JP2021031358A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2021031358A5 JP2021031358A5 JP2019156145A JP2019156145A JP2021031358A5 JP 2021031358 A5 JP2021031358 A5 JP 2021031358A5 JP 2019156145 A JP2019156145 A JP 2019156145A JP 2019156145 A JP2019156145 A JP 2019156145A JP 2021031358 A5 JP2021031358 A5 JP 2021031358A5
- Authority
- JP
- Japan
- Prior art keywords
- oxide film
- crystalline oxide
- laminated structure
- structure according
- raw material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 229910052593 corundum Inorganic materials 0.000 claims description 6
- 239000010431 corundum Substances 0.000 claims description 6
- 239000012535 impurity Substances 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 3
- 239000002994 raw material Substances 0.000 claims 4
- 238000004519 manufacturing process Methods 0.000 claims 3
- 239000003795 chemical substances by application Substances 0.000 claims 2
- 239000010419 fine particle Substances 0.000 claims 2
- 238000009499 grossing Methods 0.000 claims 2
- 150000001298 alcohols Chemical class 0.000 claims 1
- 239000012159 carrier gas Substances 0.000 claims 1
- 125000005594 diketone group Chemical group 0.000 claims 1
- 229910052594 sapphire Inorganic materials 0.000 claims 1
- 239000010980 sapphire Substances 0.000 claims 1
- 230000003746 surface roughness Effects 0.000 claims 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019156145A JP7045014B2 (ja) | 2019-08-28 | 2019-08-28 | 積層構造体の製造方法 |
| JP2022033298A JP7306640B2 (ja) | 2019-08-28 | 2022-03-04 | 結晶性酸化物膜 |
| JP2023100733A JP7610229B2 (ja) | 2019-08-28 | 2023-06-20 | 積層構造体、半導体装置及び積層構造体の製造方法 |
| JP2024150923A JP2025001669A (ja) | 2019-08-28 | 2024-09-02 | 積層構造体及び半導体装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019156145A JP7045014B2 (ja) | 2019-08-28 | 2019-08-28 | 積層構造体の製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022033298A Division JP7306640B2 (ja) | 2019-08-28 | 2022-03-04 | 結晶性酸化物膜 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2021031358A JP2021031358A (ja) | 2021-03-01 |
| JP2021031358A5 true JP2021031358A5 (enExample) | 2021-07-26 |
| JP7045014B2 JP7045014B2 (ja) | 2022-03-31 |
Family
ID=74675335
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019156145A Active JP7045014B2 (ja) | 2019-08-28 | 2019-08-28 | 積層構造体の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP7045014B2 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20240124974A1 (en) * | 2021-05-04 | 2024-04-18 | Shin-Etsu Chemical Co., Ltd. | Method of producing raw material solution, method of film-forming and production lot |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2933825B1 (en) | 2014-03-31 | 2017-07-05 | Flosfia Inc. | Crystalline multilayer structure and semiconductor device |
| US10109707B2 (en) | 2014-03-31 | 2018-10-23 | Flosfia Inc. | Crystalline multilayer oxide thin films structure in semiconductor device |
-
2019
- 2019-08-28 JP JP2019156145A patent/JP7045014B2/ja active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5575852B2 (ja) | グラフェンを含む導電性薄膜および透明導電膜 | |
| JP2015199649A5 (enExample) | ||
| CN105074868B (zh) | 复合基板、半导体装置及半导体装置的制法 | |
| JP2018507562A5 (enExample) | ||
| JP2018002544A5 (enExample) | ||
| TWI642086B (zh) | Substrate substrate and method for manufacturing composite substrate for semiconductor | |
| JP2014082500A5 (ja) | グリーンシートの製造方法およびグリーンシート | |
| JP2016175807A5 (enExample) | ||
| JP2012509581A5 (enExample) | ||
| JP2016098166A5 (enExample) | ||
| JP2018014372A5 (enExample) | ||
| JP6076486B2 (ja) | 半導体用複合基板のハンドル基板 | |
| JP2017071552A (ja) | ダイヤモンド基板及びダイヤモンド基板の製造方法 | |
| JPWO2016121642A1 (ja) | ＳｉＣ被覆炭素複合材 | |
| JP2014189422A5 (enExample) | ||
| JP2021031358A5 (enExample) | ||
| JP5404135B2 (ja) | 支持基板、貼り合わせ基板、支持基板の製造方法、及び貼り合わせ基板の製造方法 | |
| CN107835796B (zh) | 多孔质陶瓷结构体 | |
| JP2016058631A (ja) | グラフェン積層体の製造方法 | |
| Itoh et al. | Positron annihilation in porous silicon | |
| TW201634728A (zh) | 撥水性高硬度膜、鑄模及撥水性高硬度膜之製造方法 | |
| JP2020111495A5 (enExample) | ||
| CN106281257A (zh) | 一种具有石墨烯的热界面材料及其制备方法 | |
| CN107400923B (zh) | 一种增强金刚石热导率的方法 | |
| JP3848584B2 (ja) | カーボンナノチューブの製造方法 |