JP2021090061A - 窒化ケイ素と比べてp型ドープポリシリコンを選択的にエッチングするための組成物及び方法 - Google Patents
窒化ケイ素と比べてp型ドープポリシリコンを選択的にエッチングするための組成物及び方法 Download PDFInfo
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- JP2021090061A JP2021090061A JP2021012437A JP2021012437A JP2021090061A JP 2021090061 A JP2021090061 A JP 2021090061A JP 2021012437 A JP2021012437 A JP 2021012437A JP 2021012437 A JP2021012437 A JP 2021012437A JP 2021090061 A JP2021090061 A JP 2021090061A
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- Prior art keywords
- acid
- ether
- nitrate
- doped polysilicon
- glycol
- Prior art date
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- 239000000203 mixture Substances 0.000 title claims abstract description 124
- 229910021420 polycrystalline silicon Inorganic materials 0.000 title claims abstract description 94
- 229920005591 polysilicon Polymers 0.000 title claims abstract description 91
- 238000000034 method Methods 0.000 title claims abstract description 52
- 229910052581 Si3N4 Inorganic materials 0.000 title claims abstract description 47
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 title claims abstract description 47
- 238000005530 etching Methods 0.000 title description 17
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 44
- 239000002253 acid Substances 0.000 claims abstract description 43
- 229910002651 NO3 Inorganic materials 0.000 claims abstract description 42
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims abstract description 41
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims abstract description 41
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 39
- 239000010703 silicon Substances 0.000 claims abstract description 39
- 239000000463 material Substances 0.000 claims abstract description 32
- 239000000758 substrate Substances 0.000 claims abstract description 30
- 239000002904 solvent Substances 0.000 claims abstract description 28
- 239000003638 chemical reducing agent Substances 0.000 claims abstract description 26
- -1 hexafluorosilicic acid Chemical compound 0.000 claims description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 20
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 18
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 16
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical group O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 15
- 229910052717 sulfur Inorganic materials 0.000 claims description 15
- 239000011593 sulfur Substances 0.000 claims description 15
- 229910017604 nitric acid Inorganic materials 0.000 claims description 14
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 9
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 9
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 8
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims description 8
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical group F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 7
