
| KR (1) | KR20210101129A (ko) |
| CN (1) | CN113311667A (ko) |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1145681A (ja) * | 1997-07-28 | 1999-02-16 | Hitachi Ltd | 光触媒付蛍光ランプ |
| JPH1167151A (ja) * | 1997-08-18 | 1999-03-09 | Hitachi Ltd | リサイクル蛍光ランプ |
| JP2000329904A (ja) | 1999-05-18 | 2000-11-30 | Hoya Corp | 光触媒機能を有する反射防止膜を有する物品及びその製造方法 |
| JP2005072076A (ja) * | 2003-08-28 | 2005-03-17 | Nikon Corp | 露光装置及びケミカルフィルタ並びにデバイスの製造方法 |
| JP2005345812A (ja) | 2004-06-03 | 2005-12-15 | Nikon Corp | 光学部材およびそれを搭載した投影露光装置 |
| US8698998B2 (en) * | 2004-06-21 | 2014-04-15 | Nikon Corporation | Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device |
| JP2007156365A (ja) * | 2005-12-09 | 2007-06-21 | Canon Inc | 反射防止膜、光学素子、光学系、露光装置及びデバイス製造方法 |
| JP2008003390A (ja) | 2006-06-23 | 2008-01-10 | Bridgestone Corp | 反射防止膜及び光学フィルター |
| JP2014004548A (ja) * | 2012-06-26 | 2014-01-16 | Fukuoka Univ | 光触媒体による防汚機能を持つ太陽電池カバーガラス |
| JP6513486B2 (ja) * | 2015-05-27 | 2019-05-15 | ジオマテック株式会社 | 防曇性反射防止膜、防曇性反射防止膜付きカバー基体及び防曇性反射防止膜の製造方法 |
-
2020
- 2020-02-07 JP JP2020020076A patent/JP2021124690A/ja not_active Withdrawn
-
2021
- 2021-01-15 KR KR1020210005691A patent/KR20210101129A/ko active IP Right Grant
- 2021-02-03 CN CN202110147111.5A patent/CN113311667A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CN113311667A (zh) | 2021-08-27 |
| KR20210101129A (ko) | 2021-08-18 |
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