JP2021039282A5 - - Google Patents

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Publication number
JP2021039282A5
JP2021039282A5 JP2019161464A JP2019161464A JP2021039282A5 JP 2021039282 A5 JP2021039282 A5 JP 2021039282A5 JP 2019161464 A JP2019161464 A JP 2019161464A JP 2019161464 A JP2019161464 A JP 2019161464A JP 2021039282 A5 JP2021039282 A5 JP 2021039282A5
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JP
Japan
Prior art keywords
concave mirror
substrate
mask
exposure apparatus
optical system
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JP2019161464A
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English (en)
Japanese (ja)
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JP7357488B2 (ja
JP2021039282A (ja
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Priority to JP2019161464A priority Critical patent/JP7357488B2/ja
Priority claimed from JP2019161464A external-priority patent/JP7357488B2/ja
Priority to TW109126462A priority patent/TWI825339B/zh
Priority to KR1020200107614A priority patent/KR102747768B1/ko
Priority to CN202010922291.5A priority patent/CN112445082B/zh
Publication of JP2021039282A publication Critical patent/JP2021039282A/ja
Publication of JP2021039282A5 publication Critical patent/JP2021039282A5/ja
Application granted granted Critical
Publication of JP7357488B2 publication Critical patent/JP7357488B2/ja
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JP2019161464A 2019-09-04 2019-09-04 露光装置、および物品製造方法 Active JP7357488B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2019161464A JP7357488B2 (ja) 2019-09-04 2019-09-04 露光装置、および物品製造方法
TW109126462A TWI825339B (zh) 2019-09-04 2020-08-05 曝光裝置，及物品的製造方法
KR1020200107614A KR102747768B1 (ko) 2019-09-04 2020-08-26 노광 장치 및 물품제조방법
CN202010922291.5A CN112445082B (zh) 2019-09-04 2020-09-04 曝光装置以及物品制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019161464A JP7357488B2 (ja) 2019-09-04 2019-09-04 露光装置、および物品製造方法

Publications (3)

Publication Number Publication Date
JP2021039282A JP2021039282A (ja) 2021-03-11
JP2021039282A5 true JP2021039282A5 (enrdf_load_stackoverflow) 2022-08-24
JP7357488B2 JP7357488B2 (ja) 2023-10-06

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ID=74735493

Family Applications (1)

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JP2019161464A Active JP7357488B2 (ja) 2019-09-04 2019-09-04 露光装置、および物品製造方法

Country Status (4)

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JP (1) JP7357488B2 (enrdf_load_stackoverflow)
KR (1) KR102747768B1 (enrdf_load_stackoverflow)
CN (1) CN112445082B (enrdf_load_stackoverflow)
TW (1) TWI825339B (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113296342B (zh) * 2021-05-21 2024-03-12 光感(上海)科技有限公司 一种光学投影系统
JP7614962B2 (ja) * 2021-07-08 2025-01-16 キヤノン株式会社 投影光学系、露光装置、および物品の製造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW594438B (en) * 1997-11-07 2004-06-21 Koninkl Philips Electronics Nv Three-mirror system for lithographic projection, and projection apparatus comprising such a mirror system
US7158215B2 (en) * 2003-06-30 2007-01-02 Asml Holding N.V. Large field of view protection optical system with aberration correctability for flat panel displays
JP2008089832A (ja) 2006-09-29 2008-04-17 Canon Inc 露光装置
JP5196869B2 (ja) * 2007-05-15 2013-05-15 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
KR101010605B1 (ko) 2007-10-15 2011-01-24 재단법인 포항산업과학연구원 Ｕ형 벤딩 파이프의 자동 열처리장치
JP5398185B2 (ja) * 2008-07-09 2014-01-29 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法
JP2010135479A (ja) * 2008-12-03 2010-06-17 Canon Inc 走査型投影露光装置
JP5595001B2 (ja) * 2009-10-06 2014-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
JP6410406B2 (ja) 2012-11-16 2018-10-24 キヤノン株式会社 投影光学系、露光装置および物品の製造方法
DE102014218474A1 (de) * 2014-09-15 2016-03-17 Carl Zeiss Smt Gmbh Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren für die EUV-Mikrolithographie
JP2016161923A (ja) 2015-03-05 2016-09-05 キヤノン株式会社 露光装置及び物品の製造方法
US10025079B2 (en) * 2015-09-28 2018-07-17 Kenneth Carlisle Johnson Actinic, spot-scanning microscope for EUV mask inspection and metrology
JP6661371B2 (ja) * 2015-12-25 2020-03-11 キヤノン株式会社 評価方法、露光方法、および物品の製造方法
JP6748482B2 (ja) * 2016-05-25 2020-09-02 キヤノン株式会社 露光装置、および、物品の製造方法

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