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 claims description 7
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims description 6
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 claims description 6
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 6
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 6
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 claims description 6
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims description 6
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 claims description 6
- 229920000555 poly(dimethylsilanediyl) polymer Polymers 0.000 claims description 6
- 239000000243 solution Substances 0.000 claims description 6
- 125000005207 tetraalkylammonium group Chemical group 0.000 claims description 6
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 claims description 6
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 claims description 6
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 claims description 6
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 5
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 claims description 5
- 150000001412 amines Chemical class 0.000 claims description 5
- 229910052796 boron Inorganic materials 0.000 claims description 5
- 239000012530 fluid Substances 0.000 claims description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 5
- 239000011863 silicon-based powder Substances 0.000 claims description 5
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 claims description 4
- BBMCTIGTTCKYKF-UHFFFAOYSA-N 1-heptanol Chemical compound CCCCCCCO BBMCTIGTTCKYKF-UHFFFAOYSA-N 0.000 claims description 4
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims description 4
- CUDYYMUUJHLCGZ-UHFFFAOYSA-N 2-(2-methoxypropoxy)propan-1-ol Chemical compound COC(C)COC(C)CO CUDYYMUUJHLCGZ-UHFFFAOYSA-N 0.000 claims description 4
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 claims description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 4
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical group O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 claims description 4
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- ZCCIPPOKBCJFDN-UHFFFAOYSA-N calcium nitrate Chemical compound [Ca+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ZCCIPPOKBCJFDN-UHFFFAOYSA-N 0.000 claims description 4
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 claims description 4
- HHLFWLYXYJOTON-UHFFFAOYSA-N glyoxylic acid Chemical compound OC(=O)C=O HHLFWLYXYJOTON-UHFFFAOYSA-N 0.000 claims description 4
- SUMDYPCJJOFFON-UHFFFAOYSA-N isethionic acid Chemical compound OCCS(O)(=O)=O SUMDYPCJJOFFON-UHFFFAOYSA-N 0.000 claims description 4
- YIXJRHPUWRPCBB-UHFFFAOYSA-N magnesium nitrate Chemical compound [Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O YIXJRHPUWRPCBB-UHFFFAOYSA-N 0.000 claims description 4
- 229940098779 methanesulfonic acid Drugs 0.000 claims description 4
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 claims description 4
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 claims description 4
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 claims description 4
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 claims description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 claims description 4
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 claims description 4
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 claims description 4
- PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 claims description 3
- HXLAEGYMDGUSBD-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propan-1-amine Chemical compound CCO[Si](C)(OCC)CCCN HXLAEGYMDGUSBD-UHFFFAOYSA-N 0.000 claims description 3
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 claims description 3
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims description 3
- YPCQEKFKZHUKPT-UHFFFAOYSA-N 4-[ethoxy(dimethyl)silyl]butan-1-amine Chemical compound CCO[Si](C)(C)CCCCN YPCQEKFKZHUKPT-UHFFFAOYSA-N 0.000 claims description 3
- GJWAPAVRQYYSTK-UHFFFAOYSA-N [(dimethyl-$l^{3}-silanyl)amino]-dimethylsilicon Chemical compound C[Si](C)N[Si](C)C GJWAPAVRQYYSTK-UHFFFAOYSA-N 0.000 claims description 3
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 229910021529 ammonia Inorganic materials 0.000 claims description 3
- 239000002738 chelating agent Substances 0.000 claims description 3
- SJJCABYOVIHNPZ-UHFFFAOYSA-N cyclohexyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)C1CCCCC1 SJJCABYOVIHNPZ-UHFFFAOYSA-N 0.000 claims description 3
- JWCYDYZLEAQGJJ-UHFFFAOYSA-N dicyclopentyl(dimethoxy)silane Chemical compound C1CCCC1[Si](OC)(OC)C1CCCC1 JWCYDYZLEAQGJJ-UHFFFAOYSA-N 0.000 claims description 3
- ZMAPKOCENOWQRE-UHFFFAOYSA-N diethoxy(diethyl)silane Chemical compound CCO[Si](CC)(CC)OCC ZMAPKOCENOWQRE-UHFFFAOYSA-N 0.000 claims description 3
- VSYLGGHSEIWGJV-UHFFFAOYSA-N diethyl(dimethoxy)silane Chemical compound CC[Si](CC)(OC)OC VSYLGGHSEIWGJV-UHFFFAOYSA-N 0.000 claims description 3
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 claims description 3
- KZFNONVXCZVHRD-UHFFFAOYSA-N dimethylamino(dimethyl)silicon Chemical compound CN(C)[Si](C)C KZFNONVXCZVHRD-UHFFFAOYSA-N 0.000 claims description 3
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 claims description 3
- 235000019253 formic acid Nutrition 0.000 claims description 3
- 229940016409 methylsulfonylmethane Drugs 0.000 claims description 3
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 claims description 3
- YLBPOJLDZXHVRR-UHFFFAOYSA-N n'-[3-[diethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CCO[Si](C)(OCC)CCCNCCN YLBPOJLDZXHVRR-UHFFFAOYSA-N 0.000 claims description 3
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 claims description 3
- KFOZMMAXUUCIKU-UHFFFAOYSA-N n-(3-triethoxysilylpropyl)butan-1-amine Chemical compound CCCCNCCC[Si](OCC)(OCC)OCC KFOZMMAXUUCIKU-UHFFFAOYSA-N 0.000 claims description 3
- XCOASYLMDUQBHW-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)butan-1-amine Chemical compound CCCCNCCC[Si](OC)(OC)OC XCOASYLMDUQBHW-UHFFFAOYSA-N 0.000 claims description 3
- WTXITWGJFPAEIU-UHFFFAOYSA-N n-methyl-3-trimethoxysilyl-n-(3-trimethoxysilylpropyl)propan-1-amine Chemical compound CO[Si](OC)(OC)CCCN(C)CCC[Si](OC)(OC)OC WTXITWGJFPAEIU-UHFFFAOYSA-N 0.000 claims description 3
- 235000006408 oxalic acid Nutrition 0.000 claims description 3
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 claims description 3
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 claims description 3
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 claims description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 claims description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 claims description 2
- NMRPBPVERJPACX-UHFFFAOYSA-N (3S)-octan-3-ol Natural products CCCCCC(O)CC NMRPBPVERJPACX-UHFFFAOYSA-N 0.000 claims description 2
- OKIYQFLILPKULA-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,4-nonafluoro-4-methoxybutane Chemical compound COC(F)(F)C(F)(F)C(F)(F)C(F)(F)F OKIYQFLILPKULA-UHFFFAOYSA-N 0.000 claims description 2
- RIQRGMUSBYGDBL-UHFFFAOYSA-N 1,1,1,2,2,3,4,5,5,5-decafluoropentane Chemical compound FC(F)(F)C(F)C(F)C(F)(F)C(F)(F)F RIQRGMUSBYGDBL-UHFFFAOYSA-N 0.000 claims description 2
- ZZXUZKXVROWEIF-UHFFFAOYSA-N 1,2-butylene carbonate Chemical compound CCC1COC(=O)O1 ZZXUZKXVROWEIF-UHFFFAOYSA-N 0.000 claims description 2
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 claims description 2
- DFUYAWQUODQGFF-UHFFFAOYSA-N 1-ethoxy-1,1,2,2,3,3,4,4,4-nonafluorobutane Chemical compound CCOC(F)(F)C(F)(F)C(F)(F)C(F)(F)F DFUYAWQUODQGFF-UHFFFAOYSA-N 0.000 claims description 2
- IBLKWZIFZMJLFL-UHFFFAOYSA-N 1-phenoxypropan-2-ol Chemical compound CC(O)COC1=CC=CC=C1 IBLKWZIFZMJLFL-UHFFFAOYSA-N 0.000 claims description 2
- WMDZKDKPYCNCDZ-UHFFFAOYSA-N 2-(2-butoxypropoxy)propan-1-ol Chemical compound CCCCOC(C)COC(C)CO WMDZKDKPYCNCDZ-UHFFFAOYSA-N 0.000 claims description 2
- MTVLEKBQSDTQGO-UHFFFAOYSA-N 2-(2-ethoxypropoxy)propan-1-ol Chemical compound CCOC(C)COC(C)CO MTVLEKBQSDTQGO-UHFFFAOYSA-N 0.000 claims description 2
- GZMAAYIALGURDQ-UHFFFAOYSA-N 2-(2-hexoxyethoxy)ethanol Chemical compound CCCCCCOCCOCCO GZMAAYIALGURDQ-UHFFFAOYSA-N 0.000 claims description 2
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 claims description 2
- XYVAYAJYLWYJJN-UHFFFAOYSA-N 2-(2-propoxypropoxy)propan-1-ol Chemical compound CCCOC(C)COC(C)CO XYVAYAJYLWYJJN-UHFFFAOYSA-N 0.000 claims description 2
- WOFPPJOZXUTRAU-UHFFFAOYSA-N 2-Ethyl-1-hexanol Natural products CCCCC(O)CCC WOFPPJOZXUTRAU-UHFFFAOYSA-N 0.000 claims description 2
- COBPKKZHLDDMTB-UHFFFAOYSA-N 2-[2-(2-butoxyethoxy)ethoxy]ethanol Chemical compound CCCCOCCOCCOCCO COBPKKZHLDDMTB-UHFFFAOYSA-N 0.000 claims description 2
- JDSQBDGCMUXRBM-UHFFFAOYSA-N 2-[2-(2-butoxypropoxy)propoxy]propan-1-ol Chemical compound CCCCOC(C)COC(C)COC(C)CO JDSQBDGCMUXRBM-UHFFFAOYSA-N 0.000 claims description 2
- WFSMVVDJSNMRAR-UHFFFAOYSA-N 2-[2-(2-ethoxyethoxy)ethoxy]ethanol Chemical compound CCOCCOCCOCCO WFSMVVDJSNMRAR-UHFFFAOYSA-N 0.000 claims description 2
- FYYLCPPEQLPTIQ-UHFFFAOYSA-N 2-[2-(2-propoxypropoxy)propoxy]propan-1-ol Chemical compound CCCOC(C)COC(C)COC(C)CO FYYLCPPEQLPTIQ-UHFFFAOYSA-N 0.000 claims description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 claims description 2
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 claims description 2
- UPGSWASWQBLSKZ-UHFFFAOYSA-N 2-hexoxyethanol Chemical compound CCCCCCOCCO UPGSWASWQBLSKZ-UHFFFAOYSA-N 0.000 claims description 2
- BGIVXKVLORRHQX-UHFFFAOYSA-N 2-methylprop-1-ene-1-sulfonic acid Chemical compound CC(C)=CS(O)(=O)=O BGIVXKVLORRHQX-UHFFFAOYSA-N 0.000 claims description 2
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 claims description 2
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 claims description 2
- VATRWWPJWVCZTA-UHFFFAOYSA-N 3-oxo-n-[2-(trifluoromethyl)phenyl]butanamide Chemical compound CC(=O)CC(=O)NC1=CC=CC=C1C(F)(F)F VATRWWPJWVCZTA-UHFFFAOYSA-N 0.000 claims description 2
- ZNBNBTIDJSKEAM-UHFFFAOYSA-N 4-[7-hydroxy-2-[5-[5-[6-hydroxy-6-(hydroxymethyl)-3,5-dimethyloxan-2-yl]-3-methyloxolan-2-yl]-5-methyloxolan-2-yl]-2,8-dimethyl-1,10-dioxaspiro[4.5]decan-9-yl]-2-methyl-3-propanoyloxypentanoic acid Chemical compound C1C(O)C(C)C(C(C)C(OC(=O)CC)C(C)C(O)=O)OC11OC(C)(C2OC(C)(CC2)C2C(CC(O2)C2C(CC(C)C(O)(CO)O2)C)C)CC1 ZNBNBTIDJSKEAM-UHFFFAOYSA-N 0.000 claims description 2
- FUSNOPLQVRUIIM-UHFFFAOYSA-N 4-amino-2-(4,4-dimethyl-2-oxoimidazolidin-1-yl)-n-[3-(trifluoromethyl)phenyl]pyrimidine-5-carboxamide Chemical compound O=C1NC(C)(C)CN1C(N=C1N)=NC=C1C(=O)NC1=CC=CC(C(F)(F)F)=C1 FUSNOPLQVRUIIM-UHFFFAOYSA-N 0.000 claims description 2
- WVYWICLMDOOCFB-UHFFFAOYSA-N 4-methyl-2-pentanol Chemical compound CC(C)CC(C)O WVYWICLMDOOCFB-UHFFFAOYSA-N 0.000 claims description 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 claims description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 2
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- MOVBJUGHBJJKOW-UHFFFAOYSA-N methyl 2-amino-5-methoxybenzoate Chemical compound COC(=O)C1=CC(OC)=CC=C1N MOVBJUGHBJJKOW-UHFFFAOYSA-N 0.000 description 1
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- 229920000642 polymer Polymers 0.000 description 1
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- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 239000004304 potassium nitrite Substances 0.000 description 1
- 235000010289 potassium nitrite Nutrition 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 239000008237 rinsing water Substances 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
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- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
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- 230000000087 stabilizing effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229910003468 tantalcarbide Inorganic materials 0.000 description 1
- VSSLEOGOUUKTNN-UHFFFAOYSA-N tantalum titanium Chemical compound [Ti].[Ta] VSSLEOGOUUKTNN-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- SHRKDVQQQPFSIY-UHFFFAOYSA-M tetrabutylazanium;nitrite Chemical compound [O-]N=O.CCCC[N+](CCCC)(CCCC)CCCC SHRKDVQQQPFSIY-UHFFFAOYSA-M 0.000 description 1
- QLNOVKKVHFRGMA-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical group [CH2]CC[Si](OC)(OC)OC QLNOVKKVHFRGMA-UHFFFAOYSA-N 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- UHUUYVZLXJHWDV-UHFFFAOYSA-N trimethyl(methylsilyloxy)silane Chemical compound C[SiH2]O[Si](C)(C)C UHUUYVZLXJHWDV-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
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- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66545—Unipolar field-effect transistors with an insulated gate, i.e. MISFET using a dummy, i.e. replacement gate in a process wherein at least a part of the final gate is self aligned to the dummy gate
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- H01L21/0214—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC the material being a silicon oxynitride, e.g. SiON or SiON:H
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Abstract
Description
好ましくは、該組成物は、基板上に存在している他のゲートスタック材料を実質的に除去しないものである。
一実施態様では、除去用組成物は、少なくとも1種類のナイトレート、少なくとも1種類のフッ化物及び少なくとも1種類の強酸を含むもの、これらからなるもの、又は本質的にこれらからなるものである。
別の実施態様では、除去用組成物は、少なくとも1種類のナイトレート、少なくとも1種類のフッ化物及び少なくとも1種類の硫黄含有強酸を含むもの、これらからなるもの、又は本質的にこれらからなるものである。
また別の実施態様では、除去用組成物は、少なくとも1種類のナイトレート、少なくとも1種類のフッ化物、少なくとも1種類の強酸及び少なくとも1種類の溶媒を含むもの、これらからなるもの、又は本質的にこれらからなるものである。
さらに別の実施態様では、除去用組成物は、少なくとも1種類のナイトレート、少なくとも1種類のフッ化物、少なくとも1種類の硫黄含有強酸及び少なくとも1種類の溶媒を含むもの、これらからなるもの、又は本質的にこれらからなるものである。
別の実施態様では、除去用組成物は、少なくとも1種類のナイトレート、少なくとも1種類のフッ化物及び少なくとも1種類の強酸を含むもの、これらからなるもの、又は本質的にこれらからなるものであって、添加された水が実質的にないものである。
別の実施態様では、除去用組成物は、少なくとも1種類のナイトレート、少なくとも1種類のフッ化物及び少なくとも1種類の硫黄含有強酸を含むもの、これらからなるもの、又は本質的にこれらからなるものであって、添加された水が実質的にないものである。
別の実施態様では、除去用組成物は、少なくとも1種類のナイトレート、少なくとも1種類のフッ化物、少なくとも1種類の強酸及び少なくとも1種類のシリコン源又は少なくとも1種類の還元剤を含むもの、これらからなるもの、又は本質的にこれらからなるものである。
別の実施態様では、除去用組成物は、少なくとも1種類のナイトレート、少なくとも1種類のフッ化物、少なくとも1種類の硫黄含有強酸及び少なくとも1種類のシリコン源を含むもの、これらからなるもの、又は本質的にこれらからなるものである。
別の実施態様では、除去用組成物は、少なくとも1種類のナイトレート、少なくとも1種類のフッ化物、少なくとも1種類の硫黄含有強酸及び少なくとも1種類の還元剤を含むもの、これらからなるもの、又は本質的にこれらからなるものである。
別の実施態様では、除去用組成物は、少なくとも1種類のナイトレート、少なくとも1種類のフッ化物、少なくとも1種類の強酸、少なくとも1種類のシリコン源又は少なくとも1種類の還元剤、及び少なくとも1種類の溶媒を含むもの、これらからなるもの、又は本質的にこれらからなるものである。
また別の実施態様では、除去用組成物は、少なくとも1種類のナイトレート、少なくとも1種類のフッ化物、少なくとも1種類の硫黄含有酸、少なくとも1種類のシリコン源及び少なくとも1種類の溶媒を含むもの、これらからなるもの、又は本質的にこれらからなるものである。
別の実施態様では、除去用組成物は、少なくとも1種類のナイトレート、少なくとも1種類のフッ化物、少なくとも1種類の硫黄含有酸、少なくとも1種類の還元剤、及び少なくとも1種類の溶媒を含むもの、これらからなるもの、又は本質的にこれらからなるものである。
さらに別の実施態様では、除去用組成物は、少なくとも1種類のナイトレート、少なくとも1種類のフッ化物、少なくとも1種類の強酸及び少なくとも1種類のシリコン源又は少なくとも1種類の還元剤を含むもの、これらからなるもの、又は本質的にこれらからなるものであって、添加された水が実質的にないものである。
さらに別の実施態様では、除去用組成物は、少なくとも1種類のナイトレート、少なくとも1種類のフッ化物、少なくとも1種類の強酸、少なくとも1種類のシリコン源又は少なくとも1種類の還元剤、及び少なくとも1種類の溶媒を含むもの、これらからなるもの、又は本質的にこれらからなるものである。
さらに別の実施態様では、除去用組成物は、少なくとも1種類のナイトレート、少なくとも1種類のフッ化物、少なくとも1種類の硫黄含有強酸及び少なくとも1種類のシリコン源を含むもの、これらからなるもの、又は本質的にこれらからなるものであって、添加された水が実質的にないものである。
また別の実施態様では、除去用組成物は、少なくとも1種類のナイトレート、少なくとも1種類のフッ化物、少なくとも1種類の硫黄含有強酸、少なくとも1種類のシリコン源及び少なくとも1種類の溶媒を含むもの、これらからなるもの、又は本質的にこれらからなるものである。
また別の実施態様では、除去用組成物は、少なくとも1種類のナイトレート、少なくとも1種類のフッ化物、少なくとも1種類の硫黄含有強酸及び少なくとも1種類の還元剤を含むもの、これらからなるもの、又は本質的にこれらからなるものであって、添加された水が実質的にないものである。
別の実施態様では、除去用組成物は、少なくとも1種類のナイトレート、少なくとも1種類のフッ化物、少なくとも1種類の硫黄含有強酸、少なくとも1種類の還元剤、及び少なくとも1種類の溶媒を含むもの、これらからなるもの、又は本質的にこれらからなるものである。
さらに別の実施態様では、除去用組成物は、少なくとも1種類のナイトレート、少なくとも1種類のフッ化物、少なくとも1種類の強酸、少なくとも1種類のシリコン源、少なくとも1種類の還元剤、及び少なくとも1種類の溶媒を含むもの、これらからなるもの、又は本質的にこれらからなるものである。
表2:配合物A−Dの実験結果
Claims (23)
- 窒化ケイ素と比べてp型ドープポリシリコンを選択的に除去する方法であって、p型ドープポリシリコンと窒化ケイ素を含む基板を除去用組成物と接触させることを含み、前記除去用組成物が、窒化ケイ素と比べてp型ドープポリシリコンを選択的に除去するものである方法。
- 前記除去用組成物は、前記基板上に存在している他のゲートスタック材料を実質的に除去しないものである、請求項1に記載の方法。
- 前記p型ドープポリシリコンが、ホウ素、アルミニウム、ガリウム及び/又はインジウムを含むものである、請求項1又は2に記載の方法。
- 前記p型ドープポリシリコンがホウ素を含むものである、請求項1又は2に記載の方法。
- 前記除去用組成物が、少なくとも1種類のナイトレート、少なくとも1種類のフッ化物、少なくとも1種類の強酸、任意選択的に少なくとも1種類のシリコン源、任意選択的に少なくとも1種類の還元剤、及び任意選択的に少なくとも1種類の溶媒を含むものである、請求項1から4の何れか一項に記載の方法。
- 前記少なくとも1種類のフッ化物が、フッ化水素酸、フッ化アンモニウム、二フッ化アンモニウム、ヘキサフルオロケイ酸、テトラフルオロホウ酸、テトラフルオロホウ酸テトラブチルアンモニウム(TBA-BF4)、ヘキサフルオロタンタル酸、ヘキサフルオロチタン酸、ヘキサフルオロタンタル酸アンモニウム、式[NR1R2R3R4]F(式中、R1、R2、R3及びR4は互いに同じであるか、又は異なっており、C1−C6アルキル及びC6−C10アリールからなる群より選択される)を有するフッ化テトラアルキルアンモニウム、並びにその組合せからなる群より選択される種を含み、好ましくはHFを含む、請求項5に記載の方法。
- 前記少なくとも1種類のナイトレートが、硝酸、硝酸ナトリウム、硝酸カリウム、硝酸ルビジウム、硝酸マグネシウム、硝酸カルシウム、硝酸アンモニウム、式[NR1R2R3R4]NO3(式中、R1、R2、R3及びR4は互いに同じであるか、又は異なっており、C1−C6アルキル及びC6−C10アリールからなる群より選択される)を有する硝酸テトラアルキルアンモニウム、並びにその組合せからなる群より選択される種を含み、好ましくは硝酸を含む、請求項5又は6に記載の方法。
- 前記除去用組成物がさらに少なくとも1種類の溶媒を含むものである、請求項5から7の何れか一項に記載の方法。
- 前記少なくとも1種類の溶媒が、水、メタノール、エタノール、イソプロパノール、ブタノール、ペンタノール、ヘキサノール、2-エチル-1-ヘキサノール、ヘプタノール、オクタノール、エチレングリコール、プロピレングリコール、ブチレングリコール、ブチレンカーボネート、エチレンカーボネート、プロピレンカーボネート、ジプロピレングリコール、ジエチレングリコールモノメチルエーテル、トリエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、トリエチレングリコールモノエチルエーテル、エチレングリコールモノプロピルエーテル、エチレングリコールモノブチルエーテル、ジエチレングリコールモノブチルエーテル、トリエチレングリコールモノブチルエーテル、エチレングリコールモノヘキシルエーテル、ジエチレングリコールモノヘキシルエーテル、エチレングリコールフェニルエーテル、プロピレングリコールメチルエーテル、ジプロピレングリコールメチルエーテル(DPGME)、トリプロピレングリコールメチルエーテル(TPGME)、ジプロピレングリコールジメチルエーテル、ジプロピレングリコールエチルエーテル、プロピレングリコールn-プロピルエーテル、ジプロピレングリコールn-プロピルエーテル(DPGPE)、トリプロピレングリコールn-プロピルエーテル、プロピレングリコールn-ブチルエーテル、ジプロピレングリコールn-ブチルエーテル、トリプロピレングリコールn-ブチルエーテル、プロピレングリコールフェニルエーテル、2,3-ジヒドロデカフルオロペンタン、エチルパーフルオロブチルエーテル、メチルパーフルオロブチルエーテル、アルキルカーボネート、アルキレンカーボネート、4-メチル-2-ペンタノール、酢酸、無水酢酸、トリフルオロ酢酸、ジメチルスルホキシド、スルホラン、メチルスルホニルメタン、高密度流体、及びその組合せ、好ましくは、水、スルホラン、メチルスルホニルメタン、及びその組合せからなる群より選択される種を含む、請求項8に記載の方法。
- 前記少なくとも1種類の強酸が、硫酸、メタンスルホン酸(MSA)、エタンスルホン酸、2-ヒドロキシエタンスルホン酸、n-プロパンスルホン酸、イソプロパンスルホン酸、イソブテンスルホン酸、n-ブタンスルホン酸、n-オクタンスルホン酸、トリフルオロメタンスルホン酸、p-トルエンスルホン酸、テトラフルオロホウ酸、過塩素酸、及びその組合せからなる群より選択される種を含み、好ましくは硫酸を含む、請求項5から9の何れか一項に記載の方法。
- 前記少なくとも1種類のナイトレートの量が約0.1wt%から約1wt%、好ましくは約0.1wt%から約1wt%であり、前記少なくとも1種類のフッ化物の量が約0.1wt%から約3wt%、好ましくは約0.1wt%から約3wt%であり、前記少なくとも1種類の強酸の量が約50wt%から約85wt%、好ましくは約60wt%から約80wt%であり、前記少なくとも1種類の溶媒の量が約11wt%から約49.8wt%、好ましくは約16wt%から約39.8wt%である、請求項5から10の何れか一項に記載の方法。
- 前記少なくとも1種類のシリコン源、前記少なくとも1種類の還元剤、又は両方を含む、請求項5から10の何れか一項に記載の方法。
- 前記少なくとも1種類のシリコン源が、シリコン粉末、オルトケイ酸テトラメチル(TMOS)、オルトケイ酸テトラエチル(TEOS)、3-アミノプロピルトリメトキシシラン、ビス[3-(トリメトキシシリル)プロピル]-エチレンジアミン、ビス[3-(トリエトキシシリル)プロピル]-エチレンジアミン、メチルトリメトキシシラン(MTMS)、ポリジメチルシラン(PDMS)、プロピルトリメトキシシラン(PTMS)、メチルトリエトキシシラン(MTES)、エチルトリエトキシシラン、トリエトキシシラン、トリメトキシシラン、ジメチルジエトキシシラン、ジエチルジエトキシシラン、ジエチルジメトキシシラン、ビス(3-トリメトキシシリルプロピル)-N-メチルアミン、3-(2-アミノエチルアミノ)プロピルトリエトキシシラン、N-プロピルトリエトキシシラン、3-(2-アミノエチルアミノ)プロピルトリメトキシシラン、メチルシクロヘキシルジメトキシシラン、ジメチルジメトキシシラン、ジシクロペンチルジメトキシシラン、3-[2(ビニルベンジルアミノ)エチルアミノ]プロピルトリメトキシシラン、3-アミノプロピルトリエトキシシラン、3-(アミノプロピル)ジメチルエトキシシラン、3-(アミノプロピル)メチルジエトキシシラン、3-(アミノプロピル)メチルジメトキシシラン、3-(アミノプロピル)ジメチルメトキシシラン、N-ブチル-3-アミノプロピルトリエトキシシラン、N-ブチル-3-アミノプロピルトリメトキシシラン、N-(β-アミノエチル)-γ-アミノ-プロピルトリエトキシシラン、4-アミノ-ブチルジメチルエトキシシラン、N-(2-アミノエチル)-3-アミノプロピルメチルジメトキシシラン、N-(2-アミノエチル)-3-アミノプロピルメチルジエトキシシラン、3-アミノプロピルメチルジエトキシシラン、1,1,3,3-テトラメチルジシロキサン、1,1,3,3-テトラメチルジシラザン、(N,N-ジメチルアミノ)ジメチルシラン、テトラアルキルアンモニウムシリケート、及びその組合せからなる群より選択され、
前記少なくとも1種類の還元剤が、二酸化硫黄溶液、亜硫酸塩、チオ硫酸塩、亜硫酸、硫黄元素、ジメチルスルホキシド、ギ酸、ホルムアルデヒド、グリオキシル酸、グリオキサール、硫酸ヒドラジン、硫酸ヒドロキシルアミン、ボロキシン、ボラン−アミン錯体、ボラン−アンモニア錯体、テトラメチルアンモニウムボロヒドリド、水素化ホウ素カリウム、及びその組合せからなる群より選択される種を含む、請求項12に記載の方法。 - 前記少なくとも1種類のナイトレートの量が約0.1wt%から約1wt%、好ましくは約0.1wt%から約1wt%であり、前記少なくとも1種類のフッ化物の量が約0.1wt%から約3wt%、好ましくは約0.1wt%から約3wt%であり、少なくとも1種類の硫黄含有酸の量が約50wt%から約85wt%、好ましくは約60wt%から約80wt%であり、前記少なくとも1種類のシリコン源又は前記少なくとも1種類の還元剤の量が約0.00001wt%から約0.5wt%、好ましくは約0.00001wt%から約0.3wt%であり、前記少なくとも1種類の溶媒の量が約10.5wt%から約49.8wt%、好ましくは約15.7wt%から約39.8wt%である、請求項12又は13に記載の方法。
- 前記除去用組成物は、XeF2、アミン、塩化物(Cl−)、金属ハロゲン化物、イミノ二酢酸、マロン酸、シュウ酸、コハク酸、ホウ酸、リンゴ酸、2,4-ペンタンジオン、グリコールエーテルキレート剤、及びその組合せが実質的にないものである、請求項5から14の何れか一項に記載の方法。
- 前記除去用組成物のpHが2から約−8、好ましくは約−1から約−5の範囲である、請求項5から15の何れか一項に記載の方法。
- 前記少なくとも1種類のフッ化物に対する前記少なくとも1種類のナイトレートの重量パーセント比が約0.2:1から約2:1、好ましくは約0.3:1から約1:1の範囲である、請求項5から16の何れか一項に記載の方法。
- 温度が約10℃から約75℃、好ましくは約20℃から約50℃の範囲である、請求項1から17の何れか一項に記載の方法。
- 窒化ケイ素に対するp型ドープポリシリコンの除去選択性が約2:1から約1000:1、好ましくは約10:1から約300:1、最も好ましくは約50:1から約200:1である、請求項1から18の何れか一項に記載の方法。
- 前記p型ドープポリシリコンの除去速度が約50nm/分−1から約500nm/分−1、より好ましくは約100nm/分−1から約300nm/分−1、最も好ましくは約120nm/分−1から約300nm/分−1の範囲である、請求項1から19の何れか一項に記載の方法。
- 前記窒化ケイ素の除去速度が約3nm/分−1未満、より好ましくは約2nm/分−1未満である、請求項1から20の何れか一項に記載の方法。
- 前記除去用組成物がさらに溶解型のp型ドープポリシリコンを含むものである、請求項1から21の何れか一項に記載の方法。
- 前記除去用組成物を、リンス液を用いて前記デバイスから洗い流す、請求項1から22の何れか一項に記載の方法。
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CN110373719B (zh) * | 2019-08-13 | 2020-12-15 | 湖北兴福电子材料有限公司 | 一种高选择比的多晶硅蚀刻液及其制备方法 |
JP7398550B2 (ja) * | 2019-08-21 | 2023-12-14 | インテグリス・インコーポレーテッド | 高度に選択的な窒化ケイ素エッチングのための改良された配合物 |
WO2021076676A1 (en) * | 2019-10-17 | 2021-04-22 | Versum Materials Us, Llc | Etching composition and method for euv mask protective structure |
CN111019659B (zh) * | 2019-12-06 | 2021-06-08 | 湖北兴福电子材料有限公司 | 一种选择性硅蚀刻液 |
JP7446097B2 (ja) * | 2019-12-06 | 2024-03-08 | 東京応化工業株式会社 | 表面処理剤及び表面処理方法 |
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